Pr0.7(Sr1-xCax)0.3MnO3多晶体系中的小极化子性质

采用基于柠檬酸体系的溶胶-凝胶法制备了Pr0.7(Sr1-xCax)0.3MnO3系列的多晶块材, 同时还用脉冲激光沉积技术(PLD)在SrTiO3(100)衬底上外延生长了同一系列的薄膜, 系统研究了它们的晶格结构和电输运行为. 多晶和薄膜样品都具有正交晶格结构, 电输运行为在居里温度TC以上的高温顺磁相都很好地符合了绝热小极化子模型. 用绝热小极化子模型对两者的电阻率温度曲线进行拟合, 多晶和薄膜样品的拟合结果在定性上是一致的. 随着Ca掺杂量的增加, 极化子跳迁能Ehop变大,ρ0先减小后增大. 实验结果说明, 只要多晶样品制备的质量好, 缺陷、晶界的影响可以大大降低, 多晶样品的电输运行为也能表现出本征的小极化子性质.     

Er硅酸盐化合物薄膜的相转变和光致发光特性研究

溶胶-凝胶法在Si(100)基片上旋涂法制备铒硅酸盐化合物（Er silicate）薄膜.系统研究了烧结温度和烧结时间对Er silicate薄膜相结构、相转变以及光致发光特性的影响.在1000 ℃以下,薄膜晶体结构为Er₂O₃ 晶体和SiO₂ 非晶的混合物.随着烧结温度增加到1200 ℃,保温时间增加到30 min,薄膜晶体结构转变成(100),(200)和(300)择优取向的Er₂SiO₅相. 关键词： 发光学 光学薄膜 溶胶-凝胶法 铒硅酸盐     

在SrTiO3基底上用溶胶-凝胶法制备CeO2缓冲层

CeO2是目前被广泛研究的能与YBCO超导材料有良好晶格匹配的缓冲层材料,溶胶-凝胶法是一种成本低廉的非真空制备薄膜的方法,如果能用这种方法制备质量良好的CeO2薄膜,则可降低YBCO覆膜导体制备的成本.本文通过一种以Ce(NO3)3*6H2O为先驱液相的溶胶体系,在SrTiO3(100)基底上用溶胶-凝胶方法制备了CeO2薄膜.研究了不同热处理温度对CeO2薄膜晶粒生长的影响.为了避免CeO2薄膜表面微裂纹的形成,研究了在烘干和热解过程中所采用的有效方法.利用TGA,DSC,SEM和XRD,对CeO2薄膜的吸热放热过程、表面形貌和相组成进行了分析.结果表明,该溶胶经旋涂、120℃下烘干以及直接300℃热解后,再在600℃下烧结,可制得无裂纹和孔洞、表面质量良好的CeO2薄膜.     

采用溶胶凝胶协同自组装方法制备SiO2反蛋白石结构薄膜及其光学性质研究

研究了溶胶凝胶协同自组装制备大面积高质量SiO₂反蛋白石结构薄膜的方法. 向单分散的聚苯乙烯(PS)胶体溶液中添加SiO₂前驱物溶液,用垂直自组装法一步得到微球空隙中均匀填充有凝胶的 复合PS胶体晶体薄膜,在空气中烧结去除PS后得到SiO₂反蛋白石结构薄膜.通过对添加前驱物溶液比例、 自组装温度以及烧结温度等参数的研究,用不同粒径的PS微球制备了不同孔径的高质量SiO₂反蛋白石结构薄膜. 用扫描电子显微镜和X射线能量色散谱仪对制备得到的薄膜样品进行显微形貌和成分表征,并测试了其透射光谱. 结果表明:溶胶凝胶协同自组装法制备的SiO₂反蛋白石结构薄膜大面积高度有序,孔径可以控制且选择范围宽; 薄膜的透射光谱带隙明显,带隙中心波长与理论计算结果相符.     

溶胶-凝胶VO2薄膜转换特性研究

利用溶胶凝胶法在SiO2Si衬底上沉积高取向的V2O5薄膜,在压强低于2Pa,温度高于400℃的条件下,对V2O5薄膜进行真空烘烤,获得了电阻率变化3个数量级以上、弛豫宽度为62℃的VO2多晶薄膜.以X射线衍射(XRD)、扫描电子显微镜(SEM)图和电阻率转换特性等实验结果为依据,详细分析了溶胶凝胶薄膜在真空烘烤时从V2O5向VO2的转化,它经历了从VnO2n+1(n=2,3,4,6)到VO2的过程.实验证明,根据选择合适的成膜热处理条件和真空烘烤条件是实现溶胶凝胶V2O5结构向VO2结构成功转换的关键 关键词： 溶胶-凝胶法 氧化钒薄膜 VO2膜转换特性     

采用溶胶-凝胶法制备nc-Si/SiO2薄膜

溶胶-凝胶方法是近年发展起来的一种新型的材料制备技术，被广泛的应用于薄膜、均匀超细粉末和陶瓷涂层的制备中。本文以正硅酸乙酯(TEOS)为原料，在乙醇共溶剂和盐酸催化剂条件下，采用溶胶-凝胶方法制备含有纳米晶硅（nc-Si）的SiO2胶体溶液，通过旋涂法使溶剂迅速挥发而迅速凝胶化，经过适当温度的干燥和烧结制备了nc—Si／SiO2薄膜。探讨了胶体粘度、盐酸催化剂浓度、旋涂速度和时间对成膜质量的影响。给出了nc—S／SiO2薄膜的扫描电镜图像和表征nc-Si／SiO2薄膜组分的能谱图。     

溶胶-凝胶法制备高折射率TiO2薄膜

 采用溶胶- 凝胶法制备了TiO₂纳米晶溶胶，并以旋涂法（spin-coating）镀制了高折射率光学薄膜。借助光散射技术和透射电镜研究了溶胶的微结构。采用原子力显微镜、场发射扫描电镜、紫外-可见-近红外光谱仪、椭偏仪、漫反射吸收光谱及强激光辐照实验，对膜层的结构、光学性能及抗激光损伤性能进行了系统的表征。结果显示:纳米晶薄膜的折射率达到了1.9，而传统的溶胶-凝胶薄膜折射率只有1.6；同时纳米晶薄膜的抗激光损伤阈值与传统的溶胶-凝胶薄膜相差不大，在1 064 nm处分别为16.3 J/cm²(3 ns脉冲) 和16.6 J/cm²(3 ns脉冲);纳米晶溶胶薄膜可以在保持较高抗激光损伤阈值情况下，大幅度提高薄膜折射率。     

La掺杂浓度对PLZT薄膜红外光学性质的影响

采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱，采用经典色 散模型拟合获得PLZT薄膜的红外光学常数，同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大，折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外，呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ 关键词： PLZT薄膜 红外光学性质 红外椭圆偏振光谱     

CdSyTe1-y多晶薄膜的制备及光谱表征

采用真空共蒸发法制备了CdSyTe1-y(0≤y≤1)多晶薄膜,并用X射线衍射谱(XRD)、能量色散谱(EDS)研究了CdSyTe1-y多晶薄膜的结构、组分。实验结果表明:石英振荡法监控的组分与EDS谱结果较为一致;当y<0·3时,CdSyTe1-y多晶薄膜为立方结构,当y≥0·3时,CdSyTe1-y多晶薄膜为六方结构。采用XRD线形分析法可计算出CdSyTe1-y多晶薄膜晶粒大小约20～50nm。最后,用紫外-可见-近红外谱(UV-Vis-NIR),测得300～2500nmCdSyTe1-y多晶薄膜的透过率曲线,并结合一阶Sellmeier模型的折射率色散关系,表征了CdSyTe1-y多晶薄膜的光学性质,获得了CdS0·22Te0·78多晶薄膜的光学厚度d～535nm,光能隙Eg～1·41eV,以及吸收系数α(λ)、折射率n(λ)等光学量。结果也表明,采用真空共蒸发法可以制备需要组分的CdSyTe1-y多晶薄膜,对CdSyTe1-y多晶薄膜光学性质的表征方法可推广到其他的半导体薄膜材料。     

溶胶-凝胶软石印法制备Zn2SiO4:Mn图案化薄膜及其发光性能的研究

采用溶胶-凝胶法制备了Zn2SiO4:Mn薄膜并结合毛细管微模板技术实现了薄膜的图案化,利用X射线衍射(XRD),原子力显微镜,光学显微镜,发光光谱等手段对Zn2SiO4:Mn的结晶过程、发光性质进行了研究.XRD结果表明,溶胶-凝胶法合成的样品在800℃时已开始结晶,在1000℃时可得到纯相的Zn2SiO4:Mn,这比传统的固相法的烧结温度低150℃.Zn2SiO4:Mn薄膜的激发光谱在220nm和280nm之间有一个强的吸收峰,峰值位于248nm,发射光谱的最大值位于522nm,为绿光发射.从原子力显微镜照片可知组成薄膜的粒子比较均匀,其平均直径为220nm.我们获得了四种图案化宽度,分别是5,10,20,50μm.光学显微镜的结果表明,图案薄膜烧结后相对于烧结前有10%～20%的收缩.     

Bipolar doping and band-gap anomalies in delafossite transparent conductive oxides

Doping wide-gap materials p type is highly desirable but often difficult. This makes the recent discovery of p-type delafossite oxides, CuM(III)O2, very attractive. The CuM(III)O2 also show unique and unexplained physical properties: Increasing band gap from M(III) = Al,Ga, to In, not seen in conventional semiconductors. The largest gap CuInO2 can be mysteriously doped both n and p type but not the smaller gaps CuAlO2 and CuGaO2. Here, we show that both properties are results of a large disparity between the fundamental gap and the apparent optical gap, a finding that could lead to a breakthrough in the study of bipolarly dopable wide-gap semiconductor oxides.     

Structural and magnetic characterization of the complete delafossite solid solution (CuAlO?)?-x(CuCrO?)x

We have prepared the complete delafossite solid solution series between diamagnetic CuAlO(2) and the t(2g)(3)frustrated antiferromagnet CuCrO(2). The evolution with composition x in CuAl(1-x)Cr(x)O(2) of the crystal structure and magnetic properties has been studied and is reported here. The room-temperature unit cell parameters follow the Végard law and increase with x as expected. The μ(eff) is equal to the Cr(3+) spin-only S = 3/2 value throughout the entire solid solution. Θ(CW) is negative, indicating that the dominant interactions are antiferromagnetic, and its magnitude increases with Cr substitution. For dilute Cr compositions, the nearest-neighbor exchange coupling constant J(BB) was estimated by mean-field theory to be 3.0 meV. Despite the sizable Θ(CW), long-range antiferromagnetic order does not develop until x is almost 1, and is preceded by glassy behavior. The data presented here, and those on dilute Al substitution from Okuda et al, suggest that the reduction in magnetic frustration due to the presence of non-magnetic Al does not have as dominant an effect on magnetism as chemical disorder and dilution of the magnetic exchange. For all samples, the 5 K isothermal magnetization does not saturate in fields up to 5 T and minimal hysteresis is observed. The presence of antiferromagnetic interactions is clearly evident in the sub-Brillouin behavior with a reduced magnetization per Cr atom. An inspection of the scaled Curie plot reveals that significant short-range antiferromagnetic interactions occur in CuCrO(2) above its Néel temperature, consistent with its magnetic frustration. Uncompensated short-range behavior is present in the Al-substituted samples and is likely a result of chemical disorder.     

Defect properties of CuCrO₂:A density functional theory calculation

Using the first-principles methods,we study the formation energetics properties of intrinsic defects,and the charge doping properties of extrinsic defects in transparent conducting oxides CuCrO2.Intrinsic defects,some typical acceptortype,and donor-type extrinsic defects in their relevant charge state are considered.By systematically calculating the formation energies and transition energy,the results of calculation show that,V Cu,O i,and O Cu are the relevant intrinsic defects in CuCrO2 ;among these intrinsic defects,V Cu is the most efficient acceptor in CuCrO2.It is found that all the donor-type extrinsic defects have difficulty in inducing n-conductivity in CuCrO2 because of their deep transition energy level.For all the acceptor-type extrinsic defects,substituting Mg for Cr is the most prominent doping acceptor with relative shallow transition energy levels in CuCrO2.Our calculation results are expected to be a guide for preparing promising n-type and p-type materials in CuCrO2.     

Magnetodielectric CuCr0.5V0.5O2: an example of a magnetic and dielectric multiglass

The complex dielectric susceptibility and spin glass properties of polycrystalline CuCr(0.5)V(0.5)O(2) delafossite have been investigated. Electron diffraction, high resolution electron microscopy and electron energy loss spectroscopy show that the Cr(3+) and V (3+) magnetic cations are randomly distributed on the triangular network of CdI(2)-type layers. In contrast to CuCrO(2), CuCr(0.5)V(0.5)O(2) exhibits two distinctive (magnetic and electric) glassy states evidenced by memory effects in electric and magnetic susceptibilities. A large magnetodielectric coupling is observed at low temperature.     

Ab initio materials design for transparent-conducting-oxide-based new-functional materials

Based upon ab initio electronic structure calculations for delafossite CuAlO₂ and ZnO, we report on the design of new-functional materials for transparent conducting oxides (TCO), such as (i) low-resistive p-type ZnO and CuAlO₂ by co-doping, (ii) high-efficiency thermoelectric power in CuAlO₂ (ZT>3) by p-type doping, (iii) half-metallic ferromagnetism in transition-metal-impurity doped CuAlO₂ and ZnO-based diluted magnetic semiconductors, and (iv) CaO, MgO, SrO and BaO based DMS without transition metal impurities. We also discuss the implementation of the self-interaction correction to our materials design method. PACS 61.72.Bb; 61.72.Jj; 71.15.Mb; 72.15.Jf; 82.75.-d     

Effect of substrates on the properties of p-type ZnO films

Influence of substrates on the properties of p-type ZnO films, which were fabricated by N–Al co-doping technique, was studied. Hall measurement results indicated that ZnO films deposited on common glass substrate were p-type conductivity when Zn:N:Al atomic ratio amounts to 1:3:0.1. However, ZnO films deposited on corning 7059 glass substrate showed n-type conductivity. Secondary ion mass spectroscopy demonstrated that Na content incorporated into ZnO films deposited on common glass substrate was more evident than that of corning 7059 glass. In addition, Hall mobility and conductivity of p-type ZnO thin films deposited on silicon substrate were improved largely.     

生长条件对脉冲激光沉积制备ZnO：Al薄膜光电性能的影响

本文研究了脉冲激光沉积(PLD)生长过程中, 铝掺量、氧压及衬底温度等实验参数对ZnO:Al(AZO)薄膜生长的影响, 并利用扫描电子显微镜、原子力显微镜、X射线衍射、霍尔效应、光透射光谱等实验手段对其透明导电性能进行了探讨. 变温霍尔效应和光透射测量表明, 当靶材中铝掺量大于0.5 wt%时, 所制备AZO薄膜中铝施主在80 K时已完全电离, 因Bernstein-Moss (BM) 效应其带隙变大, 均为重掺杂简并半导体. 进一步系统研究了氧压和衬底温度对AZO薄膜透明导电性能的影响, 实验发现当氧压为1 Pa, 衬底温度为200 ℃时, AZO 导电性能最好, 其霍尔迁移率为28.8 cm²/V·s, 薄膜电阻率最小可达2.7×10^-4 Ω·cm, 且在可见光范围内光透过率超过了85%. 氧压和温度的增加, 都会导致薄膜电阻率变大. 关键词： 脉冲激光沉积法 ZnO：Al薄膜 透光性 导电性     

用电化学沉积法制备ZnO/Cu2O异质p-n结

由于P型ZnO的制备仍然存在一定的困难,限制了ZnO在光电方面的应用,尤其是在发光二极管和激光器的实际应用,目前利用P型的透明半导体氧化物与n型ZnO制备异质p-n结,成为新的研究热点。选择P型导电Cu2O与ZnO制备出异质p-n结。Cu2O是一种典型的P型半导体材料,禁带宽度为2．1eV,可见光范围的吸收系数较高。首次利用电化学沉积的方法制备了ZnO／Cu2O异质p-n结,研究了电沉积ZnO,Cu2O的生长机制和ZnO／Cu2O异质结的结构、光学和电学特性。     

Effects of Cr doping on physical properties of amorphous In-Ga-Zn-O films

Amorphous thin films of InGaZnO₄ (a-IGZO) doped with Cr have been fabricated by using pulsed-laser deposition (PLD). The electrical, optical and magnetic properties of Cr-doped a-IGZO films grown at 25 °C and 150 °C were investigated. The conductivity, optical transmission and band gap of films are remarkably enhanced by increasing the growth temperature. Conductivity, carrier concentration and mobility decrease with increasing the Cr content. However, the optical transmission and band gap are not significantly affected by Cr doping. Moreover, all Cr-doped films exhibit room-temperature ferromagnetism.     

Preparation of p-type CdS thin films and in situ dark conductivity in vacuum deposited CdS:Cu films

CdS:Cu thin films were prepared using a vacuum co-evaporation technique. The Hall measurements indicate that the conductivity characteristic of CdS thin films transformed from highly compensated in as-grown or weakly annealed materials to p-type conductive in strongly annealed materials. X-ray diffraction spectra show that as-deposited thin films were the hexagonal phase of CdS except the presence of copper for high Cu doping and the diffraction peaks of Cu disappeared after annealing. From the X-ray photoelectron spectroscopy we found the ionization of Cu atoms and the formation of an acceptor level. In situ dark conductivity in vacuum as-deposited CdS:Cu was performed in the temperature range between 27 and 250 °C. An abnormal temperature dependence of conductivity was observed in medium and heavily Cu-doped films. The formation of a p-type material at a certain temperature was also studied by the hot probe measurements, which indicates a complex compensation process in the Cu-doped CdS films.