SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50-100 nm wavelength range in Seya-Namioka mount

A broadband [SiC/W/Ir](2) multilayer coating was deposited onto a diffraction grating to enhance the grating efficiency in the 50-100 nm wavelength range in a Seya-Namioka mount. The holographic ion-beam etched grating had a laminar profile with 1200 lines/mm. The coating was designed by using the subquarterwave multilayer theory. The measurement results show that the efficiency in the -1st diffraction order is greater than 9.3% throughout the wavelength range of 50-100 nm, which is obviously higher than that of single-layer gratings with SiC, Ir, or Au coatings.     

Polarizing beam splitter of a deep-etched fused-silica grating

We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. To achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications.     

Deep silicon grating as high-extinction-ratio polarizing beam splitter

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter （PBS） at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection （TIR） by using the rigorous coupled wave analysis （RCWA）. The extinction ratio of the rectangular PBS grating can reach 2.5~105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. The efficiencies of TM-polarized wave in the 0th order and TE-polarized wave in the -1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma （ICP） etching could be used to fabricate the silicon PBS grating.     

A reflective surface-relief two-layer grating for splitting beams with the polarization-selective property

A polarization-selective beam splitter is presented based on a reflective surface-relief two-layer grating with a metal slab. The grating is composed of two dielectric layers and a metal slab on the substrate. For TE polarization, efficiencies of 97.58% can be diffracted into the reflective −1st order. For TM polarization, two-port output of 47.55% and 47.11% can be split into the 0th order and the −1st order, respectively. Such a polarization-selective beam splitter can be fulfilled by one grating in reflection. The grating depths of two layers are optimized by using rigorous coupled-wave analysis with the given duty cycle of 0.6 and period of 1100 nm. The performance for different incident conditions is investigated when the incident wavelength and angle deviate from the central wavelength and the Bragg angle, respectively. For TM polarization, good uniformity can still be achieved within the given incident wavelength and angle regions. For TE polarization, the reflective polarization-selective beam splitter can have merits of wideband for different incident wavelengths.     

Polarization-selective subwavelength grating used with 193 nm light

Hyper-NA ArF (193 nm) immersion lithography is one of the most potential technologies to achieve 32 nm critical dimension node. At the corresponding large angles in the photoresist, control of polarization becomes necessary. A polarization beam splitter (PBS) based on a subwavelength dielectric grating has been designed for use with 193 nm light. The polarization-selective property of such grating is explained by the mechanism of mode interference. The designed grating working as a 1 × 2 beam splitter can transmit TM wave (∼ 90%) to the zeroth order with extinction ratio of 753, and it diffracts TE wave (∼ 80%) to the −1st order with extinction ratio of 300.     

Low-loss grating for coupling to a high-finesse cavity

A concept for a low-loss all-reflective cavity coupler is experimentally demonstrated at a wavelength of 1064 nm. A 1450-nm period dielectric reflection grating with a diffraction efficiency of 0.58% in the - 1st order is used in the 2nd-order Littrow configuration as a coupler to form a cavity with a finesse of 400. The application of such reflective low-loss cavity couplers in future generations of gravitational-wave detectors and implementation issues are discussed.     

Role of propagating modes in a double-groove grating with a +1st-order diffraction angle larger than the substrate-air critical angle

Here we show, analytically and numerically, that in a TiO(2) double-groove grating with two different groove widths per period attached on the SiO(2) substrate, the normally incident light couples to the +1st-order transmission with 96.9% efficiency and with a 50° diffraction angle that is larger than the SiO(2)-air interface critical angle. Modal analysis reveals that three propagating modes for the +1st diffraction order reach the grating back end in phase, while the corresponding propagating modes for the -1st and zeroth orders are added destructively at the grating end. Four optical devices based on this grating characteristic are numerically demonstrated.     

软X射线位相型金透射光栅的设计与制作

根据衍射光栅的标量理论,计算并讨论了金透射光栅在软X波段衍射效率对光栅厚度和占宽比的依赖关系.结果表明,选择合适的光栅槽深和占宽比,高达 21.9%的衍射效率可能被获得,远高于振幅型光栅的+1级衍射效率10.14%.通过全息光刻与电镀转移技术制作的位相型金透射光栅由300nm的聚酰亚胺薄膜支撑,光栅槽深200nm,占宽比为0.55,周期为1μm,面积为20mm×5mm.在国家同步辐射装置上,测得其+1级透射衍射效率在波长λ=7.425nm时获得最大值,约为16%. 关键词： 透射位相光栅 全息光刻 电镀     

共振域矩形介质光栅的逆向设计

采用模态法研究了共振域光栅分束器及闪耀光栅等光学器件的设计原理及逆向设计方法,给出了-1级非偏振闪耀光栅的典型设计示例。研究表明,自准直角入射时,光束在光栅内传输将激发产生离散模,通过调节离散模透过光栅传输时的累积相位差,可对衍射光进行调控,实现偏振(非偏振)分束、偏振(非偏振)闪耀等功能。采用严格耦合波法对基于模态法逆向设计的-1级非偏振石英闪耀光栅的几何参数进行验证,计算结果显示两者非常吻合,证明了该方法的正确性。     

Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5 16.0-nm wavelength region

The efficiency of an ion-etched laminar holographic grating was measured at near-normal incidence in the 14.5-16.0-nm wavelength range. The grating had an electron-beam-evaporated Mo/Si multilayer coating matched to the grating groove depth. The efficiency peaked at 16.3% in the first inside order at 15.12 nm and 15.0% in the first outside order at 14.94 nm. These are believed to be the highest efficiencies obtained to date from a multilayer-coated laminar grating at near-normal incidence in the EUV (lambda<30.0nm) . Zero and even orders were almost completely suppressed. The grating groove efficiency in the first order approached the theoretical limit of 40.5%.     

高损伤阈值矩形石英闪耀光栅的设计分析

 采用模态法分析了矩形亚波长石英闪耀光栅的设计原理,给出了1.06 μm工作波长的矩形亚波长石英闪耀光栅的设计示例。研究表明,要设计性能优良的-1级透射闪耀光栅,应使0/1阶传输模的累积相位差为π的奇数倍。设计的透射闪耀光栅能够使TM偏振光和TE偏振光获得近100%的-1级衍射效率,且具有较大的加工容差,较宽的入射波长和入射角变化适应范围。     

高密度相位光栅的偏振选择性

高密度光栅具有与传统光栅不同的性质,其衍射特性往往是偏振相关的。本文针对1550nm波长TE/TM偏振入射光和0.5的光栅占空比,利用严格耦合波分析数值计算了不同光栅周期下0级及-1级的衍射效率。研究表明,相比周期为1550nm的光栅,当周期为1200nm时,偏振相关衍射效应明显增强,当光栅周期为890nm时,TE偏振光的衍射效率随着光栅深度呈正余弦变化,而TM偏振光的衍射效率始终集中在0级,具有偏振选择性。通过模式方法,利用模式中的有效折射率概念,研究了不同周期下被入射光所激发的两种光波模式通过光栅区域传播所累积的相位差;基于双光束干涉,模拟了0级和-1级的衍射效率。结果表明,利用严格耦合波分析的数值计算结果符合模式方法的理论预期,对于高密度相位光栅的偏振选择性给予了合理的物理机制解释。     

基于二维结构薄膜的偏振选择相位光栅的研究

利用二维结构薄膜构建了具有偏振选择特性的新型相位光栅,借助严格耦合波分析(RCWA)方法计算了光栅各级衍射强度随入射光波长及入射角的变化,发现在垂直入射情况下,波长600—640 nm范围内,相位光栅对横向电学(TE)模主要产生0级衍射,而对横向磁学(TM)模产生±1级衍射,在波长633nm处,0级衍射光的偏振消光比为109.8,±1级衍射光的偏振消光比为334.6.利用时域有限差分方法对这种相位光栅的偏振分束现象进行了模拟,偏振分离角在玻璃基板内可以达到10°左右,最后模拟了入射角为23°时光栅对不同偏     

A mixed metal dielectric sandwiched grating for polarization-selective reflection

A mixed metal dielectric sandwiched grating is described for polarization-selective reflection. The novel grating is composed of substrate, metal slab, two dielectric grating layers, and covering layer. The polarization-selective grating is optimized by using rigorous coupled-wave analysis for the usual duty cycle of 0.5. With the optimized grating parameters, reflective efficiency of 96.49% can be diffracted into the −1st order for TE polarization. And two-port output of 48.26%/48.27% can be diffracted into the 0th and the −1st orders for TM polarization. Polarization-selective reflection with good performance can be obtained by the mixed metal dielectric sandwiched grating. The usual duty cycle of 0.5 makes it easy and simple to be fabricated for practical applications. Moreover, the polarization-selective beam splitter based on the mixed metal dielectric sandwiched grating has advantages of wide incident wavelength range for TE polarization and angular bandwidth for TM polarization.     

用于高能啁啾脉冲压缩的光子晶体光栅的设计

 为了克服目前高能短脉冲装置压缩光栅的损伤阈值无法满足要求的问题,针对星光Ⅲ装置皮秒激光束的压缩器,设计了由熔石英材料构成的、具有较高损伤阈值的光子晶体光栅,该光栅由2维光子晶体和表面光栅结构两部分组成,具有高反射效率和强角色散的能力。计算结果显示:经过优化设计的光子晶体光栅在波长1 053 nm,57°～77°的入射范围内,-1级衍射效率超过了92%,而当入射角为71°时,在1 040～1 090 nm光谱范围内,-1级衍射效率超过92%,性能满足使用要求。     

Design of ultrabroadband internal reflection gratings with high efficiency

A high-efficiency, ultrabroadband dielectric internal reflection grating with rhombus-shaped grooves is designed by a rigorous coupled-wave analysis, and an effective method for predicting spectral bandwidths of gratings from their efficiency maps is presented. The grating can be fabricated from a single dielectric material, and its reflection diffraction efficiency of the -1st order can reach more than 0.99. More importantly, an ultrabroadband top-hat diffraction spectrum with efficiency exceeding 0.98 over 170 nm wavelength wide is achieved, which makes the gratings suitable for applications associated with broadband illumination, such as ultrashort pulses.     

自支撑透射光栅的设计、制作和测试

采用标量衍射理论和严格耦合波理论分别计算和讨论了金自支撑透射光栅的衍射效率随波长和光栅周期变化的情况并设计了光栅的结构参数.制作了周期为300 nm、线宽/周期比为055、厚度为200 nm、总面积为1 mm×1 mm、有效面积比为65%的金自支撑透射光栅.在国家同步辐射实验室检测了该光栅在55—38 nm波长范围内的绝对衍射效率.检测结果表明所制作的光栅在8 nm附近具有接近10%的最大衍射效率,并且该光栅对于波长15—35 nm范围内的极紫外波段具有基本稳定的衍射效率. 关键词： 自支撑透射光栅 电子束光刻 电镀     

Surface plasmon resonance sensor based on diffraction grating with high sensitivity and high resolution

A surface plasmon resonance (SPR) sensor based on diffraction grating with high sensitivity and high resolution is proposed. The sensitivity of grating coupled SPR sensor based on angular interrogation is enhanced by replacing +1st diffraction order of metallic grating with −1st diffraction order to excite the surface plasmon. To improve the resolution of grating-based SPR sensor, aluminum is used as an SPR-active metal. The reflectivity dip of the Al-based sensor is sharper than an Au-based one, which is the mostly widely used as SPR-active metal. And 3-nm-thick gold film is deposited on the grating surface in order to protect the Al layer from getting oxidized. Numerical simulations show that the sensor not only has high sensitivity and high resolution, but also exhibits good linearity.     

Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength

We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 80Ohm. The optimized grating can achieve 〉 95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 77Ohm to 83Ohm, with peak diffraction efieieney of 〉 99.5% at 80Ohm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-effieieney, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti：sapphire laser systems.