薄膜结构分析中的低角X射线衍射方法

利用带折射修正的布喇格衍射定律和薄膜光学理论分析了低角Ｘ射线衍射谱中出现的一系列现象，导出了多层膜周期厚度和周期中不同材料间的配比率的计算公式，对多层膜的低角射线衍射谱中主峰间的次峰现象作出了解释，并对低角Ｘ射线衍射测量单层膜厚度进行了分析，给出了精确的测厚公式。     

簿膜结构分析中的低角X射线衍射方法

利用带折射修正的布喇格衍射定律和薄膜光学理论分析了低角Ｘ射线衍射谱中出现的一系列现象，导出了多层膜周期厚度和周期中不同材料间的配比率的计算公式，对多层膜的低角Ｘ射线衍射谱中主峰间的次峰现象作出了解释，并对低角Ｘ射线衍射测量单层膜厚度进行分析，给出了精确的测厚公式。     

Pd2Si的生成对Pd/Si多层膜衍射性能的影响

本文研究了Pd₂Si的生成对周期性Pd/Si多层膜X射线衍射性能的影响。X射线衍射强度的测量数据表明Pd₂Si的生成对长周期多层膜的衍射强度影响不大,但对短周期多层膜衍射强度的影响较大。在引入折射率修正后,我们不仅用单个峰的位置计算了多层膜的周期,而且还用了以两个峰的位置联立消去折射率修正的方法计算了多层膜的周期,前者的误差大于后者。模拟计算的结果说明:均匀Pd₂Si层的生成不足以解释Pd/Si多层膜衍射强度随退火温度的变化,界面的平整化或粗糙化是影响衍射强度的另一个要素。 关键词：     

用不同的Mo靶溅射功率制备Mo/Si多层膜

 用磁控溅射法制备了周期厚度和周期数均相同的Mo/Si多层膜，用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时，Mo/Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。研究发现，随着Mo靶溅射功率的增大，Mo/Si多层膜的表面粗糙度增加，Mo的特征X射线衍射峰也增强，Mo/Si多层膜的软X射线峰值反射率先增大后减小。     

Pd_2Si的生成对Pd/Si多层膜衍射性能的影响

本文研究了Pd_2Si的生成对周期性Pd/Si多层膜X射线衍射性能的影响。X射线衍射强度的测量数据表明Pd_2Si的生成对长周期多层膜的衍射强度影响不大,但对短周期多层膜衍射强度的影响较大。在引入折射率修正后,我们不仅用单个峰的位置计算了多层膜的周期,而且还用了以两个峰的位置联立消去折射率修正的方法计算了多层膜的周期,前者的误差大于后者。模拟计算的结果说明:均匀Pd_2Si层的生成不足以解释Pd/Si多层膜衍射强度随退火温度的变化,界面的平整化或粗糙化是影响衍射强度的另一个要素。     

同步辐射软X射线多层膜反射偏振元件研究

利用多靶磁控溅射方法分别镀制了W/C和Mo/Si两种周期性结构多层膜。通过对其相关参数周期数、厚度比以及周期厚度的调整,使薄膜的布拉格衍射峰出现在布儒斯特角附近,两种多层膜的应用能量范围分别落于C的近K边处和Si的L边前。在北京同步辐射装置3W1B光束线的软X射线光学实验站上进行了反射率的测量,得到W/C膜的反射率在214eV时达到4.18%;Mo/Si周期性多层膜的反射率在89eV处达到32.3%。根据测量结果,分析了在同步辐射装置作为偏振元件的可行性     

短波长软X射线多层膜高级次峰设计与制备

考虑了短波长软X射线多层膜的设计问题，比较了一、二、三级布喇格衍射峰设计的反射率结果，分析了反射率与周期厚度及金属层在周期中的比率的关系．本文认为，在存在不连续金属膜层的情况下，用布喇格衍射峰的二级次设计，有助于获得实测的反射率．给出了利用磁控溅射方法沉积的Mo/Si多层膜在4.47nm处同步辐射测量，在60°入射角下获得8.5%实测反射率的结果． 关键词：     

溅射气压对X射线多层膜反射率的影响

本文在不同的溅射气压的情况下制备了具有相同结构参量的Mo/Si多层膜,测出了其对应的小角度X衍射曲线,在北京同步辐射实验室测量了多层膜的软X射线反射率.小角X射线衍射谱表明:随着溅射气压升高,多层膜的小角X射线衍射曲线的高次峰的峰高急剧变小,半峰宽变大.反射率测量结果也表明:多层膜的X射线反射率随溅射气压的升高而急剧降低.     

磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力

采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜.利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值.结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力.WSi2单层...     

Co/Ti金属磁性多层膜的激光布里渊散射研究(英文)

在室温下利用直流磁控溅射法制备出了具有不同Co层厚度的 [Co(dConm) /Ti(dTinm) ]n 金属磁性多层膜 (其中dCoanddTi是Co和Ti的厚度 ,n薄膜调制周期数 )。在 30 0K下用X射线衍射法 (XRD)和布里渊散射方法研究了Co层厚度分别为dCo=1 ,2 ,2 5 ,3 5nm ,Ti层厚度为dTi=2 5nm的Co/Ti多层膜。XRD的结果所示在Co/Ti多层膜中Co层厚度超过 2 5nm ,其结构类似块材Co的多晶结构。对比之下 ,Co/Ti多层膜中Co层厚度低于 2 5nm ,其XRD衍射峰随Co层厚度减少变的峰形加宽 ,衍射峰的强度减少 ,峰位移动和消失。在Co/Ti多层膜中自旋波的布里渊散射结果表明 :在Co/Ti多层膜中 ,对于dCo>2 5nm磁性呈铁磁性耦合 ,在dCo≤ 2 5nm时 ,其呈反铁磁性耦合。除表面自旋波外 ,在呈反铁磁性耦合的材料中观测到了两个有体特征的自旋波 ,而在呈铁磁耦合的材料中只观测到一个有体特征的自旋波。     

金属单层膜的小角X射线衍射强度的研究

本文对金属单层膜进行研究,在多种样品中没有发现X射线衍射峰.我们在基底上预先淀积一层重金属膜,然后再淀积所需样品,发现样品有较好的衍射峰产生.我们对此进行了探讨并提出了一个可能的理论定量解释.     

Formation of short-period multilayer W/B4C compositions

The quantitative characteristics of the interlayer interaction in multilayer W/B₄C periodic compositions produced by magnetron sputtering are studied by small-angle X-ray diffraction using CuK _?? radiation and by electron microscopy of transverse cuts. It is found that approximately 0.85 nm of the tungsten layer thickness is consumed for the formation of mixed zones at layer boundaries. The mixed layers have a density of 13.4 ± 0.7 g/cm³ and contain tungsten in a bound chemical state. The effect of these mixed zones on the X-ray reflectivity of multilayer W/B₄C compositions is estimated. A method is proposed to determine the layer thickness at a small number of peaks in an X-ray diffraction pattern.     

非尖锐界面多层膜对软X光衍射研究

本文研究超薄膜情况下,提出一个新物理模型,研究膜系内密度呈周期性连续变化时X射线正入射衍射强度理论计算,并由此得到水窗波段超薄膜设计参数,与用光学常数得到的参数非常一致。理论上推出一个质量密度呈余弦变化的多层膜仍然有高的软X光反射率。     

Effects of hydrogen flow on properties of hydrogen doped ZnO thin films prepared by RF magnetron sputtering

The hydrogen doped ZnO (ZnO:H) thin films were deposited on quartz glass substrates by radio frequency magnetron sputtering. The doping characteristics of ZnO:H thin films with varied hydrogen flow ratio were investigated. At low hydrogen flow ratio (H₂/(H₂+Ar)≤0.02), the ZnO:H thin films exhibited dominant (002) peaks from X-ray diffraction and the lattice constants became smaller. The particles were mainly a columnar structure. The particles’ size became smaller, and the island-like structure appeared on the thin films surface. In addition, the low resistivity properties of ZnO:H thin films was ascribed to the increase of the carriers concentration and carriers mobility; When the hydrogen flow ratio was more than 0.02 (M≥0.02), two absorption bands at 1400–1800 cm^?1 and 3200–3900 cm^?1 were observed from the FT-IR spectra, which indicated that the ZnO:H thin films had typical Zn–H bonding, O–H bonding (hydroxyl), and Zn–H–O bonding (like-hydroxyl). The scanning electron microscope (SEM) results show that a large number of hydroxyl agglomeration formed an island-like structure on the thin films surface. The absorption peak at about 575 cm^?1 in the Raman spectra indicated that oxygen vacancies (V_O) defects were produced in the process of high hydrogen doping. In this condition, the low resistivity properties of ZnO:H thin films were mainly due to the increasing electron concentration resulted from V_O. Meanwhile, the Raman absorption peaks at approximately 98 cm^?1 and 436 cm^?1 became weaker, and the (002) XRD diffraction peak quenched and the lattice constants increased, which shows that the ZnO:H thin films no longer presented a typical ZnO hexagonal wurtzite structure. With the increasing of hydrogen flow ratio, the optical transmittance of ZnO:H thin films in the ultraviolet band show a clear Burstein–Moss shift effect, which further explained that electron concentration was increased due to the increasing V_O with high hydrogen doping concentration. Moreover, the optical reflectance of the thin films decreased, indicating the higher roughness of the films surface. It was noteworthy that etching effect of H plasma was obvious in the process of heavy hydrogen doping.     

Deposition of ZnO multilayer on LiNbO3 single crystals by DC-magnetron sputtering

Zinc oxide (ZnO) thin films were deposited on LiNbO₃ (LN) single crystals with 200 nm thicknesses by three different ways, where coating of zinc (Zn) film was followed by thermal oxidation for four, two, and one steps with 50, 100, and 200 nm thicknesses repeatedly. Sample, which was produced at 4-step of deposition and oxidation of Zn layer, showed high transmittance and low structural defect due to a lower photoluminescence intensity and Urbach energy. Average grain size in X-ray diffraction (XRD), scanning electron microscopy (SEM) micrograph, and atomic force microscopy (AFM) images for multilayer of ZnO was lower than monolayer of ZnO thin films. Applying multilayer coating technique leads to decrease of surface roughness and scattering on light on surface and fabrication of LiNbO₃ waveguides with lower optical loss.     

TiO2和SiO2薄膜应力的产生机理及实验探索

对最常用的TiO₂和SiO₂薄膜应力, 包括应力模型、应力测试方法和不同实验条件下的应力测试结果作了研究.基于曲率法模型，对TiO₂和SiO₂单层膜和多层膜进行了实验测试，得到了一些有价值的结果，特别是离子辅助淀积和基板温度等工艺参数对薄膜应力的影响.提出了薄膜聚集密度是应力的重要因素，低聚集密度产生张应力，而高聚集密度产生压应力.在多层膜中通过调节工艺参数，适当地控制张应力或压应力，可使累积应力趋向于零. 关键词： 薄膜应力 离子辅助淀积 聚集密度     

Monte Carlo模拟计算应用于微区薄膜厚度测定

本文用Monte Carlo模拟计算了孤立薄膜和同一材料厚样中同样厚度表层的X射线强度分布函数,然后提出一简单关系式确定有衬底薄膜的X射线出射强度,以校正膜厚测定中Z.A.P.影响,使膜厚测定的准确度比前人有所提高。对GaAS,Si衬底上的Ta₂O₅膜、ZrO₂膜的测厚结果与椭圆术测定结果一致。 关键词：     

The film thickness dependent thermal stability of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>:Ag thin films as high-temperature solar selective absorbers

The monolayer Al₂O₃:Ag thin films were prepared by magnetron sputtering. The microstructure and optical properties of thin film after annealing at 700 °C in air were characterized by transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and spectrophotometer. It revealed that the particle shape, size, and distribution across the film were greatly changed before and after annealing. The surface plasmon resonance absorption and thermal stability of the film were found to be strongly dependent on the film thickness, which was believed to be associated with the evolution process of particle diffusion, agglomeration, and evaporation during annealing at high temperature. When the film thickness was smaller than 90 nm, the film SPR absorption can be attenuated until extinct with increasing annealing time due to the evaporation of Ag particles. While the film thickness was larger than 120 nm, the absorption can keep constant even after annealing for 64 h due to the agglomeration of Ag particles. On the base of film thickness results, the multilayer Al₂O₃:Ag solar selective thin films were prepared and the thermal stability test illustrated that the solar selectivity of multilayer films with absorbing layer thickness larger than 120 nm did not degrade after annealing at 500 °C for 70 h in air. It can be concluded that film thickness is an important factor to control the thermal stability of Al₂O₃:Ag thin films as high-temperature solar selective absorbers.     

Research on Raman-scattering and Fabrication of Multilayer Thin Film with Different Structures and Components Based on Pt/Ti/Si3N4/SiO2/Si Substrate

选用三水醋酸铅、乙酰基丙酮酸锆、四异丙氧基钛、乙酰丙酮作初始材料，用同样的方法分别制备了锆钛酸铅(PZT)和钛酸铅(PT)两种固体前驱物. 采用改良型的溶胶-凝胶工艺技术，分别在不同的Pt-Ti-Si₃N₄-SiO₂-Si基底上，按照不同的组合方式，制备了三种多层薄膜：PZT、PT/PZT-PZT/PT、PT/PZT/-/PZT/PT. 较详细地讨论了薄膜制备的工艺技术，发现当凝胶通过烧结和干燥后变成固态物质时，薄膜内部存在着较大的残余应力，当薄膜在600 ºC下退火时其内部残余应力可以被减小. 通过拉曼     

Microstructures and tribological properties of CrN/ZrN nanoscale multilayer coatings

Nanoscale multilayer CrN/ZrN coatings with bilayer thicknesses ranging from 11.7 to 66.7 nm were prepared by reactive magnetron sputtering techniques. The structure of the thin films was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). X-ray diffraction results showed that CrN individual layers presented a <1 1 1> preferred orientation in the multilayer coatings. The diffraction peaks of CrN shifted continuously to low diffraction angle with decreasing bilayer thickness. TEM observations showed that the multilayer did not form a superlattice structure instead of the coexistence of nanocrystalline CrN and ZrN layers. Columnar growth for all the coatings was observed by cross-sectional SEM. Nanoindentation tests showed that the multilayer coatings had almost a constant nanohardness of 29 GPa in spite of the variations of bilayer thickness. Pin-on-disk tests indicated that both the friction coefficients and wear rates increased when decreasing bilayer thickness. However, in comparison with the monolayer coating, the multilayer coatings exhibited excellent wear resistance.