模拟分析少子复合速率及吸收层对HIT太阳电池性能的影响

采用AMPS-1D程序模拟分析了前后接触少子复合速率以及吸收层的厚度和少子迁移率对非晶硅/单晶硅异质结太阳电池光伏性能的影响.模拟发现,与太阳电池的前接触少子复合速率相比,背接触少子复合速率对太阳电池光伏性能的影响更为显著.吸收层单晶硅的厚度对太阳电池光伏性能的影响要受到单晶硅隙间缺陷态密度以及背接触少子复合速率的制约.当背接触复合占主要地位时,吸收层越厚电池的转换效率越高;当吸收层隙间缺陷复合占主要地位时,电池的转换效率在某一厚度处达到峰值.吸收层的少子迁移率对太阳电池性能的影响,也要受到背接触少子复合速率的制约.当背接触复合速率较低时,少子迁移率越大,电池的转换效率越高;当背接触复合速率较高时,少子迁移率越小,电池的转换效率越高.     

模拟分析少子复合速率及吸收层对HIT太阳电池性能的影响

采用AMPS-1D程序模拟分析了前后接触少子复合速率以及吸收层的厚度和少子迁移率对非晶硅/单晶硅异质结太阳电池光伏性能的影响.模拟发现,与太阳电池的前接触少子复合速率相比,背接触少子复合速率对太阳电池光伏性能的影响更为显著.吸收层单晶硅的厚度对太阳电池光伏性能的影响要受到单晶硅隙间缺陷态密度以及背接触少子复合速率的制约.当背接触复合占主要地位时,吸收层越厚电池的转换效率越高;当吸收层隙间缺陷复合占主要地位时,电池的转换效率在某一厚度处达到峰值.吸收层的少子迁移率对太阳电池性能的影响,也要受到背接触少子复合速率的制约.当背接触复合速率较低时,少子迁移率越大,电池的转换效率越高;当背接触复合速率较高时,少子迁移率越小,电池的转换效率越高.     

利用PC2D优化高方阻均匀发射极电池的栅线电极

利用新型二维PC2D软件研究高方阻均匀发射极太阳能电池的栅线电极对电池性能的影响,通过对细栅线的宽度和排布方式的优化,增大填充因子,找到常规电池的效率极限。结果表明,在不采用复杂电池结构的情况下,以现有大规模生产工艺条件为基础,细栅线优化后（正面细栅线109根,线宽为40 μm）,在常规电池中能实现19.09%以上的效率。     

复合绒面ZnO:Al光栅增强薄膜硅电池陷光特性

探讨复合绒面ZnO:Al光栅对薄膜硅太阳能电池光俘获效率的影响.织构了由关联长度(lcor)和平均高度(have)表征的绒面,叠加到周期为980nm和槽深为160nm的一维正弦ZnO:Al光栅上,形成复合绒面ZnO:Al光栅.前电极AZO光栅,当lcor较小和have较大时,电池的短路电流较高.若lcor取0.01,则短路电流随have的增大而升高,由have=0.05时的21.93 mA/cm2增加到have=0.80时的23.80mA/cm2.置于背电极且lcor=0.01时,短路电流随have的增加而逐渐减小,由have=0.05时的25.50mA/cm2降到have=0.80时的24.81 mA/cm2.采用直流溅射和化学腐蚀方法分别制备了无绒面ZnO:Al光栅和lcor=0.01,have=0.14的复合绒面ZnO:Al光栅.反射率测试结果表明,复合绒面ZnO:Al光栅总反射率(8.3%)较无绒面ZnO:Al栅(10.2%)降低了1.9%,镜面反射率(4.7%)较无绒面ZnO:Al栅(6.8%)降低了2.1%.以实验制备的两种光栅为模型用严格耦合波方法进行模拟,计算结果表明与无绒面ZnO:Al光栅相比,复合绒面ZnO:Al光栅的总反射率和镜面反射率均显著下降.复合绒面ZnO:Al光栅由于具有较好的减反作用更适合用作薄膜电池前电极,从而得到更高的短路电流;而无绒面ZnO:Al光栅因具有较高的反射适用于背电极,能将到达背电极的光子重新返回硅吸收层而获得更高的陷光效率.     

质子辐射损伤对单结GaAs/Ge太阳电池暗特性参数的影响

基于p-n结暗特性双指数模型,对经质子辐射后的单结GaAs/Ge太阳电池的暗特性I-V曲线进行数值拟合,确定了单结GaAs/Ge太阳电池在辐射前后的四个暗特性特征参数,即串联电阻R_s、并联电阻R_(sh)、扩散电流I_(s1)和复合电流I_(s2).研究结果表明,质子辐射后单结GaAs/Ge太阳电池的R_s,R_(sh),I_(s1)和I_(s2)四个暗特性参数均发生显著变化.经低能质子辐射后,单结GaAs/Ge太阳电池的R_(sh)随位移损伤剂量的增加而减小,而R_s,I_(s1)和I_(s2)三个参数随位移损伤剂量的增加而增大,其中串联电阻随位移损伤剂量线性增加而与辐射质子能量无关.理论分析表明,上述参数的变化与质子辐射损伤区域分布有关.基区和发射区的损伤主要引起单结电池串联电阻和扩散电流的增加;结区的损伤导致并联电阻减小,复合电流增大.     

一维铝背栅单晶硅薄膜太阳能电池光吸收分析

分别以铝、银、硅为一维背栅设计了三种单晶硅结构的薄膜太阳能电池.利用时域有限差分法,在入射光为300nm~1100nm的波长段,计算了三种背栅材料的单晶硅薄膜太阳能电池单晶硅层的光吸收效率;利用计算所得到的磁场强度分布特点,分析了600nm以上波长段光吸收增强的机理.定义了归一化光吸收密度的概念,以定量衡量给定波段的光吸收效率.通过比较三种太阳能电池的归一化光吸收密度和短路电流密度,发现铝背栅比硅背栅和银背栅能更加有效地提高单晶硅薄膜太阳能电池的全波段光吸收效率.     

高绒度掺硼氧化锌透明导电薄膜用作非晶硅太阳电池前电极的研究

将自行研制的具有优异陷光能力的掺硼氧化锌用作p-i-n型非晶硅太阳电池的前电极,并且将传统商业用U型掺氟二氧化锡作为对比电极.相比表面较为平滑的掺氟二氧化锡,掺硼氧化锌表面大类金字塔的绒面结构会在本征层生长过程中触发阴影效应,形成大量的高缺陷材料区和漏电沟道,进而恶化电池的开路电压和填充因子.在不修饰掺硼氧化锌表面形貌的情况下,通过调节非晶硅本征层的沉积温度来消弱高绒度表面形貌引起的这种不利影响,对应的电池开路电压和填充因子均出现提升.在仅有铝背电极的情况下,在本征层厚度为200 nm的情况下,以掺硼氧化锌为前电极的非晶硅太阳电池转换效率达7.34%(开路电压为0.9 V,填充因子为70.1%,短路电流密度11.7 mA/cm2).     

氧化镁层对石墨烯/硅太阳能电池的界面优化

为了探究石墨烯/硅太阳能电池的铝/硅背接触特性,采用连续蒸镀的方法在铝/硅背接触间插入一层氧化镁介质层,对比测试具有不同厚度氧化镁层的电池的电流-电压特性、外量子效应、电池的串联电阻以及背接触电阻。研究表明:随着氧化镁厚度的增加,电池的光电转换效率、串联电阻以及背接触电阻存在先增大后降低的趋势,当氧化镁的厚度为1nm时的光电转化效率最优,达到5.53%,厚度为0nm时,光电转换效率为2.90%;当氧化镁的厚度为0nm和1nm时,相应的串联电阻(背接触电阻)分别为4.1Ω(9.6Ω)和1.8Ω(3.2Ω).     

基于分布式布拉格反射器结构的空间三结砷化镓太阳能电池抗辐照研究

根据电子辐照条件下的常规三结砷化镓太阳能电池光谱响应以及电池电流的损伤特征, 确定电池衰减的物理机理: 中电池在电子辐照后形成的辐照损伤缺陷, 使得基区少子扩散长度被大幅缩短, 影响了光生载流子的收集. 针对中电池衰减的物理机理, 设计不同的基区厚度, 验证辐照后扩散长度缩短至1.5 μm左右. 为提升中电池抗辐照性能, 消除辐照后扩散长度缩减带来的影响, 对中电池外延结构进行设计, 将中电池基区减薄至1.5 μm, 并在其下方嵌入分布式布拉格反射器, 对特定波段光反射进行二次吸收, 弥补中电池减薄的影响. 通过TFCalc光学模系设计软件模拟出的中心波长为850 nm, 15对Al_0.9Ga_0.1As/Al_0.1Ga_0.9As的分布式布拉格反射器, 实际测试最高反射率大于97%, 高反带宽94 nm, 能够满足设计要求. 此基础上进行了新结构电池的外延生长与辐照测试对比. 实验结果表明: 新结构太阳能电池辐照后短路电流衰减比原结构降低了50%, 效率的剩余因子提升2.3%.     

In_(0.53)Ga_(0.47)As光电探测器量子效率的理论仿真分析

研究了材料参数对In0.53Ga0.47As光电探测器量子效率的影响。分析发现量子效率的变化主要取决于入射光的方向,P区与N区载流子浓度以及各区的表面复合速度和厚度。当光从P区入射时,P区载流子的表面复合速度、载流子浓度以及厚度对量子效率均产生极大的影响。N区材料参数对量子效率也有轻微的影响。在高载流子浓度范围内(n1017cm-3),表面复合速度和厚度是主要影响因素。当光从N区入射时,载流子浓度n1017cm-3时,N区表面复合速度为影响量子效率的主要因素;而当载流子浓度n1016cm-3时,对量子效率产生影响的主要因素为材料厚度。     

载流子选择性接触:高效硅太阳电池的选择

太阳电池可看成由光子吸收层和接触层两个基本单元组成,接触层是高复合活性金属界面和光子吸收层之间的区域.为了进一步提高硅太阳电池的转换效率,关键是降低光子吸收层和接触之间的复合损失.近年来,载流子选择性接触引起了光伏界的研究兴趣,其被认为是接近硅太阳电池效率理论极限的最后的障碍之一.本文分析了三种类型的载流子选择性接触:在光子吸收层与金属界面之间引入薄的重掺杂层,即所谓的发射极或背面场;利用两种材料之间的导带或价带对齐;利用高功函数的金属氧化物与晶硅接触从而在晶硅中感应能带弯曲.基于一维太阳电池模拟软件wx AMPS,模拟了扩散同质结硅太阳电池[结构为(p~+)c-Si/(n)c-Si/(n~+)c-Si]、非晶硅薄膜硅异质结太阳电池[结构为(p~+)a-Si/(i)a-Si/(n)c-Si/(i)a-Si/(n~+)a-Si]和氧化物薄膜硅异质结太阳电池[结构为(n)MoO_x/(n)c-Si/(n)TiO_x]暗态下的能带结构和载流子浓度的空间分布,其中c-Si为晶硅;a-Si为非晶硅;(i),(n)和(p)分别表示本征、n型掺杂和p型掺杂.模拟结果表明:载流子选择性接触的核心是在接触处晶硅表面附近形成载流子浓度空间分布的不对称进而使得电导率的不对称,形成了对电子的高阻和空穴的低阻或者对空穴的高阻和电子的低阻,从而让空穴轻松通过同时阻挡电子,或者让电子轻松通过同时阻挡空穴,形成空穴选择性接触或者电子选择性接触.     

High efficiency screen-printed n-type silicon solar cell using co-diffusion of APCVD boron emitter and POCl3 back surface field

We present the fabrication and analysis of Passivated Emitter and Rear Totally Diffused (PERT) solar cells on n-type silicon using a co-diffusion process. In a single high temperature step, a BSG/SiO_x stack deposited by APCVD and a POCl₃ back surface field diffuse into the wafer to form the boron doped emitter and phosphorus doped back surface field. The SiO_x layer on top of BSG acts as a masking layer to prevent cross-doping of phosphorus as well as a blocking layer for boron out-diffusion. This resulted in an initial sheet resistance of 76 Ω/□ with good uniformity and a final p⁺ emitter sheet resistance of 97 Ω/□ after boron rich layer removal. Additionally, bulk lifetime was investigated before and after the high temperature step that resulted in an increase from 1.2 ms to 1.5 ms due to a POCl₃ gettering effect. A peak cell efficiency of 20.3% was achieved and each recombination component in terms of saturation current density was calculated and analyzed to understand the cell for further efficiency enhancement.     

钙钛矿/硅叠层太阳电池中平面a-Si:H/c-Si异质结底电池的钝化优化及性能提高

最近,旋涂法制备的钙钛矿/平面硅异质结高效叠层太阳电池引起人们广泛关注,主要原因是相比于绒面硅衬底制备的钙钛矿/硅叠层太阳电池,其制备工艺简单、制备成本低且效率高.对于平面a-Si:H/c-Si异质结电池, a-Si:H/c-Si界面的良好钝化是获得高转换效率的关键,进而决定了钙钛矿/硅异质结叠层太阳电池的性能.本文主要从硅片表面处理、a-Si:H钝化层和P型发射极等方面展开研究,通过对硅片表面的氢氟酸(HF)浸泡时间和氢等离子体预处理气体流量、a-Si:H钝化层沉积参数、钝化层与P型发射极(I/P)界面富氢等离子体处理的综合调控,获得了相应的优化工艺参数.对比研究了p-a-Si:H和p-nc-Si:H两种缓冲层材料对I/P界面的影响,其中高电导、宽带隙的p-nc-Si:H缓冲层既能够降低I/P界面的缺陷态,又可以增强P型发射层的暗电导率,提高了前表面场效应钝化效果.通过上述优化,制备出最佳的P-type emitter layer/aSi:H(i)/c-Si/a-Si:H(i)/N-type layer (inip)结构样品的少子寿命与implied-Voc分别达到2855μs和709 mV,表现出良好的钝化效果.应用于平面a-Si:H/c-Si异质结太阳电池,转换效率达到18.76%,其中开路电压达到681.5 mV,相对于未优化的电池提升了34.3 mV.将上述平面a-Si:H/c-Si异质结太阳电池作为底电池,对应的钙钛矿/硅异质结叠层太阳电池的开路电压达到1780 mV,转换效率达到21.24%,证明了上述工艺优化能够有效地改善叠层太阳电池中的硅异质结底电池的钝化及电池性能.     

硅异质结太阳电池的物理机制和优化设计

硅异质结太阳电池是一种由非晶硅薄膜层沉积于晶硅吸收层构成的高效低成本的光伏器件,是一种具有大面积规模化生产潜力的光伏产品.异质结界面钝化品质、发射极的掺杂浓度和厚度以及透明导电层的功函数是影响硅异质结太阳电池性能的主要因素.针对这些影响因素已经有大量的研究工作在全世界范围内展开,并且有诸多研究小组提出了器件效率限制因素背后的物理机制.洞悉物理机制可为今后优化设计高性能的器件提供准则.因此及时总结硅异质结太阳电池的物理机制和优化设计非常必要.本文主要讨论了晶硅表面钝化、发射极掺杂层和透明导电层之间的功函数失配以及由此形成的肖特基势垒;讨论了屏蔽由功函数失配引起的能带弯曲所需的特征长度,即屏蔽长度;介绍了硅异质结太阳电池优化设计的数值模拟和实践;总结了硅异质结太阳电池的研究现状和发展前景.     

Photocarrier radiometry for noncontact evaluation of space monocrystalline silicon solar cell under low-energy electron irradiation

A space monocrystalline silicon(c-Si) solar cell under low-energy( 1 MeV) electron irradiation was investigated using noncontact photocarrier radiometry(PCR). Monte Carlo simulation(MCS) was employed to characterize the effect of different energy electron irradiation on the c-Si solar cell. The carrier transport parameters(carrier lifetime, diffusion coefficient, and surface recombination velocities) were obtained by best fitting the experimental results with a theoretical one-dimensional two-layer PCR model. The results showed that the increase of the irradiation electron energy caused a large reduction of the carrier lifetime and diffusion length. Furthermore, the rear surface recombination velocity of the Si:p base of the solar cell at the irradiation electron energy of 1 Me V was dramatically enhanced due to 1 MeV electron passing through the whole cell. Short-circuit current(I sc) degradation evaluated by PCR was in good agreement with that obtained by electrical measurement.     

Surface passivation schemes for high‐efficiency n‐type Si solar cells

An effective passivation on the front side boron emitter is essential to utilize the full potential of solar cells fabricated on n‐type silicon. However, recent investigations have shown that it is more difficult to achieve a low surface recombination velocity on highly doped p‐type silicon than on n‐type silicon. Thus, the approach presented in this paper is to overcompensate the surface of the deep boron emitter locally by a shallow phosphorus diffusion. This inversion from p‐type to n‐type surface allows the use of standard technologies which are used for passivation of highly doped n‐type surfaces. Emitter saturation current densities (J_0e) of 49 fA/cm² have been reached with this approach on SiO₂ passivated lifetime samples. On solar cells a certified conversion efficiency of 21.7% with an open‐circuit voltage (V_oc) of 676 mV was achieved. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of interface states,conduction band offset,and front contact on the performance of a-SiC:H(n)/c-Si(p)heterojunction solar cells

P-type silicon heterojunction(SHJ) solar cells with a-SiC:H(n) emitters were studied by numerical computer simulation in this paper. The influence of interface states, conduction band offset, and front contact on the performance of a-SiC:H(n)/c-Si(p) SHJ solar cells was investigated systematically. It is shown that the open circuit voltage(V_(oc)) and fill factor(F F) are very sensitive to these parameters. In addition, by analyzing equilibrium energy band diagram and electric field distribution, the influence mechanisms that interface states, conduction band offset, and front contact impact on the carrier transport, interface recombination and cell performance were studied in detail. Finally, the optimum parameters for the a-SiC:H(n)/c-Si(p) SHJ solar cells were provided. By employing these optimum parameters, the efficiency of SHJ solar cell based on p-type c-Si was significantly improved.     

Buried emitter solar cell structures: Decoupling of metallisation geometry and carrier collection geometry of back contacted solar cells

We present a novel solar cell structure, the “buried emitter solar cell”. This concept is designed for decoupling the metallisation geometry from the geometry of the carrier collecting p–n junction in back‐contacted (and in particular back‐junction) solar cells without requiring electrical insulation by dielectric layers. The most prominent features of this device structure are a carrier collecting emitter that covers close to 100% of the total cell area and an effective electrical insulation between emitter and base metallisation via a p⁺–n⁺ junction. The experimental results presented in this paper report a 19.5% efficient “buried emitter solar cell”, where 50% of the solar cell's rear side exhibit a p⁺–n⁺ junction. This preparation technique implies covering a boron‐doped p‐type emitter with an n‐type surface layer that can be efficiently surface‐passivated by thermal oxidation. All structuring of this cell has been performed by laser processing without any photo‐lithography. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Doped SiO x emitter layer in amorphous/crystalline silicon heterojunction solar cell

In this work we propose to replace the emitter layer of the n-type doped a-Si:H/p-type doped crystalline silicon heterojunction solar cell, with an n-type doped SiO _x amorphous oxide layer. The n-type doped SiO _x :H shows a lower activation energy and higher carrier mobility value with respect to the n-type doped a-Si:H. Moreover, higher transmission, below 500 nm of wavelength, and higher conductivity are measured. The relevance of transparency of the (n) a-SiO _x :H has been studied using that film in solar cells. The electrical parameters revealed a solar cell efficiency of 15.8 %. Moreover, the effect of TCO as a front side cell electrode is considered and discussed on the base of its workfunction when applied on top of the n-type doped SiO _x emitter layer using also numerical simulations.