Simulation of island aggregation influenced by substrate temperature, incidence kinetic energy and intensity in pulsed laser deposition

Using kinetic Monte Carlo method, we have simulated a pulsed energetic growth process in pulsed laser deposition. During the growth of film, substrate temperature mainly influences upon film morphology by directly enhancing the adatom mobility through the temperature-dependent thermal vibration. By contrast, the effect of incidence kinetic energy on film growth is complex resulting from the collisions between the incident particles and the adatoms. The results show that improving incident kinetic energy cannot significantly accelerate the migration rate of adatom but change surface microstructure and promote single adatom formation resulting in more island aggregation density. Moreover, since pulse-influx characterizes pulsed laser deposition, the intensity per pulse contributes to the evolvement of nucleation density and the results illustrate that a general scaling law different from ordinary power law still exists in energetic growth of pulsed laser deposition.     

Non-monotonous dependence of surface roughness on factors influencing energy of adatoms during thin island film growth

Many experimental results show that surface roughness of thin films can increase, decrease, stay constant or pass through the minimum with the change in substrate temperature, energy of arriving atoms or assisted beam (electrons, photons, ions), depending on material and interval of variation of those parameters. The aim of this paper is to explain and analyze this non-monotonous behavior of surface roughness by proposed kinetic model. The model is based on rate equations and includes processes of surface diffusion of adatoms, nucleation, growth and coalescence of islands in the case of thin films growth in Volmer-Weber mode. It is shown by modeling that non-monotonous dependence of surface roughness on the factors influencing energy of adatoms (e.g. temperature, assisted beam irradiation, accelerating voltage) occurs as a result of interplay between diffusion length of adatoms and size of islands, because both parameters depend on energy of adatoms. Variation of island size and diffusion length results in atomic jumps from islands forming rougher or smoother surface. The functions of surface roughness, island size, island density on diffusion length of adatoms and on other parameters are calculated and analyzed in this work.     

Atomic-level investigation of Al and Ni thin film growth on Ni(1 1 1) surface: Molecular dynamics simulation

Using molecular dynamics (MD) simulation, the structural characteristics of Al and Ni thin film growth on Ni(1 1 1) substrate according to the incident energy of adatoms were investigated. In case of Al on Ni(1 1 1), Al adatoms were grown basically through the layer-by-layer growth mode. On the other hand, Ni thin films on Ni(1 1 1) surface at low incident energy were shown to favor island growth. The steering effect due to atomic attraction, which results in rougher surface, was significantly observed at low incident energy. The growth mode of Ni film was, however, changed to follow layer-by-layer growth mode for the incident energy of 6 eV. The different aspects of surface morphology between Al and Ni deposition on Ni(1 1 1) surface could be successfully explained by the surface diffusion and impact cascade diffusion.     

A kinetic Monte Carlo investigation of island nucleation and growth in thin-film epitaxy in the presence of substrate-mediated interactions

Island nucleation and growth during thin-film epitaxy is typically described using mean-field rate equations, which can be solved to predict the density of stable islands as a function of the deposition rate and the diffusivity of an isolated adatom. Recent theoretical and experimental studies indicate that medium- and long-range interactions between adatoms may change the simple picture that nucleation theory provides, because the presence of these interactions invalidates some of its assumptions. In this work, we investigate the ramifications of medium-range, substrate-mediated interactions for aspects of island nucleation and growth. The interactions are quantified for Ag on a strained Ag (111) substrate using density-functional-theory calculations. We discuss our incorporation of these interactions into a kinetic Monte Carlo model to study thin-film epitaxy. The simulated thin-film growth is compared to predictions by standard nucleation theory. We discuss features of island nucleation and growth that are actuated by the presence of medium-range interactions. Received: 30 April 2001 / Accepted: 23 July 2001 / Published online: 3 April 2002     

First-principles studies of kinetics in epitaxial growth of III–V semiconductors

We demonstrate how first-principles calculations using density-functional theory (DFT) can be applied to gain insight into the molecular processes that rule the physics of materials processing. Specifically, we study the molecular beam epitaxy (MBE) of arsenic compound semiconductors. For homoepitaxy of GaAs on GaAs (001), a growth model is presented that builds on results of DFT calculations for molecular processes on the β2-reconstructed GaAs (001) surface, including adsorption, desorption, surface diffusion, and nucleation. Kinetic Monte Carlo simulations on the basis of the calculated energetics enable us to model MBE growth of GaAs from beams of Ga and As₂ in atomistic detail. The simulations show that island nucleation is controlled by the reaction of As₂ molecules with Ga adatoms on the surface. The analysis reveals that the scaling laws of standard nucleation theory for the island density as a function of growth temperature are not applicable to GaAs epitaxy. We also discuss heteroepitaxy of InAs on GaAs (001), and report first-principles DFT calculations for In diffusion on the strained GaAs substrate. In particular, we address the effect of heteroepitaxial strain on the growth kinetics of coherently strained InAs islands. The strain field around an island is found to cause a slowing down of material transport from the substrate towards the island, and thus helps to achieve more homogeneous island sizes. Received: 2 May 2001 / Accepted: 23 July 2001 / Published online: 3 April 2002     

Simulation study on nanocluster growth deposited on a substrate

We present a model equation that describes nucleation and growth of hemispherical nanoclusters or islands deposited on a substrate for the small surface coverage case. The model is formulated in terms of a set of rate equations for the island sizes, combined with the time-dependent behavior of supersaturation and island nucleation rate. As an example to demonstrate the usefulness of the model, we study effects of the deposition rate of adatoms on the nanocluster growth. Large-scale computer simulation results show that the broadness of island size distribution is a decreasing function of the deposition rate for small rates, and bimodal distributions are obtained for large rates.     

Nanowedge island formation on Mo(1 1 0)

The deposition of ultrathin Fe films on the Mo(1 1 0) surface at elevated temperatures results in the formation of distinctive nanowedge islands. The model of island formation presented in this work is based on both experiment and DFT calculations of Fe adatom hopping barriers. Also, a number of classical molecular dynamics simulations were carried out to illustrate fragments of the model. The islands are formed during a transition from a nanostripe morphology at around 2 ML coverage through a Bales-Zangwill type instability. Islands nucleate when the meandering step fronts are sufficiently roughened to produce a substantial overlap between adjacent steps. The islands propagate along the substrate [0 0 1] direction due to anisotropic diffusion/capture processes along the island edges. It was found that the substrate steps limit adatom diffusion and provide heterogeneous nucleation sites, resulting in a higher density of islands on a vicinal surface. As the islands can be several layers thick at their thinnest end, we propose that adatoms entering the islands undertake a so-called “vertical climb” along the sides of the island. This is facilitated by the presence of mismatch-induced dislocations that thread to the sides of the islands and produce local maxima of compressive strain. Dislocation lines also trigger initial nucleation on the surface with 2-3 ML Fe coverage. The sides of the nanowedge islands typically form along low-index crystallographic directions but can also form along dislocation lines or the substrate miscut direction.     

STUDY OF THE MECHANISM OF GaAs(001) MOLECULAR-BEAM EPITAXY

In this paper the nucleation and growth processes of GaAs(001) molecular-beam epitaxy were studied by Monte Carlo simulation, The density of islands and the density of isolated Ga adatoms were obtained for different growth temperatures, and the island size distribution at low coverage, as well as the correlation function between atoms and its relation with the temperature were studied in detail.     

Unified phase-field model for epitaxial growth of multi-scale three-dimensional islands on insulating surfaces

In this paper we present a unified phase-field model for non-equilibrium growths of various three-dimensional metal islands on insulating surfaces. We introduce a phase-field variable to distinguish the island from the non-island regions and substrate and a density variable to describe local density of deposited adatoms. Two partial differential equations with appropriate boundary conditions, as the governing equations, are used to describe the evolution of the three-dimensional metal islands and the diffusion of adatoms. We solve the equations by using an adaptive mesh refinement method so that we can simulate the non-equilibrium growth of three-dimensional metal islands from tens of nanometers to several micrometers. We investigate the dependence of simulated results on the model parameters and experimental conditions. Equilibrium shape of such islands can be obtained through sufficient post-deposition relaxation. Experimental trends of island size and shape on various scales are obtained with reasonable parameters. This method should be a good approach to non-equilibrium growths of multi-scale three-dimensional metal islands.     

Substrate-step-induced effects on the growth of CaF2 on Si (111)

The growth of CaF₂ on vicinal Si (111) surfaces was studied by scanning tunneling microscopy (STM) and atomic force microscopy (AFM) for the temperature range from 300 to 750 °C. In the submonolayer range a transition from terrace to step nucleation is observed for increasing temperature. The first monolayer grows in the step-flow growth mode since second layer islands are not nucleated before completion of the wetting layer. For the subsequent growth of CaF₂ on the CaF interface layer, substrate-induced steps do not act as preferential nucleation sites, but rather as growth barriers. Thus CaF₂ films grow very inhomogeneously at high temperatures. At lower deposition temperatures, the film homogeneity increases due to the increased (homogeneous) nucleation rate on terraces. The lattice mismatch leads to (lateral) relaxation of thicker CaF₂ film close to substrate steps. In addition, CaF₂ self-decoration effects are caused by the relaxed regions close to the film steps at temperatures above 500 °C. Received: 7 August 2001 / Accepted: 23 October 2001 / Published online: 3 April 2002     

沉积粒子能量对薄膜早期生长过程的影响

利用Monte Carlo(MC)模型研究了能量粒子对薄膜生长的初始阶段岛膜的形貌和岛的尺寸的影响,沉积粒子的能量范围为:0—0.7eV.在模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,并详细考虑了临近和次临近原子的影响.结果表明,在所采用的参量范围内不同的基底温度情况下,能量粒子的影响有很大的区别.低基底温度情况下,沉积粒子强烈地影响着薄膜的生长过程中,岛膜的形貌、数量和尺寸随能量粒子的能量增加而有很大的变化.分析表明,这些变化都是由于能量粒子的介入使得表面吸附粒子的扩散能力增强所致 关键词： 薄膜生长 Monte Carlo方法 扩散     

Nucleation and growth mechanisms of Fe on Au(111) in the sub-monolayer regime

The growth of Fe on Au(111) at 300 K in the sub-monolayer regime has been investigated using scanning tunneling microscopy, focusing on the mechanisms of nucleation, coalescence and interlayer diffusion. Below a coverage of 0.1 ML, Fe growth proceeds in a well-ordered fashion producing regular arrays of islands, while approaching the island coalescence threshold (above 0.35–0.4 ML), we observed a consistent increasing of random island nucleation. These observations have been interpreted through rate equation models for the island densities in the presence of preferred nucleation sites. The evolution of the second layer fraction has also been interpreted in a rate equation scheme. Our results show that the ordered to random growth transition can be explained by including in the model bond breaking mechanisms due to finite Fe–Fe bond energy. A moderate interlayer diffusion has been inferred from data analysis between the second and the first layer, which has been used to estimate the energy barrier of the adatoms descending process.     

Size distribution and optical properties of self-assembled Ge on Si

The distribution of Ge islands is analysed in order to understand their optical behaviour. The Ge islands described in this paper were deposited by low-pressure chemical vapour deposition at relatively high temperature (700 °C), therefore the diffusion length of adatoms is high (∼100 μm) and thus, not the limiting factor for nucleation. By changing the deposition time and the coverage, square-based pyramids, domes and relaxed domes are nucleated. Mainly domes emit light, the emission being in the wavelength range 1.38–1.55 μm. When pyramids or relaxed domes are present, the photoluminescence broadens and decreases in intensity. The electroluminescence of vertically correlated islands increases with the number of layers, i.e. with the number of islands. The nucleation of islands on patterned (001) Si is changed when the deposition is performed on Si mesas with high index facets. The size distribution becomes narrower when the mesa size is decreased. An intermixing of up to 40% Si in the 2D layer was determined from photoluminescence data. PIN diodes fabricated on patterned wafers show an area-dependent electroluminecence related to a different microstructure of islands on large and small mesas. Finally, the lateral ordering on {hkl} facets is discussed. Received: 14 April 2000 / Accepted: 17 April 2000 / Published online: 6 September 2000     

薄膜生长中的表面动力学(Ⅱ)

本文较全面地从理论上研究了薄膜生长过程中原子在表面上的各种动力学表现，涉及的内容包括亚单层生长时，原子在表面上的扩散，粘接，成核，以及已经形成的原子岛之间的相互作用，兼并，失稳，退化等一系列过程。在第一部分(即0—6章，刊登在《物理学进展》23卷1期上)介绍了薄膜生长动力学的基础之后，从第7章开始我们侧重研究一个在向同性和各向异性表面都普遍成立的原子岛尺寸大小及密度分布的标度定律；建立了一套研究在各向同性和各向异性表面上二维原子岛退化过程的广义动力学标度理论。基于对层间质量扩散通道的研究，本文提出了两种不同的原子下跃机制，既任意跃迁机制和选择跃迁机制，并做了进一步的实验验证。利用这一新的层间质量扩散机制，我们成功地解释了实验上观测到的三维原子岛的退化规律。更加有趣的是，本文讨论了应力对岛的形状和各种动力学规律的影响。在最后我们还提出了一个利用凝聚能转化来控制二维原子岛生长的方法，其目的是希望能够找到一种人为有效地在表面上制备低维量子结构的方法。     

薄膜生长中的表面动力学(Ⅱ)

本文较全面地从理论上研究了薄膜生长过程中原子在表面上的各种动力学表现 ,涉及的内容包括亚单层生长时 ,原子在表面上的扩散 ,粘接 ,成核 ,以及已经形成的原子岛之间的相互作用 ,兼并 ,失稳 ,退化等一系列过程。在第一部分 (即 0～ 6章 ,刊登在《物理学进展》2 3卷 1期上 )介绍了薄膜生长动力学的基础之后 ,从第 7章开始我们侧重研究一个在向同性和各向异性表面都普遍成立的原子岛尺寸大小及密度分布的标度定律 ;建立了一套研究在各向同性和各向异性表面上二维原子岛退化过程的广义动力学标度理论。基于对层间质量扩散通道的研究 ,本文提出了两种不同的原子下跃机制 ,既任意跃迁机制和选择跃迁机制 ,并做了进一步的实验验证。利用这一新的层间质量扩散机制 ,我们成功地解释了实验上观测到的三维原子岛的退化规律。更加有趣的是 ,本文讨论了应力对岛的形状和各种动力学规律的影响。在最后我们还提出了一个利用凝聚能转化来控制二维原子岛生长的方法 ,其目的是希望能够找到一种人为有效地在表面上制备低维量子结构的方法。     

Sensor studies of the initial stages of the cadmium telluride film formation through vapor deposition

The results of sensor and electron-microscopic studies of the initial stages of cadmium telluride film formation through vapor deposition on a substrate at room temperature and on a substrate cooled by liquid nitrogen (highly nonequilibrium conditions) are reported. A piezoelectric quartz resonator is used as a sensor. The kinetic curves of the sensor analytical signal and photomicrographs are presented. A jumplike character of the nucleation process and a quasi-periodical growth mechanism for island films are disclosed. A sequence of new-phase island ensembles is formed in an analogous way. These islands increase the substrate surface coverage in a quasi-discrete manner. The experimental results are shown to agree with current theory of the first-order phase transitions and models of layer formation in highly nonequilibrium conditions.     

Lead growth on Si(111) surfaces reconstructed by indium

We study the Pb growth on both √3 × √3-In and 4 × 1-In reconstructed Si(111) surfaces at room and low temperature (160 K). The study takes place with complementary techniques, to investigate the role of the substrate reconstruction and temperature in determining the growth mode of Pb. Specifically, we focus on the correlation between the growth morphology and the electronic structure of the Pb films. The information is obtained by using Auger electron spectroscopy, low energy electron diffraction, soft x-ray photoelectron spectroscopy, scanning tunneling microscopy and spot profile analysis-low energy electron diffraction. The results show that, at low temperature and coverage ≤12 ML on the Si(111)√3 × √3-In surface, Pb does not alter the initial semiconducting character of the substrate and three-dimensional Pb islands with poor crystallinity are grown on a wetting layer. On the other hand, for the same coverage range, Pb growth on the Si(111)4 × 1-In surface results in metallic Pb(111) crystalline islands after the completion of a double incomplete wetting layer. In addition, the bond arrangement of the adatoms is studied, confirming that In adatoms interact more strongly with the silicon substrate than the Pb ones. This promotes a stronger Pb-Pb interaction and enhances metallization. The onset of the metallization is correlated with the amount of pre-deposited In on the Si(111) surface. The decoupling of the Pb film from the 4 × 1-In interface can also explain the unusual thermal stability of the uniform height islands observed on this interface. The formation of these Pb islands is driven by quantum size effects. Finally, the different results of Pb growth on the two reconstructed surfaces confirm the importance of the interface, and also that the growth morphology, as well as the electronic structure of the Pb film can be tuned with the initial substrate reconstruction.     

Self-assembled InAs island formation on GaAs (1 1 0) by metalorganic vapor phase epitaxy

Formation of self-assembled InAs 3D islands on GaAs (1 1 0) substrate by metal organic vapor phase epitaxy has been investigated. Relatively uniform InAs islands with an average areal density of 10⁹ cm⁻²are formed at 400 ° C using a thin InGaAs strain reducing (SR) layer. No island formation is observed without the SR layer. Island growth on GaAs (1 1 0) is found to require a significantly lower growth temperature compared to the more conventional growth on GaAs (1 0 0) substrates. In addition, the island height is observed to depend only weakly on the growth temperature and to be almost independent of the V/III ratio and growth rate. Low-temperature photoluminescence at 1.22 eV is obtained from the overgrown islands.     

Scaling regimes for second layer nucleation

Nucleation on top of two-dimensional islands with step edge barriers is investigated using scaling arguments. The nucleation rate is expressed in terms of three basic time scales: the time interval between deposition events, the residence time of atoms on the island, and the encounter time required for atoms forming a stable nucleus to meet. Application to the problem of second layer nucleation on growing first layer islands yields a sequence of scaling regimes with different scaling exponents relating the critical island size, at which nucleation takes place, to the diffusion and deposition rates. Second layer nucleation is fluctuation-dominated, in the sense that the typical number of atoms on the island is small compared to , when the first layer island density exponent satisfies . The upper critical nucleus size, above which the conventional mean field theory of second layer nucleation is valid, increases with decreasing dimensionality. In the related case of nucleation on top of multilayer mounds fluctuation-dominated and mean field like regimes coexist for arbitrary values of the critical nucleus size . Received 4 September 2000     

Virtual-surfactant-induced wetting in strained-layer heteroepitaxy

We show that surface stoichiometry and growth mode are intimately related for heteroepitaxy of InAs on GaO_0.47In_0.53As. Under As-stable conditions during molecular beam epitaxy, the high strain of the InAs film induces a morphological phase-transition from layer-by-layer to island nucleation. In contrast, under In-stable conditions without direct As₄ flux, islanding is inhibited. The In-stabilized surface imposes limitations to the migration of both As and In adatoms and forces layer-by-layer nucleation, thus acting as a virtual surfactant.