SiO2内保护层对LiB3O5晶体倍频增透膜损伤阈值的影响

 利用离子辅助电子束沉积方法在LiB₃O₅基底上镀制了不加SiO₂内保护层和加SiO₂内保护层的倍频增透膜，测量了两类薄膜在波长1 064 nm多脉冲辐照下的激光损伤阈值，获得了两种不同的损伤形貌，并对损伤原因作了初步探讨。实验结果表明：保护层的加入把由基底膜层界面缺陷吸收所决定的阈值改变到由HfO₂膜层内缺陷吸收所决定的阈值，显著提高了倍频增透膜的抗激光损伤能力。     

溶胶-凝胶法MgF2紫外增透膜的制备和性能研究

 采用溶胶-凝胶法，以醋酸镁和氟化氢为原料，以甲醇为溶剂制备了MgF₂溶胶，利用浸渍提拉法在洁净石英基片上镀膜，考察了反应温度对溶胶微结构、薄膜结构和性能的影响。样品采用激光动态光散射、透射电镜、X射线粉体衍射仪、紫外-可见光谱仪、原子力显微镜进行表征。结果表明：通过该方法制备的表面平整的低折射率MgF₂薄膜，在紫外区具有很好的增透性能，同时在紫外波长355 nm激光的辐照下（脉宽6 ns），薄膜具有较高的抗激光损伤性能，激光损伤阈值达10.85 J·cm^-2。     

不同后处理方法对溶胶-凝胶SiO2膜层抗污染能力的影响

 以正硅酸乙酯作为前驱体,利用碱催化方式制备了SiO₂溶胶,采用提拉法在K9基片上镀制SiO₂单层薄膜,分别用热处理、紫外辐射处理、氨水加六甲基二硅胺烷气氛处理和酸碱复合膜4种后处理法对膜层进行处理,采用分光光度计、红外光谱、扫描探针显微镜、静滴接触角测量仪、椭偏仪等分析了薄膜的特性,通过真空环境加速污染实验对处理前后的膜层进行抗污染能力对比,结果表明：在碱性SiO₂膜层上加镀一层酸性SiO₂膜的复合膜层整体透过率仍保持在99%以上,疏水角达到128°,膜层真空抗污染能力大大加强。     

沉积温度对LaF3薄膜性能的影响

 在189，255，277和321 ℃的沉积温度下用热舟蒸发方法制备了LaF₃薄膜。通过X射线衍射(XRD)测试了薄膜的晶体结构;采用分光光度计测量了薄膜的透射光谱，并计算得到样品的折射率、消光系数和截止波长;利用光学干涉仪测试得到了薄膜的残余应力;采用三倍频Nd:YAG脉冲激光测试了薄膜的激光损伤阈值。结果表明：随沉积温度的提高，LaF₃薄膜的结晶状况明显变好，晶粒尺寸逐渐变大；膜层变得更加致密，折射率变大，然而薄膜吸收变得严重，截止波段向长波漂移，同时薄膜的残余应力也增加，内应力在薄膜的残余应力中起着决定作用；薄膜的激光损伤阈值在高温制备时相对较高。     

缓冲层对LBO晶体上1 064 nm，532 nm增透膜附着力的影响

 采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜。利用分光光度计、纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力以及抗激光损伤性能进行了测试分析。结果表明：所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1％和0.2％;与无缓冲层样品相比,预镀Al₂O₃缓冲层样品的附着力提高了43.1％,具有SiO₂缓冲层样品的附着力显著提高,而MgF₂缓冲层的插入却导致薄膜附着力降低。应用全塑性压痕理论和剪切理论对薄膜的附着力增强机制进行了分析。薄膜的抗激光损伤性能分析表明,SiO₂缓冲层也有助于改进薄膜的激光损伤阈值。     

向列相液晶染料可调谐激光器的研究

对向列相液晶染料的可调谐激光器进行了光学特性研究. 以650 nm为中 心波长设计了SiO₂和TiO₂多层膜的一维光子晶体, 以激光染料与向列相液晶的混合物作为增益介质层, 制备了波长可调谐激光器.用Nd: YAG倍频脉冲激光器输出的532 nm激光抽运所制备的激光器样品得出如下光学特性: 激光发射波长随温度调谐范围为605.5---639.8 nm, 达到34.3 nm, 随电压调谐范围为634.5---619.5 nm, 达到15 nm. 发射激光每脉冲的阈值能量为12.3 μJ, 激光线宽小于1 nm.     

杂质对溶胶-凝胶SiO2薄膜激光损伤的影响

 采用溶胶-凝胶法制备了含有吸收性杂质和非吸收性杂质的SiO₂增透膜,采用波长为1 064 nm的激光对其进行了小光斑激光预处理,对比研究了预处理前后的激光损伤差异,研究表明：激光预处理对于洁净的SiO₂薄膜影响不大;含10 μm SiO₂颗粒杂质的样品微透镜效应很明显,容易成为损伤起始的种子,激光预处理后情况有所改善;含有CeO₂颗粒杂质的样品表现出了很强的吸收性质,损伤阈值降低到不足洁净样品的一半。所有样品激光预处理后损伤形貌未发生变化,透光率峰值均有约50 nm的蓝移。     

多孔TiO2/Al/SiO2纳米复合结构的紫外光吸收特性研究

在SiO₂玻璃衬底上用脉冲激光沉积(PLD)技术，分别沉积Ti和Ti/Al膜，经电化学阳极氧化成功制备了多孔TiO₂/SiO₂和TiO₂/Al/SiO₂纳米复合结构. 其中TiO₂薄膜上的微孔阵列高度有序，分布均匀. 实验研究了Al过渡层对多孔TiO₂薄膜光吸收特性的影响. 结果表明：无Al过渡层的多孔TiO₂薄膜其紫外吸收峰在27     

固体C60/PMMA的激发态吸收光限幅研究

应用五能级模型计算了C₆₀/PMMA的激发态吸收光限幅特性;采用调Q倍频Nd:YAG脉冲激光测量了C₆₀/PMMA的激发态吸收光限幅效应。理论和实验结果基本符合。     

LBO晶体上1064 nm,532 nm二倍频增透膜的制备和性能

采用电子束蒸发方法在三硼酸锂(LBO)晶体上制备了1064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计、MTSNanoIndenter纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力和激光损伤阈值进行了分析测试.结果表明,通过多次实验,不断改进薄膜沉积工艺条件,在LBO晶体上获得了综合性能优异的二倍频增透膜.样品在1064 nm,532 nm波长的剩余反射率分别为0.07%和0.16%,薄膜粘附失效的临界附着力和激光损伤阈值分别为137.4 mN和15.14 J/cm2,薄膜激光损伤发生在Al2O3膜层.     

Postprocessing treatments to improve the laser damage resistance of fused silica optical surfaces and SiO2 coatings

The combination of deep wet etching and a magneto-rheological finishing(MRF) process is investigated to simultaneously improve laser damage resistance of a fused-silica surface at 355 nm. The subsequently deposited SiO2 coatings are researched to clarify the impact of substrate finishing technology on the coatings. It is revealed that a deep removal proceeding from the single side or double side had a significant impact on the laser-induced damage threshold(LIDT) of the fused silica, especially for the rear surface. After the deep etching, the MRF process that followed does not actually increase the LIDT, but it does ameliorate the surface qualities without additional LIDT degradation. The combination guarantee both the integrity of the surface’s finish and the laser damage resistance of the fused silica and subsequent SiO2 coatings.     

退火对ZrO2薄膜微结构及激光损伤阈值的影响

利用电子束蒸发方法在Yb∶YAG晶体和熔融石英衬底上沉积单层ZrO2薄膜，分别在673 K和1 073 K的温度下经过12 h退火以后，通过X射线衍射（XRD）分析了薄膜晶相，计算了薄膜的晶粒尺寸;利用表面热透镜技术获得了薄膜的吸收；测量了退火后薄膜的激光损伤阈值。实验结果表明:两种衬底上的薄膜结构受到退火温度和衬底表面结构的影响，高温退火有利于单斜相的形成，含单斜相的ZrO2薄膜具有较高的激光损伤阈值，而由于衬底的吸收，Yb∶YAG晶体上薄膜的损伤阈值远小于石英衬底上薄膜的损伤阈值。     

Research on the UV Dielectric Coatings with High Damage Threshold

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溶胶-凝胶法制备疏水性自组装SiO2薄膜

 以正硅酸乙酯（TEOS）和六甲基二硅氮烷（HMDS）为前驱体,研究了引入聚乙烯吡咯烷酮（PVP）对膜层的影响,在碱催化条件下制备了改性的二氧化硅溶胶,并采用提拉涂膜的方法在石英基底上涂膜。对不同组分的薄膜,先经热处理或紫外辐照处理,然后用十八烷基三氯硅烷（OTS）/甲苯溶液对膜层表面进行化学修饰,制备出疏水性能良好的纳米二氧化硅自组装薄膜,分析了不同后处理方法对膜层透过率、接触角、膜层表面微观形貌和激光损伤阈值影响。实验结果表明：溶胶中加入PVP提高了膜层的平整度,经OTS改性后膜层疏水性和激光损伤阈值均得到提高。     

常压百级洁净度环境中SiO2薄膜稳定性

在常压百级洁净度环境下，采用三种不同折射率的SiO₂溶胶在熔石英基底上涂制四种不同薄膜，利用光学理论计算模拟了三种胶体涂制的膜层稳定性，通过实验考查了膜层光学指标随时间的变化规律。SiO₂薄膜能够显著提升光学元件透射率，但由于膜层表面的大量羟基及其多孔结构，SiO₂薄膜易吸附周围环境中的有机污染物及水分填充膜层孔隙，从而导致膜层折射率发生变化，影响膜层透射率、反射率等光学性能。实验结果发现，三种溶胶凝胶化学膜在常压百级环境中的有效期为80 d(绝对变化率小于0.1%)，且三种胶体涂制的膜层稳定性由高到低依次为折射率1.19, 1.15, 1.25的膜层。     

Influence of Annealing Temperature on Structure, Optical Loss and Laser-Induced Damage Threshold of TiO2 Thin Films

TiO2 thin films are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for 4h, the spectra and XRD patterns of the TiO2 thin film are obtained. Weak absorption of coatings is measured by the surface thermal lensing technique, and laser-induced damage threshold （LIDT） is determined. It is found that with the increasing annealing temperature, the transmittance of TiO2 films decreases. Especially when coatings are annealed at high temperature over 1173K, the optical loss is very serious. Weak absorption detection indicates that the absorption of coatings decreases firstly and then increases, and the absorption and defects play major roles in the LIDT of TiO2 thin films.     

Sol-gel preparation of a silica antireflective coating with enhanced hydrophobicity and optical stability in vacuum

A new silica antireflective coating with improved hydrophobicity and optical stability in a vacuum is obtained by a two-step route. Firstly, silica sols are prepared with a sol-gel process, in which tetraethyl orthosilicate is utilized as a precursor. And by introduction of fluorine containing glycol into the sols,the porosity of silica particles and surface polarity of the coatings are decreased. Afterward, coatings are constructed with low surface roughness by modification of PMBA-PMMA. The coatings retain transmission of up to 99.6%, and laser damage threshold of about 50 J/cm2at a wavelength of 532 nm(1-on-1, 10 ns).     

The electric field modulation by lateral crack coated with HfO2/SiO2 high reflector

High-dielectric constant multilayer coatings are commonly used on optics to increase the laser damage resistance of optics. In this work, the three-dimensional finite-difference time-domain is improved to simulate the electric field intensity distribution in the silica–hafnia multilayer coatings on fused silica subsurface with lateral crack. Results reveal that as the substrate is defect-free, the largest intensification is at the surface layer, especially in the hafnia layer. As the lateral crack appears on the subsurface of fused silica, the intensified sites are mainly located at distorted coatings layers. Dependences of peak LIEF on crack's parameters are detailed investigated. Results show that laser intensification is more sensitive to its width, and the modulation of lateral defect with silica–hafnia multilayer is greater than nodular defect as its width larger than 5λ.     

Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F(2) and KrF excimer lasers

Novel materials processing by a multiwavelength excitation process using F(2) and KrF excimer lasers for high-efficiency and high-speed refractive-index modification of fused silica is demonstrated. We find this process to be essentially superior to single-wavelength F(2) -laser processing: The multiwavelength excitation process achieves more than twice the diffraction efficiency of fused silica modified by a F(2) laser at the same total number of photons in each irradiated laser beam supplied to the fused-silica substrate. This superiority is attributed to a resonance-photoionization-like process based on excited-state absorption.     

248 nm高反膜抗激光损伤性能

用电子束蒸发法在熔融石英基底上沉积了适用于248nm的HfO2/SiO2高反膜,为提高其抗激光损伤能力,设计并制备了两种保护层,一种是在常规高反膜系的基础上镀制二分之一波长厚度的SiO2保护层,另一种是用Al2O3/MgF2做保护层。测试了3种高反膜样品的激光损伤情况,通过损伤形貌的变化分析了两种保护层使抗激光损伤能力提高的原因以及存在的问题。