硅中掺铒发光的研究现状和前景

硅在微电子学领域有着极其广泛的应用，但它是一种间接能隙半导体，发光器件领域是它的缺项，利用在硅中掺入发光中心─—铒，已经研制出一种新的发光二极管（Ｓｉ：ＥｒＬＥＤ），它的发光波长是１．５３μｍ，恰好满足石英光纤通信的要求。进一步提高输出功率后，Ｓｉ：ＥｒＬＲＤ将可用作光纤通信用的单片光电子集成电路的光源部件。介绍了Ｓｉ：Ｅｒ发光研究的现状，讨论它的发光机制及制约输出动率的因素，探讨提高ＬＥＤ性能的途径。     

掺铒硅多孔化后的光致发光特性

采用一种新的方法制备掺Er多孔硅.首先通过分子束外延法生长Er,O共掺的硅外延层,然后通过常规的电化学阳极腐蚀法将外延层制备成掺Er离子的纳米硅柱结构.由于实现了Er离子在多孔硅中沿深度方向的均匀分布,得到峰宽仅6nm的Er3+本征发光.同时,由于铒与氧共掺于硅柱内部,多孔硅不再需要通过高温后处理引入氧来实现铒的光学激活.实验还对多孔化前后,Er3+的发光强度作出直观的比较,讨论多孔硅可见光及红外光区域的发光对Er3+红外发射的影响. 关键词：     

掺铒硅的发光特性及机理

Ｓｉ中掺Ｅｒ是利用Ｅｒ离子的发光来制造Ｓｉ基发光二极管的一条途径,文章对掺Ｅｒ的一些基本物理特性,如铒在硅中的电子结构,电学特性以及光致发光和电致发光的机理等,根据目前研究的进展进行了综合介绍。     

室温下掺Er富硅氧化硅和掺Er富硅氮化硅的光致发光及其退火

用磁控溅射淀积掺Er氧化硅、掺Er富硅氧化硅、掺Er氮化硅和掺Er富硅氮化硅薄膜,室温下测量这四种薄膜的光致发光（PL）谱,观察到这四种薄膜都具有1.54μm的峰位,其强度与薄膜的退火温度有关。为了确定1.54μmPL的最佳退火温度,这些薄膜都分别在600,700,800,900,1000,1100℃的温度下同时退火,发现两种富硅薄膜的最佳退火温度是800℃,不富硅的两种薄膜的最佳退火温度是900℃。样品的1.54μmPL最强,且800℃退火的掺Er富硅氧化硅薄膜的1.54μm峰强度是最强的,比不富硅的强了约20倍,还观察到这四种薄膜都具有1.38μm的PL带,且掺Er富硅氧化硅和掺Er富硅氮化硅这两种薄膜的PL在强度上1.38μm峰与1.54μm峰有一定的关系。     

掺铒硅发光的晶场分裂

测量了掺铒硅的高分辨光致发光光谱，得到9条铒发光分裂谱线.利用群对称理论指出9条谱线来自Er³⁺中⁴I_13/2到⁴I_15/2光跃迁在T_d晶场下的分裂.Er³⁺的第一激发态⁴I_13/2最低能量的两个Stark能级为Γ₈，Γ₆(能量递增)，它们到基态⁴关键词：     

Si中掺Er的原子构型与电子特性

采用定域密度泛函-离散变分方法(LDF-DVM)计算了Si中掺Er的原子构型与电子特性，并计算了O共掺杂对Si中掺Er体系的原子构型与电子特性的影响.结果表明，在没有O共掺杂时，Er处于四面体间隙位置时能量最低，此时Er的5d轨道在Si的导带中引入浅的共振态.处于替代位置的Er形成能略高，Er的5d轨道在Si的导带顶附近引入了受主态.当有O存在时，体系的形成能降低，能量最低的构型是Er处于六角形间隙位置，周围有6个O，此时Er的5d轨道在Si的导带下约为0.3eV处引入杂质态.从而解释了Si中掺Er体系在 关键词：     

氧和铒共注入硅的卢瑟福背散射和发光研究

将铒和氧共注人硅中,卢瑟福背散射分析表明,退火后铒的分布剖面因共注入氧的剂量而异。在高氧剂量下,退火后铒保持退火前的剖面不变,样品再结晶良好。在中等氧剂量下,退火后铒的分布剖面出现双峰。认为退火过程中形成了铒—氧复合物。复合物的形成减缓了铒的偏析和扩散,影响了铒的削面再分布。铒和氧离子注入剂量的系列实验证实了氧在Er3+发光中有重要作用。     

掺铒Si/Al2O3多层结构中结晶形态对1.54 μm发光的影响

利用脉冲激光沉积的方法制备掺铒 Si/Al₂O₃多层结构薄膜,获得了由纳米结构的Si作为感光剂增强的Er³⁺在1.54 μm高效发光.利用拉曼散射、高分辨透射电镜和光致发光测量研究了在不同退火温度下（600—1000 ℃）纳米结构Si层的结晶形态变化,及对Er³⁺在1.54 μm的发光的影响特征.研究发现最佳发光是在退火温度600—700 ℃.在这个条件下纳米Si的尺寸和密度,Si和Er的作用距离以及Er^{3+ 关键词： 铒 纳米硅 能量转移 氧化铝}     

稀土铒离子注入多孔硅的发光

稀土离子Er注入多孔硅中.在350keV能量,1×1012~1×1015/cm2剂量范围内,注入后的多孔硅仍保持明亮的可见光发射.退火后,在近红外区测到1.54μm附近Er3+的特征发射.其发射强度比硅单晶对照样品明显增强,实验表明这增强作用来源于多孔硅的表面发光层.电化学制备过程中在表面层中带入的O、C、F等多种杂质可能是Er3+发光增强的原因.     

稀土铒离子注入多孔硅的发光

稀土离子Ｅｒ注入多孔硅中．在３５０ｋｅＶ能量，１×１０（１２）～１×１０（１５）／ｃｍ２剂量范围内，注入后的多孔硅仍保持明亮的可见光发射．退火后，在近红外区测到１．５４μｍ附近Ｅｒ（３＋）的特征发射．其发射强度比硅单晶对照样品明显增强，实验表明这增强作用来源于多孔硅的表面发光层．电化学制备过程中在表面层中带入的Ｏ、Ｃ、Ｆ等多种杂质可能是Ｅｒ（３＋）发光增强的原因．     

INFRARED EMISSION FROM Si IMPLANTED WITH HIGH Er CONCENTRATION

Erbium-doped silicon has been fabricated by ion implantation performed on a metal vapour vacuum arc ion source. After rapid thermal annealing (RTA), 1.54μm photoluminescence was observed at 77K. Rutherford backscattering spectrum indicated that Er ions are mainly distributed near the surface of the samples, and Er concentration exceeded 10²¹cm^-3. Needle nanometre crystalline silicon (nc-Si) was formed on the substrate surface. Band edge emission spectrum at 10K verified that the minority carrier lifetime increased upon RTA. The photocarrier mediated processes enabled energy transferring from nc-Si (or c-Si) to the Er³⁺ ions and resulted in light emission of 1.54μm.     

(Si,Er)双注入热氧化硅的光致发光

采用强流金属蒸汽真空弧（MEVVA）离子源注入机，先将Si大束流注入热氧化SiO2/单晶硅，直接形成镶嵌在SiO2中的纳米晶Si，再小束流注入Er。Er离子在掺杂层中的浓度可达10^21cm^-3量级，大大地提高了作为孤立发光中心的Er^3 浓度。在77K和室温下，观察到了Er^3 的1.54цm特征发射。     

铒掺杂富硅热化SiO2／Si发光薄膜的显微结构

利用金属蒸气真空弧(MEVVA)离子源将稀土元素Er离子掺杂到富硅热氧化SiO2/Si薄膜中.卢瑟福背散射(RBS)和X-射线电子能谱仪(XPS)分析表明,Er浓度可达原子百分数(x)～10,即Er的原子体浓度为～1021·     

掺铒nc-Si/SiO2薄膜中nc-Si和Er3+与非辐射复合缺陷间相互作用对薄膜发光特性的影响

对nc-Si/SiO2薄膜中纳米硅(nc-Si)、Er3+和非辐射复合缺陷三者间的关系作了研究.在514.5 nm光激发下，nc-Si/SiO2薄膜在750nm和1.54μm处存在较强的发光，前者与薄膜中的nc-Si有关，后者对应于Er3+从第一激发态4I13/2到基态4I15/2的辐射跃迁.随薄膜中Er3+含量的提高，1.54μm处的发光强度明显增强，750 nm处的发光强度却降低.H处理可以明显增强薄膜的发光强度，但是对不同退火温度样品，处理效果却有所不同.根据以上实验结果，可得如下结 关键词： Er3+ nc-Si H处理     

掺饵氢化非晶氧化硅1.54μm发光性质的研究

采用等离子体增强化学汽相沉积技术生长不同氧含量的氢化非晶氧化硅薄膜(a-SiO_{x∶H),离子注入铒及退火后在室温观察到很强的光致发光.当材料中氧硅含量比约为1和 1.76时,分别对应77Ｋ和室温测量时最强的1.54μm光致发光.从15到250Ｋ的变温实验显示 出三个不同的强度与温度变化关系,表明氢化非晶氧化硅中铒离子的能量激发和发光是一个 复杂的过程.提出氢化非晶氧化硅薄膜中发光铒离子来自于富氧区,并对实验现象进行了解 释.氢化非晶氧化硅中铒发光的温度淬灭效应很弱.从15到250Ｋ,光致发光强度减弱约1/2. 关键词： 铒 光致发光 氧含量}     

阳离子对Er3+掺杂硼酸盐玻璃结构和发光特性的影响

针对Si/Al掺杂量增大使BaO-(1-x)SiO₂-xAl₂O₃-B₂O₃-0.005Er³⁺(x=0,0.5,1,摩尔分数)玻璃样品的1 540 nm红外发光和540 nm上转换发光强度呈现相反的变化趋势,讨论了阳离子掺杂对稀土离子周边对称性和电负性变化与荧光行为的内在关系。红外傅里叶透射光谱显示,不同掺杂浓度下样品的最大声子能量没有明显变化,说明光谱随掺杂浓度的变化与玻璃体系的最大声子能量无关。根据Judd-Ofelt理论计算了⁴I_13/2和⁴S_3/2能级的光学参数,通过比较两能级的跃迁几率(A)、寿命(τ)、荧光分支比(β)和受激发射截面(σ)等光学参数,发现⁴I_13/2能级和⁴S_3/2能级的相关参数呈现相反的趋势。最后测试了样品⁴I_13/2能级下1 540 nm的寿命,进一步从电负性角度考虑了样品的发光效率。理论计算和实验结果相符。     

Photoluminescence properties of Er-doped β-FeSi2 grown by ion implantation

Photoluminescence (PL) properties of Er-doped β-FeSi₂ (β-FeSi₂:Er) and Er-doped Si (Si:Er) grown by ion implantation were investigated. In PL measurements at 4.2 K, the β-FeSi₂:Er showed the 1.54 μm PL due to the intra-4f shell transition of ⁴I_13/2→⁴I_15/2 in Er³⁺ ions without a defect-related PL observed in Si:Er. In the dependence of the PL intensity on excitation photon flux density, the obtained optical excitation cross-section σ in β-FeSi₂:Er (σ=7×10⁻¹⁷ cm²) is smaller than that in Si:Er (σ=1×10^-15 cm²). In the time-resolved PL and the temperature dependence of the PL intensity, the 1.54 μm PL in β-FeSi₂:Er showed a longer lifetime and larger activation energies for non-radiative recombination (NR) processes than Si:Er. These results revealed that NR centers induced by ion implantation damage were suppressed in β-FeSi₂:Er, but the energy back transfer from Er³⁺ to β-FeSi₂ was larger than Si:Er.     

1.54 μm emission mechanism of Er-doped zinc oxide thin films

Zinc oxide (ZnO) and Er-doped zinc oxide (ZnO:Er) thin films were formed by pulsed laser deposition, and characterized by photoluminescence (PL) and X-ray diffraction (XRD) in order to clarify the 1.54 μm emission mechanism in the ZnO:Er films. Er ions were excited indirectly by the 325 nm line of a He-Cd laser, and the comparison of the ultraviolet to infrared PL data of ZnO and ZnO:Er films showed that the 1.54 μm emission of Er³⁺ in ZnO:Er film appears at the expense of the band edge emission and the defect emission of ZnO. The crystallinity of the films was varied with the substrate temperature and post-annealing, and it was found that the intensity of the 1.54 μm emission is strongly related with the crystallinity of the films. There are three processes leading to the 1.54 μm emission; absorption of excitation energy by the ZnO host, energy transfer from ZnO to Er ions, and radiative relaxation inside Er ions, and it is suggested that the crystallinity plays an important role in the first two processes.     

Effect of concentration quenching on the spectroscopic properties of Er3+/Yb3+ co-doped AlF3-based glasses

A series of highly Er3+/Yb3+ co-doped fluoroaluminate glasses have been investigated in order to develop a microchip laser at 1.54 μm under 980 nm excitation. Measurements of absorption, emission and upconversion spectra have been performed to examine the effect of Er3+/Yb3+ concentration quenching on spectroscopic properties. In the glasses with Er3+ concentrations below 10 mol%, concentration quenching is very low and the Er3+/Yb3+ co-doped fluoroaluminate glasses have stronger fluorescence of 1.54 μm due to the 4I13/2 → 4I15/2 transition than that of Er3+ singly-doped glasses. As Er3+ concentrations above 10 mol% in the Er3+/Yb3+ co-doped samples, concentration quenching of 1.54 μm does obviously occur as a result of the back energy transfer from Er3+ to Yb3+. To obtain the highest emission efficiency at 1.54 μm, the optimum doping-concentration ratio of Er3+/Yb3+ was found to be approximately 1:1 in mol fraction when the Er3+ concentration is less than 10 mol%.