High-quality two-dimensional electron gas at large scale GaN/AlGaN wafer interface prepared by mass production MOCVD systems

Basic electronic properties of two-dimensional electron gas (2DEG) formed at GaN/AlGaN hetero-interface in large-scale (100 mm) wafer made by metal organic chemical vapour deposition (MOCVD) have been reported and discussed. From conventional Hall measurements, highest electron mobility was found to be μ_e∼1680 and 9000 cm²/V s at room temperature and at ∼5 K, respectively, for sheet electron density of n_s∼8×10¹² cm⁻². In magneto-resistance (MR) measurements carried out at 1.5 K in Hall bar sample defined by photolithography and ion implantation, very clear Schubnikov de-Haas oscillations and integer quantum Hall effect were observed in diagonal (R_xx) and off-diagonal (R_xy) resistances, respectively. In addition, a good insulating nature of GaN layer is confirmed by capacitance-voltage (C-V) measurement. These results suggest the high-qualitiness of our 100 mm GaN/AlGaN high electron mobility transistor (HEMT) wafers comparable to those so far reported.     

Gate-voltage-induced realization of different rational fractions ofh/e2at fixed values of current and magnetic field

We present magnetotransport measurement results obtained on samples with a window-shaped geometry and Schottky gates in the quantum Hall regime. The investigated samples consist of two Hall bars shorted by wide regions of 2DEG. With Schottky gates across each of the Hall bars electron densities and hence filling factors within the two arms of the structures can individually be tuned.We show that by applying appropriate gate voltages to the samples four-terminal resistances equal to different rational fractions ofh/e²can be realized at fixed magnetic field. The measurement results can be explained in the edge channel picture of the quantum Hall effect as well as in a local transport model. In both models it is the interplay between the gate-voltage-induced sub-gate filling factors and the resulting partition of the total current onto the two sample arms that leads to the observed phenomena.     

Effects of the passivation of SiNx with various growth stoichiometry on the high temperature transport properties of the two-dimensional electron gas in AlxGa1−xN/GaN heterostructures

Effects of the passivation of SiN_x on the high temperature transport characteristics of the two-dimensional electron gas (2DEG) in unintentionally doped Al_xGa_1−xN/GaN heterostructures have been investigated by means of high temperature Hall measurements. The 2DEG density increases much after SiN_x passivation, and the increment is proportional to the Si content in SiN_x layer, indicating that the increment is mainly caused by ionized Si atoms at the SiN/Al_xGa_1−xN interface with dangling bonds or by Si atoms incorporated into the Al_xGa_1−xN layer during the SiN_x growth, which is approved by strain analysis and X-ray photoemission spectroscopy (XPS). There is lower 2DEG mobility at room temperature in a passivated sample than in an unpassivated one. However, the 2DEG mobility becomes to be higher in a passivated sample than in an unpassivated one when the temperature is above 250 °C, which is suggested to be caused by different subband occupation ratios in the triangular quantum well at the heterointerface before and after passivation.     

Inhomogeneous Hall-geometry sample in the quantum Hall regime

A generalization of the known theory describing the Hall channels with integer filling factors in inhomogeneous 2D electronic samples to the case of a stationary nonequilibrium state (with a nonzero Hall voltage V _H across the 2D system) is proposed. For the central strip located near the extremum of the electron density, the theory predicts a change in its width and a shift of the whole strip from the equilibrium position as functions of V _H . The theoretical results are used to interpret recent experiments on measuring the local electric fields along the Hall samples both in equilibrium conditions and in the presence of transport in the quantum Hall regime.     

Electronic parameters and electronic structures in modulation-doped highly strained InxGa1−xAs/InyAl1−yAs coupled double quantum wells

Electronic parameters of a two-dimensional electron gas (2DEG) in modulation-doped highly strained In_xGa_1−xAs/In_yAl_1−yAs coupled double quantum wells were investigated by performing Shubnikov-de Haas (S-dH), Van der Pauw Hall-effect, and cyclotron resonance measurements. The S-dH measurements and the fast Fourier transformation results for the S-dH at 1.5 K indicated the electron occupation of two subbands in the quantum well. The electron effective masses of the 2DEG were determined from the cyclotron resonance measurements, and satisfied qualitatively the nonparabolicity effects in the quantum wells. The electronic subband structures were calculated by using a self-consistent method.     

Galvanomagnetic properties of air-stable and highly conductive potassium-intercalated graphite sheet

Magnetoresistance and Hall coefficient of air-stable potassium-intercalated graphite sheets (hereafter abbreviated as K-PGS) were determined at room temperature. The magnitude of the magnetoresistance and the absolute value of Hall coefficient of K-PGS decreased with increasing potassium content of K-PGS, n_K/n_C. Two-carrier model was used for calculating carrier density and mobility. The electron density increased with increasing n_K/n_C: 3.07×10²⁰ cm⁻³ (n_K/n_C=0.005), 5.67×10²⁰ cm⁻³ (n_K/n_C=0.008) and 6.40×10²⁰ cm⁻³ (n_K/n_C=0.011). The value of the electron density of K-PGS with n_K/n_C=0.011 (nominal composition KC₉₁) was about 80% of the reported value, 7.8×10²⁰ cm⁻³, for KC₄₈ (n_K/n_C=0.021) prepared from HOPG (highly oriented pyrolytic graphite). The mobility decreased with increasing n_K/n_C: 2.11×10³ cm² V⁻¹ s⁻¹ (n_K/n_C=0.005), 1.42×10³ cm² V⁻¹ s⁻¹ (n_K/n_C=0.008) and 1.34×10³ cm² V⁻¹ s⁻¹ (n_K/n_C=0.011). The value of the mobility of K-PGS with n_K/n_C=0.011 was about 60% of the reported value (2300 cm² V⁻¹ s⁻¹) for KC₄₈ prepared from HOPG.     

Probing spin entanglement by gate-voltage-controlled interference of current correlation in quantum spin Hall insulators

We propose an entanglement detector composed of two quantum spin Hall insulators and a side gate deposited on one of the edge channels. For an ac gate voltage, the differential noise contributed from the entangled electron pairs exhibits the nontrivial step structures, from which the spin entanglement concurrence can be easily obtained. The possible spin dephasing effects in the quantum spin Hall insulators are also included.     

Temperature dependence of the inelastic scattering in a GaAs/n-AlGaAs selectively doped heterojunction with InGaAs quantum dots

Inelastic scattering processes of two-dimensional electron gas (2DEG) have been investigated in a inverted GaAs/n-AlGaAs heterojunction with self-organized InGaAs quantum dots (QDs) embedded near the 2DEG channel where the electron population in the QDs is controllable by the gate voltage V_g. By analyzing magnetoresistance, the inelastic scattering time τ_ε have been evaluated as functions of V_g at 0.6, 0.8, 1.2, and 1.7 K. It is found that τ_ε increases with V_g below 0.8 K and decreases above 1.2 K, which suggests that the dominant scattering mechanisms below 0.8 K and above 1.2 K are different. To interpret this behavior, we have calculated the inelastic scattering time theoretically. It is found that the experimental data are well explained by a theoretical model where a 2D electron is considered to be inelastically scattered both by the other 2D electrons and by the trapped electrons in QDs. It is also found that the 2DEG–2DEG scattering is dominant at low temperature, while the 2DEG-QDs scattering becomes important as the temperature increases.     

Low temperature electron transport in phosphorus-doped ZnO films grown on Si substrates

Low temperature magneto-transport properties and electron dephasing mechanisms of phosphorus-doped ZnO thin films grown on (1 1 1) Si substrates with Lu₂O₃ buffer layers using pulsed laser deposition were investigated in detail by quantum interference and weak localization theories under magnetic fields up to 10 T. The dephasing length follows the temperature dependence with an index p≈1.6 at higher temperatures indicating electron–electron interaction, yet becomes saturated at lower temperatures. Consistent with photoluminescence measurements and the multi-band simulation of the electron concentration, such behavior was associated with the dislocation densities obtained from x-ray diffraction and mobility fittings, where charged edge dislocations acting as inelastic Coulomb scattering centers were affirmed responsible for electron dephasing. Owing to the temperature independence of the dislocation density, the phosphorus-doped ZnO film maintained a Hall mobility of 4.5 cm² V⁻¹ s⁻¹ at 4 K.     

Bilayer counterflow transport at filling factor 1 in the strong interacting regime

We review magneto-transport properties of interacting GaAs bilayer hole systems, with very small inter-layer tunneling, in a geometry where equal currents are passed in opposite directions in the two, independently contacted layers (counterflow). In the quantum Hall state at total bilayer filling ν=1 both the longitudinal and Hall counterflow resistances tend to vanish in the limit of zero temperature, suggesting the existence of a superfluid transport mode in the counterflow geometry. As the density of the two layers is reduced, making the bilayer more interacting, the counterflow Hall resistivity (ρ_xy) decreases at a given temperature while the counterflow longitudinal resistivity (ρ_xx), which is much larger than ρ_xy, hardly depends on density. Our data suggest that the counterflow dissipation present at any finite temperature is a result of mobile vortices in the superfluid created by the ubiquitous disorder in this system.     

New experimental results for electron transport in weak accumulation layers of ZnO crystals

Previous Hall measurements on (0001) and (0001&#x0304;) faces of ZnO have shown a Hall mobility oscillating as a function of Hall surface electron density in the range between N_SH=10⁶ and 10¹¹ cm^?2. Here we report on new results obtained by a field effect arrangement for free surfaces in UHV. With donors from H exposure or by illumination weak accumulation layers (n_sh <10¹¹ cm^?2) are established. The field effect shows oscillations in surface conductivity as a function of gate voltage. Also the combination of a field effect with a Hall effect measurement reveals discrete values of Hall surface electron density n_sh. Various pretreatments do not change the periodicity of these oscillations. Necessary preconditions are a temperature below 130 K, a Hall surface electron density below 3 × 10¹² cm^?2 and a source-drain field of a few V/cm. A model regarding impurity levels in the space charge layer relates the results of the field effect measurements to the results of the Hall effect measurements.     

Quantitative analysis of charge-carrier trapping in organic thin-film transistors from transfer characteristics

A dynamic method for quantifying the amount and mechanism of trapping in organic field effect transistors (OFETs) is proposed. It exploits transfer characteristics acquired upon application of a triangular waveform gate sweep V _G. The analysis of the transfer characteristics at the turning point V _G=−V _max between forward and backward gate sweeps, viz. around the maximum gate voltage V _max applied, provides a differential slope Δm which depends exclusively on trapping. Upon a systematic change of V _max it is possible to extract the initial threshold voltage, equivalent to one of the observables of conventional stress measurements, and assess the mechanism of trapping via the functional dependence on the current. The analysis of the differential logarithmic derivative at the turning point yields the parameters of trapping, as the exponent β and the time scale of trapping τ. In the case of an ultra-thin pentacene OFET we extract β=1 and τ=10²–10³ s, in agreement with an exponential distribution of traps. The analysis of the hysteresis parameter Δm is completely general and explores time scales much shorter than those involved in bias stress measurements, thus avoiding irreversible damage to the device.     

Operation of thin-film gated SOI lateral PIN photodetectors with gate voltage applied and intrinsic length variation

This paper describes the operation principle of thin-film gated SOI lateral PIN photodetectors, and an analytical model of depletion voltage is presented and validated by two-dimensional Atlas simulations. With gate voltage applied to achieve fully depleted (FD) condition in intrinsic region, the variation of intrinsic length (L_i) on photocurrent and dark current characteristics, sensitivity, and speed is addressed. With L_i between 1 and 10 μm, the simulated results predict internal quantum efficiency (QI) in excess of 95% even near 100% at a 400 nm wavelength. Also, QI can yield over 87% for the long channels. Under FD condition, the total −3 dB frequency value can achieve 16 GHz (19 GHz) for L_i = 1  and 4.1 GHz (6.2 GHz) for L_i = 2 μm with V_K = 1.0 V (2.0 V). And a high ratio of more than 10⁷ between illuminated and dark currents can be yielded for all detectors realized in 0.18 μm SOI CMOS technology.     

The quantum Hall＇s effect： A quantum electrodynamic phenomenon

<正>We have applied Maxwell’s equations to study the physics of quantum Hall’s effect.The electromagnetic properties of this system are obtained.The Hall’s voltage,V_H = 2πh²n_s/em,where n_s is the electron number density,for a 2- dimensional system,and h = 2πh is the Planck’s constant,is found to coincide with the voltage drop across the quantum capacitor.Consideration of the cyclotronic motion of electrons is found to give rise to Hall’s resistance. Ohmic resistances in the horizontal and vertical directions have been found to exist before equilibrium state is reached. At a fundamental level,the Hall’s effect is found to be equivalent to a resonant LCR circuit with L_H = 2πm/e²n_s and C_H = me²/2πh²n_s satisfying the resonance condition with resonant frequency equal to the inverse of the scattering （relaxation） time,τ_s.The Hall’s resistance is found to be R_H =（（L_H）/C_H）^1/2.The Hall’s resistance may be connected with the impedance that the electron wave experiences when it propagates in the 2-dimensional gas.     

Quantized four-terminal resistances in a ferromagnetic graphene p-n junction

The quantum Hall and longitudinal resistances in four-terminal ferromagnetic graphene p-n junctions under a perpendicular magnetic field are investigated. In the Hall measurement, the transverse contacts are assumed to be located at the p-n interface to avoid the mixing of edge states at the interface and the resulting quantized resistances are then topologically protected. According to the charge carrier type, the resistances in a four-terminal p-n junction can be naturally divided into nine different regimes. The symmetric Hall and longitudinal resistances are observed, with many new robust quantum plateaus revealed due to the competition between spin splitting and local potentials.     

Magneto-oscillations of the Hall coefficient in n-type GaSb at the extreme quantum limit

Magnetoquantum oscillations of the Hall coefficient R_H were observed in Te-doped GaSb layers grown by molecular beam epitaxy. The free electron densities were in the low 10¹⁶ cm⁻³ range or even slightly lower, thus achieving, for the first time in GaSb, the extreme quantum limit, where all the electrons occupy the spin-split 0⁽⁺⁾ Landau level (LL). Similarly to other known cases, the amplitude of the last maximum of R_H could be explained as enhanced by the metal-to-insulator transition of the spin-down electron system in the n=0 LL. The occurrence of the last negative oscillation of R_H below its classical value, called Hall dip, could be frustrated, in samples with sufficiently low carrier densities, by an incipient carrier freeze-out at donor impurities induced by the magnetic field.     

Enhancement of the anomalous Hall effect and spin glass behavior in the bilayered manganite La2−2xSr1+2xMn2O7

The Hall resistivity and magnetization have been investigated in the ferromagnetic state of the bilayered manganite La_2−2xSr_1+2xMn₂O₇ (x=0.36). The Hall resistivity shows an increase in both the ordinary and anomalous Hall coefficients at low temperatures below 50 K, a region in which experimental evidence for the spin glass state has been found in a low magnetic field of 1 mT. The origin of the anomalous behavior of the Hall resistivity relevant to magnetic states may lie in the intrinsic microscopic inhomogeneity in a quasi-two-dimensional electron system.     

Design and Analysis of InGaN-GaN Modulation Doped Field-Effect Transistors (MODFETs) for Over 60 GHz Operation

A Modulation-Doped Field-Effect Transistor (MODFET) structure realized in InGaN-GaN material system is presented for the first time. An analytical model predicting the transport characteristics of the proposed MODFET structure is given in detail. Electron energy levels inside and outside the quantum well channel of the MODFET are evaluated. The two-dimensional electron gas (2DEG) density in the channel is calculated by self-consistently solving Schrödinger and Poisson's equations simultaneously. Analytical results of the current-voltage and transconductance characteristics are presented. The unity-current gain cutoff frequency (f _T) of the proposed device is computed as a function of the gate voltage V _G . The results are compared well with experimental f _T value of a GaN/AlGaN HFET device. By scaling the gate length down to 0.25 m the proposed InGaN-GaN MODFET can be operated up to about 80GHz. It is shown in this paper that InGaN-GaN system has small degradation in f _T as the operating temperature is increased from 300°K to 400°K.     

The effect of interface states, excess capacitance and series resistance in the Al/SiO2/p-Si Schottky diodes

The current-voltage (I-V) characteristics of Al/SiO₂/p-Si metal-insulator-semiconductor (MIS) Schottky diodes were measured at room temperature. In addition the capacitance-voltage (C-V) and conductance-voltage (G-V) measurements are studied at frequency range of 10 kHz-1 MHz. The higher value of ideality factor of 3.25 was attributed to the presence of an interfacial insulator layer between metal and semiconductor and the high density of interface states localized at Si/SiO₂ interface. The density of interface states (N_ss) distribution profile as a function of (E_ss − E_v) was extracted from the forward bias I-V measurements by taking into account the bias dependence of the effective barrier height (Φ_e) at room temperature for the Schottky diode on the order of ≅4 × 10¹³ eV⁻¹ cm⁻²_. These high values of N_ss were responsible for the non-ideal behaviour of I-V and C-V characteristics. Frequency dispersion in C-V and G-V can be interpreted only in terms of interface states. The N_ss can follow the ac signal especially at low frequencies and yield an excess capacitance. Experimental results show that the I-V, C-V and G-V characteristics of SD are affected not only in N_ss but also in series resistance (R_s), and the location of N_ss and R_s has a significant on electrical characteristics of Schottky diodes.