大光腔小垂直发散角InGaAs/GaAs/AlGaAs半导体激光器

提出并实现了新型隧道再生耦合大光腔半导体激光器，近场光斑宽度达到1μm，较普通半导体激光器提高了一个数量级，有效地解决了普通半导体激光器由于发光面积狭窄而导致的端面灾变性毁坏和垂直发散角大的问题. 采用低压金属有机物化学气相沉积方法生长了以C和Si分别作为掺杂剂的AlGaAs隧道结、GaAs/InGaAs应变量子阱有源区和新型半导体激光器外延结构，并制备出器件，其垂直发散角为20°，阈值电流密度为277A/cm2，斜率效率在未镀膜时达到0.80W/A. 关键词： 半导体激光器 大光腔 隧道再生     

941nm 2%占空比大功率半导体激光器线阵列

计算了半导体激光器的激射波长与量子阱宽度以及有源层中In组分的关系,确定了941nm波长的量子阱宽度和In组分.并利用金属有机化合物气相淀积(MOCVD)技术生长了InGaAs/GaAs/AlGaAs分别限制应变单量子阱激光器材料.利用该材料制成半导体激光器线阵列的峰值波长为940.5 nm,光谱的FWHM为2.6 nm,在400 μs,50 Hz的输入电流下,输出峰值功率达到114.7 W(165 A),斜率效率高达0.81 W/A,阈值电流密度为103.7 A/cm2;串联电阻5 mΩ,最高转换效率可达36.9%.     

载流子输运和寄生参数对隧道再生双有源区垂直腔面发射激光器调制特性的影响

建立了一种适用于多量子阱和多有源区的多层速率方程模型. 通过小信号分析,得到了光子密度、载流子俘获、逃逸和隧穿时间等关键参数对单有源区和隧道再生双有源区垂直腔面发射激光器频率响应特性的影响,并分析了在相同驱动电流下隧道再生双有源区器件调制带宽大于单有源区器件的原因. 进一步研究了隧道再生双有源区内腔接触氧化限制型垂直腔面发射激光器的寄生电参数及其寄生电路,对其频率响应进行了模拟分析. 关键词： 垂直腔面发射激光器 速率方程 调制特性 隧道再生     

高功率AlGaAs/GaAs单量子阱远结激光器及其老化特性

为了提高器件的可靠性和使用寿命,设计并研制了一种将p-n结和有源层分开的高功率AlGaAs／GaAs单量子阱远异质结(SQW-RJH)激光器,发射波长为808nm,腔长900μm,条宽100μm,其外延结构与通常的808nm AlGaAs／GaAs单量子阱半导体激光器的结构不同,在p-n结和有源区间多了一层p型AlGaAs层,其厚度约为0．1μm。为减小衬底表面位错对外延层质量的影响,在n^ -GaAs衬底和n-Al0．5Ga0．5As下包层间加一层n^ -GaAs缓冲层。对器件进行了电导数测试及恒流电老化实验。与常规AlGaAs／GaAs大功率半导体激光器相比,远结大功率半导体激光器具有阈值电流Ith偏大、导通电压Vth偏高的直流特性。3000h的恒流电老化结果表明,器件在老化初期表现出阈值电流随老化时间缓慢下降,输出功率随老化时间缓慢上升的远结特性。     

InGaAsP/InGaP/GaAs单量子阱激光器工作特性

利用低压-金属有机化学汽相沉积(LP-MOCVD)方法研制出InGaAsP/InGaP/GaAs单量子阱大功率激光器并分析了阈值电流密度、特征温度和外微分量子效率与腔长的关系.     

半导体激光器

TN248.4 2004010136 大功率半导体激光器的可靠性研究=Reliability of highpower semiconductor laser diodes[刊,中]/曹玉莲(中科院长春光机所.吉林,长春(1300220),王乐…∥发光学报.—2003,24(1).—100-102 对InGaAs/A1GaAs和InGaAsP/GaAs有源区含铝的915nm和无铝的808nm腔面镀膜及未镀膜的大功率半     

双波长外腔面发射激光器

双波长激光光源在干涉测量、非线性频率变换产生中红外及太赫兹波段相干辐射等方面有重要的应用.外腔面发射激光器具有输出功率高、光束质量好、发射波长可设计等突出优势,非常适合用于双波长的产生.用有源区为In0.185Ga0.815As/GaAs应变多量子阱、设计波长为960 nm,以及有源区为In0.26Ga0.74As/GaAsP0.02应变多量子阱、设计波长为1080 nm的两块半导体增益芯片,在一个共线Y型谐振腔中,获得了激光波长分别为953 nm和1100 nm的双波长输出,对应光谱线宽为1.1 nm和2.7 nm,波长间隔147 nm.室温下,每块增益芯片的抽运吸收功率均为5.8 W时,双波长激光器总的输出功率达到293 mW.     

多有源区隧道再生半导体激光器稳态热特性

 利用有限元软件ANSYS结合傅里叶定律,对制约适用于光纤耦合输出的新型高功率多有源区隧道再生半导体激光器长寿命工作的稳态热特性进行了系统计算、分析。获得了这种新型器件工作时各有源区温度分布特征及与传统单有源区器件稳态热特性的区别,并给出了多有源区隧道再生半导体激光器工作时各有源区温度的估算方法,同时对有效降低这种新型器件热阻的方法进行了讨论。结果表明:连续工作时,多有源区隧道再生半导体激光器比同材料体系传统结构器件更易获得较高的输出功率。     

利用InAs/GaAs数字合金超晶格改进InAs量子点有源区的结构设计

利用分子束外延技术,通过InAs/GaAs数字合金超晶格代替传统的直接生长InGaAs层的方式,在GaAs(100)衬底上生长了InAs量子点结构并成功制备了1.3μm InAs量子点激光器.通过原子力显微镜和光致荧光谱测试手段,对传统生长模式和数字合金超晶格生长模式的两种样品进行了表征,研究发现采用32周期InAs/GaAs数字合金超晶格样品的量子点密度非常高,发光性能良好.通过与常规生长方式所制备激光器的性能对比,发现采用InAs/GaAs数字合金超晶格生长InAs量子点的有源区也可以得到高质量的激光器.利用该方式生长的InAs量子点激光器的阈值电流为24 mA,相应的阈值电流密度仅为75 A/cm2,最高工作温度达到120℃.InAs/GaAs数字合金超晶格既可以保证生长过程中源炉的温度保持不变,还可以对InGaAs层的组分实现灵活调控.不需要改变生长速度,通过改变InAs/GaAs数字合金超晶格的周期数以及InAs层和GaAs层的厚度,便可以获得任意组分的InGaAs,从而得到不同发光波长的激光器.这种生长方式对量子点有源区的结构设计和外延生长提供了新思路.     

高功率垂直腔面发射半导体激光器优化设计研究

与传统的端发射半导体激光器相比，垂直腔面发射半导体激光器（VCSEL）具有可单模输出，光束对称性好，可被高度聚焦，进入光纤的耦合效率极高和有利于大规模二维列阵等优 点.为了得到高功率的激光输出，除了要增大VCSEL的发射面积之外，关键的是要选择适 当的量子阱层数、有源区电流密度的均匀分布和良好的热管理等.本文详细研究和分析了高功率VCSEL有源区量子阱层数，有源区直径，材料的热导和电阻，电极间距等对VCSEL 器件性能的影响.通过优化参数，进行最佳设计，研制出了980 nm In0.2Ga0.8As/Ga 关键词： 垂直腔面发射激光器（VCSEL） 量子阱 高功率     

A tunnel regenerated coupled multi-active-region large optical cavity laser with a high quality beam

A novel coupled multi-active-region large optical cavity structure cascaded by a tunnel junction is proposed to solve the problems of facet catastrophic optical damage (COD) and the large vertical divergence caused by the thin emitting area in conventional laser diodes. For a laser with three active regions, a slope efficiency as high as 1.49 W/A, a vertical divergence angle of 17.4 , and a threshold current density of 271 A/cm 2 are achieved. By optimizing the structural parameters, the beam quality is greatly improved, and the level of the COD power increases by more than two times compared with that of the conventional laser.     

Tunnel regenerated coupled multi-active-region large optical cavity laser with high quality beam

A novel coupled multi-active-region large optical cavity structure cascaded by tunnel junction is proposed to solve the problems of catastrophic optical damage (COD) of facet and large vertical divergence caused by the thin emitting area in the conventional laser diode. For the laser with three active regions, a slope efficiency as high as 1.49 W/A, a vertical divergence angle of 17.4°, and a threshold current density of 271 A/cm² are achieved. By optimizing the structure parameters, the beam quality is greatly improved, and the level of COD power increases more than two times compared with that of the conventional laser.     

A Novel Kind of Transverse Micro-Stack High-Power Diode Bars

Novel transverse micro-stack semiconductor laser bars are put forward to improve the output optical power of semiconductor laser bars at low injection current. More importantly, the novel laser bars have a coupled large optical cavity, which can overcome the problem of catastrophic optical damage and improve light beam quality due to the coherently coupled emitting along the transverse direction. The micro-stack tunnel regeneration tri-active region laser structure was grown by metal organic chemical vapour deposition. For a weakly coupled uncoated device, the optical power exceeds 60 W under 50 A driving current and the slope efficiency reaches 1.55 W/A. Further experiments show that the perpendicular divergence of 23° is achieved from transverse strongly coupled devices.     

隧道再生四有源区大功率半导体激光器

利用隧道再生原理实现半导体激光器在低注入电流下的高光功率输出。通过传输矩阵法对隧道再生四有源区光耦合半导体激光器的模式特性进行了理论分析,指出器件的激射模式应为TE3,且存在最优的内限制层厚度。利用金属有机物化学气相沉积(MOCVD)外延法生长了内限制层厚度分别为0.3μm、0.5μm和0.7μm的器件。内限制层厚度等于0.5μm的器件的P-I特性最好,腔面未镀膜时,在2 A的注入电流下其光输出功率大于5 W,P/I斜率达2.74 W/A。结果表明,为了得到尽可能高的光输出功率,需要合理地设计隧道再生多有源区激光器的内限制层厚度。     

Properties of (InGa)As/GaAs QW (λ ≈ 1.2 µm) facet-coated edge emitting diode laser

In this paper, we report on the design and optical properties of laser diodes with an emission wave-length of ～1170 nm based on an (InGa)As/GaAs double quantum well active layer. The back and front facet of the laser diodes were coated with SiO_x dielectric films that influence the output optical power by enhancing or lowering the facet reflectivity. The measurements show improvement of the facet-coated laser diode properties in the threshold-current-density reduction along with light output power enhancement. Furthermore, a narrow far field pattern and high side mode suppression have been observed.     

Facet-embedded thin-film III-V edge-emitting lasers integrated with SU-8 waveguides on silicon

A thin-film InGaAs/GaAs edge-emitting single-quantum-well laser has been integrated with a tapered multimode SU-8 waveguide onto an Si substrate. The SU-8 waveguide is passively aligned to the laser using mask-based photolithography, mimicking electrical interconnection in Si complementary metal-oxide semiconductor, and overlaps one facet of the thin-film laser for coupling power from the laser to the waveguide. Injected threshold current densities of 260A/cm(2) are measured with the reduced reflectivity of the embedded laser facet while improving single mode coupling efficiency, which is theoretically simulated to be 77%.     

Channeled substrate window twin stripe GaAs/GaAlAs visible laser: Fabrication and steady state analysis

GaAs/GaAlAs high power window stripe lasers are developed with straight ac-tive layer in region adjacent to facet and curved active layer in central part.Only one-step liq-uid-phase epitaxy(LPE)growth is used in the fabvrication to from two internal current patheslaterally,allowing of a very simple fabrication process.Optical coupling from two stimulatingregions makes less beam divergence.The steady state analysis of such laser structure agreewell with experimental results.     

Multiple quantum well structures and high-power lasers of gaas- algaas grown by metalorganic vapor phase epitaxy (MOVPE)1

GaAs/AlGaAs GRIN-SCH type multiple quantum well lasers with four wells of 11 nm GaAs, grown in an MOVPE chimney reactor, exhibit an output power as high as 110 mW/facet (CW, 30°C; 5 μm stripe) and 1.3 W/facet (pulsed, 30°C; 53 μm stripe) until catastrophic optical damage occurs. 2000 hours life tests conducted at 60°C and 15 mW CW show no noticeable degradation for the 5 μm stripe laser with a reflective coating on both facets. Raman spectroscopy on similar multiple quantum well structures with 65 GaAs wells is used to ascertain that the wells have minimum residual aluminum- content.