Resonant Raman scattering by strained and relaxed germanium quantum dots

This paper reports on the results of resonant Raman scattering investigations of the fundamental vibrations in Ge/Si structures with strained and relaxed germanium quantum dots. Self-assembled strained Ge/Si quantum dots are grown by molecular-beam epitaxy on Si(001) substrates. An ultrathin SiO₂ layer is grown prior to the deposition of a germanium layer with the aim of forming relaxed germanium quantum dots. The use of resonant Raman scattering (selective with respect to quantum dot size) made it possible to assign unambiguously the line observed in the vicinity of 300 cm^?1 to optical phonons confined in relaxed germanium quantum dots. The influence of confinement effects and mechanical stresses on the vibrational spectra of the structures with germanium quantum dots is analyzed.     

The role of interdiffusion and spatial confinement in the formation of resonant raman spectra of Ge/Si(100) heterostructures with quantum-dot arrays

The phonon modes of self-assembled Ge/Si quantum dots grown by molecular-beam epitaxy in an apparatus integrated with a chamber of the scanning tunneling microscope into a single high-vacuum system are investigated using Raman spectroscopy. It is revealed that the Ge-Ge and Si-Ge vibrational modes are considerably enhanced upon excitation of excitons between the valence band Λ₃ and the conduction band Λ₁ (the E ₁ and E ₁ + Δ₁ transitions). This makes it possible to observe the Raman spectrum of very small amounts of germanium, such as one layer of quantum dots with a germanium layer thickness of ≈10 Å. The enhancement of these modes suggests a strong electron-phonon interaction of the vibrational modes with the E ₁ and E ₁ + Δ₁ excitons in the quantum dot. It is demonstrated that the frequency of the Ge-Ge mode decreases by 10 cm^?1 with a decrease in the thickness of the Ge layer from 10 to 6 Å due to the spatial-confinement effect. The optimum thickness of the Ge layer for which the size dispersion of quantum dots is minimum is determined.     

Hall effect in hopping conduction in an ensemble of quantum dots

The Hall effect in heterostructures with a two-dimensional array of tunneling-coupled Ge quantum dots grown by molecular-beam epitaxy on Si is investigated. The conductivity of these structures in zero magnetic field at 4.2 K varies in the range of 10^?12?10^?4 Ω^?1, which includes both the diffusive transport under weak localization conditions and hopping conduction. It is shown that the Hall effect can be discerned against the magnetoresistance-related background in both high- and low-conductivity structures. The Hall coefficient in the hopping regime exhibits a nonmonotonic dependence on the occupancy of quantum dots by holes. This behavior correlates with that of the localization length of the hole wavefunctions.     

Intraband photoresponse of SiGe quantum dot/quantum well multilayers

In this contribution we study the intravalence band photoexcitation of holes from self-assembled Ge quantum dots (QDs) in Si followed by spatial carrier transfer into SiGe quantum well (QW) channels located close to the Ge dot layers. The structures show maximum response in the important wavelength range 3–5 μm. The influence of the SiGe hole channel on photo- and dark current is studied depending on temperature and the spatial separation of QWs and dot layers. Introduction of the SiGe channel in the active region of the structure increases the photoresponsivity by up to about two orders of magnitude to values of 90 mA/W at T=20 K. The highest response values are obtained for structures with small layer separation (10 nm) that enable efficient transfer of photoexcited holes from QD to QW layers. The results indicate that Si/Ge QD structures with lateral photodetection promise very sensitive large area mid-infrared photodetectors with integrated readout microelectronics in Si technology.     

溅射沉积自诱导混晶界面与Ge量子点的生长研究

在不同的沉积温度下采用离子束溅射技术,在Si基底上生长得到分布密度高、尺寸单模分布的圆顶形Ge量子点.研究发现:随沉积温度的升高Ge量子点的分布密度增大,尺寸减小,当沉积温度升高到750 ℃时,溅射沉积15个单原子层厚的Ge原子层,生长得到高度和底宽分别为14.5和52.7 nm的Ge量子点,其分布密度高达1.68×10¹⁰ cm^-2;Ge量子点的形貌、尺寸和分布密度随沉积温度的演变规律与热平衡状态下气相凝聚的量子点不同,具有稳定形状特征和尺寸分布的Ge量子点是 关键词： Ge量子点 离子束溅射沉积 表面原子行为 混晶界面     

Diagnostics of height distribution of InAs/GaAs quantum dot arrays by means of carbon tetrachloride treatment in vapor phase epitaxy conditions

A technique for determination of InAs quantum dots bimodal distribution has been developed. This technique is based on vapor-chemical etching of quantum dot arrays coated with thin GaAs layers and on combined investigation of the morphology and photoluminescence spectra of etched quantum-size structures. It has been shown that, in some growth modes of quantum-size heterostructures by metal-organic vapor phase epitaxy, bimodal arrays of large and small quantum dots are formed. The surface concentration of large and small dots has been established to be about 2 × 10⁹ and 3 × 10¹⁰ cm⁻², respectively.     

Spontaneous formation of a system of highly ordered germanium nanoislands upon epitaxial deposition on profiled (111) silicon substrates under electromigration conditions

Atomic-force microscopy was used to study the surface topography of SiGe structures grown by epitaxial deposition of Ge on profiled Si(111) substrates under electromigration conditions. Systems of highly ordered germanium nanosized islands with dimensions of 10–20 nm and a density of 6×10¹⁰ cm^?2 were obtained. It is shown that the geometrical parameters of self-organizing nanoislands can be controlled by a proper choice of the growth and postgrowth annealing conditions for these structures.     

Narrow bandgap mid-infrared photodetectors based on InAsSbP quantum dots

The results of investigations of mid-infrared photodetectors based on InAsSbP quantum dot (QD) grown on InAs(100) substrate by modified liquid phase epitaxy are presented. The atomic force microscope measurements have shown that the surface density of grown QDs is (4–8) × 10⁹ cm^?2. Also, the morphology and crystalline quality of grown QDs are investigated by a scanning tunneling microscope. Photodetectors based on n-InAs(100) substrate with InAsSbP QDs on its surface were fabricated in the form of a photoconductor cell. The photoresponse spectrum extended up to 4 μm was observed. The optical properties of fabricated structures were investigated under He–Ne laser irradiation with wavelength of 1.15 μm. It was found that the relative surface conductance increases by 16% at power density of 0.15 W/cm². Capacitance hysteresis with maximal remnant capacitance of 2.17 nF at 10³ Hz was observed as well.     

Formation of zero-dimensional hole states during molecular-beam epitaxy of Ge on Si (100)

The characteristic features of electronic spectra in Ge/Si (100) heterostructures obtained by molecular-beam epitaxy are investigated by capacitance spectroscopy. It is observed that the self-organization of a Ge film into an island film when the effective germanium thickness exceeds six monolayers is accompanied by the appearance of hole bound states, which can be attributed to size quantization and the Coulomb interaction of carriers in the array of Ge quantum dots. Pis’ma Zh. éksp. Teor. Fiz. 68, No. 2, 125–130 (25 July 1998)     

n doping effect modeling in 1.3 μm GaN0.58yAs1−1.58yBiy/GaAs quantum wells

The effect of n doping on the band structure of lattice-matched GaNAsBi/GaAs quantum wells was investigated using a self-consistent calculation combined with the 16-band anti-crossing model. Bi/N incorporation and doping effects can offer a huge potential to engineer the electronic band structure of such materials suitable for the design of photodetectors and emitters operating at 1.3 µm. The increase of the doping density induces a blue-shift of the fundamental transition energy in the doping range between 6×10¹⁷ and 5×10¹⁸ cm⁻³. The absorption spectra dependence on the well width are discussed. To maintain the fundamental transition fixed at the wavelength 1.3 µm, we have adjusted the Bi composition for the well width range between 4.5 and 10 nm with respect of the confinement conditions.     

Sub-10-nm multifacet domelike Ge quantum dots grown on clean Si (001) (2×1) surface

Sub-10-nm multifacet domelike Ge quantum dots (QDs) ensembles with uniform size have been achieved on a clean Si (001) (2×1) reconstructed surface at a substrate temperature of 450°C, total Ge coverage of 7 ML, Ge deposition rate of ∼0.0115 ML/s and no post-annealing. Their areal density and diameter are 5.2×10¹¹ cm⁻² and 7.2±2.3 nm, respectively, which is explained by a pit-mediated mass transferring nucleation mechanism suggested by us. According to the phase diagram analysis, their domelike morphology can be attributed to a relatively high growth temperature. Their high density and small size result in a strong non-phonon peak with a large blue shift of 0.19 eV in the low-temperature photoluminescence spectrum.     

Formation of InAs quantum dots in silicon by sequential ion implantation and flash lamp annealing

InAs quantum dots (QDs) were successfully formed in single-crystalline Si by sequential ion implantation and subsequent milliseconds range flash lamp annealing (FLA). Samples were characterized by μ-Raman spectroscopy, Rutherford Backscattering Spectrometry (RBS) high-resolution transmission electron microscopy (HRTEM) and low temperature photoluminescence (PL). The Raman spectrum shows two peaks at 215 and 235 cm^?1 corresponding to the transverse optical (TO) and longitudinal optical (LO) InAs phonon modes, respectively. The PL band at around 1.3 μm originates from the InAs QDs with an average diameter 7.5±0.5 nm and corresponds to the increased band gap energy due to the strong quantum confinement size effect. The FLA of 20 ms is sufficient for InAs QDs formation. It also prevents the out-diffusion of implanted elements. Moreover, the silicon layer amorphized during ion implantation is recrystallized by solid-phase epitaxial regrowth during FLA.     

Absorption of terahertz radiation in Ge/Si(001) heterostructures with quantum dots

The terahertz spectra of the dynamic conductivity and radiation absorption coefficient in germanium-silicon heterostructures with arrays of Ge hut clusters (quantum dots) have been measured for the first time in the frequency range of 0.3–1.2 THz at room temperature. It has been found that the effective dynamic conductivity and effective radiation absorption coefficient in the heterostructure due to the presence of germanium quantum dots in it are much larger than the respective quantities of both the bulk Ge single crystal and Ge/Si(001) without arrays of quantum dots. The possible microscopic mechanisms of the detected increase in the absorption in arrays of quantum dots have been discussed.     

Thermal conductivity of <Emphasis Type="Italic">n</Emphasis>-type Ge monocrystals

The pyroelectric method is used to demonstrate the dependence of the thermal conductivity and thermal diffusivity coefficients of n-type germanium monocrystals on the concentration of antimony impurities (6 × 10¹³, 1.3 × 10¹⁴, 1.7 × 10¹⁴, 3.7 × 10¹⁴, 6 × 10¹⁴ cm^?3). The investigated samples are cut from germanium crystals grown from a melt using the Czochralski method with crystallographic orientation [111].     

Photoluminescence of germanium quantum dots grown in silicon on a SiO<Subscript>2</Subscript> submonolayer

The photoluminescence of quantum dots in Si/Ge/SiO₂/Si and Si/Ge/Si structures is investigated as a function of temperature. The low activation energies for the temperature quenching of photoluminescence of germanium quantum dots in both structures are explained in terms of the thermally stimulated capture of holes from quantum dots to the energy levels of defects localized in their vicinity.     

Influence of defects on the optical and structural properties of Ge dots embedded in an Si/Ge superlattice

In this work we studied the influence of high-energy proton irradiation on the optical and structural properties of an Si/Ge superlattice (SL) with embedded Ge quantum dots (QDs). The presence of QDs in the as-grown samples was established by transmission electron microscopy and photoluminescence (PL). The samples were irradiated with 2.0 MeV protons to fluences in the range 2×10¹²-2×10¹⁴ cm^-2. The structural characterization made by X-ray reciprocal space mapping, X-ray reflection and Rutherford backscattering/channelling has shown no changes in the as-grown heterostructure due to the irradiation. In spite of the expected high concentration of nonradiative recombination centres caused by the proton-induced damage, the PL emission from the Ge dots has been observed even for the highest irradiation fluence. The studied QD-in-SL structure has shown an extraordinarily high radiation hardness when compared with previously studied QD heterostructures.     

Silicon negative ion implantation induced vacancy defects in thermally grown SiO2 thin films

ABSTRACT

Thermally grown SiO₂ thin films on a silicon substrate implanted with 100?keV silicon negative ions with fluences varying from 1?×?10¹⁵ to 2?×?10¹⁷ ions cm^?2 have been investigated using Electron spin resonance, Fourier transforms infrared and Photoluminescence techniques. ESR studies revealed the presence of non-bridging oxygen hole centers, E′-centers and P_b-centers at g-values 2.0087, 2.0052 and 2.0010, respectively. These vacancy defects were found to increase with respect to ion fluence. FTIR spectra showed rocking vibration mode, stretching mode, bending vibration mode, and asymmetrical stretching absorption bands at 460, 614, 800 and 1080?cm^?1, respectively. The concentrations of Si–O and Si–Si bonds estimated from the absorption spectra were found to vary between 11.95?×?10²¹ cm^?3 and 5.20?×?10²¹ cm^?3 and between 5.90?×?10²¹ cm^?3 and 3.90?×?10²¹ cm^?3, respectively with an increase in the ion fluence. PL studies revealed the presence of vacancies related to non-bridging oxygen hole centers, which caused the light emission at a wavelength of 720?nm.     

Ultrasensitive PbS‐Quantum‐Dot Photodetectors for Visible–Near‐Infrared Light Through Surface Atomic‐Ligand Exchange

A surface atomic‐ligand exchange method is applied the first time in the construction of photodetectors (PDs) based on PbS quantum dots (QDs) for ultrasensitivity. The device thus produces a high photosensitivity to visible and near‐infrared light with a photoresponsivity up to 7.5 × 10³ A W^?1 and a high stability in air. In particular, these PbS‐QD‐based PDs show the capability of following a pulse light with a frequency up to 100 kHz well at a relatively fast response time/recovery time of ≈4/40 μs, much faster than most previous QD‐based PDs. The short response time is attributed to modification for the surface of the PbS‐QDs by cetyltrimethylammonium bromide treatment, which effectively improves the contact between the QDs and the Au electrodes, leading to extracting a high carrier mobility (≈0.142 cm² V^?1 s^?1). These findings show the great potential of PbS‐QDs as high‐speed nano‐photodetectors, and, more importantly, demonstrate the importance of the surface atomic‐ligand exchange method in the construction of QD‐based devices.     

Gemma experiment: The results of neutrino magnetic moment search

The result of the neutrino magnetic moment (NMM) measurement at the Kalinin Nuclear Power Plant (KNPP) with GEMMA spectrometer is presented. The antineutrino-electron scattering is investigated. A high-purity germanium (HPGe) detector with a mass of 1.5 kg placed at a distance of 13.9 m from the 3 GW_th reactor core is exposed to the antineutrino flux of 2.7 × 10¹³ cm^?2s^?1. The recoil electron spectra taken in 18134 and 4487 h for the reactor ON and OFF periods are compared. The upper limit for the NMM μ_ν < 2.9 × 10^?11 μ_B at 90% C.L. is derived from the data processing.     

Normal incidence p-i-n Ge heterojunction photodiodes on Si substrate grown by ultrahigh vacuum chemical vapor deposition

We report on normal incidence p-i-n heterojunction photodiodes operating in the near-infrared region and realized in pure germanium on planar silicon substrate. The diodes were fabricated by ultrahigh vacuum chemical vapor deposition at 600 °C without thermal annealing and allowing the integration with standard silicon processes. Due to the 0.14% residual tensile strain generated by the thermal expansion mismatch between Ge and Si, an efficiency enhancement of nearly 3-fold at 1.55 μm and the absorption edge shifting to longer wavelength of about 40 nm are achieved in the epitaxial Ge films. The diode with a responsivity of 0.23 A/W at 1.55 μm wavelength and a bulk dark current density of 10 mA/cm² is demonstrated. These diodes with high performances and full compatibility with the CMOS processes enable monolithically integrating microphotonics and microelectronics on the same chip.