n‐type silicon solar cells with surface‐passivated screen‐printed aluminium‐alloyed rear emitter

Aluminium‐doped p‐type (Al‐p⁺) silicon emitters fabricated by means of a simple screen‐printing process are effectively passivated by plasma‐enhanced chemical‐vapour deposited amorphous silicon (a‐Si). We measure an emitter saturation current density of only 246 fA/cm², which is the lowest value achieved so far for a simple screen‐printed Al‐p⁺ emitter on silicon. In order to demonstrate the applicability of this easy‐to‐fabricate p⁺ emitter to high‐efficiency silicon solar cells, we implement our passivated p⁺ emitter into an n⁺np⁺ solar cell structure. An independently confirmed conversion efficiency of 19.7% is achieved using n‐type phosphorus‐doped Czochralski‐grown silicon as bulk material, clearly demonstrating the high‐efficiency potential of the newly developed a‐Si passivated Al‐p⁺ emitter. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Analysis of the current linearity at low illumination of high‐efficiency back‐junction back‐contact silicon solar cells

The relation between current and illumination intensity of three structures of high‐efficiency back‐junction back‐contact silicon solar cells was analyzed. Both, n‐type cells with non‐diffused front surface and p‐type cell with floating n‐emitter show a pronounced non‐linearity due to strong illumination dependence of the passivation quality of the non‐diffused surface and the floating junction respectively. Quantum efficiency (QE) of this cell type drops significantly for the illumination lower than 0.5 suns. In contrast the QE of n‐type cells with n⁺‐front surface field (FSF) is linear. Low illumination current characteristics of all three of the analyzed structures could be well described by physical models. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Defect removal after low temperature annealing of boron implantations by emitter etch‐back for silicon solar cells

Ion implantation offers new possibilities for silicon solar cell production, e.g. single side doping that can be structured in‐situ with shadow masks. While phosphorus implantations can easily be annealed at low temperature, the annealing of boron implantations is challenging. In this study, we use low energy implantations of boron (1 keV and 5 keV) with a projected range of 5.6 nm and 21.2 nm that form defects causing charge carrier recombination after a low temperature anneal (950 °C, 30 min). An ozone‐based wet chemical etching step is applied to remove this near surface damage. With increasing chemical etch‐back the electrical quality (i.e. emitter saturation current density, J_0e) improves continuously. The calculated limit for J_0e was reached with an abrasion of 35 nm for 1 keV and 85 nm for 5 keV implantations, showing that the relevant defects causing charge carrier recombination are located very close to the surface, corresponding to the as‐implanted profile depth. This emitter etch‐back allows for the fabrication of defect free boron doping profiles with good sheet resistance uniformity (standard deviation <2%). With the resulting characteristics (sheet resistance <100 Ω/sq, surface doping concentration >5 × 10¹⁹ cm^–3, J_0e < 30 fA/cm²), these boron profiles are well suited for silicon solar cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Electrical properties of p +/n + InGaAsP tunnel diodes with a bandgap of 0.95 eV grown by liquid phase epitaxy

p ⁺/n ⁺ InGaAsP tunnel diodes with a bandgap of 0.95 eV were fabricated by liquid phase epitaxy and their electrical properties were characterized. Forward conductances of 500 ^–1 cm^–2, peak current densities of 28.5 A/cm² and peak to valley current ratios of 14.3 were obtained at room temperature. These devices were incorporated successfully as Intercell Ohmic Connections (IOCs) for an InP-based, two-terminal monolithic multijunction tandem solar cell.     

Analysis (Simulation) of Ni-63 beta-voltaic cells based on silicon solar cells

Beta-voltaic cells based on standard silicon solar cells with bilateral coating with beta-radiation sources in the form of ⁶³Ni isotope have been studied experimentally and by numerical simulation. The optimal parameters of the cell, including its thickness, the doping level of the substrate, the depth of the p–n junction on its front side, and the p⁺ layer on the back side, as well as the activity of the source material, have been calculated. The limiting theoretical values of the open-circuit voltage (0.26 V), short-circuiting current (2.1 μA), the output power of the cell (0.39 μW), and the efficiency of the conversion of the radioactive energy onto the electric energy (4.8%) have been determined for a beta-source activity of 40 mCi. The results of numerical analysis have been compared with the experimental data.     

Calibrated numerical model of a GaInP–GaAs dual‐junction solar cell

In this letter a calibrated numerical model of a III–V dual‐junction solar cell including tunnel diode and Bragg reflector is presented. The quantum efficiencies of the subcells are computed by using the principle of current‐limitation in monolithic multi‐junction solar cells. A special procedure with bias‐illumination and bias‐voltage was implemented. Numerical simulations are used to study the influence of the top cell thickness on the cells' quantum efficiency and on the current‐matching condition. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

InGaAsP/InGaAs tandem cells for a solar cell configuration with more than three junctions

Currently, triple‐junction solar cells realized from III–V semiconductor compounds hold the solar energy conversion efficiency world record. To improve the efficiency significantly, it is necessary to increase the number of junctions and to involve a sub‐cell with an absorber layer in the band gap range of 1 eV. For the realization of a stacked four‐junction device with optimised band gaps, we have grown InGaAsP/InGaAs tandem cells lattice matched to InP substrates, and investigated properties of the absorber bulk material. Time‐resolved photoluminescence of the low band gap In_0.53Ga_0.47As absorber embedded between InP barriers was measured. The InGaAs/GaAsSb tunnel diode structure used in the tandem has been processed into a separate device and I –V curves were measured. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Comparison of D.C. and A.C. electro-analytical methods for measuring diode ideality factors and series resistances of silicon solar cells

The diode ideality factor (m) and the series resistance (R_s) of a Si solar cell represent two critical performance-indicator parameters of the device. Since both m and R_s are functions of voltage (V) and temperature (T), simultaneous electrical measurements of these parameters under variable conditions of V and T can often be difficult with traditional direct current (D.C.) techniques. Using the electro-analytical method of linear sweep voltammetry (LSV) and a commonly available Si solar cell, we explore these specific confines of such D.C. measurements. The results are compared with those obtained from a parallel set of alternating current (A.C.) measurements using impedance spectroscopy (IS). LSV provides the main D.C. parameters (open circuit voltage, short circuit current, fill factor, and efficiency) of the cell, but is limited in terms of independently measuring m and R_s beyond strong forward biased conditions. The IS approach is free of the latter experimental constraints, and at the same time can provide several other important electrical parameters of the solar cell. Specifically, IS detects the presence of a low-high (p–p⁺) junction at the back surface of the cell, and serves as an efficient probe of certain electrical characteristics of this junction.     

Effect of AlGaAs barrier layer on the characteristics of InGaP/InGaAs/Ge triple junction solar cells

As an effort to improve the conversion efficiency of InGaP/InGaAs/Ge triple junction solar cells, we investigated the effect of AlGaAs barrier layer on the cell performance under concentrated light condition. Three different solar cells having upper tunnel junctions (TJs) as n⁺⁺-GaAs/p⁺⁺-AlGaAs layers, n⁺⁺-GaAs/p⁺⁺-GaAs layers and n⁺⁺-GaAs/p⁺⁺-GaAs/p⁺⁺-AlGaAs layers were prepared. Under concentrated light condition, open-circuit voltage (V_OC), fill factor (FF) and conversion efficiencies were higher for the sample with an AlGaAs barrier layer than the samples without an AlGaAs barrier layer. For the sample with an AlGaAs barrier layer, external quantum efficiency was higher than other two samples. Most of all, the sample with a TJ as n⁺⁺-GaAs/p⁺⁺-GaAs layers showed a very poor electrical performance, which was associated with an imperfect crystalline quality of the InGaP top cell layers.     

Microwave photoconductivity relaxation time in a bifacial silicon solar cell base in the vicinity of a p-n junction

Microwave photoconductivity relaxation time depending on light intensity is studied in n ⁺-p-p ⁺ silicon solar cells. The results from experiments performed under conditions of open-circuit and short-circuit currents are in agreement with the simulated data. The relaxation times of microwave photoconductivity are found for a part of the base region adjacent to the n ⁺-p junction.     

Electrical properties of p +/n + In0.53Ga0.47As tunnel diodes grown by liquid phase epitaxy

p ⁺/n ⁺ In_0.53Ga_0.47As tunnel diodes were prepared by liquid phase epitaxy and their electrical properties were characterized. These devices exhibit large forward conductances (2.59×10^{3 –1} cm^–2), high peak current densities (793 A/cm²) and large peak to valley current ratios (16.2). These devices offer great promise as intercell ohmic contacts (IOCs) for InP-based, onolithic multijunction solar cells.     

Direct detection of carrier traps in Si solar cells after light‐induced degradation

In solar cells fabricated from boron‐doped Cz‐Si wafers minority and majority carrier traps were detected by deep level transient spectroscopy (DLTS) after so‐called “light‐induced degradation” (LID). The DLTS signals were detected from mesa‐diodes with the full structure of the solar cells preserved. Preliminary results indicate metastable traps with energy levels positioned at E_V + 0.37 eV and E_C – 0.41 eV and apparent carrier capture cross‐sections in the 10^–17–10^–18 cm² range. The concentration of the traps was in the range of 10¹²–10¹³ cm^–3. The traps were eliminated by annealing of the mesa‐diodes at 200 °C. No traps were detected in Ga‐doped solar cells after the LID procedure or below the light protected bus bar locations in B‐doped cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Computer studies on the space charge dependence of avalanche zone width and conversion efficiency,of single driftp +nn+ andn +pp+ indium phosphide impatts

The effect of mobile space charge on avalanche zone width and conversion efficiency of single drift region (SDR) indium phosphide impatts at 12 and 60 GHz has been investigated. The results show thatp ⁺nn⁺ InP diodes have a narrower avalanche zone and a higher conversion efficiency compared ton ⁺pp⁺ diodes for both the frequencies at normal operating current densities. The expansion of avalanche zone and efficiency degradation at high current levels are more pronounced inp ⁺nn⁺ at 12 GHz and inn ⁺pp⁺ at 60 GHz.     

Investigation of three-terminal voltage-controlled switching devices prepared by molecular beam epitaxy

Three-terminal GaAs switching devices prepared by molecular beam epitaxy using p ⁺-n ^–-(p ⁺)-n ^–-n ⁺ structures are fabricated. The effects of the third-electrode position and the possible voltage-controlled operation on the device performance are discussed. Concepts are proposed to obtain new and improved voltage-controlled properties. The internal barrier of one proposed structure can be modulated directly and is found to be effective for the studied structures. The position of the third-electrode is found to affect the electrical properties profoundly due to different dominant mechanisms. Comparisions are made by defining a control efficiency. Due to the idea of varying the gate position, a conceptual understanding of such a set of results would enhance our understanding of the physics of bulk barrier devices in general.     

Contact passivation in silicon solar cells using atomic‐layer‐deposited aluminum oxide layers

Atomic‐layer‐deposited aluminum oxide (AlO_x) layers are implemented between the phosphorous‐diffused n⁺‐emitter and the Al contact of passivated emitter and rear silicon solar cells. The increase in open‐circuit voltage V_oc of 12 mV for solar cells with the Al/AlO_x/n⁺‐Si tunnel contact compared to contacts without AlO_x layer indicates contact passivation by the implemented AlO_x. For the optimal AlO_x layer thickness of 0.24 nm we achieve an independently confirmed energy conversion efficiency of 21.7% and a V_oc of 673 mV. For AlO_x thicknesses larger than 0.24 nm the tunnel probability decreases, resulting in a larger series resistance. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of P<Superscript>+</Superscript>-ZnTe back surface contact on photovoltaic performance of ZnTe based solar cells

In order to improve photovoltaic performance of solar cells based on ZnTe thin films two device structures have been proposed and its photovoltaic parameters have been numerically simulated using Solar Cell Capacitance Simulator software. The first one is the ZnO/CdS/ZnTe conventional structure and the second one is the ZnO/CdS/ZnTe/P⁺-ZnTe structure with a P⁺-ZnTe layer inserted at the back surface of ZnTe active layer to produce a back surface field effect which could reduce back carrier recombination and thus increase the photovoltaic conversion efficiency of cells. The effect of ZnO, CdS and ZnTe layer thicknesses and the P⁺-ZnTe added layer and its thickness have been optimized for producing maximum working parameters such as: open-circuit voltage V_oc, short-circuit current density J_sc, fill factor FF, photovoltaic conversion efficiency η. The solar cell with ZnTe/P⁺-ZnTe junction showed remarkably higher conversion efficiency over the conventional solar cell based on ZnTe layer and the conversion efficiency of the ZnO/CdS/ZnTe/P⁺-ZnTe solar cell was found to be dependent on ZnTe and P⁺-ZnTe layer thicknesses. The optimization of ZnTe, CdS and ZnTe layers and the inserting of P⁺-ZnTe back surface layer results in an enhancement of the energy conversion efficiency since its maximum has increased from 10% for ZnO, CdS and ZnTe layer thicknesses of 0.05, 0.08 and 2 µm, respectively to 13.37% when ZnO, CdS, ZnTe and P⁺-ZnTe layer thicknesses are closed to 0.03, 0.03, 0.5 and 0.1 µm, respectively. Furthermore, the highest calculated output parameters have been J_sc?=?9.35 mA/cm², V_oc?=?1.81 V, η?=?13.37% and FF?=?79.05% achieved with ZnO, CdS, ZnTe, and P⁺-ZnTe layer thicknesses about 0.03, 0.03, 0.5 and 0.1 µm, respectively. Finally, the spectral response in the long-wavelength region for ZnO/CdS/ZnTe solar cells has decreased at the increase of back surface recombination velocity. However, it has exhibited a red shift and showed no dependence of back surface recombination velocity for ZnO/CdS/ZnTe/P?+?-ZnTe solar cells.     

Influence of charge carrier mobility on the performance of organic solar cells

The power conversion efficiency of organic solar cells based on donor–acceptor blends is governed by an interplay of polaron pair dissociation and bimolecular polaron recombination. Both processes are strongly dependent on the charge carrier mobility, the dissociation increasing with faster charge transport, with raised recombination losses at the same time. Using a macroscopic effective medium simulation, we calculate the optimum charge carrier mobility for the highest power conversion efficiency, for the first time accounting for injection barriers and a reduced Langevin‐type recombination. An enhancement of the charge carrier mobility from 10^–8 m²/V s for state of the art polymer–fullerene solar cells to about 10^–6 m²/V s, which yields the maximum efficiency, corresponds to an improvement of only about 20% for the given parameter set. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optimized emitter contacting on multicrystalline silicon thin film solar cells

We present an optimized contacting scheme for multicrystalline silicon thin film solar cells on glass based on epitaxially crystallized emitters with a thin Al₂O₃ layer and a silver back reflector. In a first step a 6.5 µm thick amorphous silicon absorber layer is crystallized by a diode laser. In a second step a thin silicon emitter layer is epitaxially crystallized by an excimer laser. The emitter is covered by an Al₂O₃ layer with a thickness ranging from 1.0 nm to 2.5 nm, which passivates the surface and acts as a tunnel barrier. On top of the Al₂O₃ layer a 90–100 nm thick silver back reflector is deposited. The Al₂O₃ layer was found to have an optimal thickness of 1.5 nm resulting in solar cells with back reflector that achieve a maximum open‐circuit voltage of 567 mV, a short‐circuit current density of 27.9 mA/cm², and an efficiency of 10.9%. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Doped SiO x emitter layer in amorphous/crystalline silicon heterojunction solar cell

In this work we propose to replace the emitter layer of the n-type doped a-Si:H/p-type doped crystalline silicon heterojunction solar cell, with an n-type doped SiO _x amorphous oxide layer. The n-type doped SiO _x :H shows a lower activation energy and higher carrier mobility value with respect to the n-type doped a-Si:H. Moreover, higher transmission, below 500 nm of wavelength, and higher conductivity are measured. The relevance of transparency of the (n) a-SiO _x :H has been studied using that film in solar cells. The electrical parameters revealed a solar cell efficiency of 15.8 %. Moreover, the effect of TCO as a front side cell electrode is considered and discussed on the base of its workfunction when applied on top of the n-type doped SiO _x emitter layer using also numerical simulations.     

Investigation of fill factor losses on 20.2% efficient n‐type mono‐like silicon solar cells with laser contact opening

Large area (243.36 cm²) back‐junction passivated emitter, rear totally diffused (PERT) solar cells with laser contact opening (LCO) on n‐type mono‐like crystalline Si with efficiencies of 20.2% are presented. Boron emitters with high electrical quality (implied open circuit voltage iV_OC up to 700 mV) are formed during a co‐diffusion step using SiO_x:B layers. Increasing the rear metal contact coverage, we observed a decrease in fill factor (FF) instead of the expected increase due to the decrease of the back side series resistance. We show that it can be attributed to recombination centers (RCs) in the space charge region underneath the contact spots inducing an increasing second diode contribution. The presented empirical model for the RCs implemented in Synopsys Sentaurus TCAD allows for a successful reproduction of the FF, pseudo FF and V_OC behaviour with contact coverage. According to this model, the RCs induced by laser ablation and subsequently evaporation of Al have a shallow exponential distribution with a characteristic length of L_T = 0.2 µm and an effective surface density of N *_T0 = 25 cm^–1. (© 2016 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)