CdTe:Li晶体中ALi°受主与电子及激子的相互作用

用两种不同方法实现了在CdTe晶体中Li杂质的低温扩散。其中后一种无Te预扩散的方法是首次报导的。为研究在CdTe:Li中ALi°受主与电子和激子的相互作用,分析了各种发光机制中的动力学过程,观测了(e,ALi°)及(ALi°,X)发光的激发光强度效应。(ALi°、X)束缚激子可以热离解成一个自由电子和一个自由空穴而留下一个中性受主ALi°,其束缚能为Eb=4meV。在不同强度的光激发下,研究了(e,ALi°)辐射复合中电子—声子耦合。当杂质中心不变时,平均声子数N～0.1基本上保持不变,它是杂质中心波函数半径的一个量度。若假定杂质中心上电荷分布为Gaussian形,计算出表征电荷在杂质中心局域程度的常数α～160Å。     

缓冲层InxGa1-xAs组分对In0.82Ga0.18As结晶质量和表面形貌的影响

采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In_0.82Ga_0.18As材料.研究缓冲层In_xGa_1-xAs的In组分对In_0.82Ga_0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层In_xGa_1-xAs的In组分影响高温生长的外延层In_0.82Ga_0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In_0.82Ga_0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳.     

高质量ZnO及BeZnO薄膜的发光性质

用分子束外延设备插入缓冲层在c面蓝宝石上生长得到高质量ZnO和BeZnO薄膜。XRD测试显示薄膜具有六方结构和c轴取向,并具有良好的晶体质量,其中ZnO薄膜的半高宽仅为108 arcsec,Be_xZn_1-xO薄膜的半高宽小于600 arcsec。对ZnO和BeZnO薄膜的拉曼光谱进行对比研究发现,随着Be元素的掺入,A₁(LO)、A₁(2LO)声子模频率往大波数方向移动,并且首次发现了与Be元素掺杂有关的局域振动模。利用变温光致发光光谱研究了薄膜的发光性质,结果显示ZnO薄膜室温光致发光只出现一个紫外发发光峰(378 nm),而低温光谱(80 K)则出现了很强的自由激子发光峰。随着温度的升高,束缚激子发光逐渐湮灭向自由激子发光转变,并且峰值位置红移。相对于ZnO薄膜,BeZnO薄膜的紫外发光主峰位置蓝移,并且由于Be元素的掺入导致薄膜晶体质量下降,在低温(80 K)光致发光光谱中没有出现强的自由激子发光峰。另外,在低温光致发光及拉曼光谱中,主峰位置在100~200 K之间有局部最大值,推测为由于合金晶格热膨胀系数失配而引起的应力效应。     

用等离子体辅助分子束外延生长氧化锌单晶薄膜

利用等离子体辅助分子束外延(P-MBE)方法,通过优化生长条件,在c平面蓝宝石(Al_2O_3)上生长出氧化锌(ZnO)单晶薄膜。使用反射式高能衍射仪(RHEED)原位监测到样品表面十分平整,X射线摇摆曲线(XRC)测得ZnO薄膜的<002>取向半峰全宽为0.20°,证实为ZnO单晶薄膜。室温下吸收谱(ABS)和光致发光(PL)谱显示了较强的激子吸收和发射,且无深能级(DL)发光。电学性能测量表明,生长的ZnO为n型半导体,室温下载流于浓度为7×10~(16) cm~(-3),与体单晶ZnO中的载流子浓度相当。     

Si1－xGex/Si量子阱发光材料的分子束外延生长及其结构研究

采用固源Si分子束外延,在较高的生长温度于Si(100)衬底上制备出Si1－xGex/Si量子阱发光材料。发光样品的质量和特性通过卢瑟福背散射、X射线双晶衍射及光致发光评估。背散射实验中观察到应变超晶格的反常沟道效应;X射线分析表明材料的生长是共度的、无应力释放的,结晶完整性好。低温光致发光主要是外延合金量子阱中带边激子的无声发射和横光学声子参与的激子复合。并讨论了生长温度对量于阱发光的影响。     

掺杂在GaAs材料中Be受主能级之间的跃迁

通过远红外吸收谱、光致发光光谱和拉曼散射光谱,对均匀掺杂在GaAs材料中Be受主能级之间的跃迁进行了研究.实验中使用的GaAs:Be样品是通过分子束外延设备,生长在半绝缘(100) GaAs衬底之上的外延单层.在4.2 K温度下,对样品分别进行了远红外吸收光谱、光致发光光谱、Raman光谱的实验测量.在远红外吸收光谱中,清楚地观察到了从Be受主1S_(3/2)Γ_8基态到它的三个激发态2P_(3/2)Γ_8, 2P5/2Γ_8和2P5/2Γ_7之间的奇宇称跃迁吸收峰.跃迁能量与先前文献中报道的符合得很好.从光致发光光谱中,观察到了Be受主从1S_(3/2)Γ_8基态到2S_(3/2)Γ_8激发态的两空穴跃迁的发光峰,从而间接地找到了两能级之间的跃迁能量.在Raman光谱中,清楚地分辨出来了Be受主从1S_(3/2)Γ_8基态到2S_(3/2)Γ_8激发态偶宇称跃迁的拉曼散射峰,直接得到了两能级间的跃迁能量.对比发现,分别直接和间接得到的1S_(3/2)Γ8基态到2S_(3/2)Γ8激发态跃迁能量结果是一致的.     

分子束外延生长的极性与非极性BeZnO薄膜的比较研究

采用分子束外延设备在不同晶面蓝宝石衬底上(c面,a面,r面)生长BeZnO薄膜。使用复合缓冲层生长得到了高质量的BeZnO薄膜,X射线衍射半高宽达到600 arcsec。在c面与a面蓝宝石衬底上生长得到了极性BeZnO薄膜,在r面蓝宝石上生长得到了非极性BeZnO薄膜。共振拉曼光谱测试结果表明薄膜中的Be含量在同一水平。相对于c面与a面蓝宝石上的极性BeZnO薄膜,生长在r面蓝宝石衬底上的非极性BeZnO薄膜具有较大的表面粗糙度以及较大的半高宽,但是其光致发光谱中的紫外发光峰远远强于极性BeZnO薄膜,并且黄绿光发光峰弱于极性BeZnO薄膜。     

InGaAsSb/InP的MBE生长及特性

研究了InP基InGaAsSb外延材料受生长温度和Ⅴ/Ⅲ比的影响。实验中利用高能电子衍射(RHHEED)监测获得了合适的生长温度和Ⅴ/Ⅲ比,采用扫描电子显微镜 (SEM)、X射线光电子能谱(XPS)、X射线双晶衍射(XRDCD)和光致发光(PL)谱等方法研究了InGaAsSb薄膜材料的表面形貌、结晶质量和发光特性。通过控制生长温度和Ⅴ/Ⅲ比,获得了X射线衍射峰半峰全宽较窄的高质量的外延材料。     

绿色荧光粉Gd2Ba3B3O12:Tb3+的发光性能研究

采用高温同相法制备了一系列Gd<,2>Ba<,3>B<,3>O<,12>:Tb<'3+>绿色荧光粉,借助X射线粉末衍射仪(XRD)、真空紫外光谱和荧光光谱仪(VUV-UV)对样品的物相、发光性能进行了表征.结果表明,Tb<'3+>作为发光中心全部进入到基质Gd<,2>Ba<,3>B<,3>O<,12>的品格中并占据Gd...     

AlN插入层对硅衬底GaN薄膜生长的影响

利用金属有机化合物气相外延沉积技术在2inch(5.08cm)Si(111)图形衬底上生长了GaN外延薄膜,在Al组分渐变AlGaN缓冲层与GaN成核层之间引入了AlN插入层,研究了AlN插入层对GaN薄膜生长的影响。结果表明,随着AlN插入层厚度的增加,GaN外延膜(002)面与(102)面X射线衍射摇摆曲线半峰全宽明显变小,晶体质量变好,同时外延膜在放置过程中所产生的裂纹密度逐渐减小直至不产生裂纹。原因在于AlN插入层的厚度对GaN成核层的生长模式有明显影响,较厚的AlN插入层使GaN成核层倾向于岛状生长,造成后续生长的nGaN外延膜具有更多的侧向外延成分,从而降低了GaN外延膜中的位错密度,减少了GaN外延膜中的残余张应力。同时还提出了一种利用荧光显微镜观察黄带发光形貌来表征GaN成核层形貌和生长模式的新方法。     

CdS单晶中的绿色电致发光和光致发光

在50-290K温度范围内,研究了在正向电压激发下,用高纯CdS单晶制备的MIS发光二极管的电致发光光谱。在室温时,发射光谱分别由峰值为5135±25Å和5300±15Å的二个绿色谱带所组成,而在低温下,观测到有很多结构的光谱。在50K时,自由和束缚激子的发射实际上占有统治地位。文中提出,在室温时,谱峰为5135±25Å的谱带是与受导带自由电子散射的自由激子的发射有关;而谱峰为5300±15Å的谱带归结为与同时发射二个纵光学声子的自由激子的发射有关。比较了刚生长的高阻CdS单晶以及在熔融镉中热处理的低阻CdS单晶的光致发光光谱。在熔融镉中的热处理抑制了自由到束缚(HES)和束缚到束缚(LES)的边缘发射,也抑制了I2束缚激子谱线,但是增强了自由激子的发射,在电场激发下,也使自由激子的发射增强。     

The photoluminescence characterization of the N-doped ZnO films produced by wet chemical deposition

The ZnO:N films are prepared by a wet chemical method. The temperature-dependent photoluminescence (PL) is used to investigate those ZnO: N films. Due to the introduction of nitrogen atoms into ZnO film, another phase appears in the ZnO film, which can release the stress and improve the film quality. As a result, a neutral donor-bound exciton (D⁰X) emission peak is shown in low temperature PL spectrum. With the increasing temperature, the D⁰X line gradually loses its intensity and shifts to 3.30 eV, which is consistent with the well-known conversion from bound exciton to free exciton at elevated temperatures. Then, due to the thermal quenching effect, the D⁰X line vanishes in room temperature. In addition, no shift is shown in the location of visible band emission and only the intensity decreases with the increasing temperature.     

Optical properties of the Ge donor and acceptor in GaP

The observation of discrete pair line emission and the analysis of the spectra from Ge donor - C acceptor and S donor - Ge acceptor pairs in GaP is reported. The Ge donor binding energy is 0.200 ± 0.002 eV and the Ge acceptor binding energy is 0.258 ± 0.002 eV. The bound exciton recombination at neutral Ge donors was observed at 2.265 eV corresponding to an exciton binding energy of 0.063 eV. This is the most tightly donor bound exciton observed in GaP.     

Photoluminescence lifetime,absorption and excitation spectroscopy measurements on isoelectronic bound excitons in beryllium-doped silicon

Photoluminescence lifetime measurements confirm that the intense lines seen in Be-doped Si result from exciton recombination at an isoelectronic binding centre, and in addition reveal that other weaker lines are due to a different isoelectronic binding centre. We suggest that these two binding centres may be related in the same way as are the Group III acceptors and the X-acceptors in Si. A number of excited states of the main isoelectronic bound exciton have been observed in absorption, excitation and luminescence spectra, and the density of the binding centres has been determined.     

Evidence of multiexciton complexes bound to neutral acceptors in GaAs

The first observation of six sharp photoluminescence lines with energies less than the energies of the lines associated with a radiative recombination of a single exciton bound to a neutral acceptor in high purity epilayers of GaAs at liquid helium temperature is reported. It is proposed that these lines arise as a result of a radiative recombination of an exciton in a multiexciton complex bound to a neutral acceptor.     

Photoluminescence from excitons in ZrS3

The photoluminescence spectrum of the layered ZrS₃ crystal shows several narrow emission lines under the excitation by an Ar⁺ laser in the wavelength range from 605–630 nm at 4.2 K. The excitation spectra for these emission lines and their temperature dependences suggest that the observed narrow emission lines originate from the radiative annihilation of indirect excitons bound to impurities. Some of these emission lines seem to be associated with the radiative annihilation of the indirect bound exciton with emission of phonons.     

Decay of the proposed Bose-Einstein condensed excitons in AgBr

A narrow emission line close to the free singlet exciton emission in AgBr has been subject to different interpretations. Bose-Einstein condensed free triplet excitons as well as a weakly bound exciton have been suggested as the origin of this emission line. The line is investigated from 1.5 to 2.1 K with respect to the temperature dependence of the lifetime and intensity. A strong decrease of both lifetime and intensity with increasing temperature is observed and suggests this line to originate from the recombination of bound, rather than of free, excitons.     

Optical properties of Tm-doped GaSe single crystals

Optical properties of Tm-doped GaSe single crystals were investigated by measurements of optical absorption and photoluminescence. The single crystals were grown by the Bridgman technique. The X-ray diffraction analysis revealed that the single crystals were in the ε-type GaSe phase. The optical absorption spectra showed a sharp absorption peak at 582 nm near the band edge, which is due to direct free exciton. The temperature dependence of the energy of the exciton absorption peak was well fitted by the Varshni relation. In the photoluminescence spectrum at 10 K, we observed a very weak emission peak at 586 nm, a relatively strong emission peak centered at 613 nm, and several sharp and narrow emission peaks in the 790-840 nm region. The two emission peaks at 586 and 613 nm were associated with intrinsic emission lines due to direct free exciton and indirect bound exciton. The emission peaks in the 790-840 nm region, which were related to extrinsic emission, were assigned as due to the ³F₄→³H₆ transition of Tm³⁺ ions with a low symmetry of D₃ in the host lattice.     

Double acceptor bound exciton in Ge

Six photoluminescence lines from excitons bound to neutral zinc acceptors in germanium are observed. The six lines consist of three replicas associated with zero, TA and LA phonons. Two lines from each replica correspond to the transitions from the split ground states of the bound exciton complex. The binding energy of the bound exciton is found to be 3.2 meV.     

Luminescence of CuInS2: II. Exciton and near edge emission

The near-edge (exciton) emission of CuInS₂ is investigated for various material-compositions as a function of temperature. From these investigations the exciton ionization energy (20 meV) and the temperature dependence of the energy gap were determined. For the first time, recombination of the free exciton belonging to the deeper lying Γ₇ valence bands has been observed. Moreover, six different bound exciton emission lines and a donor to valence band transition were detected. These emissions could be assigned in terms of the defect-chemical model presented in Part I.