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1.
采用低压金属有机物化学气相沉积 (LP-MOCVD) 法制备GaSb/GaAs量子点。通过对不同生长温度的样品进行分析发现温度的变化对GaSb/GaAs量子点的相位角无明显影响,量子点的形状是透镜型。由于量子点特殊的应力分布,可实现量子点的"自限制"生长。量子点的化学势不连续性以及Ostwald熟化机制的影响使得量子点尺寸分布在一定范围内不连续,会出现两种尺寸模式的量子点生长。Sb原子的表面迁移率对GaSb/GaAs量子点生长有较大的影响。升高温度可有效改善量子点的分立性,在升温过程中量子点体现出其熟化过程,高温时表面原子的解析附作用对量子点尺寸和密度的影响较大。  相似文献   

2.
The hole confinement in type-II self-organized GaSb/GaAs quantum dots (QDs) was investigated by combining optical excitation and time-resolved capacitance spectroscopy. The experimental results indicate energy-selective charging even for type-II QDs. With increasing excitation energy the apparent hole activation energy decreases, which is attributed to light absorption in sub-ensembles of QDs with decreasing hole localization. The large localization energy of about 450 meV and the possibility of optical-multiplexing makes type-II GaSb/GaAs QDs a potential material system for QD memory concepts.  相似文献   

3.
We investigate effects of annealing on GaSb quantum dots (QDs) formed by droplet epitaxy. Ga droplets grown on GaAs are exposed to Sb molecular beam and then annealed at Ta=340–450 °C for 1 min to form GaSb QDs. An atomic force microscope study shows that with the increase of Ta, the average diameter of dots increases by about 60%, while their density decreases to about 1/3. The photoluminescence (PL) of GaSb QDs is observed at around 1 eV only for those samples annealed above Ta=380 °C, which indicates that the annealing process plays an important role in forming high quality GaSb QDs.  相似文献   

4.
We discuss a technique that allows us to grow high-density GaSb and InGaSb quantum dots (QDs) on (0 0 1)-oriented GaAs substrates. We study the use of Si atom irradiation on the substrate surface as an anti-surfactant before the QDs fabrication. It is clear that the densities of GaSb and InGaSb QDs are drastically enhanced with the Si atom irradiation. Photoluminescence intensities from these QDs are also increased with the Si atom irradiation. These results indicate that the Si atom irradiation technique is useful to improve the properties of the Sb-based QDs.  相似文献   

5.
The intermixing of Sb and As atoms induced by rapid thermal annealing (RTA) was investigated for type II GaSb/GaAs self-assembled quantum dots (QD) formed by molecular beam epitaxy growth. Just as in InAs/GaAs QD systems, the intermixing induces a remarkable blueshift of the photoluminescence (PL) peak of QDs and reduces the inhomogeneous broadening of PL peaks for both QD ensemble and wetting layer (WL) as consequences of the weakening of quantum confinement. Contrary to InAs/GaAs QDs systems, however, the intermixing has led to a pronounced exponential increase in PL intensity for GaSb QDs with annealing temperature up to 875 °C. By analyzing the temperature dependence of PL for QDs annealed at 700, 750 and 800 °C, activation energies of PL quenching from QDs at high temperatures are 176.4, 146 and 73.9 meV. The decrease of QD activation energy with annealing temperatures indicates the reduction of hole localization energy in type II QDs due to the Sb/As intermixing. The activation energy for the WL PL was found to drastically decrease when annealed at 800 °C where the QD PL intensity surpassed WL.  相似文献   

6.
The variation of the size distribution and dot shape of the GaSb quantum dots (QDs) induced by ion sputtering with sputtering time was investigated by high-resolution atomic force microscopy (AFM). The results showed that the range of the size distribution firstly becomes broad with the sputtering time below 150 s; after this time, it starts to decrease and then keep quite constant at a long time. Meanwhile, the GaSb QDs undergo a shape transition from partly dome to cone, and finally develops into complete dome structure. These transitions can be explained by the change in chemical potential, as suggested by Ross et al. (Phys. Rev. Lett. 80 (1998) 984).  相似文献   

7.
Novel self-assembled quantum dots (QDs) in the GaSb/AlAs heterosystem were obtained and studied by means of transmission electron microscopy, steady-state and transient photoluminescence. A strong inter-mixing of both III and V group materials results in the fabrication of quaternary alloy QDs in the AlAs matrix. The QDs have atypical energy structure: band alignment of type I with the lowest electronic state at the indirect X minimum of the conduction band.  相似文献   

8.
A systematic study was performed to control the geometrical anisotropy of GaSb(As)/GaAs quantum dot structures formed by the Stranski–Krastanov growth mode of molecular beam epitaxy. In particular, effects of both the Sb4 beam flux and the As4 background pressure on the geometrical anisotropy were clarified and elongated QDs with lateral aspect ratio greater than 3 were successfully formed. Under a low As4 background pressure, As4 is found to act as surfactant to influence the adatom diffusion and change the density of QDs. By contrast, under high As4 background pressure, the intermixing of As and Sb takes place and reduces strains induced by the lattice mismatch.  相似文献   

9.
研究了GaSb/GaAs复合应力缓冲层上自组装生长的InAs量子点.在2ML GaSb/1ML GaAs复合应力缓冲层上获得了高密度的、沿[100]方向择优分布量子点.随着复合应力缓冲层中GaAs层厚度的不同,量子点的密度可以在1.2×1010cm-2和8×1010cm-2进行调控.适当增加GaAs层的厚度至5ML,量子点的发光波长红移了约25nm,室温下PL光谱波长接近1300nm. 关键词: 自组装量子点 分子束外延 Ⅲ-Ⅴ族化合物半导体  相似文献   

10.
We have studied the molecular beam epitaxy (MBE) of GaSb films on GaAs (0 0 1) substrates by using ZnTe as a new buffer layer. GaSb films were grown on two distinct ZnTe surfaces and the influence of surface chemical composition of ZnTe on the morphological and structural properties of GaSb films has been investigated. Initial 2-dimensional (2D) growth of GaSb films is obtained on Zn-terminated surface consequently smooth morphology and high crystal quality GaSb films are achieved. The thin GaSb film (0.4 μm) grown on Zn-terminated ZnTe surface reveals considerably narrow X-ray diffraction linewidth (113 arcsec) along with small residual strain, which strongly supports the availability of ZnTe buffer for the growth of high-quality GaSb film.  相似文献   

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