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1.
ITO导电膜红外发射率理论研究   总被引:5,自引:0,他引:5       下载免费PDF全文
根据红外辐射理论和薄膜光学原理计算了高品质ITO(indium tin oxide)导电膜的红外发射 率,其理论曲线与实测曲线基本符合. 并得出方块电阻小于30Ω时,ITO膜在红外波段8—14μ m的平均红外发射率理论值小于0.1.实际制备方块电阻小于10Ω的ITO膜具有优良的红外隐身 性能. 讨论了高品质ITO膜具有低红外发射率的物理机理,并提出了低红外发射率临界方块电 阻值,这有利於理论研究和工艺制备红外隐身ITO膜. 关键词: 红外发射率 ITO薄膜 理论计算 方块电阻  相似文献   

2.
采用反应离子镀新工艺成功地在K9玻璃上制备了ITO(Indium Tin Oxide)透明导电膜,所制备的ITO膜在550~600nm波长范围内,典型的峰值透过率为89%,面电阻为34Ω/□。  相似文献   

3.
采用氧离子辅助电子束反应蒸发工艺在K9玻璃基底上制备了性能优异的ITO薄膜.通过对薄膜方块电阻和透过率的测量分析,研究了基底温度、离子束流、沉积速率等工艺参数对ITO薄膜光电性能的影响.发现升高基底温度有利于减小薄膜的短波吸收,但过高的基底温度会增加薄膜的电阻率,合适的沉积速率可以同时改善薄膜的光学和电学性能.在比较理想的工艺参数下制备的ITO薄膜的电阻率约为5.4×10-4Ω·cm,可见光(波长范围425~685 nm)平均透过率达84.8%,其光电性能均达到实用化要求.  相似文献   

4.
采用磁控溅射法研制了 YBa_2Cu_3O_x-PrBa_2Cu_3O_x-YBa_2Cu_3O_x 多层外延膜.上、下 YBa_2·Cu_3O_x 层的零电阻转变温度分别是80K 和82K.在77K 测量得到 PrBa_2Cu_3O_x 隔离层的电阻率约为 8×10~4Ω·cm.  相似文献   

5.
透明导电半导体ZnO膜的研究   总被引:7,自引:1,他引:6  
本文采用独特的电子束蒸镀方法,在光学镀膜机上,以 ZnO+3%Al2O3和 ZnO为膜料.k9光学玻璃为衬底,制备出ZnO 膜。膜层为多晶膜,可见光透过率为T=70-90%,电阻率p=1×10-5Ω·m,方电阻为 R =150±50±50Ω/ ,膜机械强度超过国标单层标准,找到实用最佳工艺条件。  相似文献   

6.
ITO材料在减反射膜设计中的应用   总被引:7,自引:7,他引:0  
徐颖  高劲松  王笑夷  陈红  王彤彤 《光子学报》2005,34(8):1187-1189
改变ITO材料通常作为透明导电膜单独使用的状况,将其作为减反射膜系中的一层,能够在很大程度上增加ITO透明导电膜在可见光部分的透过率.通过使用将ITO材料置于膜系的内层和最外层两类不同的设计思想,可以使ITO透明导电膜达到相当优良的应用效果.使用低压反应离子镀方法制备了设计的两类减反射膜系,实验证明,膜层在可见光部分的透过率显著提高,剩余反射率明显下降,并得到了平均透过率为95.83%,最高透过率达到97.26%,方块电阻为13.2~24.6Ω/□的试验结果.  相似文献   

7.
在1.5~300K温度范围内,研究了非品态Y_5Ni_(95),溅射合金膜的霍尔效应。观察到该材料的正常霍尔系数R_o不随温度改变,R_o=—1.46×10~(-12)Ω·cm/G;反常霍尔系数R_s值随温度增高而增大,其值从1.5K的—2.2×10~(-10)变化至300K的—3.3×10~(-10)Ω·cm/G。利用斜散射和边跳跃机制对此进行了讨论。  相似文献   

8.
两种方法制备ITO薄膜的红外特性分析   总被引:7,自引:1,他引:6  
比较了用电束加热蒸发法和直流磁控溅射法制备的氧化锡铟(ITO)薄膜在红外波段的光学特性实验发现,通过直流磁控溅射在常温下制备的ITO薄膜在红外波段折射率稳定、消光系数小,比电子束加热蒸发制备的膜有较高的透过率在波长1550nm附近的透过率可达86%以上,消光系数约为004,方电阻最低为100Ω/□.  相似文献   

9.
王全坤 《发光学报》1985,6(2):131-136
采用改进的气相外延法在(100)GaAs衬底上外延生长了ZnSe单晶膜。最大生长速率为每小时10μm左右。淀积过程的激活能为10kcal/mol。在77K的温度下测量了外延膜的光致发光,4460Å附近可以观察到很强的蓝色发射。外延膜的电阻率~1.1Ω·cm。  相似文献   

10.
低压反应离子镀方法制备ITO透明导电膜   总被引:2,自引:1,他引:1  
溅射镀膜方法是制备ITO透明导电膜最常用也是实验研究最多的方法。实验使用一种不同于溅射方法的另一种制备工艺—低压反应离子镀方法—制备ITO透明导电膜。实验对不同沉积速率和不同氧气流量对ITO透明导电膜的方块电阻以及光学透过率的影响进行了详细地分析,并综合比较得到了当沉积速率为0.5nm/s,氧气流量为24cm3/min时,在波长为550nm处,方块电阻为20Ω,λ=550nm透过率为90.8%的优质ITO透明导电膜。  相似文献   

11.
J.Y. Lee 《Optics Communications》2009,282(12):2362-3085
Sn doped In2O3 (ITO) single layer and a sandwich structure of ITO/metal/ITO (IMI) multilayer films were deposited on a polycarbonate substrate using radio-frequency and direct-current magnetron sputtering process without substrate heating. The intermediated metal films in the IMI structure were Au and Cu films and the thickness of each layer in the IMI films was kept constant at 50 nm/10 nm/40 nm. In this study, the ITO/Au/ITO films show the lowest resistivity of 5.6 × 10−5 Ω cm.However the films show the lower optical transmission of 71% at 550 nm than that (81%) of as deposited ITO films. The ITO/Cu/ITO films show an optical transmittance of 54% and electrical resistivity of 1.5 × 10−4 Ω cm. Only the ITO/Au/ITO films showed the diffraction peaks in the XRD pattern. The figure of merit indicated that the ITO/Au/ITO films performed better in a transparent conducting electrode than in ITO single layer films and ITO/Cu/ITO films.  相似文献   

12.
In this paper we report on the effects of the insertion of Cr atoms on the electrical and optical properties of indium tin oxide (ITO) films to be used as electrodes in spin-polarized light-emitting devices. ITO films and ITO(80 nm)/Cr-doped ITO(20 nm) bilayers and Cr-doped ITO films with a thickness of 20 nm were grown by pulsed ArF excimer laser deposition. The optical, structural, morphological and electrical properties of ITO films and ITO/Cr-doped structures were characterized by UV–Visible transmission and reflection spectroscopy, transmission electron microscopy (TEM), atomic force microscopy (AFM) and Hall-effect analysis. For the different investigations, the samples were deposited on different substrates like silica and carbon coated Cu grids. ITO films with a thickness of 100 nm, a resistivity as low as ~4×10?4 Ω?cm, an energy gap of ~4.3 eV and an atomic scale roughness were deposited at room temperature without any post-deposition process. The insertion of Cr into the ITO matrix in the upper 20 nm of the ITO matrix induced variations in the physical properties of the structure like an increase of average roughness (~0.4–0.5 nm) and resistivity (up to ~8×10?4 Ω?cm). These variations were correlated to the microstructure of the Cr-doped ITO films with particular attention to the upper 20 nm.  相似文献   

13.
Transparent and conducting indium tin oxide (ITO) thin films were deposited on soda lime glass substrates by RF plasma magnetron sputtering at room temperature. The effect of thickness (100, 200 and 300?nm) on the physical (structural, optical, electrical) properties of ITO thin films was investigated systematically. It is observed that with an increase in thickness, the X-ray diffraction data indicate polycrystalline films with grain orientations predominantly along (222) and (400) directions; the average grain size increases from 10 to 30?nm; the optical band gap increases from 3.68 to 3.73?eV and the transmission decrease from 80% to 70% . Four-point probes show a low resistivity (2.4×10?5?Ω?cm) values for film with a thickness 300?nm. Present work shows that the ITO is a promising transparent conductive oxide material for the solar cell application.  相似文献   

14.
Tin-doped indium oxide (ITO) films with 200 nm thickness were deposited on glass substrates by DC magnetron sputtering at room temperature. And they were annealed by rapid thermal annealing (RTA) method in vacuum ambient at different temperature for 60 s. The effect of annealing temperature on the structural, electrical and optical properties of ITO films was investigated. As the RTA temperature increases, the resistivity of ITO films decreases dramatically, and the transmittance in the visible region increases obviously. The ITO film annealed at 600 °C by RTA in vacuum shows a resistivity of 1.6 × 10−4 Ω cm and a transmittance of 92%.  相似文献   

15.
In this paper we study the electro-optical behavior and the application of indium–tin oxide (ITO) and aluminum-doped zinc oxide (AZO) bilayer thin films for silicon solar cells. ITO–AZO bilayer thin films were deposited on glass substrates using radio-frequency magnetron sputtering. The experimental results show that a decrease in the electrical resistivity of the ITO–AZO bilayer thin films has been achieved without significant degradation of optical properties. In the best case the resistivity of the bilayer films reached a minimum of 5.075×10?4 Ω?cm when the thickness of the AZO buffer layer was 12 nm. The ITO–AZO bilayer films were applied as the front electrodes of amorphous silicon solar cells and the short-circuit current density of the solar cells was considerably increased.  相似文献   

16.
Transparent and conducting ITO/Au/ITO multilayered films were deposited without intentional substrate heating on polycarbonate (PC) substrate using a magnetron sputtering process. The thickness of ITO, Au and ITO metal films in the multilayered structure was constant at 50, 10 and 40 nm, respectively.Although the substrate temperature was kept constant at 70 °C, ITO/Au/ITO films were polycrystalline with an (1 1 0) X-ray diffraction peak, while single ITO films were amorphous. Surface roughness analysis indicated ITO films had a higher average roughness of 1.76 nm, than the ITO/Au/ITO film roughness of 0.51 nm. The optoelectrical properties of the ITO/Au/ITO films were dependent on the Au thin film, which affected the ITO film crystallinity. ITO/Au/ITO films on PC substrates were developed with a resistivity as low as 5.6 × 10−5 Ω cm and a high optical transmittance of 71.7%.  相似文献   

17.
Indium tin oxide (ITO) films were produced by low-energy oxygen ion beam assisted electron-beam evaporation. The dependence of surface morphology, electrical and optical properties on evaporation rate, oxygen ion beam energy and density, as well as substrate temperatures was characterized by atomic force microscopy, X-ray photoelectron spectroscopy, Hall-effect and optical transmittance measurements. The results show that high-quality ITO films (resistivity of 7.0×10−4 Ω cm, optical transmittance above 85% at wavelength 550 nm, surface roughness of 0.6 nm in root mean square) can be obtained at room temperature.  相似文献   

18.
《Current Applied Physics》2020,20(8):994-1000
We report the influence of reactive oxygen (O2) and argon (Ar) plasma based ITO:Zr bi-layers for silicon heterojunction (SHJ) solar cells. The purpose of reactive O2 sputtered ITO:Zr was to improve the Hall mobility and work function while the Ar based ITO:Zr films play an important role to maintain good electrical characteristics. The thickness of reactive O2 based ITO:Zr films was fixed at 15 nm while Ar based films was varied from 65 to 125 nm, respectively. ITO:Zr bi-layers with the thickness of 15/105 nm deposited by O2 and Ar plasma, respectively, showed lowest resistivity of 2.358 × 10−4 Ω cm and high Hall mobility of 39.3 cm2/V · s. All ITO:Zr bi-layers showed an average transmittance of above 80% in the visible wavelength (380–800 nm) region. Work function of ITO:Zr bi-layers was calculated from the X-ray photoelectron spectroscopic (XPS) data. The ITO:Zr work function was enhanced from 5.3 eV to 5.16 eV with the variation of ITO:Zr bi-layers from 15/65 to 15/125 nm, respectively. Front barrier height in SHJ solar cells can be modified by using TCO films with high work function. The SHJ solar cells were fabricated by employing the ITO:Zr bi-layer as front anti-reflection coating. The SHJ solar cells fabricated on ITO:Zr bi-layer with the thickness of 15/105 nm showed the best photo-voltage parameters as; Voc = 739 mV, Jsc = 39.12 mA/cm2, FF = 75.97%, η = 21.96%.  相似文献   

19.
Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm.In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In2O3 or SnO2. Only a weak diffraction peak for Pt (1 1 1) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3×10−4 Ω cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.  相似文献   

20.
Without intentionally heating the substrates, indium tin oxide (ITO) thin films of thicknesses from 72 nm to 447 nm were prepared on polyethylene terephthalate (PET) substrates by DC reactively magnetron sputtering with pre-deposition substrate surfaces plasma cleaning. The dependence of structural, electrical, and optical properties on the films thickness were systematically investigated. It was found that the crystal grain size increases, while the transmittance, the resistivity, and the sheet resistance decreases as the film thickness was increasing. The thickest film (∼447 nm) was found of the lowest sheet resistance 12.6 Ω/square, and its average optical transmittance (400-800 nm) and the 550 nm transmittance was 85.2% and 90.4%, respectively. The results indicate clearly that dependence of the structural, electrical, and optical properties of the films on the film thickness reflected the improvement of the film crystallinity with the film thickness.  相似文献   

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