共查询到18条相似文献,搜索用时 109 毫秒
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利用锁相热像方法定量测量了光学镀膜的吸收率。待测薄膜吸收周期调制的激光能量,在表面形成热波,将红外相机记录的热分布信号进行锁相相关处理,获得信噪比提高的热图像。采用标准吸收样品对系统进行定标,可获得光热信号幅度与样品吸收率之间的定量联系,进而在相同实验条件下测量待测样品,可通过光热信号直接计算获得其绝对吸收率。在1 060 nm波长处开展了实验研究,测量获得了不同厚度Nb2O5镀膜的吸收率数值,实测的吸收可达80 ppm。 相似文献
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采用热透镜测量方法进行了SiO2和HfO2单层膜的体吸收与界面吸收分离研究.首先推导了光从薄膜侧及基底侧入射时单层膜内的驻波场分布,给出了单一厚度薄膜分离体吸收和界面吸收的计算方程式以及求解薄膜消光系数的方法.利用电子束蒸发工艺制备了半波长光学厚度(λ=1064 nm)的SiO2和HfO2单层膜,通过热透镜的测量数据实际分离了两种薄膜的体吸收和界面总吸收.计算结果表明,对于吸收小至10-6关键词:
驻波场理论
光热技术
薄膜吸收
消光系数 相似文献
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给出了连续调制激励光照射下光学薄膜样品表面热变形场的理论分布,并由此定义了表面热透镜(STL)信号。根据表面热透镜理论实验测量了一个BK7基底高反膜样品的形变,给出了表面热透镜信号随调制频率的变化曲线。实验结果表明:在采用的STL实验构型中,探测了最小1.985 nm的直流形变,对应不调制时的形变为3.97 nm,相应的形变探测灵敏度达到了10 pm量级;直流形变与功率成线性关系;交流表面热透镜信号随着频率增大而减小,在高频端近似成线性减小。 相似文献
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利用电子束热蒸发方法在K9玻璃基底上沉积氧化锆薄膜,并对其中一些样品用低能O2+进行了后处理。采用表面热透镜技术测量薄膜样品表面弱吸收,采用显微镜观察样品离子后处理前后的显微缺陷密度。测试结果表明:经离子后处理样品表面的缺陷密度从18.6/mm2降低到6.2/mm2,且其激光损伤阈值从15.9 J/cm2提高到23.1 J/cm2,样品的平均吸收率从处理前的1.147×10-4降低到处理后的9.56×10-5。通过对处理前后样品的表面微缺陷密度、吸收率及损伤形貌等的分析发现:离子后处理可以降低薄膜的显微缺陷和亚显微缺陷,从而降低薄膜的平均吸收率,同时增强了薄膜与基底的结合力,提高了薄膜的激光损伤阈值。 相似文献
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Influence of Surface Transition Layers on Phase Transformation and Pyroelectric Properties of Ferroelectric Thin Film 下载免费PDF全文
Taking into account surface transition layers (STLs), we study the phase transformation and pyroelectric properties of ferroelectric thin films by employing the transverse Ising model (TIM) in the framework of the mean field approximation. The distribution functions representing the intra-layer and inter-layer couplings between the two nearest neighbour pseudo-spins are introduced to characterize STLs. Compared with the results obtained by the traditional treatments for the thin films using only the single surface transition layer (SSL), it is shown that the STL model reflects a more realistic and comprehensive situation of films. The effects of various parameters on the phase transformation properties have shown that STL can make the Curie temperature of the film higher or lower than that of the corresponding Sulk material, and the thickness of STL is a key factor influencing the film properties. For a film with definite thickness, there exists a critical STL thickness at which ferroelectricity will disappear when the intra-layer and inter-layer interactions are weak. 相似文献
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传统的等离子体闪光法,是根据探测器是否接收到来自薄膜样片周围发射的闪光信号,对薄膜是否发生损伤进行评判,这样的评判方法极易把空气与薄膜的等离子体闪光混淆而发生误判。为了消除这种误判,提出通过比较空气和薄膜各自的等离子体闪光的点燃时间,利用两者时间上的差异,实现对传统等离子体闪光法误判现象的消除方法。为了验证新方法的可靠性,借助于多光子吸收和级联电离理论,建立了空气等离体子体点燃时间的计算模型,根据薄膜与激光的相互作用原理建立了薄膜被击穿时的等离子体点燃时间计算模型,利用建立的模型仿真计算了空气和薄膜的等离子体闪光点燃时间分别为1.856和7.843 ns;搭建实验装置以实现对传统等离子体闪光法的更新,在装置中的不同位置设置三个光电探测器分别采集入射激光信号、空气和薄膜等离子体闪光信号,采集入射激光信号的光电探测器置于聚焦透镜的侧面,另外两个探测器位于薄膜样片周围且左右对称放置,分别用于采集薄膜的等离子体闪光信号和空气的等离子体闪光信号,所有光电探测器采集的信号转换为电信号后同步传输至示波器,以入射激光信号为基准信号,其与空气和薄膜等离子体闪光信号的起始时刻之差,分别为空气和薄膜等离子体闪光点燃时间。脉宽为10 ns、波长为1 064 nm的Nd∶YAG脉冲激光以0.015 cm的聚焦光斑半径、82.4 mJ的入射能量作用于光学厚度为λ/4、直径为20 mm的单层Al2O3薄膜样片上后,采集上述激光作用条件下的各路信号,经处理后得到的空气和薄膜的等离子体闪光点燃时间测试值分别为2.7和7.8 ns;理论计算和实验测试结果表明,空气的点燃时间总是小于薄膜的点燃时间,二者有很好的一致性。说明当强激光作用于单层Al2O3薄膜表面时,空气等离子体闪光先于薄膜等离子体闪光发生。基于空气和薄膜等离子体闪光点燃时间上的这种差异,利用闪光信号时间上的差别就可准确分辨出薄膜是否发生损伤,从而获得识别薄膜损伤与否的判据,这种从时间差异上识别薄膜等离子体闪光损伤的新方法,无论从理论上还是实验上均为传统等离子体闪光法误判现象的消除提供了技术基础。 相似文献
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An explicit thermoelastic model is developed to describe
the photothermal deformation of a coated sample excited by a cw modulated
laser beam with a top-hat profile. The surface displacement obtained with
this explicit model is compared to that obtained by an approximate model
developed by Reichling and Gr?nbeck (J. Appl. Phys. 75, 1914 (1994)).
Both thermoelastic models are then applied in a Fresnel diffraction based
surface thermal lens (STL) theory. Numerical calculations are performed to
investigate the differences between the explicit and approximate models in
both surface displacement and STL signal. The simulation results show that
the approximate model over-estimates the surface displacement and the
corresponding STL signal amplitude. A decrease in the thermal diffusion
length reduces the differences between the results obtained with the two
thermoelastic models. 相似文献
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ZrO2 thin films were prepared by electron beam evaporation at different oxygen partial pressures. The influences of oxygen partial pressure on structure and related properties of ZrO2 thin films were studied. Transmittance, thermal absorption, structure and residual stress of ZrO2 thin films were measured by spectrophotometer, surface thermal lensing technique (STL), X-ray diffraction and optical interferometer, respectively. The results showed that the structure and related properties varied progressively with the increase of oxygen partial pressure. The refractive indices and the packing densities of the thin films decreased when the oxygen partial pressure increased. The tetragonal phase fraction in the thin films decreased gradually as oxygen partial pressure increased. The residual stress of film deposited at base pressure was high compressive stress, the value decreased with the increase of oxygen partial pressure, and the residual stress became tensile with the further increase of oxygen pressure, which was corresponding to the evolution of packing densities and variation of interplanar distances. 相似文献
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为了分析纳米金表面修饰对表面等离子体共振(SPR)的放大作用,以及其对传感器本身的影响,首先,基于色散介质的吸收理论,通过建立波长型SPR生物传感器四层膜结构的数学模型,理论分析了传感器表面所吸附纳米金对传感器的影响:纳米金的表面修饰,改变了表面等离子体传感器中棱镜表面各介质层内电磁场的能量分布,削弱了金属膜在共振吸收中的作用,从而使SPR曲线的半波宽度增加,最小反射系数增大,金膜的最优膜厚度也随之改变.其次,通过不同厚度的金膜外吸附纳米金的对比试验,验证了此理论.金膜厚45nm、表面修饰10nm纳米金颗
关键词:
表面等离子体共振
生物传感器
纳米金
金属膜 相似文献
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本文采用直流磁控溅射方法在普通浮法玻璃基底上制备了立方多晶铁锰矿结构的铟锡氧化物(indium tin oxide, ITO)薄膜,并对其进行了结晶性、表面粗糙度、紫外-可见吸收光谱、折射率、介电常数及霍尔效应的测试.研究了溅射时基底温度的改变对于ITO薄膜的光电、表面等离子体性质的影响.随着基底温度由100?C升高至500?C,其光学带隙(3.64—3.97eV)展宽,减少了电子带间跃迁的概率,有效降低了ITO薄膜的光学损耗.与此同时,对应ITO薄膜的载流子浓度(4.1×10~(20)-—2.48×10~(21)cm~(-3))与迁移率(24.6—32.2 cm~2·V~(-1)·s~(-1))得到提高,电学损耗明显降低. 相似文献