Microstructure of epitaxial scandium nitride films grown on silicon

Epitaxial scandium nitride films (225 nm thick) were grown on (1 1 1)-oriented silicon substrates by molecular beam epitaxy (MBE), using ammonia as a reactive nitrogen source. Film microstructure was investigated using X-ray diffraction (XRD). The (1 1 1) ω-scan FWHM of 0.551° obtained for films grown at 850 °C is the lowest reported so far for ScN thin films. The principal orientation of ScN with respect to Si is (1 1 1)_ScN//(1 1 1)_Si and []_ScN//[]_Si, representing a 60° in-plane rotation of the ScN layer with respect to the Si substrate. However, some twinning is also present in the films; the orientation of the twinned component is (1 1 1)_ScN//(1 1 1)_Si and []_ScN//[]_Si, representing a ‘cube-on-cube’ orientation. The volume percentage of these twins in the films decreases with increasing film growth temperature.     

Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films

This letter reports the novel nanostructure and excellent magnetic properties of Co_19.35Fe_53.28Hf_7.92O_19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization, , low coercivity, , and high hard-axis anisotropy field of . The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior.     

First-principles study on the electronic structures and absorption spectra for the PbWO4 crystal with lead vacancy

The electronic structures and absorption spectra for the perfect PbWO₄ (PWO) crystal and the crystal containing lead vacancy have been calculated using density functional theory code CASTEP with the lattice structure optimized. The calculated absorption spectra of the PWO crystal containing exhibit seven absorption bands peaking at 1.72 eV (720 nm), 2.16 eV (570 nm), 2.81 eV (440 nm), 3.01 eV (410 nm), 3.36 eV (365 nm), 3.70 eV (335 nm) and 4.0 eV (310 nm), which are very close to the experimental values. It predicts that the 330, 360, 420, 500-750 nm absorption bands are related to the existence of in the PWO crystal.     

Enhanced flux pinning in pulsed laser deposited Y Ba2Cu3O7−δ : BaTiO3 nanocomposite thin films

The effect of incorporation of BaTiO₃(BTO) nanoparticles on the flux pinning properties of pulsed laser deposited YBCO:BTO thin films was studied. Substantial increase in the critical current density (J_C) and the pinning force density (F_p) of the nanocomposite thin films was observed. At 77 K, and zero applied magnetic field, the value of J_C for YBCO and YBCO:BTO (2%) thin films were 2.93 MA/cm² and 6.43 MA/cm², respectively. At the same temperature and an applied magnetic field of 4 T, the value of J_C increases from 3.6×10⁴ A/cm² for YBCO thin film to 2.7×10⁵ A/cm² for YBCO:BTO (2%) nanocomposite thin film. The study of temperature and field dependence of of YBCO and YBCO:BTO thin films indicates similar type of pinning. The lattice mismatch between YBCO and BTO seems to introduce more defects resulting in the improvement of flux pinning properties.     

Differences between surface and bulk refractive indices of a-InxSe1−x

Thin films of amorphous indium selenide compounds (a-In_xSe_1−x) are important, e.g. for photovoltaics. The feature of merit in such applications is also the real part of refractive index n of this material. The data on n in literature are divergent. In this paper, the results of investigations on n in the bulk as well as in the interface layers of thin films of a-In_xSe_1−x are presented. The measurements had been performed using optical transmittance and reflectance in spectral range from 1.24 to 1.96 eV of linear polarized radiation that hit the samples with angles of incidence from 0° to 80°. Investigations had been done for sample temperatures from 80 to 340 K. It was found that the refractive index for areas at the free surface n_f is bigger than the refractive index n_b at the interface of thin film-substrate. The averaged over thin film thickness value of real part refractive index have the biggest value in all spectral range. Values of these coefficients increase with increasing the temperature.     

Structural and luminescent characteristics of non-stoichiometric ZnO films by various sputtering and annealing temperatures

ZnO thin films were prepared by reactive RF magnetron sputtering at various deposition temperatures. They were annealed in oxygen ambient at various annealing temperatures. The microstructures and photoluminescence characteristics of ZnO films were investigated. The grain size of the ZnO thin film that was deposited at room temperature (RT) after annealing exceeded that of the film that was deposited at . Excess Zn atoms were considered to be present in the ZnO film that was deposited at RT, so the film was non-stoichiometric ZnO. No visible emission of either of the ZnO films deposited at the two temperatures was observed before annealing. Following annealing at high temperature, the green emission from the ZnO film that was deposited at RT was stronger than that of the film that was deposited at . The relationship between the non-stoichiometry of the thin film and the visible emission was discussed. The luminescent centers that correspond to green emission are defects; the concentration of defects was higher in the ZnO thin film that was deposited at RT than in the film that was deposited at .     

Investigation of charge carrier mobility in 5,6,11,12-tetraphenylnapthacene (rubrene) and coumarin 6 doped Alq3 films

The doping effect on charge carrier mobility in tris (8-hydroxyquinolinato) aluminum (Alq₃) was studied by time-of-flight (TOF) measurements. The polar dopant, coumarin 6 (C-6) and extensive π conjugated dopant, 5,6,11,12-tetraphenylnaphthacene (rubrene) were used for this study. The co-doped of rubrene (Rb) with C-6 into Alq₃ improved the carrier mobility compared to the single doped Alq₃:C-6 film. The carrier mobility in single doped Alq₃:C-6 film did not follow the linear relationship of Poole-Frenkel (PF) model with applied electric field. The mobility was in agreement with the PF model at two different ranges of electric fields (F) separated by a critical field . The mobility in co-doped Alq₃:(Rb:C-6) film followed the linear relationship with the PF model. The energetic disorder was found as ∼0.32 eV in co-doped films. It was ∼0.55 and ∼0.27 eV before and after the critical field in Alq₃:C-6 film. The values of positional disorders in co-doped films were estimated as ∼1.8 and it was ∼2 in Alq₃:C-6 film at . The organic light emitting diode performance of the co-doped film was improved compared to single doped film. The luminescence efficiency was improved tremendously to ∼6  Cd/A in co-doped device at 45 mA/cm² current compared to Alq₃:C-6 film device of ∼1  Cd/A.     

Observation of internal-conversion electrons induced by inelastic nuclear resonant scattering

Measurements of the internal-conversion electron emission due to the inelastic nuclear resonant excitation are reported. thin films of 20 and 1.3 nm thickness were deposited on Si(1 1 1), and the internal-conversion electrons were measured as a function of the photon energy. From the inelastic part of the spectra, the phonon density of states was obtained. Whereas the phonon density of states of 20-nm thick film resembles that of bulk -Fe, the 1.3-nm thick film revealed an obvious softening of the acoustic mode.