Nano-structured Fe thin film deposition using plasma focus device

This paper reports the deposition of nano-structured Fe thin films using 3.3 kJ Mather-type plasma focus. The conventional hollow copper anode was replaced by anode fitted with solid Fe top and the deposition was done using different numbers of deposition shots at two different angular positions. Scanning Electron Microscopy shows that the size of nano-phase agglomerate is smaller when the sample is deposited using either lesser number of deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction shows that crystal structure characteristics change with increase in number of deposition shots. Measurements of magnetic properties using Vibrating Sample Magnetometer identify intermediate magnetization and coercivity in Fe thin films deposited at smaller angular position with respect to anode axis. It is concluded that the morphological, structural and magnetic characteristics of Fe thin films deposited using plasma focus device depend not only on the number of focus deposition shots but also on the angular position of the sample.     

Low energy repetitive miniature plasma focus device as high deposition rate facility for synthesis of DLC thin films

Diamond-like carbon (DLC) films were deposited on Si (1 0 0) substrate using a low energy (219 J) repetitive (1 Hz) miniature plasma focus device. DLC thin film samples were deposited using 10, 20, 50, 100 and 200 focus shots with hydrogen as filling gas at 0.25 mbar. The deposited samples were analyzed by XRD, Raman Spectroscopy, SEM and XPS. XRD results exhibited the diffraction peaks related to SiO₂, carbon and SiC. Raman studies verified the formation amorphous carbon with D and G peaks. Corresponding variation in the line width (FWHM) of the D and G positions along with change in intensity ratio (I_D/I_G) in DLC films was investigated as a function of number of deposition shots. XPS confirmed the formation sp² (graphite like) and sp³ (diamond like) carbon. The cross-sectional SEM images establish the 220 W repetitive miniature plasma focus device as the high deposition rate facility for DLC with average deposition rate of about 250 nm/min.     

Studies on high-moment soft magnetic FeCo/Co thin films

The dependences of soft magnetic properties and microstructures of the sputtered FeCo (=FeFeCo薄膜 溅射条件 软磁性 高饱和磁化强度FeCo film, sputtering conditions, high saturation magnetization, soft magnetic properties2005-10-263/7/2006 12:00:00 AMThe dependences of soft magnetic properties and microstructures of the sputtered FeCo （=Fe65Co35） films on Co underlayer thickness tCo, FeCo thickness tFeCo, substrate temperature Ts and taxget-substrate spacing dT-s are studied. FeCo single layer generally shows a high coercivity with no obvious magnetic anisotropy. Excellent soft magnetic properties with saturation magnetization μ0Ms of 2.35 T and hard axis coercivity Hch of 0.25 kA/m in FeCo films can be achieved by introducing a Co underlayer. It is shown that sandwiching a Co underlayer causes a change in orientation and reduction in grain size from 70 nm to about 10 nm in the FeCo layer. The magnetic softness can be explained by the Hoffmann＇s ripple theory due to the effect of grain size. The magnetic anisotropy can be controlled by changing dT-S, and a maximum of 14.3 kA/m for anisotropic field Hk is obtained with dT-S=18.0 cm.     

Excellent soft magnetic properties realized in FeCoN thin films

FeCoN soft magnetic thin films are prepared by using the reactive direct-current magnetron sputtering technique. It is found that the addition of N₂ can reduce the coercivity of the FeCoN film, and excellent soft magnetic properties can be obtained when the ratio of N₂ flow to total gas flow is 10%. The influences of texture, grain size, and stress on the magnetic properties and the high-frequency behaviors of the films are also discussed.     

Effect of Co underlayer on soft magnetic properties and microstructure of FeCo thin films

High saturation magnetization soft magnetic FeCo (=Fe₆₅Co₃₅) films were prepared using a thin Co underlayer. The FeCo/Co films exhibited a well-defined in-plane uniaxial anisotropy with easy axis coercivity (H_ce) of 10 Oe and hard axis coercivity (H_ch) of 3 Oe, and a half reduction of H_c with H_ce=4.8 Oe and H_ch=1.0 Oe was obtained when the composition was adjusted to 25 at% Co. The effective permeability of the films remains flat around 250 to 800 MHz. The saturation magnetostriction was 5.2×10⁻⁵ and the intrinsic stress was 0.8 GPa in FeCo single layer, both were slightly reduced by Co underlayer. The Co underlayer changed the preferred orientation of the FeCo films from (2 0 0) to (1 1 0) but more significantly, reduced the average grain size from ∼74 to ∼8.2 nm. It also reduced the surface roughness from 2.351 to 0.751 nm. The initial stage and interface diffusion properties were examined by TEM and XPS.     

Al-O,C元素添加对FeCo合金薄膜磁性和频率特性的影响

用磁控射频溅射法制备了FeCoAlOC薄膜,研究了Al-O和C元素的添加对FeCo合金薄膜的软磁性和高频特性的影响.随着Al,O,C元素添加量的增加,薄膜微结构发生了由多晶到纳米晶再到非晶状态的转化,软磁性得到提高;薄膜电阻率则由最初的87 μΩ·cm增至900 μΩ·cm,高频特性得到改善: 截止频率最高可达2.9 GHz,低频实部磁导率最高可到达400. 关键词： 纳米晶 非晶 软磁薄膜     

Microstructure and microwave permeability of FeCo thin films with Co underlayer

Microstructure, static magnetic properties and microwave permeability of sputtered FeCo films were examined. Fe₆₀Co₄₀ films (100 nm in thickness) deposited on glass substrates exhibited in-plane isotropy and a large coercivity of 161.1 Oe. When same thickness films were deposited on 2.5 nm Co underlayer, well-defined in-plane anisotropy was formed with an anisotropy field of 65 Oe. The sample had a static initial permeability of about 285, maximum imaginary permeability of 1255 and ferromagnetic resonance frequency of 2.71 GHz. Cross-sectional TEM image revealed that the Co underlayer had induced a columnar grain structure with grain diameter of 10 nm in the FeCo films. In comparison, FeCo films without Co underlayer showed larger grains of 70 nm in diameter with fewer distinct vertical grain boundaries. In addition, the Co underlayer changed the preferred orientation of the FeCo from (1 0 0) to (1 1 0). The improvement in soft magnetic properties and microwave behavior originates from the modification of the film microstructure, which can be well understood by the random anisotropy theory.     

Excellent soft magnetic properties realized in FeCoN thin films

FeCoN soft magnetic thin films are prepared by using the reactive direct-current magnetron sputtering technique.It is found that the addition of N2 can reduce the coercivity of the FeCoN film,and excellent soft magnetic properties can be obtained when the ratio of N2 flow to total gas flow is 10%.The influences of texture,grain size,and stress on the magnetic properties and the high-frequency behaviors of the films are also discussed.     

Oriented growth of CoPt nanoparticles by pulsed laser deposition

The magnetic nanoparticles of Fe/FeCo/FePt, in the past, in a PLD system were grown by us using argon ambient gas pressure of about 0.1–75.0 mbar, as the ambient gas pressure can be used to tune the energy of the incident plasma plume species, the expansion volume, the growth duration, etc. which can control the particle size. In present paper, we report the direct synthesis of small-sized nanoparticles even when no ambient gas was used, with the experiments being done in higher vacuum of about 10^?5 mbar in PLD chamber. The deposition rate under vacuum condition is significantly higher than the deposition rate at high ambient pressure. The study of inplane and outplane magnetic properties, along with XRD results, confirmed that the as-deposited CoPt nanoparticles thin film has oriented growth. The as-deposited CoPt nanoparticles are in magnetically soft fcc phase and a post deposition annealing at 600°C resulted in phase transition to magnetically hard fct phase.     

Studies of thin FeAlN films prepared by different techniques

The microstructure, morphology, and magnetic properties of FeAlN films deposited by reactive rf magnetron sputtering with subsequent treatment by three techniques, namely, in situ, ex situ (with the sputtering and annealing processes separated), and thermal crystallization of amorphous alloys, have been studied. FeAlN films prepared by the ex situ technique exhibit the best soft magnetic characteristics. Thermal crystallization of amorphous alloys produced films with properties having the highest thermal stability. Films 800-to 1000-nm thick were found to have the best soft magnetic properties. The dependences of the properties of FeAlN films on nitrogen content and annealing temperature were established. The conditions favoring the preparation of thin nanostructured FeAlN films featuring the best soft magnetic characteristics (saturation induction B _S = 1.8 T, coercivity H _C = 1.2 Oe, magnetic susceptibility μ₁ (1 MHz) = 3400) were determined.     

Investigation of structural and magnetic properties of Ni, NiFe and NiFe2O4 thin films

Soft magnetic thin films of Ni, NiFe and NiFe₂O₄ were prepared using reactive magnetron sputtering in various deposition conditions. Experimentally observed soft magnetic property was compared and correlated with nanocrystalline structure evolution. Ni and NiFe deposited films are textured with fcc(111) phase preferred orientation. Accordingly, grain size and lattice parameter were calculated from X-ray diffraction (111) peak line width and 2θ peak position. Addition of reactive gas oxygen in deposition process has substantial effect on crystalline structure of film. There is phase transition from the ordered NiFe (111) structure to the NiFe₂O₄ nanocrystalline phase. The resulting film has shown small X-ray diffraction intensity peak corresponding to (311) and (400) orientation, indicating small amount of existing NiFe₂O₄ phase. The mechanism has been discussed to be responsible for nanocrystallization and amorphization of NiFe₂O₄ films. Magnetic measurement (M-H) loop reveal soft magnetic nature of films with magnetic anisotropy. The coercivity (H_c) of films is in accordance with random anisotropy model, where H_c reduced with grain size. The structural transformation was supported by Fourier transforms infrared spectroscopy measurement. The films are highly smooth with surface roughness in the range of ∼0.53-0.93 nm. NiFe₂O₄ films have shown lowest surface roughness with highest electrical resistivity values. The structural, surface, magnetic and infrared spectroscopy results are observed and analyzed.     

Nanostructuring of FePt thin films by plasma focus device: pulsed ion irradiation dependent phase transition and magnetic properties

The effects of the different number (1, 2 and 3) of H⁺ ion irradiation shots on pulsed laser deposited FePt thin films, using pulsed plasma focus device, are investigated. The FePt thin films were exposed to energetic H⁺ ions in a plasma focus device at a fixed distance of 4 cm from the top of central electrode. It was deduced that single shot ion irradiation based transient thermal treatment induces an effect similar to the conventional annealing at 400°C. Well-separated nanoparticles are formed, and the significant enhancement of the coercivity, by about two orders of magnitude, at a lower annealing temperature of 400°C has been observed in the single shot ion irradiated samples. The increase of plasma focus ion irradiation shots lead to the amorphorization in irradiated FePt samples due to excessive energy transfer causing more defects and lattice distortion, and a decreasing coercivity trend in irradiated and annealed samples are observed due to reduction in the texture coefficient of magnetic easy axis (001) orientation fct phase.     

Magnetic properties of anisotropic Pr–Fe–B films with different deposition rates and pressures

Anisotropic Pr–Fe–B films with hard magnetic properties have been prepared by DC magnetron sputtering on heated Si (100) substrates. The influences of thickness, deposition rate and sputtering gas pressure on the magnetic properties of Pr–Fe–B films were investigated. It is found that the magnetic properties are sensitive to deposition rate and sputtering gas pressure. High deposition rate and argon pressure result in a high coercivity and a low remanence.     

Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus

Pulsed laser deposition synthesized ZnO thin films, grown at 400 °C substrate temperature in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions obtained from 2.94 kJ dense plasma focus to achieve the nitrogen doping in ZnO. Structural, compositional and optical properties of as-deposited and nitrogen ion irradiated ZnO thin films were investigated to confirm the successful doping of nitrogen in irradiated samples. Spectral changes have been seen in the nitrogen irradiated ZnO thin film samples from the low temperature PL measurements. Free electron to acceptor emissions can be observed from the irradiated samples, which hints towards the successful nitrogen doping in films. Compositional analysis by X-ray photoelectron spectroscopy and corresponding shifts in binding energy core peaks of oxygen and nitrogen confirmed the successful use of plasma focus device as a novel source for nitrogen ion doping in ZnO thin films.     

Dependence of the structure and nagnetic properties of FeTaN films on nitrogen concentration

The structural morphology and magnetic properties of thin FeTaN films with a high Ta content (10 wt %) prepared by annealing compounds deposited by reactive rf magnetron sputtering in an Ar + N gas mixture are studied. The dependence of the properties of FeTaN films on their nitrogen content and annealing temperature were established. The deposition and thermal treatment regimes favoring the preparation of thin nanostructural FeTaN films with high soft magnetic characteristics [B _s = 1.6 T, H _c = 0.2 Oe, and μ₁ (1 MHz) = 3400] were determined.     

Stress analysis, structure and magnetic properties of sputter deposited Ni-Mn-Ga ferromagnetic shape memory thin films

The residual stress instituted in Ni-Mn-Ga thin films during deposition is a key parameter influencing their shape memory applications by affecting its structural and magnetic properties. A series of Ni-Mn-Ga thin films were prepared by dc magnetron sputtering on Si(1 0 0) and glass substrates at four different sputtering powers of 25, 45, 75 and 100 W for systematic investigation of the residual stress and its effect on structure and magnetic properties. The residual stresses in thin films were characterized by a laser scanning technique. The as-deposited films were annealed at 600 °C for 1 h in vacuum for structural and magnetic ordering. The compressive stresses observed in as-deposited films transformed into tensile stresses upon annealing. The annealed films were found to be crystalline and possess mixed phases of both austenite and martensite, exhibiting good soft magnetic properties. It was found that the increase of sputtering power induced coarsening in thin films. Typical saturation magnetization and coercivity values were found to be 330 emu/cm³ and 215 Oe, respectively. The films deposited at 75 and 100 W display both structural and magnetic transitions above room temperature.     

Microstructure and soft magnetic properties of CoFeZrO thin films

Nanogranular CoFeZrO thin films were successfully prepared by radio frequency reactive magnetron sputtering in O₂/Ar atmosphere. The magnetic properties and microstructure were investigated. It is found that the Co_17.08Fe_49.76Zr_16.24O_16.91 films show the best soft magnetic properties: magnetic coercivity of 0.3 Oe; anisotropy field of 44.9 Oe; saturation magnetization of 16.8 kG; electrical resistivity of 462.8 μΩ cm. The effective permeability of the films reaches 800 and flattens up to 2 GHz.     

Effect of nanoparticle size on magnetic damping parameter in Co92Zr8 soft magnetic films

Co₉₂Zr₈(50 nm)/Ag(x) soft magnetic films have been prepared on Si (111) substrates by oblique sputtering at 45°. Nanoparticle size of Co₉₂Zr₈ soft magnetic films can be tuned by thickening Ag buffer layer from 9 nm to 96 nm. The static and dynamic magnetic properties show great dependence on Ag buffer layer thickness. The coercivity and effective damping parameter of Co₉₂Zr₈ films increase with thickening Ag buffer layer. The intrinsic and extrinsic parts of damping were extracted from the effective damping parameter. For x=96 nm film, the extrinsic damping parameter is 0.028, which is significantly larger than 0.004 for x=9 nm film. The origin of the enhancement of extrinsic damping can be explained by increased inhomogeneity of anisotropy. Therefore, it is an effective method to tailor magnetic damping parameter of thin magnetic films, which is desirable for high frequency application.     

Superlattice CoCrPt/Ru/CoFe structure fabricated by pulsed laser deposition

The synthetic antiferromagnets (SAF) have been used in spin-valve sensor in data storage industry [1]. We report a new hard/Ru/soft sandwich structure (SHBL) fabricated by pulsed lased deposition to replace current single layer structure for information recording application. SHBL consists of two magnetic layers separated by thin nonmagnetic layers, typically with Ru layers of 0.7-1.2 nm, through which antiferromagnetic coupling is induced. Varying the relative thickness of the magnetic layers, the spacer layers, and the type of magnetic materials can alter magnetic properties of CoCrPt/Ru/CoFe superlattice. The coercivity H_c and grain size of magnetic layer is also dependent on the laser fluence. High laser fluence results in both small grain size and high H_c. The observed phenomena are related to high quenching and deposition rates during PLD at high fluence, resulting in more pronounced phase segregation.     

Effects of the Hf content on the microstructure and magnetic properties of Co-Hf-Ta thin films

Effects of the Hf content in Co-Hf-Ta thin films on the microstructure and magnetic properties were investigated in this study. It was found that appropriate Hf addition can effectively refine the Co grain size. Co grain sizes sharply decreased from 50 nm down to 2.3 nm with increasing the Hf content from 1.02 at.% to 2.81 at.%, leading to the reduced magneto-crystalline anisotropy. The Co-Hf-Ta thin films with small Co grains reveal low anisotropy field, low coercivity, and high resistivity. By optimizing the Hf content, the film with Hf concentration of 2.81 at.% exhibits excellent soft magnetic properties: high saturation magnetization (4πM_S ∼ 13.6 kG), and low coercivity (H_C ∼ 0.6 Oe). The effective permeability of the film reaches 800 and remains constant up to 1 GHz.