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1.
用射频控共溅射方法在不同温度的单晶硅基片上生长薄膜,然后在800℃真空环境下对薄膜进行退火处理,成功获得了结晶状态良好的Zn2GeO4多晶薄膜.利用X射线衍射(XRD),X射线光电子能谱(XPS)和原子力显微镜(AFM)对薄膜进行了结构、成分和形貌分析,研究了基片温度对三者的影响.结果显示,当基片温度升高到400℃以上时,薄膜中的Zn2GeO4晶粒在(220)方向上显示出了明显的择优取向.当基片温度在500-600℃范围内,有利于GeO2结晶相的形成.XPS显示薄膜中存在着Zn2GeO4,GeO2,GeO,ZnO四种化合态.同时,随着基片温度的升高,晶粒尺寸增大且薄膜表面趋于平整.薄膜的光致发光在绿光带存在中心波长为530和550 nm两个峰,应该归因于主体材料Zn2GeO4中两个不同的Ge2 的发光中心.  相似文献   

2.
基于SSCVD方法的a-b轴取向ZnO薄膜制备   总被引:1,自引:0,他引:1       下载免费PDF全文
陈根  汤采凡  戴丽萍  邓宏 《发光学报》2006,27(5):773-776
以Zn4(OH)2(O2CCH3)6·2H2O为单一固相有机源,采用单源化学气相沉积法(Single sour cechem icalvapor deposition,SSCVD)在Si(100)衬底上制备ZnO薄膜,用X射线衍射(XRD)、原子力显微镜(AFM)分析ZnO薄膜样品的晶体结构和微观形貌,并用X射线光电子能谱(XPS)对薄膜的锌氧化学计量比进行了分析。研究结果表明:在非平衡条件下所得到的ZnO薄膜沿a-b轴取向生长,基片温度对ZnO薄膜生长过程影响较大,随着基片温度的升高,薄膜呈现c轴生长趋势;晶粒成柱状、尺寸均匀、膜层结构致密;薄膜样品中nZn:nO=0.985。  相似文献   

3.
张军  谢二庆  付玉军  李晖  邵乐喜 《物理学报》2007,56(8):4914-4919
采用射频反应溅射法在玻璃衬底上制备Zn3N2薄膜,然后向真空室中通入纯氧气进行热氧化制备ZnO薄膜.利用X射线衍射、扫描电子显微镜、霍尔效应测量、透射光谱和光致发光光谱等表征技术,研究了氧化温度和氧化时间对ZnO薄膜的结晶质量、电学性质和光学性能的影响.研究结果显示,450 ℃ 下氧化2 h后的样品中除含有ZnO外,还有Zn3N2成分,500 ℃下氧化2 h可以制备出电阻率为0.7 Ωcm,空穴载流子浓度为10关键词: p型ZnO薄膜 3N2薄膜')" href="#">Zn3N2薄膜 射频溅射 原位氧化  相似文献   

4.
利用化学气相沉积法(CVD),气-液-固(VLS)生长法则在表面溅有金属Au催化剂层的1 cm×1 cm的Si片上制备三元Zn2GeO4纳米线。X射线衍射仪(XRD)测试结果表明,锌源与锗源质量比为8:1时可成功制备出Zn2GeO4纳米结构;扫描电子显微镜(SEM)测试结果表明,Zn2GeO4纳米线直径为100 nm,长度为10~11 μm;光致发光(PL)测试结果表明,Zn2GeO4纳米线在432和480 nm处具有两个发光峰,最后对其生长机理进行了分析。  相似文献   

5.
邱东江  王俊  丁扣宝  施红军  郏寅 《物理学报》2008,57(8):5249-5255
以NH3为掺N源,采用电子束反应蒸发技术生长了Mn和N共掺杂的Zn1-xMnxO:N薄膜,生长温度为300℃,然后在O2气氛中400℃退火0.5 h.X射线衍射测量表明,Zn0.88Mn0.12O(Mn掺杂)薄膜或Zn0.88Mn0.12O:N(Mn和N共掺杂)薄膜仍具有单一晶相纤锌矿结构,未检测到杂质相 关键词: ZnO薄膜 Mn和N共掺杂 电学特性 磁特性  相似文献   

6.
杜新华  刘振祥  谢侃  王燕斌  褚武扬 《物理学报》1998,47(12):2025-2030
用射频/直流磁控溅射法制备了CeO2/Nb2O5双层氧敏薄膜,利用X射线光电子能谱(XPS),描述并解释了单层CeO2薄膜中氧随温度变化的动力学行为,以及CeO2/Nb2O5薄膜界面对氧敏特性的影响.通过对Ce3d XPS谱的高斯拟合,计算了Ce3+浓度并给出了判定Ce4+还原的标志.结果表明,界面效应可以提高CeO2/Nb2O5薄膜中Ce4+的还原能力,使之远远高于单层CeO2薄膜,这对薄膜的氧敏特性是极为有利的. 关键词:  相似文献   

7.
田曼曼  王国祥  沈祥  陈益敏  徐铁峰  戴世勋  聂秋华 《物理学报》2015,64(17):176802-176802
本文采用双靶(ZnSb靶和Ge2Sb2Te5靶)共溅射制备了系列ZnSb掺杂的Ge2Sb2Te5(GST)薄膜. 利用X射线衍射、透射电子显微镜、原位等温/变温电阻测量、X射线光电子能谱等测试研究了薄膜样品的非晶形态、电学及原子成键特性. 利用等温原位电阻测试表明ZnSb掺杂的Ge2Sb2Te5薄膜具有更高的结晶温度. 采用Arrhenius 公式计算发现ZnSb掺杂的Ge2Sb2Te5薄膜的十年数据保持温度均高于传统的Ge2Sb2Te5薄膜的88.9℃. 薄膜在200, 250, 300和350℃ 下退火后的X射线衍射图谱表明ZnSb的掺杂抑制了Ge2Sb2Te5薄膜从fcc态到hex态的转变. 通过对薄膜的光电子能谱和透射电镜分析可知Zn, Sb, Te原子之间键进行重组, 形成Zn–Sb 和Zn–Te 键, 且构成非晶物质存在于晶体周围. 采用相变静态检测仪测试样品的相变行为发现ZnSb掺杂的Ge2Sb2Te5薄膜具有更快的结晶速度. 特别是(ZnSb)24.3(Ge2Sb2Te5)75.7薄膜, 其结晶温度达到250℃, 十年数据保持温度达到130.1℃, 并且在70 mW激光脉冲功率下晶化时间仅~64 ns, 远快于传统Ge2Sb2Te5薄膜的晶化时间~280 ns. 以上结果表明(ZnSb)24.3(Ge2Sb2Te5)75.7薄膜是一种热稳定性好且结晶速度快的相变存储材料.  相似文献   

8.
本文采用分子束外延技术,通过对金属分子束的精确控制,在MgO(002)基底上成功生长了GaxN2∶Zn3-x合金薄膜.高分辨率单晶X光衍射仪表征结果表明GaxN2∶Zn3-x合金薄膜仍是以(400)Zn3N2为主导的复合晶体结构,对衍射数据的分析得到该薄膜晶粒尺寸小.用扫描电子显微镜和能谱射线分析仪对其表面和成分做了深入的分析和讨论,在固定的金属流量比的生长环境下,不同厚度的样品在成膜后x均为0.65,化学通式Zn2.35Ga0.65N2.该结果表明Ga元素属于重度掺杂,同时也体现了分子束外延技术在共掺杂技术中的优越性.本文也测量并讨论了Zn2.35Ga0.65N2薄膜的光学性能,实验得到的1.85 eV的光学带隙与理论推算基本吻合,说明Ga的掺入有Ga-N结构...  相似文献   

9.
InP/SiO2纳米复合膜的微观结构和光学性质   总被引:1,自引:0,他引:1       下载免费PDF全文
应用射频磁控共溅射方法在石英玻璃和抛光硅片上制备了InP/SiO2复合薄膜,并在几种条件下对这些薄膜进行退火.X射线光电子能谱和卢瑟福背散射实验结果表明,复合薄膜中InP和SiO2的化学组分都大体上符合化学计量配比.X射线衍射和激光喇曼谱实验结果都证实了复合薄膜中形成了InP纳米晶粒.磷气氛保护下的高温(520℃)退火可以消除复合薄膜中残存的In和In2O3并得到了纯InP/SiO2纳米复合薄膜.实验观察到了室温下纳米复合薄膜的明显的光学吸收边蓝移现象和光学非线性的极大增强 关键词: InP 纳米晶粒 微观结构 光学性质  相似文献   

10.
张辉  刘应书  刘文海  王宝义  魏龙 《物理学报》2007,56(12):7255-7261
采用磁控溅射工艺制备了V2O5薄膜.通过改变制备工艺中基片温度和氧分压两个条件,研究了薄膜的晶相组成、表观形貌以及氧化物中钒和氧元素的化合价态.当基片温度升高时,V2O5薄膜中颗粒结晶由细长针状转变为平行于基片的片状,V5+状态保持不变,但723 K时氧结合能向高键能态移动.氧分压较低时,薄膜表面有部分V4+态存在,但存在较多的高键能氧,此时薄膜中晶粒尺寸较小.随着氧分压的提 关键词: 氧化钒 磁控溅射 相变薄膜 X射线光电子能谱  相似文献   

11.
用脉冲激光沉积(PLD)法在不同温度的Si(111)衬底上成功制备了c轴择优取向的Mg005Zn095O薄膜.通过X射线衍射(XRD)和光致发光谱(PL)研究了衬底温度对Mg005Zn095O薄膜结构和发光特性的影响,探讨了薄膜的结晶质量与发光特性之间的关系.结果表明,在衬底温度为450℃时生长的Mg005Zn095O薄膜具有很好的c轴取向和较强的光致发光峰.室温下分别用激发波长为240,300和325nm的氙灯作为激发光源得到不同样品的PL谱,分析表明紫外发光峰和紫峰来源于自由激子的复合辐射且发光强度与薄膜的结晶质量密切相关,蓝绿发光峰与氧空位有关.此外,探讨了衬底温度影响紫外光致发光峰红移和蓝移的可能机理. 关键词: 005Zn095O薄膜')" href="#">Mg005Zn095O薄膜 PLD 衬底温度 光致发光  相似文献   

12.
Zn0.95−xCo0.05CuxO (ZCCO, where x = 0, 0.005, 0.01 and 0.015) thin films were deposited on Si (1 0 0) substrates by pulsed laser deposition technique. Crystal structures, surface morphologies, chemical compositions, bonding states and chemical valences of the corresponding elements for ZCCO films were characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and X-ray photoelectron spectroscopy (XPS). XRD and FESEM results indicate that crystallite sizes of the highly (0 0 2)-oriented ZCCO films slightly decrease with increasing Cu content. When the Cu content increases from 0 to 0.015, Zn 2p3/2, Co 2p, Cu 2p3/2 and O 1s peaks of the ZCCO film shift towards higher or lower binding energy regions, and the reasons for these chemical shifts are investigated by fitting the corresponding XPS narrow-scan spectra. Both in-plane and out-of-plane magnetization-magnetic field hysteresis loops of the ZCCO films reveal that all the films have room temperature ferromagnetisms (RTFMs). The conceivable origin of the RTFM is ascribed to the combined effects of the local structural disorder resulted from (Co2+, Cu2+, Cu1+)-cations which substitute Zn2+ ions in the ZnO matrices, ferromagnetic coupling between coupled dopant atoms caused by Co2+ (3d74s0) and Cu2+ (3d94s0) spin states, and exchange interactions between the unpaired electron spins originating from lattice defects induced by Cu doping in the Zn0.95Co0.05O matrices.  相似文献   

13.
Amorphous Er 2 O 3 films are deposited on Si (001) substrates by using reactive evaporation.This paper reports the evolution of the structure,morphology and electrical characteristics with annealing temperatures in an oxygen ambience.X-ray diffraction and high resolution transimission electron microscopy measurement show that the films remain amorphous even after annealing at 700 C.The capacitance in the accumulation region of Er 2 O 3 films annealed at 450 C is higher than that of as-deposited films and films annealed at other temperatures.An Er 2 O 3 /ErO x /SiO x /Si structure model is proposed to explain the results.The annealed films also exhibit a low leakage current density (around 1.38 × 10 4 A/cm 2 at a bias of 1 V) due to the evolution of morphology and composition of the films after they are annealed.  相似文献   

14.
Al2O3/SiO2 films have been prepared by electron-beam evaporation as ultraviolet (UV) antireflection coatings on 4H-SiC substrates and annealed at different temperatures. The films were characterized by reflection spectra, ellipsometer system, atomic force microscopy (AFM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. As the annealing temperature increased, the minimum reflectance of the films moved to the shorter wavelength for the variation of refractive indices and the reduction of film thicknesses. The surface grains appeared to get larger in size and the root mean square (RMS) roughness of the annealed films increased with the annealing temperature but was less than that of the as-deposited. The Al2O3/SiO2 films maintained amorphous in microstructure with the increase of the temperature. Meanwhile, the transition and diffusion in film component were found in XPS measurement. These results provided the important references for Al2O3/SiO2 films annealed at reasonable temperatures and prepared as fine antireflection coatings on 4H-SiC-based UV optoelectronic devices.  相似文献   

15.
0.7BiFeO3-0.3PbTiO3 (BFPT7030) thin films were deposited on SiO2/Si substrates by sol-gel process. The influence of heating rate on the crystalline properties of BFPT7030 thin films were studied by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). XRD patterns of the films showed that a pure perovskite phase exists in BFPT7030 films annealed by rapid thermal annealing (RTA) technique. SEM and AFM observations demonstrated that the BFPT7030 films annealed by RTA at 700 °C for 90 s with the heating rate of 1 °C s−1 could show a dense, crack-free surface morphology, and the films’ grains grow better than those of the films annealed by RTA at the same temperature with other heating rates. XPS results of the films indicated that the ratio of Fe3+:Fe2+ is about 21:10 and 9:5 for the films annealed by RTA at 700 °C for 90 s with the heating rate of 1 and 20 °C s−1, respectively. That means the higher the heating rate, the higher the concentration of Fe2+ in the BFPT7030 thin films.  相似文献   

16.
王华  任鸣放 《物理学报》2006,55(6):3152-3156
采用Sol-Gel工艺低温制备了Si基Bi3.25La0.75Ti3O12铁电薄膜.研究了退火温度对薄膜微观结构、介电特性与铁电性能的影响.500℃退火处理的Bi3.25La0.75Ti3O12薄膜未能充分晶化,晶粒细小且有非晶团聚,介电与铁电性能均较差.高于550℃退火处理的Bi3.25La0.75 关键词: 铁电薄膜 3.25La0.75Ti3O12')" href="#">Bi3.25La0.75Ti3O12 Sol-Gel工艺  相似文献   

17.
采用共溅射方法和Eu离子注入热生长的SiO2方法得到SiO2(Eu)薄膜,Eu离子的浓度为4%和0.5%.对样品X射线吸收近边结构(XANES)的研究和分析表明,在高温氮气中发生了Eu3+向Eu2+的转变.SiO2(Eu)薄膜高温氮气退火下蓝光的发射证明了这一结论 关键词: 2(Eu)薄膜')" href="#">SiO2(Eu)薄膜 XANES  相似文献   

18.
HfO2 films are deposited by atomic layer deposition (ALD) using tetrakis ethylmethylamino hafnium (TEMAH) as the hafnium precursor, while O3 or H2O is used as the oxygen precursor. After annealing at 500℃ in nitrogen, the thickness of Ge oxide's interfacial layer decreases, and the presence of GeO is observed at the H2O-based HfO2 interface due to GeO volatilization, while it is not observed for the O3-based HfO2. The difference is attributed to the residue hydroxyl groups or H2O molecules in H2O-based HfO2 hydrolyzing GeO2 and forming GeO, whereas GeO is only formed by the typical reaction mechanism between GeO2 and the Ge substrate for O3-based HfO2 after annealing. The volatilization of GeO deteriorates the characteristics of the high-κ films after annealing, which has effects on the variation of valence band offset and the C–V characteristics of HfO2/Ge after annealing. The results are confirmed by X-ray photoelectron spectroscopy (XPS) and electrical measurements.  相似文献   

19.
Spherical SiO2 particles have been coated with Zn2SiO4:Eu3+ phosphor layers by a Pechini sol-gel process. The microstructure and luminescent properties of the obtained Zn2SiO4:Eu3+@SiO2 particles were well characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), transmission electron microscopy (TEM), photoluminescence (PL) spectra, and lifetime. The results demonstrate that the Zn2SiO4:Eu3+@SiO2 particles, which have regular and uniform spherical morphology, emitted an intensive red light emission at 613 nm under excitation at 395 nm. Besides, the effects of the Eu3+ concentration, annealing temperature and charge compensators of Li+ ions on the PL emission intensities were investigated in detail.  相似文献   

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