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1.
张传军  邬云骅  曹鸿  高艳卿  赵守仁  王善力  褚君浩 《物理学报》2013,62(15):158107-158107
在科宁7059玻璃, FTO, ITO, AZO四种衬底上磁控溅射CdS薄膜, 并在CdCl2+干燥空气380 ℃退火, 分别研究了不同衬底和退火工艺对CdS薄膜形貌、结构和光学性能的影响. 扫描电子显微镜形貌表明: 不同衬底原位溅射CdS薄膜的形貌不同, 退火后相应CdS薄膜的晶粒度和表面粗糙度明显增大. XRD衍射图谱表明: 不同衬底原位溅射和退火CdS薄膜均为六角相和立方相的混相结构, 退火前后科宁7059玻璃, FTO, AZO衬底上CdS薄膜有 H(002)/C(111) 最强衍射峰, ITO衬底原位溅射CdS薄膜没有明显的最强衍射峰, 退火后出现 H(002)/(111) 最强衍射峰. 紫外-可见分光光度计分析表明: AZO, FTO, ITO, 科宁7059玻璃衬底CdS薄膜的可见光平均透过率依次减小, 退火后相应衬底CdS薄膜的可见光平均透过率增大, 光学吸收系数降低; 退火显著增大了不同衬底CdS薄膜的光学带隙. 分析得出: 上述结果是由于不同衬底类型和退火工艺对CdS多晶薄膜的形貌、结构和带尾态掺杂浓度改变的结果. 关键词: CdS薄膜 磁控溅射 退火再结晶 带尾态  相似文献   

2.
近空间升华法制备CdS多晶薄膜的研究   总被引:1,自引:0,他引:1  
系统地研究了近空间升华法(CSS)制备CdS薄膜沉积速率的影响因素.发现CdS薄膜的沉积速率随升华源温度的升高而增大,但随衬底温度和沉积气压的上升而下降.对所制备样品的结构、表面形貌和光谱透过率特性进行了测试,结果表明:(1)不同氧分压下沉积的CdS薄膜沿(103)晶向择优生长.CdCl2氛围下退火后,(103)晶向的优势得到进一步加强;(2)不同氧分压制备的Cds薄膜致密且粒径均匀,晶粒的大小随着衬底温度的升高而增大,但薄膜的粗糙度也随之增大;(3)随着CdS薄膜厚度的减小,可见光中短波段的透过率有所增大,有利于提高太阳电池的短波光谱响应.并将CSS制备的(CdS多晶薄膜用于CdTe太阳电池的制作,获得了10.29%的光电转换效率,初步验证了该制作工艺的可行性.  相似文献   

3.
本文基于磁控溅射方法,功率从160 W增加到240 W,在石英衬底上沉积氧化铪薄膜(HfO_2),并对沉积后的薄膜进行退火处理.利用X射线衍射谱、X射线光电子能谱、紫外-可见-近红外透射谱和椭圆偏振仪对Hf02薄膜进行研究,对比了退火前后Hf02薄膜的光学特性及薄膜结构的变化.实验结果显示,HfO_2薄膜对波长大于200 nm的入射光具有很低的吸收系数.优化退火温度和时间,可以将沉积后的Hf02薄膜从非晶态转化成多晶态.退火有助于结晶生成和内应力的增加,同时退火可以优化薄膜的化学计量比,提升薄膜的光学密度及折射率.对功率在220 W左右沉积的薄膜进行退火,获得的Hf02薄膜具有较高并且稳定的光学折射率(2)和紫外光透射率,可在紫外波段减反膜系统中得到应用.  相似文献   

4.
实验采用射频磁控溅射法在玻璃衬底上沉积了ZnS多晶薄膜,研究了沉积气压、退火温度和衬底温度对ZnS薄膜质量的影响.利用X射线衍射(XRD)分析了薄膜的微结构,并计算了内应力值.通过紫外-可见光分光光度计测量了薄膜的透过谱,计算了Urbach能量和禁带宽度.利用扫描电子显微镜(SEM)观察了薄膜的表面形貌.结果表明: 衬底温度为室温时沉积的ZnS薄膜具有较大的压应力,并且内应力值随着工作气压增大而增大,在300 ℃下进行退火处理后内应力松弛,衬底温度为350 ℃时制备的ZnS薄膜内应力小,透过率高,经300 ℃退火处理后结晶质量有所提高. 关键词: ZnS薄膜 射频磁控溅射 内应力  相似文献   

5.
顾珊珊  胡晓君  黄凯 《物理学报》2013,62(11):118101-118101
采用热丝化学气相沉积法制备硼掺杂纳米金刚石 (BDND) 薄膜, 并对薄膜进行真空退火处理, 系统研究退火温度对BDND薄膜微结构和电学性能的影响. Hall效应测试结果表明掺B浓度为5000 ppm (NHB) 的样品的电阻率较掺B浓度为500 ppm (NLB) 的样品的低, 载流子浓度高, Hall迁移率下降. 1000 ℃退火后, NLB和NHB 样品的迁移率分别为53.3和39.3 cm2·V-1·s-1, 薄膜的迁移率较未退火样品提高, 电阻率降低. 高分辨透射电镜、紫外和可见光拉曼光谱测试结果表明, NLB样品的金刚石相含量较NHB样品高, 高的硼掺杂浓度使薄膜中的金刚石晶粒产生较大的晶格畸变. 经1000 ℃退火后, NLB和NHB薄膜中纳米金刚石相含量较未退火时增大, 说明薄膜中部分非晶碳转变为金刚石相, 为晶界上B扩散到纳米金刚石晶粒中提供了机会, 使得纳米金刚石晶粒中B浓度提高, 增强纳米金刚石晶粒的导电能力, 提高薄膜电学性能. 1000 ℃退火能够恢复纳米金刚石晶粒的晶格完整性, 减小由掺杂引起的内应力, 从而提高薄膜的电学性能. 可见光Raman光谱测试结果表明, 1000℃退火后, Raman谱图中反式聚乙炔 (TPA) 的1140 cm-1峰消失, 此时薄膜电学性能较好, 说明TPA减少有利于提高薄膜的电学性能. 退火后金刚石相含量的增大、金刚石晶粒的完整性提高及TPA含量的大量减少有利于提高薄膜的电学性能. 关键词: 硼掺杂纳米金刚石薄膜 退火 微结构 电学性能  相似文献   

6.
本研究利用射频磁控溅镀法在玻璃基板上制备3 at.%的Cr掺杂ZnO薄膜,再以300℃~500℃温度退火处理25 mins,并探讨了退火温度对Al掺杂ZnO薄膜的微观结构与机械性能的影响.微观结构分析结果表明Cr掺杂ZnO薄膜的结晶方向为(002),且沿(002)方向的成长随退火温度升高而越加明显,但薄膜的表面却随退火温度升高而变得越来越粗糙.机械性能分析结果揭示晶粒尺寸随退火温度升高而增大,导致差排原子的动能随之降低,致使Cr掺杂ZnO薄膜的硬度随退火温度升高而增大,但对其对杨氏模量却没有太大的影响;此外,Cr掺杂ZnO薄膜的耐磨性与韧性均随退火温度升高而增强,表明退火处理对该薄膜的抗塑性形变能力有很大帮助.  相似文献   

7.
热致晶化高反射率SbOx薄膜的结构分析和光学性质   总被引:2,自引:0,他引:2  
方铭  李青会  干福熹 《光学学报》2004,24(7):90-892
利用直流磁控反应溅射法制备了SbOx薄膜,利用X射线衍射分析仪和光谱仪分别研究了这种薄膜热致晶化的微观结构和光学性质的变化,并通过非晶态薄膜粉末的示差扫描量热实验测出不同加热速度条件下结晶峰温度,研究了这种薄膜的结晶动力学。发现沉积态SbOx薄膜为非晶态,非晶态SbOx薄膜在热致晶化过程中发生了两种变化,分别对应为较低温度下Sb晶体和较高温度下立方Sb2O3相的生成。退火后晶态薄膜中出现了单质Sb和Sb2O3,300℃退火后Sb2O3相含量最大。晶态薄膜的反射率均高于沉积态,在晶态薄膜中200℃退火的薄膜反射率最大。  相似文献   

8.
采用Sol-Gel工艺低温制备了Si基Bi3.25La0.75Ti3O12铁电薄膜.研究了退火温度对薄膜微观结构、介电特性与铁电性能的影响.500℃退火处理的Bi3.25La0.75Ti3O12薄膜未能充分晶化,晶粒细小且有非晶团聚,介电与铁电性能均较差.高于550℃退火处理的Bi3.25La0.75Ti3O12薄膜表面平整无裂纹,晶粒均匀,无焦碌石相或其他杂相,薄膜为多晶生长,具有较好的介电与铁电性能,4V电压下的漏电流密度低于2×10-8A/cm2.随退火温度升高,晶化程度的提升和晶粒尺寸的增大使薄膜的剩余极化增大而矫顽电场降低.600℃退火处理的Bi3.25La0.75Ti3O12薄膜显示了优于Bi4Ti3O12薄膜的铁电性能,其剩余极化Pr和矫顽电场Ec分别达到17.5μC/cm2和102kV/cm.  相似文献   

9.
本研究利用射频磁控溅镀法在玻璃基板上制备3 at.%的Cr掺杂ZnO薄膜,再以300℃~500℃温度退火处理25 mins,并探讨了退火温度对Al掺杂ZnO薄膜的微观结构与机械性能的影响.微观结构分析结果表明Cr掺杂ZnO薄膜的结晶方向为(002),且沿(002)方向的成长随退火温度升高而越加明显,但薄膜的表面却随退火温度升高而变得越来越粗糙.机械性能分析结果揭示晶粒尺寸随退火温度升高而增大,导致差排原子的动能随之降低,致使Cr掺杂ZnO薄膜的硬度随退火温度升高而增大,但对其对杨氏模量却没有太大的影响;此外,Cr掺杂ZnO薄膜的耐磨性与韧性均随退火温度升高而增强,表明退火处理对该薄膜的抗塑性形变能力有很大帮助.  相似文献   

10.
本研究利用射频磁控溅镀法在玻璃基板上制备3 at.%的Cr掺杂ZnO薄膜,再以300℃~500℃温度退火处理25 mins,并探讨了退火温度对Al掺杂ZnO薄膜的微观结构与机械性能的影响.微观结构分析结果表明Cr掺杂ZnO薄膜的结晶方向为(002),且沿(002)方向的成长随退火温度升高而越加明显,但薄膜的表面却随退火温度升高而变得越来越粗糙.机械性能分析结果揭示晶粒尺寸随退火温度升高而增大,导致差排原子的动能随之降低,致使Cr掺杂ZnO薄膜的硬度随退火温度升高而增大,但对其对杨氏模量却没有太大的影响;此外,Cr掺杂ZnO薄膜的耐磨性与韧性均随退火温度升高而增强,表明退火处理对该薄膜的抗塑性形变能力有很大帮助.  相似文献   

11.
减薄CdS窗口层是提高CdS/CdTe太阳电池转换效率的有效途径之一,减薄窗口层会对器件造成不利的影响,因此在减薄了的窗口层与前电极之间引入过渡层非常必要.利用反应磁控溅射法在前电极SnO2:F薄膜衬底上制备未掺杂的SnO2薄膜形成过渡层,并将其在N2/O2=4 ∶1,550 ℃环境进行了30 min热处理,利用原子力显微镜、X射线衍射仪、紫外分光光度计对复合薄膜热处理前后的形貌、结构、光学性能进行了表征,同时分析了复  相似文献   

12.
采用磁控溅射法在硅衬底上制备了LaCoO_3(LCO)薄膜,研究了退火温度对LCO薄膜组织结构、表面形貌及热电特性的影响,并利用X射线衍射仪、原子力显微镜(AFM)、激光导热仪等对LCO薄膜的晶体结构、表面形貌、热扩散系数等进行测量与表征.结果表明:退火温度对LCO薄膜的结晶度、晶粒尺寸和薄膜表面形貌都有较大影响;退火前后LCO薄膜的热扩散系数都随温度的升高而减小,且变化速率逐渐减缓; LCO薄膜的热扩散系数随退化温度的升高先增大后减小.LCO薄膜经过700℃退火后得到最佳的综合性能,其薄膜表面致密、平整,结晶质量最好,热扩散系数最小,热电性能最好.  相似文献   

13.
We report a study on improving the surface flatness, optical properties, and crystallinity of ZnO thin films by rf sputtering deposition. ZnO thin films grown on sapphire substrate were first exposed to post-growth annealing, and then used to regrow high-quality ZnO thin films on top. Under the same deposition conditions, the regrown ZnO layers showed much improved crystallinity, surface flatness and enhanced optical properties. The effect of the annealed layer in improving the quality of the ZnO thin film is discussed in terms of characterization results from crystal orientation, surface morphology, and photoluminescence. It was clearly observed that, during the annealing process, the ZnO grains coalesced to form larger grains and smoother surfaces, with better crystallinity and fewer defects, which resulted in the much improved quality of the regrown ZnO thin films.  相似文献   

14.
Nanostructured cadmium sulfide (CdS) thin films have been prepared by chemical bath deposition (CBD) method and after post deposition annealing of the thin films at different temperatures, photoluminescence (PL) property has been studied. The effects of various photoexcitation wavelengths on the PL behaviour of different annealed films of CdS were studied by recording the PL spectra. The intensity of PL, the profile of the PL spectra and the effects of photoexcitation wavelength depend drastically on the temperature of the post deposition annealing of the thin films. The XRD patterns of the films show the presence of both the hexagonal and cubic phases (mixed phases). The emission peak arises from the surface defects of the CdS nanocrystalline thin films. Significant modification in the surface morphology of the CdS films upon annealing has been observed from the FESEM images. The morphology of the thin films is expected to influence the PL behaviour of the CdS thin films. The quantum size effect and size dependant PL have been observed.  相似文献   

15.
In the present paper photoelectrochemical (PEC) performance of bath deposited CdS thin films based on complexing agents i.e. ammonia and triethanolamine (TEA) has been discussed. Effect of annealing has also been analyzed. The as-deposited and annealed (at 523 K for 1 h in air) films were characterized by X-ray diffraction (XRD), ultraviolet-visible (UV-vis) absorption spectroscopy, SEM, electrochemical impedance spectroscopy (EIS), and PEC properties. XRD studies revealed that the films were nanocrystalline in nature with mixed hexagonal and cubic phases. TEA complex resulted in better crystallinity. Further improvement in the crystallinity of the films was observed after air annealing. The marigold flower-like structure, in addition to flakes morphology, was observed with TEA complex, whereas for ammonia complex only flakes morphology was observed. The UV-vis absorption studies revealed that the optical absorption edge for the films with ammonia and TEA complex was around 475 nm and 500 nm, respectively. Annealing of the films resulted in red shift in the UV-vis absorption. The PEC cell performance of CdS films was found to be strongly affected by crystallinity and morphology of the films resulted due to complexing agent and annealing. The air annealed film deposited using TEA complex showed maximum short circuit current density (Jsc) and open circuit voltage (Voc) i.e. 99 μA/cm2 and 376 mV respectively, under 10 mW/cm2 of illumination. The films deposited using TEA complex showed good stability under PEC cell conditions.  相似文献   

16.
常雷  蒋毅坚 《物理学报》2009,58(3):1997-2001
利用脉冲激光沉积技术在LaAlO3(00l)单晶衬底上制备了La067Ba033MnO3薄膜,研究了CO2激光辐照对La067Ba033MnO3薄膜的微结构和磁电性能的影响.结果表明,经激光辐照后,La067Ba033MnO3薄膜的结晶性增强,薄膜应变减小;薄膜表面形貌由“岛状”结构变为“平原"结构,且粗糙度大大降低;同时,薄膜的饱和磁化强度、铁磁居里温度、金属—绝缘态转变温度和磁电阻增大,而矫顽场和电阻率减小.根据对传统退火效应的分析和理论计算,认为激光辐照导致的表面微结构的变化以及薄膜的氧含量和均匀性的提高对La067Ba033MnO3薄膜的磁电性能的改善与优化密切相关. 关键词: 庞磁电阻 激光辐照 脉冲激光溅射沉积  相似文献   

17.
Polycrystalline cadmium sulfide (CdS) thin-films were deposited on glass substrate by chemical bath deposition (CBD) and vacuum evaporation (VE) techniques. VE-CdS films consisted primarily of hexagonal phase, whereas CBD CdS films containing primarily the cubic form. VE-grown films were shown to have better crystallinity than CBD-grown films. The grain size of the CBD films is smaller than the ones of VE films. VE-CdS films exhibited relatively high transmittance in the above-gap region and band gap compared with CBD films. However, CdTe solar cells with these low quality CBD-CdS layers yield higher and more stable characteristics. Current-voltage-temperature measurements showed that the current transport for both cells was controlled by both tunneling and interface recombination but the cells with CBD-CdS displayed less tunneling.  相似文献   

18.
Zinc oxide thin films have been deposited on glass substrates at a substrate temperature of 673 K by spray pyrolysis. The samples are annealed in ambient atmosphere at various temperatures. The effect of annealing on structural, electrical, and optical properties of ZnO films has been investigated. X-ray diffraction patterns show that crystallinity of the ZnO films has been improved after annealing. The morphology of ZnO thin films is studied by atomic force microscopy. The tensile strain (compressive stress) is found to decrease with increase in annealing temperature which indicates the relaxation of tensile strain in ZnO thin films. A decrease in energy band gap is observed with increase of annealing temperature. The mechanism of blue-green luminescence of ZnO thin film has been analyzed. The resistivity is found to decrease with annealing temperature.  相似文献   

19.
Characterization and aging effect study of nitrogen-doped ZnO nanofilm   总被引:1,自引:0,他引:1  
The influence of sputtering and annealing conditions and aging effect on properties of sputtered ZnO:N thin films were investigated. Achieved results confirmed a planar growth of nitrogen-doped ZnO film with a high uniform and smooth surface morphology. Incorporation of nitrogen in the ZnO films made new Raman shifts. X-ray diffraction spectra showed only the ZnO (0 0 2) diffraction peak, which was slightly shifted toward lower angels, compared to pure ZnO, which is the result of incorporating nitrogen in the ZnO films. The amount of this shift was proportional to N concentration. In addition, annealed samples showed better crystallinity with lower shift due to dramatically reduction of N atoms during the annealing. The Hall effect measurements exhibited p-type behaviour on annealed ZnO:N thin films while the un-annealed samples showed n-type conductivity. Aging effect studies demonstrated that the N content of thin films decreased dramatically as time passed. The reduction of N concentration in annealed samples was lower than un-annealed ones after 6 months.  相似文献   

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