Electroluminescence from thin SiO2 layers after Si- and C-coimplantation

In this paper we explore the electroluminescence (EL) properties of thermally grown 350 nm thick SiO₂ layers co-implanted with Si⁺ and C⁺ ions. The implanted fluences were chosen in such a way that peak concentrations of excess Si and C of 5–10 at% were achieved. The devices show a broad photoluminescence (PL) between 2.0 and 3.2 eV with a main peak around 2.7 eV. The broad EL spectra show additional peaks around 3.3 eV and between 2.1 and 2.5 eV which are decreased with increasing Si/C concentration. The shape of the EL spectra does not change with increasing injection currents which implies that various types of defects occur for the different concentrations. The device stability is improved in comparison to Ge or Sn implanted oxide layers.     

Room temperature photoluminescence from Zr-doped sol-gel silica

Intense room-temperature photoluminescence (PL) from the UV to the green region was observed from Zr⁴⁺-doped silica synthesized by a sol-gel process using tetraethoxysilane as the precursor, followed by thermal treatment at 500 °C in air. The wide PL band can be resolved into three components centered at 3.70, 3.25, and 2.65 eV, respectively. The intensity of the 3.25 and 2.65 eV PL bands was greatly enhanced compared with pure sol-gel silica. The 3.70 eV emission was assigned to non-bridging oxygen hole centers, while the 2.65 eV one originated from neutral oxygen vacancies (V_O). The 3.25 eV PL band was most likely associated with E′ centers, as supported by electron spin resonance measurement. It was proposed that the Zr⁴⁺-doping leads to oxygen deficiency in the silica, thus resulting in enhancement of the density of V_O and E′ center defects.     

Electroluminescence of Si-SiO2 structures subjected to sequential ion implantation with silicon and carbon

The electroluminescence of Si-SiO₂ structures subjected to sequential implantation with 130-and 60-keV silicon ions and 60-keV carbon ions into a silicon dioxide layer is investigated. It is found that implantation of the structures with silicon and carbon ions is responsible for the electroluminescence bands with maxima at energies of approximately 2.7 and 4.3 eV. It is assumed that these bands are associated with the formation of silylene centers. Postimplantation annealing leads to a decrease in the intensity of the observed electroluminescence bands and gives rise to a shoulder in the short-wavelength wing of the band with a maximum at 2.7 eV.     

Silicon negative ion implantation induced vacancy defects in thermally grown SiO2 thin films

ABSTRACT

Thermally grown SiO₂ thin films on a silicon substrate implanted with 100?keV silicon negative ions with fluences varying from 1?×?10¹⁵ to 2?×?10¹⁷ ions cm^?2 have been investigated using Electron spin resonance, Fourier transforms infrared and Photoluminescence techniques. ESR studies revealed the presence of non-bridging oxygen hole centers, E′-centers and P_b-centers at g-values 2.0087, 2.0052 and 2.0010, respectively. These vacancy defects were found to increase with respect to ion fluence. FTIR spectra showed rocking vibration mode, stretching mode, bending vibration mode, and asymmetrical stretching absorption bands at 460, 614, 800 and 1080?cm^?1, respectively. The concentrations of Si–O and Si–Si bonds estimated from the absorption spectra were found to vary between 11.95?×?10²¹ cm^?3 and 5.20?×?10²¹ cm^?3 and between 5.90?×?10²¹ cm^?3 and 3.90?×?10²¹ cm^?3, respectively with an increase in the ion fluence. PL studies revealed the presence of vacancies related to non-bridging oxygen hole centers, which caused the light emission at a wavelength of 720?nm.     

Nonradiative relaxation of photoexcited O<Stack><Subscript>1</Subscript><Superscript>0</Superscript></Stack> centers in glassy SiO<Subscript>2</Subscript>

The processes involved in the excited-state relaxation of hole O ₁ ⁰ centers at nonbridging oxygen atoms in glassy SiO₂ were studied using luminescence, optical absorption, and photoelectron emission spectroscopy. An additional nonradiative relaxation channel, in addition to the intracenter quenching of the 1.9-eV luminescence band, was established to become operative at temperatures above 370 K. This effect manifests itself in experiments as a negative deviation of the temperature-dependent luminescence intensity from the well-known Mott law and is identified as thermally activated external quenching with an energy barrier of 0.46 eV. Nonradiative transitions initiate, within the external quenching temperature interval, the migration of excitation energy, followed by the creation of free electrons. In the final stages, this relaxation process becomes manifest in the form of spectral sensitization of electron photoemission, which is excited in the hole O ₁ ⁰ -center absorption band.     

Concentration of Cr<Superscript>4+</Superscript> impurity ions and color centers as an indicator of saturation of forsterite crystals Mg<Subscript>2</Subscript>SiO<Subscript>4</Subscript> with oxygen

The influence of the oxygen partial pressure P _{O 2} in the growth atmosphere on the coefficient of chromium distribution between the crystal and the melt of forsterite, the Cr³⁺ and Cr⁴⁺ ion contents in crystals, and the concentration of color centers induced by irradiation has been investigated. It has been established that the crystals grown at low oxygen partial pressures P _{O 2} (0.01–0.05 kPa) are characterized by low concentrations of Cr⁴⁺ ions and color centers. A change in the oxygen partial pressure to P _{O 2} ∼ 0.85 kPa leads to an increase in the Cr⁴⁺ center concentration by a factor of ∼10 and in the color center concentration by a factor of ∼5. A further increase in the oxygen partial pressure to P _{O 2} to 12 kPa remains the concentration of these centers almost unchanged. A model has been proposed according to which the intrinsic defects formed under conditions of a relative excess of oxygen leads to both the self-oxidation of chromium and the formation of color centers in the forsterite crystals under irradiation.     

Electron-excited luminescence of SiO2 layers on silicon

An analysis of cathodoluminescence and electroluminescence spectra of Si-SiO₂ structures suggests a conclusion concerning the processes involved in excitation of the luminescence centers generated in the UV spectral region and their localization. The electroluminescence observed in this region of the spectrum is generated in excitation of luminescence centers localized in the immediate vicinity of the Si-SiO₂ phase boundary. In the case of cathodoluminescence, the observed emission bands at ??4.3 and ??2.7 eV appear in excitation of the luminescence of silylene centers at the Si-SiO₂ phase boundary.     

Gap levels of Ti<Superscript>3+</Superscript> on Nb or Li sites in LiNbO<Subscript>3</Subscript>:(Mg):Ti crystals and their effect on charge transfer processes

The Ti dopant occupying Li or Nb sites and the charge transfer processes induced by thermochemical reduction and optical bleaching treatments have been investigated in LiNbO₃ systems using optical absorption and EPR. The Ti³⁺ centers, built preferentially at Nb sites in heavily Mg-codoped crystals, are shown to have absorption bands at 1.62±0.08 eV and 2.65±0.25 eV, which are similar or slightly redshifted compared to Ti³⁺ centers at Li sites in LiNbO₃:Ti crystals. The Ti_Nb^4+/3+ gap level plays an important role in the trapping of electron-polarons in LiNbO₃, double-doped with Mg and Ti; in particular, an enhanced optical detrapping sensitivity for pumping in the 1.3–2.8 eV range is observed, which may be relevant for applications in integrated optics. Evidence indicating the possible existence of bipolarons involving the Ti dopant is presented. PACS 77.84.Dy; 71.55.Ht; 71.38.-Mx; 78.40.Ha; 76.30.Fc     

Charge trapping phenomena in high-efficiency metal-oxide-silicon light-emitting diodes with ion-implanted oxide

This work is a comparative study of the processes of charge trapping in silicon dioxide layers doped with different rare-earth (RE) impurities (Gd, Tb, Er) as well as with Ge. Diode SiO₂-Si structures incorporating such oxide layers exhibit efficient electroluminescence (EL) in the spectral range of UV to IR. Ion implantation was performed over a wide dose range with the implant profiles peaking in the middle of the oxide. Charge trapping was studied using an electron injection technique in constant current regime with simultaneous measurements of the EL intensity (ELI). High-frequency C/V characteristics were used to monitor the net charge in the oxides.Analysis of the charge trapping and the variation of the EL intensity during electron injection shows that the current density range can be divided in three portions: (i) low injection level, where electron/hole capture at traps with large capture cross-sections and low ELI occurs; (ii) medium injection level corresponding to the main operation mode of the devices (odd hole trapping depending on the injected current level is observed); and (iii) high injection level (electrical quenching of the EL that correlates with electron capture at traps of extremely small capture cross-sections takes place). The nature of specific hole trapping at the medium injection level in RE-doped devices is discussed. Mechanisms of EL quenching at the high injection level are proposed.     

Electron paramagnetic resonance of Ce<Superscript>3+</Superscript> and Nd<Superscript>3+</Superscript> impurity ions in YBa<Subscript>2</Subscript>Cu<Subscript>3</Subscript>O<Subscript>6.13</Subscript>

The electron paramagnetic resonance (EPR) spectra of Ce³⁺ and Nd³⁺ impurity ions in unoriented powders of the YBa₂Cu₃O_6.13 compound are observed and interpreted for the first time. It is demonstrated that, upon long-term storage of the samples at room temperature, the EPR signals of these ions are masked by the spectral line (with the g factor of approximately 2) associated with the intrinsic magnetic centers due to the significant increase in its intensity.     

Injection and thermodepolarization currents in GaSe <Co> single crystals

The current-voltage characteristics (CVC) at different temperatures, the temperature dependence of electric conductivity [σ(T)] and the currents of thermostimulated depolarization (TSD) have been studied in GaSe <0.05 at.% Co> on a combined basis.The location depth (E_t=0.57eV) and the concentration of traps (N_t=2.7x10¹²cm^?3) have been determined from the temperature dependence of the trapping factor. In the course of TSD investigations, levels with location depths of 0.28±0.02 and 0.57±0.03 eV have been revealed. It is noted that traps with the energy of 0.57±0.03 eV are found both with TSD measurements and on the basis of the temperature dependence of the electric conductivity and the trapping factor.It has been established that the hole centres above the valence band are responsible for the CVC, σ(T) and TSD. The location depths, concentrations and trapping cross-sections of these centres have been determined.     

Electronic excitations and defects in nanostructural Al<Subscript>2</Subscript>O<Subscript>3</Subscript>

A time-resolved cathodo-and photoluminescence study of nanostructural modifications of Al₂O₃ (powders and ceramics) excited by heavy-current electron beams, as well as by pulsed synchrotron radiation, is reported. It was found that Al₂O₃ nanopowders probed before and after Fe⁺ ion irradiation have the same phase composition (the γ-phase/δ-phase ratio is equal to 1), an average grain size equal to ～17 nm, and practically the same set of broad cathodoluminescence (CL) bands peaking at 2.4, 3.2, and 3.8 eV. It was established that Al₂O₃ nanopowders exhibit fast photoluminescence (PL) (a band at 3.2 eV), whose decay kinetics is described by two exponential stages (τ₁ = 0.5 ns, τ₂ = 5.5 ns). Three bands, at 5.24, 6.13, and 7.44 eV, were isolated in the excitation spectrum of the fast PL. Two alternate models of PL centers were considered, according to which the 3.2-eV luminescence either originates from radiative relaxation of the P^? centers (anion-cation vacancy pairs) or is due to the formation of surface analogs of the F⁺ center (F _S ⁺ -type centers). In addition to the fast luminescence, nano-Al₂O₃ was found to produce slow luminescence in the form of a broad band peaking at 3.5 eV. The excitation spectrum of the 3.5-eV luminescence obtained at T = 13 K exhibits two doublet bands with maxima at 7.8 and 8.3 eV. An analysis of the luminescent properties of nanostructural and single-crystal Al₂O₃ suggests that the slow luminescence of nanopowders at 3.5 eV is due to radiative annihilation of excitons localized near structural defects.     

Temperature dependent photoluminescence of PECVD a-SiOx:H (x<2)

The temperature dependent visible photoluminescence (PL) property of a-SiO_x:H (x<2) samples prepared in a PECVD system by using SiH₄+CO₂ gas mixture is investigated at a temperature range of 20 K-400 K. One of the two explicitly distinguished PL bands, with varying peak photon energies between 1.70 and 2.05 eV, can be detected at only low temperatures below 200 K, which is attributed to tail-to-tail radiative recombination. Thermal quenching parameter (T_L) of the tail-to-tail PL band is calculated as varying between 120 and 280 K as the atomic oxygen concentration ([O]at.%) of the samples increases. Stokes shift (ΔE_Stokes) of the tail-to-tail PL band is found to change from 85 meV to 420 meV due to band tail widening. The other PL band emerges at 2.1 eV and can be detected at higher temperatures with thermal activation behavior. The activation energies calculated about room temperature vary in the range of 8 meV-50 meV with oxygen concentration. Thermal activation of the 2.1 eV PL band is attributed to the behavior of thermally activated incoherent hopping migration of electrons. These electrons combine with self trapped holes (STHs) to form self trapped excitons (STEs). STEs are localized at intrinsic defects of SiO₂ structure such as oxygen vacancies (E′ centers) and non-bridging oxygen hole centers (NBOHC).     

Correlation of charge trapping and electroluminescence in highly efficient Si-based light emitters

In this paper we report on recent results on charge trapping and electroluminescence (EL) from Ge rich SiO₂ layers. Thermally grown 80 nm thick SiO₂ layers were implanted with Ge ions at energies of 30–50 keV to peak concentrations of 1–6 at%. Subsequently rapid thermal annealing was performed at 1000°C for 6, 30 and 150 s under a nitrogen atmosphere in order to form luminescence centers. A combination of capacitance–voltage (CV) and current–voltage (IV) methods was used for the investigation of the trapping properties. It was found that at electric fields <8 MV/cm electron trapping dominates while at higher electric fields which are typically required for the EL operation of the devices positive charge trapping occurs. It is assumed, that the trapping sites which are responsible for the trapping of the positive charge are in strong relation to the defects causing the luminescence.     

Luminescence and electronic excitations in Li<Subscript>6</Subscript>Gd(BO<Subscript>3</Subscript>)<Subscript>3</Subscript>: Ce<Superscript>3+</Superscript> crystals

This paper reports on a study of the luminescence emitted by Li₆Gd(BO₃)₃: Ce³⁺ crystals under selective photoexcitation to lower excited states of the host ion Gd³⁺ and impurity ion Ce³⁺ within the 100–500-K temperature interval, where the mechanisms of migration and relaxation of electronic excitation energy have been shown to undergo noticeable changes. The monotonic 10–15-fold increase in intensity of the luminescence band at 3.97 eV has been explained within a model describing two competing processes, namely, migration of electronic excitation energy over chains of Gd³⁺ ions and vibrational energy relaxation between the ⁶ I _j and ⁶ P _j levels. It has been shown that radiative transitions in Ce³⁺ ions from the lower excited state 5d ¹ to ² F _5/2 and ² F _7/2 levels of the ground state produce two photoluminescence bands, at 2.08 and 2.38 eV (Ce1 center) and 2.88 and 3.13 eV (Ce2 center). Possible models of the Ce1 and Ce2 luminescence centers have been discussed.     

Energy spectrum of electron trapping centers in CuInAsS<Subscript>3</Subscript>

This paper presents the results of the investigation of the energy spectrum of electronic states due to trapping centers, the role of which in CuInAsS₃ is played by lattice defects. The results of the analysis of the thermally stimulated current curves of CuInAsS₃ demonstrate that the energy spectrum of trapping centers is localized under the bottom of the conduction band in the energy range E _C–(0.14–0.35) eV.     

Effect of hydrogen defects on nanocrystallite layers of Si solar cells by hydrogen implantation

The Si solar cells were irradiated with high energy hydrogen ions of 10, 30, 60 and 120?keV at the dose rate of 10¹⁷ H⁺ ions (proton)/cm². The structural, optical and electrical properties of the implanted samples and fabricated cells were studied. The implantation induced defects bringing structural changes before and after annealing was evidenced by the transmission electron microscopy. The Raman spectrum showed a change of crystalline to amorphous state at 480?cm^?1 when the sample was implanted by hydrogen ion of 30?keV energy. Formation of nanocrystallite layers were observed after annealing. The electroluminescence images showed that hydrogen-related defect centers were involved in the emission mechanism. The photoluminescence emission from the implanted cells was attributed to nanocrystallite layers. From current–voltage measurements, the conversion efficiencies of implanted Si solar cells were found lower than the un-implanted reference cell. The ion implantation did not passivate the defects rather acted as recombination centers.     

Trapping levels in PbI2

A first investigation on trapping levels in PbI₂, performed by the Thermally Stimulated Current (TSC) technique, is presented. Three hole trapping centers are evidenced at 0.12, 0.29 and 0.59 eV above the valence band, with densities ranging between 8 × 10¹⁴ and 5 × 10¹⁶ cm^?3 and capture cross-sections between 8 × 10^?21 and 3 × 10^?17 cm². The center at 0.59 eV is likely responsible for the relatively short trapping time in PbI₂, as determined with nuclear techniques. By using a particular method, the behaviour of hole drift mobility along the layers as a function of temperature is determined for the first time. Finally, the presence of a spurious peak, not sensitive to irradiation, is reported and discussed.     

Kinetics of electron tunneling transfer in KH<Subscript>2</Subscript>PO<Subscript>4</Subscript> and NH<Subscript>4</Subscript>H<Subscript>2</Subscript>PO<Subscript>4</Subscript> crystals with hydrogen bonds

A model of electron transfer by tunneling between trapped electron and hole centers in crystals with hydrogen bonds under the conditions of thermostimulated mobility of one carrier type in the recombination process has been developed. The proposed model describes all features in the kinetics of induced optical density relaxation observed in nonlinear optical crystals of KH₂PO₄ (KDP) and NH₄H₂PO₄ (ADP) on a wide temporal scale (10⁻⁸–10 s) under pulsed irradiation. The results of model calculations have been compared with experimental data on the photoinduced transient optical absorption (TOA) in KDP and ADP crystals in the visible and UV ranges. The nature of the radiation-induced defects, which account for the TOA, and the dependence of the TOA decay kinetics on the temperature, excitation power, and other experimental conditions have been considered.     

Radiation induced paramagnetic centres in MgOAl2O3SiO2 glasses containing TiO2

Upon irradiation with ⁶⁰Co γ-rays Cordierite glasses with added TiO₂ display two dominant ESR resonances arising from (a) Ti³⁺ ions (b) holes trapped at non-bridging oxygen ions singly bonded to [SiO₄]^? tetrahedra. The Ti³⁺ ions appear to be in D_4h octahedral sites with the evident distributions between the principal g values arising from an isotropic randomness at the titanium sites. However, the g parameter distributions of the hole resonance, and their changes during the addition of TiO₂ indicate the development of Silicate structures in the glasses which are the precursors of the major low temperature crystalline phases. The invariance of the hole and electron resonance lines with pre-crystallization heat treatments indicates that neither the titanium associated structures or the basic silicate structure of the glass are changed by such treatments.