飞秒激光脉冲宽度和脉冲波形测试技术

飞秒激光在激光核聚变、卫星精密测距、激光微加工等领域具有重要的应用前景，同时也是产生太赫兹波的主要泵浦源。介绍了国内外飞秒激光脉冲宽度和脉冲波形的测试方法，比较了自相关法、频率分辨光学快门法、光谱相位相干直接电场重构法的优缺点。自相关法具有脉宽测量范围广、结构简单等特点，但不具备脉冲波形测试能力。光谱相位相干直接电场重构法对待测激光光束质量要求较高, 不适合大量程范围激光脉宽快速测量。为满足10 fs~5 ps大量程范围超短激光脉冲宽度和脉冲波形的测试需求，采用自相关法及二次谐波频率分辨光学开关法研制飞秒激光脉冲宽度和脉冲波形测试仪，时间分辨率优于2 fs。     

飞秒激光脉冲的频率分辨偏振光学开关法测量研究

建立了一台频率分辨偏振光学开关（PG FROG）法飞秒脉冲测量装置，利用该装置对“极光Ⅱ号”飞秒激光放大系统进行了测量.在利用偏振光学开关法测得的时域和频域信号基础上，结合对信号光强度分布的计算机迭代处理，得到了有关飞秒激光电场、光谱及其相位的信息；并且对系统工作在不同状态时的激光脉冲进行了测量和比较分析，给出了有关该系统较详细的电场、光谱、相位以及啁啾状况.结果显示，当系统工作在零啁啾附近时，该系统输出的激光脉冲的电场、光谱和相位分布较规则，相位起伏较小；当系统偏离零啁啾状态时，虽然电场和光谱变化不很明显，但相位分布变化剧烈. 关键词： 频率分辨偏振光学开关(PG FROG)法 飞秒激光 自相关     

超短光脉冲波形研究

本文讨论了光脉冲技术发展中的脉冲波形测量问题。介绍了一种通用的光脉冲波形测量新方法,该方法可以给出光脉冲的波形、脉宽以及光脉冲内含的频率啁啾信息。这种测量方法已应用于半导体激光器产生ps光脉冲的实验研究,其可行性得到了验证。     

基于啁啾光纤布拉格光栅的掺镱保偏锁模光纤激光研究

利用啁啾光纤布拉格光栅作为光谱滤波器和色散控制元件来控制掺镱保偏锁模光纤激光的光谱形状和腔内色散.实验装置采用线性腔设计,利用半导体饱和吸收镜作为锁模器件,实现掺镱保偏光纤激光器的被动锁模激光输出.当泵浦功率为52 mW时,获得了脉冲宽度为4.26ps,重复频率为15.7 MHz,平均功率为9.8mW的稳定锁模脉冲激光输出.输出激光中心波长为1 030nm,3dB谱宽为7.2nm,对应理想傅里叶变换极限脉宽约为150fs.     

基于光纤光参量放大的光脉冲压窄技术的研究

在高重复频率的光窄脉冲源中,为了获得更窄的脉冲,需要增加泵浦功率|但泵浦功率的提高会使光放大器的增益趋于饱和,放大的自发辐射噪音增强,脉冲光信噪比下降.为此,提出了利用啁啾管理和光纤光参量放大相结合的脉冲压窄方案.将强度调制后的泵浦光通过相位调制引入线性负啁啾,由于经参量过程后在新的闲频光上啁啾会加倍,从而进一步增大了信号的谱宽,并通过色散补偿介质实现了光脉冲压缩.实验给出了10 GHz速率下的结果,通过泵浦光的相位调制在0.5 W平均泵浦光功率条件下得到了脉宽19 ps的光脉冲,结果与理论分析基本吻合.     

利用啁啾光纤光栅色散特性实现波长可调谐的主动锁模掺铒光纤环行腔激光器

在环形腔主动锁模光纤激光器中引入啁啾光纤光栅，利用啁啾光纤光栅的大色散特性，通过调节调制频率，实现波长调谐，调谐范围2nm。所得脉冲为重复频率2．5GHz，脉宽约60ps的正啁啾脉冲，。     

紫外超短脉冲激光放大过程中脉宽压缩的方案设计

采用放电泵浦KrF准分子激光放大器放大波长为248.4nm的紫外超短脉冲激光。对于能量为0.7mJ、脉宽为550fs的输入脉冲,在光束直径保持10mm不变的条件下,能量放大到15mJ,脉宽展宽到1200fs。为了压缩输出脉冲宽度,分析了群速度色散和自相位调制效应对脉宽展宽的影响。利用棱镜对,采用4种不同的实验方案对脉冲引入负的线性频率啁啾,以补偿KrF准分子激光放大器CaF2窗镜中的群速度色散和自相位调制对脉冲引入的正的线性频率啁啾。结果表明:在放大器之前放置棱镜对的方式可以在保持输出脉冲能量为15mJ的同时,在棱镜对间距为110cm的条件下,将输出脉冲宽度压缩到370fs,输出波长为248.4nm、带宽为0.4nm。     

大信号增益区的宽带OPCPA系统特性分析

 利用大啁啾信号光脉冲的光谱在时域内的分布特点，采用四阶龙格-库塔算法对宽光谱的光参量啁啾脉冲放大（OPCPA）激光器特性进行了数值分析。以LBO晶体为增益介质，信号光脉冲宽度取100 ps、啁啾系数为1 000，中心波长为800 nm；泵浦光的中心波长为532 nm，脉宽为100 ps。数值计算结果表明：信号光的非线性相位变化的中心部分为线性分布区，且随增益饱和的程度增大而增大；系统的功率转换效率有准振荡结构，且其第一个极值点为系统能量最大的转换率点；随着系统进入增益饱和区，压缩光脉冲的对比度明显降低，预脉冲长度显著增大。     

电子束泵浦KrF激光器进行超短脉冲的单束放大实验研究

电子束泵浦KrF激光器口径大、泵浦率高 ,可直接用于进行超短脉冲激光的放大。用天光一号电子束泵浦KrF激光器进行超短脉冲激光放大 ,将超短脉冲激光放大到 2～ 3J、1.2 ps,激光功率达到 2TW。测量了石英窗镜中的非线性吸收系数和超短脉冲激光脉宽的变化     

电子束泵浦KrF激光器进行超短脉冲的单束放大实验研究

 电子束泵浦KrF激光器口径大、泵浦率高，可直接用于进行超短脉冲激光的放大。用天光一号电子束泵浦KrF激光器进行超短脉冲激光放大，将超短脉冲激光放大到2~3J、1.2ps, 激光功率达到2TW。测量了石英窗镜中的非线性吸收系数和超短脉冲激光脉宽的变化。     

Analysis of a spark-preionized large-volume XeF and KrF discharge laser

A uv-preionized discharge-excited XeF and KrF laser has been operated with various fluorine donors. Results of a parametric study of laser performance as a function of gas composition, total pressure, electrode voltage, and energy loading are presented. The effects of easily ionizable seed gases were also studied. Results include demonstration of highest energy per pulse (0.18 J for XeF and 0.30 J for KrF) and longest lasing pulse (70 ns) reported for any similar device. Ion recombination reactions are suggested as the major processes for XeF¹ and KrF¹ excimer formation.     

Generation and focusing of submilliwatt-average-power 50-nm pulses by the fifth harmonic of a KrF laser

We demonstrate generation and focusing of 49.7-nm pulses with an average power of 0.1 mW at 200 Hz and with a pulse energy of >1 microJ at 10 Hz by the fifth harmonic of a femtosecond KrF laser. The fifth harmonic is selected and focused with a concave Sc/Si multilayer mirror to a diameter of 2microm, resulting in a peak intensity of 0.5 TW/cm(2), which will make extreme-ultraviolet nonlinear optics feasible. A novel single-shot linear in situ method of spot-size measurement by use of self-trapped exciton luminescence is also demonstrated.     

Simultaneous single-shot imaging of OH and O2 using a two-wavelength excimer laser

A technique is described for simultaneous single-shot imaging of OH and O₂. Laser-induced fluorescence of both molecules is excited by a tunable KrF laser, which is operated simultaneously on two wavelengths. By using two CCD detectors with image intensifiers and suitable filters, separate images of OH and O₂ distributions in H₂/O₂ and hydrocarbon/air flames were obtained.     

Output and picosecond amplification characteristics of an efficient and high-power discharge excimer laser

Improvements in output pulse energy and efficiency of a conventional capacitor-transfer-type discharge excimer laser with automatic preionization have been achieved by extending the discharge volume and resulting moderate pumping of the active medium. The discharge laser produces a pulse energy of more than 1 J for XeCl, KrF, and ArF lasers in square beams of about 2×2 cm², and the maximum overall efficiency observed is 2.9% for XeCl, 3.2% for KrF and 1.8% for ArF. The laser device has been involved in a picosecond ( 32 ps) XeCl laser amplification system, and was operated as an amplifier at a repetitive frequency of 10 Hz. Saturation fluence for XeCl laser was measured to be 1.4 mJ/cm², and the picosecond pulse energy of 40 mJ was extracted from the amplifier.On leave from Ebara Corp., 6-6-7, Ginza, Chuo-ku, Tokyo 104, JapanOn leave from Mitsubishi Heavy Industries, LTD., 4-6-22, Kan-on shinmachi, Nishi-ku, Hiroshima 733, Japan     

超短脉冲分布反馈染料激光器稳定工作条件分析

 利用耦合波理论，分析了一种作为KrF准分子激光MOPA系统的振荡源-亚皮秒超短脉冲分布反馈染料激光器（DFDL）的输出模式，指出实际的分布反馈染料激光器工作在单纵模状态是周期性增益调制的必然结果。数值模拟结果表明，DFDL输出光谱出现多条谱线的精细结构或调制现象，这是由多个顺序相干脉冲产生的。可以利用这种光谱调制现象来控制激光器的泵浦强度，获得稳定的单脉冲。光谱测量结果表明，在2倍泵浦阈值左右DFDL能够获得稳定的单模单脉冲输出。     

10 ps High Power Laser System at 248 nm

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10 ps High Power Laser System at 248 nm

A simple 10 ps KrF laser system consisting of quenched dye laser oscillator pumped by a XeCl laser, a distributed feedback dye laser (DFDL), a three-stage dye amplifier and a two-stage KrF amplifier are described. The output of the laser system is 140 mJ with 10 ps pulse width by using polarization-multiplexing amplification. A focused output laser intensity of about 4×1015 W/cm2 is obtained. The saturation fluence for KrF laser is obtained with this laser.     

Generation of femtosecond vacuum-ultraviolet pulses

High power femtosecond pulses in the Vacuum Ultra Violet (VUV) have been generated through the nonlinear interaction of femtosecond KrF pulses with xenon and argon gas. Under near resonant two photon excitation of xenon by a femtosecond KrF laser, parametric four wave mixing processes lead to VUV pulses at 147 and 108 nm with pulse energies in the 10 µJ range. Tuning is demonstrated by mixing the KrF pulse with a 500 fs dye laser pulse at 497 nm, resulting in 165 nm emission. In argon, a three photon resonance leads to third harmonic generation at 83 nm and micro joule level pulses near 127 nm generated by a six wave mixing process. Since the spectra of the VUV pulses show an ionization-induced blue shift with increasing KrF laser intensity, the VUV pulses can be shown to have temporal duration less than the pulse width (450 fs) of the KrF laser. Blue shifting of the third harmonic of the KrF laser in argon is dominated by a reduction in the neutral gas density rather than by an increase in the electron density.     

宽带KrF激光泵浦SBS的研究

 理论和实验研究了宽带（15GHz）KrF激光泵浦的受激布里渊散射（SBS）在SF₆介质中的转换效率和脉宽压缩比的规律。介质在1.6MPa、透镜焦距为15cm和30cm时，测得SBS最大反射率分别为40%和45%，当泵浦能量大于60mJ时SBS反射率开始趋于平坦；介质在0.85MPa、透镜焦距在30cm时，SBS脉宽压缩比随泵浦能量的上升而下降，最大压缩比为5。建立了宽带多模KrF激光泵浦的SBS理论模型，假设宽带KrF激光光谱谱线由若干窄带谱线组成，这些窄带谱线之间在产生SBS过程中有一定程度的耦合。给出了理论模型结果，并与实验结果进行了比较。     

Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process

A collinear irradiation system of F₂ and KrF excimer lasers for high-quality and high-efficiency ablation of hard materials by the F₂ and KrF excimer lasers’ multi-wavelength excitation process has been developed. This system achieves well-defined micropatterning of fused silica with little thermal influence and little debris deposition. In addition, the dependence of ablation rate on various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number is examined to investigate the role of the F₂ laser in this process. The multi-wavelength excitation effect is strongly affected by the irradiation timing, and an extremely high ablation rate of over 30 nm/pulse is obtained between -10 ns and 10 ns of the delay time of F₂ laser irradiation. The KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing F₂ laser fluence. Moreover, the ablation rate shows a linear increase with the logarithm of KrF excimer laser fluence when the F₂ laser is simultaneously irradiated, while single KrF excimer laser ablation shows a nonlinear increase. The ablation mechanism is discussed based on these results. Received: 16 July 2001 / Accepted: 27 July 2001 / Published online: 2 October 2001