Effects of graphene defects on Co cluster nucleation and intercalation

Four kinds of defects are observed in graphene grown on Ru(0001) surfaces. After cobalt deposition at room temperature, the cobalt nanoclusters are preferentially located at the defect position. By annealing at 530℃, cobalt atoms intercalate at the interface of Graphene/Ru(0001) through the defects. Further deposition and annealing increase the sizes of intercalated Co islands. This provides a method of controlling the arrangement of cobalt nanoclusters and also the density and the sizes of intercalated cobalt islands, which would find potential applications in catalysis industries, magnetism storage, and magnetism control in future information technology.     

High-Quality FeTe_(1-x)Se_x Monolayer Films on SrTiO_3(001) Substrates Grown by Molecular Beam Epitaxy

We report the growth process of FeTe_(1-x)Se_(0≤x≤≤1) monolayer films on SrTiO_3(STO) substrates through molecular beam epitaxy and discuss the possible ways to improve the film quality. By exploring the parameters of substrate treatment, growth control and post growth annealing, we successfully obtain a series of FeTe_(1-x)Se_x monolayer films. In the whole growth process, we find the significance of the temperature control through surface roughness monitored by the reflection high-energy electron diffraction and scanning tunneling microscopy. We obtain the best quality of FeSe monolayer films with the STO substrate treated at T = 900-950°C before growth,the FeSe deposited at T = 310°C during growth and annealed at T = 380°C after growth. For FeTe_(1-x)Se_x(x1), both the growth temperature and annealing temperature decrease to T = 260℃. According to the angleresolved photoemission spectroscopy measurements, the superconductivity of the FeTe_(1-x)Se_x film is robust and insensitive to Se concentration. All the above are instructive for further investigations of the superconductivity in FeTe_(1-x)Se_x films.     

High quality sub-monolayer,monolayer, and bilayer graphene on Ru（0001）

High quality sub-monolayer, monolayer, and bilayer graphene were grown on Ru(0001). For the sub-monolayer graphene, the size of graphene islands with zigzag edges can be controlled by the dose of ethylene exposure. By increasing the dose of ethylene to 100 Langmuir at a high substrate temperature(800℃), high quality single-crystalline monolayer graphene was synthesized on Ru(0001). High quality bilayer graphene was formed by further increasing the dose of ethylene while reducing the cooling rate to 5℃/min. Raman spectroscopy revealed the vibrational states of graphene, G and 2D peaks appeared only in the bilayer graphene, which demonstrates that it behaves as the intrinsic graphene. Our present work affords methods to produce high quality sub-monolayer, monolayer, and bilayer graphene, both for basic research and applications.     

Study on polarization spectrum and annealing properties of 45°-tilted fiber gratings

We have investigated the whole polarization-extinction-ratio(PER) spectrum and annealing properties of45°-tilted fiber gratings(45°-TFGs). Experimental results show the PER spectrum of 45°-TFGs is a Gaussianlike profile and covers a 540 nm bandwidth from 1260 to 1800 nm, in which the bandwidth with PER greater than 10 dB is over 250 nm. The output polarization distribution of 45°-TFGs was analyzed by employing a bulk linear polarizer, and the results show a perfect figure "8", which indicates that the 45°-TFG is a type of linear polarizer. Moreover, the annealing property of 45°-TFGs was measured up to 700°C, in which the PER of the grating started to decrease at 300°C and reached the minimum at 700°C. Based on these results, the 45°-TFGs can be used as an ultra-wide bandwidth in-fiber polarizing device.     

Effects of Fe additive on diamond crystallization from carbonyl nickel powders-C system under HPHT condition

In this paper, diamond crystallization from carbonyl nickel powders-C and carbonyl nickel powders + Fe–C systems are investigated in detail at a pressure of 6.0 GPa and temperatures ranging from 1410°C–to 1435°C by temperature gradient growth. The effects of Fe additive on the crystal morphology are discussed in the diamond crystallization process.Furthermore, Fourier infrared measurement results indicate that the spectrum of the diamond obtained from Ni + Fe–C system after annealing treatment is nearly consistent with that of natural diamond crystal. We believe that this study is of benefit to a further understanding of the growth mechanism of natural diamond.     

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temper- ature. The as-deposited films are annealed at different temperatures from 400 C to 800 C in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400 C to 800 C. The band gap of the as-deposited ZnO:In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400 C. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400 C to 800 C.     

Influence of annealing treatment on as-grown Ib-type diamond crystal at a high temperature and high pressure

In this paper,we report on the influence of annealing treatment on as-grown Ib-type diamond crystal under high pressure and high temperature in a china-type cubic anvil high-pressure apparatus.Experiments are carried out at a pressure of 7.0 GPa and temperatures ranging from 1700 C to 1900 C for 1 h.Annealing treatment of the diamond crystal shows that the aggregation rate constant of nitrogen atoms in the as-grown Ib-type diamond crystal strongly depends on diamond morphology and annealing temperature.The aggregation rate constant of nitrogen remarkably increases with the increase of annealing temperature and its value in octahedral diamond is much higher than that in cubic diamond annealed at the same temperature.The colour of octahedral diamond crystal is obviously reduced from yellow to nearly colorless after annealing treatment for 1 h at 1900 C,which is induced by nitrogen aggregation in a diamond lattice.The extent of nitrogen aggregation in an annealed diamond could approach approximately 98% indicated from the infrared absorption spectra.The micro-Raman spectrum reveals that the annealing treatment can improve the crystalline quality of Ib-type diamond characterized by a half width at full maximum at first order Raman peak,and therefore the annealed diamond crystals exhibit nearly the same properties as the natural IaA-type diamond stones of high quality in the Raman measurements.     

Low-temperature growth of large-scale,single-crystalline graphene on Ir(111)

Iridium is a promising substrate for self-limiting growth of graphene. However, single-crystalline graphene can only be fabricated over 1120 K. The weak interaction between graphene and Ir makes it challenging to grow graphene with a single orientation at a relatively low temperature. Here, we report the growth of large-scale, single-crystalline graphene on Ir(111) substrate at a temperature as low as 800 K using an oxygen-etching assisted epitaxial growth method. We firstly grow polycrystalline graphene on Ir. The subsequent exposure of oxygen leads to etching of the misaligned domains.Additional growth cycle, in which the leftover aligned domain serves as a nucleation center, results in a large-scale and single-crystalline graphene layer on Ir(111). Low-energy electron diffraction, scanning tunneling microscopy, and Raman spectroscopy experiments confirm the successful growth of large-scale and single-crystalline graphene. In addition, the fabricated single-crystalline graphene is transferred onto a SiO_2/Si substrate. Transport measurements on the transferred graphene show a carrier mobility of about 3300 cm~2·V~(-1)·s~(-1). This work provides a way for the synthesis of large-scale,high-quality graphene on weak-coupled metal substrates.     

Direct growth of graphene on gallium nitride by using chemical vapor deposition without extra catalyst

Graphene on gallium nitride(GaN) will be quite useful when the graphene is used as transparent electrodes to improve the performance of gallium nitride devices. In this work, we report the direct synthesis of graphene on GaN without an extra catalyst by chemical vapor deposition. Raman spectra indicate that the graphene films are uniform and about 5–6 layers in thickness. Meanwhile, the effects of growth temperatures on the growth of graphene films are systematically studied, of which 950℃ is found to be the optimum growth temperature. The sheet resistance of the grown graphene is 41.1Ω/square,which is close to the lowest sheet resistance of transferred graphene reported. The mechanism of graphene growth on GaN is proposed and discussed in detail. XRD spectra and photoluminescence spectra indicate that the quality of GaN epi-layers will not be affected after the growth of graphene.     

Annealing effect on structure and green emission of ZnO nanopowder by decomposing precursors

ZnO nanopowder is successfully synthesized by annealing the precursors in oxygen gas using the chemical precipitation method.Structural and optical properties of thus synthesized ZnO nanopowder are characterized by scanning electron microscopy (SEM) and photoluminescence (PL).The morphology of ZnO nanopowders evolves from nanorod to cobble as annealing temperature increases from 500 to 1000 C,while spiral structures are observed in the samples annealed at 900 and 1000 C.The PL spectra of ZnO nanopowder consist of largely green and yellow emission bands.The green emission from ZnO nanopowder depends strongly on the annealing temperature with a peak intensity at a temperature lower than 800 C while the yellow emission is associated with interstitial oxygen Oi .     

应力预释放对单晶硅片的压痕位错滑移的影响

单晶硅片的压痕位错在一定温度下的滑移距离反映了硅片的机械强度. 压痕位错的滑移是受压痕的残余应力驱动的, 因此研究残余应力与位错滑移之间的关系具有重要的意义. 本文首先采用共聚焦显微拉曼术研究了单晶硅片压痕的残余应力经过300或500 ℃ 热处理后的预释放, 然后研究了上述应力预释放对压痕位错在后续较高温度(700–900 ℃)热处理过程中滑移的影响. 在未经应力预释放的情况下, 压痕位错在700–900 ℃热处理2 h后即可滑移至最大距离. 当经过上述预应力释放后, 位错在900 ℃热处理2 h后仍能达到上述最大距离, 但位错滑移速度明显降低; 而在700和800 ℃时热处理2 h后的滑移距离变小, 其减小幅度在预热处理温度为500 ℃时更为显著. 然而, 进一步的研究表明: 即使经过预应力释放, 只要足够地延长700和800 ℃ 的热处理时间, 位错滑移的最大距离几乎与未经预应力释放情形时的一样. 根据以上结果, 可以认为在压痕的残余应力大于位错在某一温度滑移所需临界应力的前提下, 压痕位错在某一温度滑移的最大距离与应力大小无关, 不过达到最大距离所需的时间随应力的减小而显著增长.     

SiO2/Si衬底上石墨烯的制备与结构表征

在分子束外延(MBE)设备中,利用直接沉积C原子的方法在覆盖有SiO₂的Si衬底(SiO₂/Si)上生长石墨烯,并通过Raman光谱和近边X射线吸收精细结构谱等实验技术对不同衬底温度(500℃,600℃,700℃,900℃,1100℃,1200℃)生长的薄膜进行结构表征.实验结果表明,在衬底温度较低时生长的薄膜是无定形碳,在衬底温度高于700℃时薄膜具有石墨烯的特征,而且石墨烯的结晶质量随着衬底温度的升高而改善,但过高的衬底温度会使石墨烯质量降低.衬底温度为1100℃时结晶质量最好.衬底温度较低时C原子活性较低,难以形成有序的C-sp²六方环.而衬底温度过高时(1200℃),衬底表面部分SiO₂分解,C原子与表面的Si原子或者O原子结合而阻止石墨烯的形成,并产生表面缺陷导致石墨烯结晶变差.     

锰的硅化物薄膜在Si(100)-2×1表面生长的STM研究

锰的硅化物在微电子器件、自旋电子学器件等领域具有良好的应用前景, 了解锰的硅化物薄膜在硅表面的生长规律是其走向实际应用的关键步骤之一. 本文采用分子束外延方法在Si(100)-2× 1表面沉积了约4个原子层的锰薄膜, 并利用超高真空扫描隧道显微镜研究了该薄膜与硅衬底之间在250-750℃范围内的固相反应情况. 室温下沉积在硅衬底表面的锰原子与衬底不发生反应, 薄膜由无序的锰团簇构成; 当退火温度高于290℃时, 锰原子与衬底开始发生反应, 生成外形不规则的枝晶状锰硅化物和富锰的三维小岛; 325℃时, 衬底上开始形成平板状的MnSi小岛; 525℃时, 枝晶状锰硅化物完全消失, 出现平板状的MnSi_1.7大岛; 高于600℃时, 富锰的三维小岛和平板状的MnSi小岛全部消失, 仅剩下平板状的MnSi_1.7大岛. 这些结果说明退火温度决定了薄膜的形态和结构. 在大约600℃退火时岛的尺寸随着退火时间的延长而逐渐增大, 表明岛的生长遵从扩散限制的Ostwald熟化机理.     

退火对磁控溅射HfSi_xO_y薄膜光学性质的影响

采用射频反应磁控溅射方法在硅衬底制备了HfSixOy薄膜,用X射线光电子能谱(XPS)分析了HfSixOy薄膜的成分,用X射线衍射(XRD)检测了薄膜的结构,并用椭圆偏振光谱仪研究了退火处理对薄膜光学性质的影响。XRD谱显示,HfSixOy薄膜经700℃高温退火处理后仍为非晶态,而在900℃高温退火处理后出现晶化。采用Tauc-Lorentz(TL)色散模型对测试得到的曲线进行拟合并分析得出薄膜的光学常数,结果表明,薄膜的折射率随退火温度的升高而增加,而消光系数随退火温度的升高呈降低趋势。薄膜的光学带隙随着退火温度的升高增加,采用外推法得到薄膜沉积态和经500℃,700℃,900℃退火后的带隙分别为5.62,5.65,5.68,5.98eV。     

原位生长技术制备石墨烯强化铜基复合材料

利用等离子增强化学气相沉积方法,在铜粉表面原位生长了站立石墨烯,用于制备石墨烯强化铜基复合材料.研究表明,石墨烯包覆在铜粉外表面,微观尺度实现了两者的均匀混合;生长的初期阶段,碳、氢等离子基团可将铜粉表面的氧化层还原,有助于铜粉-石墨烯之间形成良好的界面;石墨烯的成核是一个生长/刻蚀相互竞争的过程,其尺寸可受制备温度调控.利用放电等离子烧结方法将粉末压制成型,测试结果显示,添加石墨烯样品的电阻率降低了一个数量级,维氏硬度和屈服强度分别提高了15.6%和28.8%.     

二氧化钛薄膜的制备及退火对其形貌、结构的影响

利用磁控溅射技术,在石英基片上沉积Ti膜,分别在400、600、700、900℃的大气中退火获得TiO2薄膜。采用这种制备方式获得的TiO2薄膜呈现不同的颜色,退火温度为400℃的样品为暗紫红色,600℃时为黑色,而在700℃和900℃时均为黄色。采用X射线衍射、扫描电子显微镜（SEM）以及Raman光谱等手段研究了退火温度对TiO2薄膜的结构和形貌的影响。结果表明：退火温度为400℃时,TiO2薄膜为锐钛矿相,温度升高至600℃时,几乎转变为金红石晶相,但仍存在微量锐钛矿相,温度升高至700℃以上,则完全转变为金红石晶相。由XRD衍射图可知退火温度为700℃和900℃时,薄膜的金红石相沿（101）晶面择优取向。     

退火温度及退火气氛对ZnO薄膜的结构及发光性能的影响(英文)

采用脉冲激光沉积技术在Si/蓝宝石衬底上制备了ZnO薄膜,结合快速退火设备研究了不同退火温度(500~900℃)及退火气氛(N2,O2)对薄膜的结构及其发光性能的影响。并优化条件得到具有最小半峰全宽及最大晶粒尺寸的薄膜。X射线衍射(XRD)结果表明:氮气氛下退火的ZnO薄膜最佳退火温度为900℃;氧气氛下退火的ZnO薄膜最佳退火温度为800℃。红外(IR)光谱中,退火后Zn-O特征振动峰红移,说明在退火过程中,原子重新排布后占据较低能量位置;同样的退火温度下,氮气氛下退火的薄膜质量更优。同步辐射光电子能谱(synchrotron-based XPS)分别表征了未退火及N2,O2下900℃退火的ZnO薄膜,分峰拟合结果表明氧气氛下退火产生更多的氧空位。结构表征结合光致发光(PL)谱表明绿光的发光峰与氧空位有关。     

离子注入的铝在Si(100)表面的偏析及其引起的纳米团簇和合金晶粒形成现象的实验研究

通过高温退火注入了铝的Si(100)样品,探讨偏析出来的铝在硅表面的热力学行为.由900℃的退火实验发现,偏析出来的铝原子一方面形成Si(100)基底的外延铝膜和铝岛,另一方面与硅原子结合形成尺度约为2—3nm的铝硅团簇.而1200℃的退火实验显示,铝和硅的快速冷凝形成了立方晶系的Al₄Si合金晶粒、尺度约为20—30nm.细小的铝硅团簇在结构上独立于样品基底并且趋于聚集成团,很可能是在高温退火和快速降温过程中形成铝硅合金晶粒的前驱. 关键词： 硅表面 铝掺杂 团簇 4Si')" href="#">Al₄Si     

用硅离子注入方法制备的纳米硅的拉曼散射研究

在直角散射配置下测量了纳米硅样品的拉曼散射谱及其退火温度的关系。结果表明,在８００℃以下退火的样品只观察到单晶硅衬底的光学声子模,在９００℃以上退火,才观察到纳米硅的特征拉曼散射峰。在１２００℃下退火后,纳米硅的特征拉曼散射峰消失,观察到类似于非晶硅的光学声子特征峰,可能表示纳米硅不能承受这样的高温热退火。这些结果进一步证实了光致发光谱的结果。     

蓝宝石衬底上生长的Ga2+xO3-x薄膜的结构分析

利用卢瑟夫背散射/沟道技术和金属有机化学气相沉积方法, 对蓝宝石衬底上 在不同温度、压强下生长的Ga_2+xO_3-x薄膜进行结构和结晶品质的测量与分析; 并结合高分辨X射线衍射分析技术, 通过对其对称(402)面的θ–2θ及ω扫描, 确定了其结构类型及结晶品质. 实验表明: 在相同的生长温度(500 ℃)下, 结晶品质随压强的下降而变好, 生长压强为15 Torr (1 Torr=133.322 Pa)的样品其结晶品质最好, 沿轴入射之比χ_min值为14.5%; 在相同的生长压强(15 Torr)下, 结晶品质受生长温度的影响不大, 所以, 生长温度不是改变结晶品质的主要因素; 此外, 在相同的生长条件下制备的样品, 分别经过700, 800和900 ℃退火后, 其结晶品质随退火温度的变化而变化. 退火温度为800 ℃的样品的结晶品质最好, χ_min值为11.1%; 当退火温度达到900 ℃时, 样品部分分解; 经热处理的样品其X射线衍射谱中有一个强的Ga₂O₃ (402)面衍射峰, 其半峰全宽为0.5°, 表明该Ga₂O₃外延膜是(402)择优取向. 关键词： 氧化镓 卢瑟夫背散射 X射线衍射 结晶品质