NH_3在Ir(211)和Ir(221)表面吸附的第一性原理计算

采用密度泛函理论,结合周期性平板模型,研究了NH_3在Ir(211)和Ir(221)表面上的吸附行为.计算结果显示,在Ir(211)、(221)两个面上,NH_3的优势吸附位皆为脊上的top位,吸附能均达到1.0 eV以上,都为化学吸附.电子结构计算结果表明,NH_3通过其N原子的2p_z轨道与底物金属Ir的5d_z~2轨道混合吸附于表面.     

原子分子在Pt(100)表面吸附的第一性原理研究

本文系统研究了H、N、O、C、S等原子,N_2、NH_3、NO、CO等分子和CH_3、CH、CH_2和OH等自由基在Pt(100)表面的吸附.从能量上来看,吸附能力从小到大的顺序是N_2NH_3COCH_3NOHOHNCH2OSCHC.原子类吸附物中H、N、O的最稳定吸附位均为桥位,而S、C则倾向于四重空位.所研究的分子吸附物(N_2、NH3、CO、NO),N_2和NH_3有且只有一种顶位吸附结构,CO和NO均优先吸附在空位.自由基吸附物(CH、CH_2、CH_3、OH)在Pt(100)表面上的吸附,CH_3优先吸附在顶位,CH_2、OH它们的最稳定吸附位均为桥位.原子、分子和自由基吸附后,会引起Pt(100)原子层间距的改变.     

NO在Ir(111)表面吸附与解离的第一性原理研究

本文系统研究了NO在Ir(111)表面的吸附,解离,以及可能的N_2生成机理.结果表明,顶位吸附的NO,其解离能垒较高(3.17 eV),不会发生解离,而三重Hcp和Fcc空位吸附的NO发生解离,能垒分别为1.23和1.28 eV.N_2是唯一的生成物,不会有副产物N_2O的产生.其最可能的反应路径为N和NO经过N_2O中间体而生成N_2,而不是直接N提取和N-N聚合产生N_2的机理.     

致密气在α-SiO_2(010)面吸附的第一性原理研究

致密气在砂岩储层中的赋存状态一直是人们研究的热点.为了论证致密气在石英砂岩表面吸附性的强弱,基于密度泛函理论的第一性原理方法,以CH_4分子为主要研究对象,研究了CH_4、C_2H_6、CO_2、N_2分子在α-SiO_2(010)面的吸附性质.结果表明:CH_4、C_2H_6、CO_2、N_2分子在α-SiO_2(010)面的吸附能力从小到大依次为CO_2N_2CH_4C_2H_6,其中CH_4分子在B12位的吸附能最低,为-0.5379 eV,几何结构变化最小,吸附最稳定,是一种物理吸附;烃类气体的吸附性比非烃类的吸附性强;不同高对称位的吸附能变化范围很小,气体在α-SiO_2(010)面的流动性很强;在B12位吸附后,CH_4分子的s态、p态电子密度整体向低能量区域偏移约3.2 eV,而α-SiO_2(010)表面硅原子的电子态密度曲线几乎不变.     

O_2/CO_2气氛燃煤半焦孔隙特性分析

在沉降炉上制备了不同燃烧气氛、不同燃尽程度的半焦,采用低温氮吸附仪和扫描电子显微镜测定了其孔隙结构和表面形态.结果表明,所取的半焦试样均具有完整且连续的孔结构体系;但在相同的操作条件下,O_2/CO_2气氛下半焦试样的孔结构参数及其分形维数均小于相同O_2浓度的O_2/N_2气氛下的情况;两种气氛下煤焦的燃尽过程中,孔隙结构参数(S_(BET)、V_(BJH)和d_(pore))随燃尽率的增加均呈减小趋势;SEM图像的定性分析结果与N_2吸附的定量测量吻合较好.研究结果为深入认识O_2/CO_2气氛下煤粉的孔隙结构与其燃烧特性的关系提供了基础.     

N_2在Co掺杂Ru(001)表面吸附的DFT研究

采用密度泛函理论与周期性平板模型相结合的方法,对N_2在Ru(001)表面top、fcc、hcp、bridge四个吸附位和Ru-Co(001)表面Ru-top、Co-top、Ru(Ru)Ru-bridge、Co(Co)Co-bridge、Ru(Co)Co-bridge、Ru(Ru)Co-bridge、Ru_2Co-hcp、RuCo_2-hcp、Ru_2Co-fcc、RuCo_2-fcc十个吸附位的14种吸附模型进行了构型优化、能量计算,得到了N_2较有利的吸附位;并对清洁表面进行能带分析,对最佳吸附位进行总态密度分析.结果表明:掺杂Co后,Ru催化剂的能带变宽,催化活性增强;N_2在Ru(001)表面的最稳定吸附位top的吸附能是-88.94 kJ·mol~(-1),在Ru-Co(001)表面的最稳定吸附位Ru-top的吸附能是-95.71 kJ·mol~(-1),而且N_2与金属表面成键,属于化学吸附.     

密度泛函理论研究Rh_n(n=2-5)团簇与部分小分子体系的相互作用

采用密度泛函理论系统计算研究了Rh_n(n=2-5)团簇吸附小分子(H_2、O_2、N_2、NO、CO、NO_2、CO_2)体系的基态几何结构和电子结构特性.结果表明:N_2、NO、CO和CO_2在Rhn表面以物理吸附的形式存在,H_2和NO_2在Rhn表面发生化学吸附,O_2在Rhn表面的吸附与Rh团簇所含原子数目的奇偶性密切相关:O_2在含奇数原子铑团簇表面发生化学吸附、在含偶数原子铑团簇表面发生物理吸附;对于各小分子在Rhn表面的物理吸附而言,吸附能强弱顺序为NO(CO≈NO_2≈O_2)(CO_2≈N_2)H_2.     

N_2O在Y_n(n=2-7)团簇表面的自然解离

运用第一性原理,研究了N2O在Yn(n=2-7)团簇表面吸附机理.结果表明:N_2O吸附于Yn(n=2-7)团簇表面时,不需要克服任何能垒而自然解离.吸附导致了主团簇Y原子平均键长增大,体系表现出了巨大的吸附能(约为8-10 e V).吸附对体系化学活性的影响具有一定的尺寸依赖性.在所有团簇中,Y_6N_2O吸附能最大,化学性质最稳定.     

NH_x(x=1～3)在金属Ir表面吸附与解离的第一性原理研究

采用密度泛函理论,在slab模型下,研究了NH_x(x=1~3)在Ir(100)、Ir(111)和Ir(110)表面上的最稳定吸附位置、几何构型以及逐步脱氢分解过程,计算了相应的吸附能和活化能.计算结果表明,在Ir(100)、Ir(111)面上,NH_3是以C_3轴垂直吸附在顶位,在Ir(110)上,NH_3是以N-Ir键与表面成68.6°吸附在顶位,且吸附能依赖于表面的结构而不同,相比而言,NH_3更容易吸附在开放表面Ir(100)、Ir(110)面上,说明NH_3在这些表面的吸附具有结构敏感性.NH_(x(x=1~3))的分解,在Ir(100),NH_3的吸附与分解存在竞争,在Ir(110)面NH_3最容易分解,在Ir(111)面NH_3是分子性吸附,不能分解.NH_2、NH在三个表面均能够分解,在Ir(110)面活化能均较高.     

酸碱环境对TiO2吸附替硝唑的影响

基于密度泛函理论,研究了酸碱性条件下替硝唑在TiO2(101)和(001)晶面上的吸附特性.优化了替硝唑在TiO2(101)和(001)晶面的吸附结构,计算了最佳吸附位点,吸附能以及态密度.结果表明,当咪唑环上N(3)原子吸附在TiO2的Ti(5)原子上时,吸附能最大,为最稳定的吸附构型.通过对吸附构型的分析,我们发现C(2)-N(3)成键性质被削弱,且光催化反应中各构型价带与导带间电子跃迁均在可见光范围内.     

Density functional theory study of Ir atom deposited on γ-Al2O3 (001) surface

Iridium adsorption on γ-Al₂O₃ (001) surface has been studied using the ab initio calculation method and the electronic structures of the bare and the Ir adsorbed γ-Al₂O₃ (001) surfaces have been analyzed. By modeling different adsorption sites, one can conclude that the energetically most favorable sites for the Ir are the top sites of the O atoms at the γ-Al₂O₃ (001) surface terminated with octahedral Al. Charge redistribution around the Ir atom adsorbed on the surface improves the activity of the Ir atom as a catalyst.     

奥硝唑在TiO_2(101)晶面上吸附特征的理论研究

奥硝唑残留是一种新兴污染物,对环境和人类健康具有巨大的威胁.采用密度泛函理论,研究了奥硝唑在锐钛矿TiO_2(101)晶面的吸附特性.优化了奥硝唑在锐钛矿TiO_2(101)晶面的吸附结构,计算了最佳吸附位点,吸附能,态密度,电子结构图.结果表明,当咪唑环上N(3)原子吸附在TiO_2的Ti(5)原子上时,吸附能最大,为最稳定的吸附构型.通过对吸附构型的分析,我们发现C(2)-N(3)键呈现变弱趋势,我们推测奥硝唑在TiO_2表面降解的可能性以及反应活性位点就是咪唑环上C-N键.     

Ar adsorptions on Al (111) and Ir (111) surfaces: a first-principles study

We investigate the adsorptions of Ar on Al (111) and Ir (111) surfaces at the four high symmetry sites, i.e., top, bridge, fcc- and hcp-hollow sites at the coverage of 0.25 monolayer (ML) using the density functional theory within the generalized gradient approximation of Perdew, Burke and Ernzerhof functions. The geometric structures, the binding energies, the electronic properties of argon atoms adsorbed on Al (111) and Ir (111) surfaces, the difference in electron density between on the Al (111) surface and on the Ir (111) surface and the total density of states are calculated. Our studies indicate that the most stable adsorption site of Ar on the Al (111) surface is found to be the fcc-hollow site for the (2 × 2) structure. The corresponding binding energy of an argon atom at this site is 0.538 eV/Ar atom at a coverage of 0.25 ML. For the Ar adsorption on Ir (111) surface at the same coverage, the most favourable site is the hcp-hollow site, with a corresponding binding energy of 0.493 eV. The total density of states (TDOS) is analysed for Ar adsorption on Al (111) surface and it is concluded that the adsorption behaviour is dominated by the interaction between 3s, 3p orbits of Ar atom and the 3p orbit of the base Al metal and the formation of sp hybrid orbital. For Ar adsorption on Ir (111) surface, the conclusion is that the main interaction in the process of Ar adsorption on Ir (111) surface comes from the 3s and 3p orbits of argon atom and 5d orbit of Ir atom.     

甲基和羟基在Ir(111)表面吸附的密度泛函理论研究

在超原胞近似和slab模型基础上,采用周期性密度泛函理论,在0.11覆盖度（ML）下,对甲基与羟基在Ir(111)表面的吸附进行了研究,得到了甲基和羟基在Ir(111)表面不同吸附位置的吸附能和吸附构型,计算了它们的振动频率,同时分析了甲基和羟基共吸附于Ir(111)表面的情况。结果表明,甲基和羟基在Ir(111)表面的最稳定吸附位置都是top位,甲基是碳端向下吸附,羟基是通过氧端向下倾斜吸附。通过频率分析发现吸附后CH3中C-H键的对称伸缩振动、反对称伸缩振动以及剪切振动频率均发生了红移,而羟基中的O-H键的振动频率发生蓝移现象。通过计算对比发现甲醇分解为甲基和羟基过程是一个放热反应,从热力学角度来说该反应是可行的。     

第一性原理研究O2和H2O在ZnO (101 ̅0)表面上的吸附行为

运用基于密度泛函理论(DFT)的第一性原理方法研究了O2和H2O单分子在ZnO (101 ̅0)表面上的吸附行为。吸附位点主要考虑了表面的Zn顶位和Zn桥位，同时也考虑了其它可能的吸附行为。对于O2在ZnO (101 ̅0)表面上的吸附设计了9个模型，H2O在ZnO (101 ̅0)表面上的吸附设计了12个模型。通过形成能计算发现，O2在表面上的吸附为正值，H2O的吸附为负值。O2和H2O单分子在表面上发生分子吸附，未见解离形态。对于O2吸附最稳定的结构是O2分子与表面相邻的Zn原子形成了Znslab1-Oads1-Oads2-Znslab2桥连键。其它较为稳定的结构是Oads1原子迁移到下一个表面重复晶胞的O原子位置附近，在表面上形成了Znslab1-Oads1键，同时Oads2原子扩散至表面沟渠上方。对于H2O吸附，不论以何种方式吸附结构都比较稳定。其中最稳定的构型是Oads迁移到下一个表面重复晶胞的O原子位置附近，形成了Znslab1-Oads键以及Oslab3-H氢键。另外较稳定的构型是Oads迁移到ZnO (101 ̅0)表面台阶上方，形成了Znslab1-Oads键以及Oslab1-H氢键。     

Optoelectronic properties of two-dimensional GaN adsorbed with H,N and O: A first-principle study

In this paper, we have investigated optoelectronic properties of two-dimensional GaN adsorbed with non-metal atoms: H, N and O based on first-principle. We find that adsorption of H, N and O atom on 2D GaN is achieved by chemisorption, and the most stable adsorption site is at the top of N atom. Band structure of 2D GaN after adsorbing H atom moves to low energy region and two-dimensional GaN is transformed into an n-type semiconductor. After adsorption of N atom, a new impurity energy appears at the Fermi level, and N adatom could induce magnetism into 2D GaN. Static dielectric constants of 2D GaN increase and adsorption spectrums have extend to infrared band when adsorbing H and N. Strong reflection peaks and strong adsorption peaks after adsorption are located at deep ultraviolet range, which is beneficial for optoelectronic application in the deep ultraviolet. Specifically, two-dimensional GaN adsorbed with H atom is more conducive to manufacture of nano-optoelectronic devices.     

Cu(100)表面c(2×2)-N原子结构与吸附行为研究

用密度泛函理论的总能计算研究了金属铜(100)面的表面原子结构以及氮原子的c(2×2)吸附状态.研究结果表明：在Cu(100) c(2×2)-N表面系统中，氮原子处于四度配位的空洞(FFH)位置，距离最表面铜原子层的垂直距离为0.20?，最短的Cu—N键长度为1.83?.结构优化的计算否定了被吸附物导致的表面再构模型，即c(2×2)元胞的两个铜原子在垂直于表面方向发生相对位移，一个铜原子运动到氮原子之上的模型.该吸附表面的功函数约为4.65eV, 氮原子的平均吸附能为4.92 eV(以孤立氮原子为能量参考点).计算结果还说明，Cu—N杂化形成的表面局域态的位置在费米面以下约1.0 eV附近出现，氮原子和第一层以及第二层铜原子均有不同程度的杂化作用.该结果为最近有关该表面的STM图像的争论提供了判据性的第一性原理计算结果. 关键词： Cu(100) c(2×2)-N 表面吸附态 密度泛函总能计算     

Deposition dynamics and chemical properties of size-selected Ir clusters on TiO2

We report a study of Ir_n/TiO₂ samples prepared by size and energy-selected deposition of Ir_n⁺ (n=1, 2, 5, 10, 15) on rutile TiO₂(1 1 0) at room temperatures. The Ir clusters are found to be formally in the zero oxidation state, and there are no significant shifts in Ir 4f binding energy with cluster size. Over a wide range of impact energies, both Ir XPS intensity and peak position are constant, indicating constant sticking coefficient, and no impact-driven redox chemistry. Low energy ion scattering spectroscopy (ISS) suggests that the deposited Ir clusters remain largely intact, neither fragmenting nor agglomerating, and retaining 3-D structures for the larger sizes. For impact energies above 10 eV/atom, comparison of ISS and XPS data show that the Ir clusters are penetrating into the TiO₂ surface, with the extent of penetration increasing with both per atom energy and cluster size. Temperature programmed desorption (TPD) of CO is used to further characterize the deposited Ir_n. This system shows pronounced substrate-mediated adsorption (SMA) in low CO exposures, with strong dependence on cluster size. ISS and sputtering experiments indicate that CO adsorbed via SMA is bound differently than CO adsorbed in high dose experiments. In experiments with sequential C¹⁶O and C¹⁸O doses, facile C¹⁶O → C¹⁸O exchange is observed for Ir₅ and larger clusters, but not for Ir₂. The peak CO desorption temperature is found to decrease with cluster size. The cycle of CO adsorption and heating comprising a TPD experiment have a dramatic effect on the sample morphology, leading to encapsulation of Ir by a thin TiO_x layer.     

The chemisorption of N2 on the (110) surface of iridium

The molecular chemisorption of N₂ on the reconstructed Ir(110)-(1 × 2) surface has been studied with thermal desorption mass spectrometry, XPS, UPS, AES, LEED and the co-adsorption of N₂ with hydrogen. Photoelectron spectroscopy shows molecular levels of N₂ at 8.0 (5σ + 1π) and 11.8 (4σ) eV in the valence band and at 399.2 eV with a satellite at 404.2 eV in the N(1s) region, where the binding energies are referenced to the Ir Fermi level. The kinetics of adsorption and desorption show that both precursor kinetics and interadsorbate interactions are important for this chemisorption system. Adsorption occurs with a constant probability of adsorption of unity up to saturation coverage (4.8 × 10¹⁴ cm^?2), and the thermal desorption spectra give rise to two peaks. The activation energy for desorption varies between 8.5 and 6.0 kcal mole^?1 at low and high coverages, respectively. Results of the co-adsorption of N₂ and hydrogen indicate that adsorbed N₂ resides in the missing-row troughs on the reconstructed surface. Nitrogen is displaced by hydrogen, and the most tightly bound state of hydrogen blocks virtually all N₂ adsorption. A p1g1(2 × 2) LEED pattern is associated with a saturated overlayer of adsorbed N₂ on Ir(110)-(1 × 2).