Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device

The Al–C–N films are deposited on Si substrates by using a dense plasma focus(DPF) device with aluminum fitted central electrode(anode) and by operating the device with CH_4/N_2 gas admixture ratio of 1:1. XRD results verify the crystalline Al N(111) and Al_3CON(110) phase formation of the films deposited using multiple shots. The elemental compositions as well as chemical states of the deposited Al–C–N films are studied using XPS analysis, which affirm Al–N, C–C, and C–N bonding. The FESEM analysis reveals that the deposited films are composed of nanoparticles and nanoparticle agglomerates. The size of the agglomerates increases at a higher number of focus deposition shots for multiple shot depositions. Nanoindentation results reveal the variation in mechanical properties(nanohardness and elastic modulus)of Al–C–N films deposited with multiple shots. The highest values of nanohardness and elastic modulus are found to be about 11 and 185 GPa, respectively, for the film deposited with 30 focus deposition shots. The mechanical properties of the films deposited using multiple shots are related to the Al content and C–N bonding.     

Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device

The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.     

Synthesis of ZrSiN composite films using a plasma focus device

ZrSiN thin films are synthesized by using plasma focus through various numbers of focus shots （10, 20, and 30）, with samples placed at 9 cm away from the tip of the anode. Crystal structures, surface morphologies, and elemental compositions of ZrSiN films are characterized by an X-ray diffractometer （XRD） and scanning electron microscope （SEM） attached with energy dispersive X-ray spectroscopy （EDS）. XRD patterns confirm the formations of polycrystalline ZrSiN films. Crystallinity of nitride increases with the increase of focus shot number. The average crystallite size of zirconium nitride increases from 27 ± 3 nm to 73±8 nm and microstrain decreases from 2.28 to 1.0 with the increase of the focus shot number. SEM results exhibit the formations of granular and oval-shaped microstructures, depending on the number of focus shots. EDS results confirm the presences of silicon, zirconium, nitrogen, and oxygen in the composite films. The content values of Zr and N in the composite films increase with the increase of the focus shot number.     

Effects of annealing temperature on the electrical property and microstructure of aluminum contact on n-type 3C–SiC

The 3C-SiC thin films used herein are grown on Si substrates by chemical vapor deposition. A1 contacts with differ- ent thickness values are deposited on the 3C-SiC/Si （100） structure by the magnetron sputtering method and are annealed at different temperatures. We focus on the effects of the annealing temperature on the ohmic contact properties and mi- crostructure of A1/3C-SiC structure. The electrical properties of A1 contacts to n-type 3C-SiC are characterized by the transmission line method. The crystal structures and chemical phases of A1 contacts are examined by X-ray diffraction, Raman spectra, and transmission electron microscopy, respectively. It is found that the A1 contacts exhibit ohmic contact behaviors when the annealing temperature is below 550 ℃, and they become Schottky contacts when the annealing tem- perature is above 650 ℃. A minimum specific contact resistance of 1.8 × 10-4 Ω cm2 is obtained when the A1 contact is annealed at 250 ℃.     

Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process

TiO2 and ZrO2 films are deposited by electron-beam （EB） evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold （LIDT） test. It is found that the sol-gel films have lower refractive index, packing density and roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.     

Influences of Annealing on Residual Stress and Structure of HfO2 Films

HfO2 films are deposited on BK7 glass substrates by electron beam evaporation. The influences of annealing between 100℃ and 400℃ on residual stresses and structures of HfO2 films are studied. It is found that little differences of spectra, residual stresses and structures are obtained after annealing at lower temperatures. After annealing at higher temperatures, the spectra shift to short wavelength, the residual stress increases with the increasing annealing temperature. At the same time, the crystallite size increases and interplanar distance decreases. The variations of optical spectra and residual stress correspond to the evolutions of structures induced by annealing.     

Effects of Substrate Temperature and Vacuum Annealing on Properties of ITO Films Prepared by Radio-Frquency Magnetron Sputtering

Indium tin oxide （ITO） films were prepared by rf magnetron sputtering under two conditions： （i） at substrate temperature Ts from room temperature （RT） to 350℃ （ii） with additional post-annealing in vacuum at 400℃ for 30 min in comparison of their crystalline structures, and electrical-optical properties of the films deposited. From the experimental results, it is found that, under the first condition, the crystalline structures and the electrical-optical properties of the films are improved with the increasing Ts. Under the other condition, i.e. with the additional post-annealing, the films exhibit higher degree of crystallinities and better electrical-optical properties. Under the two deposition conditions, inter-relation between electrical-optical properties and the crystalline structure is observed clearly. However, even under the same annealing condition, it is observed that improved properties of the films are different, depending on their deposition temperatures, which implies that an initial stage of the ITO film before annealing is an important factor for the film＇s properties improved after annealing. The resistivity of 2.33 × 10-4 Ω·cm can be achieved at Ts of 350℃after annealing.     

A Spectroscopic Ellipsometry Study of TiO2 Thin Films Prepared by dc Reactive Magnetron Sputtering： Annealing Temperature Effect

TiO2 thin films are obtained by dc reactive magnetron sputtering. A target of titanium （99.995%） and a mixture of argon and oxygen gases are used to deposit TiO2 films on to silicon wafers （100）. The crystalline structure of deposited and annealed film are deduced by variable-angle spectroscopic ellipsometry （VASE） and supported by x-ray diffractometry. The optical properties of the films are examined by VASE. Measurements of ellipsometry are performed in the spectral range O. 72-3.55 e V at incident angle 75^o. Several SE models, categorized by physical and optical models, are proposed based on the ＇simpler better＇ rule and curve-fits, which are generated and compared to the experimental data using the regression analysis. It has been found that the triple-layer physical model together with the Cody-Lorentz dispersion model offer the most convincing result. The as-deposited films are found to be inhomogeneous and amorphous, whereas the annealed films present the phase transition to anatase and rutile structures. The refractive index of TiO2 thin films increases with annealing temperature. A more detailed analysis further reveals that thickness of the top sub-layer increases, whereas the region of the bottom amorphous sub-layer shrinks when the films are annealed at 300℃.     

Influence of Different Substrates on Laser Induced Damage Thresholds at 1064nm of Ta2O5 Films

Ta2O5 films are prepared on Si, BK7, fused silica, antireflection （AR） and high reflector （HR） substrates by electron beam evaporation method, respectively. Both the optical property and laser induced damage thresholds （LIDTs） at 1064 nm of Ta2O5 films on different substrates are investigated before and after annealing at 673 K for 12 h. It is shown that annealing increases the refractive index and decreases the extinction index, and improves the O/Ta ratio of the Ta2O5 films from 2.42 to 2.50. Moreover, the results show that the LIDTs of the Ta2O5 films are mainly correlated with three parameters： substrate property, substoichiometry defect in the films and impurity defect at the interface between the substrate and the films. Details of the laser induced damage models in different cases are discussed.     

Structural and Optical Properties of Zinc Nitride Films Prepared by Pulsed Filtered Cathodic Vacuum Arc Deposition

Polycrystalline zinc nitride films are deposited on Coming 7059 glass substrates by pulsed filtered cathodic vacuum arc deposition （PFCVAD）. The crystallographic structure is studied by means of x-ray diffraction. These measurements show that all the films are crystallized in the cubic structure, in a preferred orientation along the （332） and （631） directions. Weak XRD signal shows small crystallites distributed in an amorphous tissue. A small improvement of crystallinity is observed with annealing. Optical parameters such as absorption, energy band gap, Urbach tail, extinction coefficients have been determined. The Urbach tail energy is decreased with annealing at 500℃ for one hour. Energy band gap values are found to be increased by annealing.     

Synthesis of flower-shape clustering GaN nanorods by ammoniating Ga2O3 films

Flower-shape clustering GaN nanorods are successfully synthesized on Si（111） substrates through ammoniating Ga2O3/ZnO films at 950℃. The as-grown products are characterized by x-ray diffraction （XRD）, scanning electron microscope （SEM）, field-emission transmission electron microscope （FETEM）, Fourier transform infrared spectrum （FTIR） and fluorescence spectrophotometer. The SEM images demonstrate that the products consist of flower-shape clustering GaN nanorods. The XRD indicates that the reflections of the samples can be indexed to the hexagonal GaN phase and HRTEM shows that the nanorods are of pure hexagonal GaN single crystal. The photoluminescence （PL） spectrum indicates that the GaN nanorods have a good emission property. The growth mechanism is also briefly discussed.     

Structural Properties of Cr<Superscript>3+</Superscript>-Doped Cadmium Oxide Nanopowders

The Cr³⁺-doped cadmium oxide nanopowder is prepared at room temperature by a mild and simple solution method. The prepared powder is characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), optical, electron paramagnetic resonance (EPR) and Fourier transform infrared (FT-IR) techniques. The XRD powder pattern reveals the lattice structure and cell parameters are evaluated. The SEM image shows the stone-like morphology of the nanopowder. The optical absorption spectrum indicates the distorted octahedral site symmetry of Cr³⁺ ions. The crystal field Dq and interelectronic repulsion parameters B and C are evaluated. The EPR spectrum gives a resonance signal at g = 1.973 for Cr³⁺ ions. The FT-IR spectrum reveals the characteristic vibrations of cadmium oxide.     

An investigation of phase transformation of titania slag using microwave heating

The influences of microwave heating on the phase transformation of titania slag were systematically investigated. The thermal stability, surface chemical functional groups and microstructure of the titania slag before and after microwave heating, at a temperature of 950?°C for 60 min, were also analyzed using thermogravimetry and differential thermal analysis (TG-DSC), Fourier transform infrared spectroscopy (FT-IR) spectrum and scanning electron microscope (SEM), respectively. The TG-DSC analysis revealed that the phase transformation of the titania slag from anatase TiO₂ to rutile TiO₂ occurred between 750 and 1000 °C. The FT-IR rustles demonstrate that the banding form of Ti⁴⁺, Ti³⁺ and Ti²⁺ ions and the methyl groups on the surface of the titania slag has changed and a new chemical bond Ti–OH was formed. The results of SEM showed that a large number of regulation rutile TiO₂ crystals were found on the surface of the microwave-treated samples and the synthetic rutile has been synthesized successfully using microwave heating.     

溶胶-凝胶法合成Sr3MgSi2O8:Eu3+ 红色荧光粉及其发光性能

采用溶胶-凝胶法合成了Sr_3MgSi_2O_8∶Eu~(3+)红色荧光粉,并通过X射线衍射(XRD)、傅立叶变换红外光谱(FTIR)、扫描电镜(SEM)以及荧光光谱(PL)、X射线光电子能谱(XPS)等分析方法,对不同烧结温度(950,1 050,1 150,1 250℃)热处理4 h后得到的粉体的物相、形貌及发光性能进行了表征分析。由XRD表征结果可知,制备出的样品为正交晶系的Sr_3MgSi_2O_8;由扫描电镜及比表面积的测试结果可知,经过1 150℃热处理得到的荧光粉具有最大比表面积,可达到90.213 1 m~2/g,且粒径大小均一;由红外光谱图可知:样品中含有Si—O—Si、Mg—O和Sr—O化学键;在394 nm的激发波长下,所有样品在614 nm和702 nm处出现了强发射峰,分别对应于Eu~(3+)的~5D_0→~7F_2和~5D_0→~7F_4跃迁,属红光发射。随着热处理温度的升高,样品所对应的发射峰强度呈现出先增大后减小的变化趋势,即出现温度猝灭效应;经1 150℃热处理合成的Sr_3MgSi_2O_8∶Eu~(3+)红色荧光粉的发光性能最好,即最佳的热处理温度为1 150℃。     

水热制备Sr（MoO4）x（WO4）1-x固溶体微晶及其发光性能

采用水热法制备了Sr（MoO₄）_x（WO₄）_1-x固溶体微晶。通过X射线粉末衍射（XRD）、傅里叶变换红外光谱（FT-IR）、扫描电镜（SEM）和荧光分析（FA）表征了微晶的结构、表面形貌和发光性能。XRD和FT-IR结果表明制备的Sr（MoO₄）_x（WO₄）_1-x微晶皆呈现典型的四方晶相白钨矿结构。SEM结果表明制备的微晶为表面光滑且粒径均匀的球形颗粒。荧光发射光谱显示,在275 nm紫外光激发下,随着x值的增加,Sr（MoO₄）_x-（WO₄）_1-x固溶体微晶在350 nm处的发射逐渐减弱,470 nm处的发射逐渐增强。     

HA/Bioglass composite films deposited by pulsed laser with different substrate temperature

In this experiment, the HA/Bioglass composite films on Ti–6Al–4V were deposited by a pulsed laser at Ar atmosphere, and the influence of substrate temperature on the morphology, phase constitutions, bonding configurations and adhesive strength of the films was studied. The obtained films were characterized by an electron probe microanalyzer (EPMA), scanning electron microscope (SEM), X-ray diffractometer (XRD), Fourier transform infrared spectrometer (FTIR), scratch apparatus, and so on. The results show that the amount of the droplets, the crystallinity, and the critical load of the deposited films all increase with the increase of the substrate temperature; however, the substrate temperature has little influence on the functional groups of the films.     

铁的氢氧化合物稳定相α, β-FeOOH的表征及光谱分析

铁的氢氧化合物稳定相针铁矿(α-FeOOH)及四方纤铁矿(β-FeOOH)的合成材料因具有纳米颗粒粒径、较高比表面积,在工业生产和环境治理中被广泛应用。α,β-FeOOH作为重金属等污染物的吸附材料尤受关注。但其合成过程中溶液pH值和反应条件(如不同温度下加热或室温磁力搅拌等)对α,β-FeOOH矿物材料晶型、颗粒形貌、尺寸和界面特性的影响及其与矿物环境功能的相关性报道较少。故本工作基于Fe(NO₃)₃和FeCl₃溶液在一定pH值范围内分别易于形成α-FeOOH和β-FeOOH稳定相,利用X射线衍射仪、透射/扫描电子显微镜和激光粒度分析仪对加热(40和70 ℃)和磁力搅拌(25 ℃)条件下形成的矿物α, β-FeOOH的晶型和颗粒形貌结构进行了鉴定与表征,同时利用红外光谱仪测定了矿物表面的特征结构基团。研究结果表明,40和70 ℃反应温度下形成的矿物Aka-T40, Aka-T70, Gth-T70具有颗粒均一、结晶型较好、比表面积较大等特性,是良好的去除环境污染物的吸附剂材料。     

溶胶-凝胶法制备Zn2SiO4:Eu3+红色荧光粉

采用溶胶-凝胶法在Zn2SiO4基质中掺杂Eu3+,合成了红色荧光粉Zn2SiO4:Eu3+.通过样品的X射线衍射光谱、红外光谱、扫描电镜以及光致发光光谱的测试和表征,研究了Zn2SiO4:Eu3+的内部结构和发光特性.扣描电镜结果显示样品为球状荧光粉,颗粒直径为1～3μm.在395 nm激发下,样品在613 nm处发射出很强的红光.结合荧光光谱,分析了样品的退火温度,Eu3+的浓度,电荷补偿剂Li+的浓度对样品发光强度的影响.研究发现,红色荧光粉Zn2SiO4:Eu3+的发光强度随退火温度的升高而增加,发光强度随Eu3+和Li+浓度的增加先增大后减小.     

Characterization of MoO<Subscript>3</Subscript> nanobelt cathode for Li-battery applications

Molybdenum trioxide (MoO₃) and PPy_xMoO₃ (x=0.5 and 1) nanobelts were obtained by the simple hydrothermal process from MoO₃ sol. The morphology and structure of the samples were characterized using X-ray diffractometry (XRD), Fourier transformation infrared spectroscopy (FTIR), Raman spectra, SEM and AFM. The results show that the H atoms in polypyrrole are H-bonded with the O atoms in the Mo=O bonds of MoO₃ nanobelts. Using the electrolyte, we fabricated electrochemical cells with a configuration of Li/(LiPF₆+EC+DMC)/(MoO₃+acetyleneblack+PTFE) and studied discharge profiles. PACS 81.07.BC; 81.05.Je; 82.47.Aa; 82.45.Fk; 82.45.Gj     

磷酸盐玻璃微球的制备

采用粉末飘浮法制备了磷酸盐玻璃微球。通过使用差热分析仪,X射线衍射仪,扫描电镜和傅里叶变换红外光谱仪对所制备的磷酸盐玻璃微球的性能进行表征。研究结果表明:磷酸盐玻璃微球的玻璃转化温度和析晶温度为580℃和930℃,主晶相为Mg3(PO4)2,直径约为5μm。所制备的磷酸盐玻璃微球可以用于光学微腔的研究。