Evaluation of multiaxial stress in textured cubic films by x-ray diffraction

X-ray diffraction is used extensively to determine the residual stress in bulk or thin film materials on the as- sumptions that the material is composed of fine crystals with random orientation and the stress state is biaxial and homogeneous through the x-ray penetrating region. The stress is calculated from the gradient of ε ～ sin^2 φ linear relation. But the method cannot be used in textured films due to nonlinear relation. In this paper, a novel method is proposed for measuring the multiaxial stresses in cubic films with any [hkl] fibre texture. As an example, a detailed analysis is given for measuring three-dimensional stresses in FCC films with [111] fibre texture.     

Twin—layer films of copper phthalocyanine and amorphous titanyl or vanadyl phthalocyanine

Metallophthalocyanine (MPc) twin-layer thin films on glass substrates, consisting of copper phthalocyanine (CuPc) overlayer and amorphous vanadyl phthalocyanine (VOPc) as well as titanyl phthalocyanine (TiOPc) buffers, were found to have different gas sensing characteristics. These twin-layer thin films were studied using x-ray photoemission spectroscopy. Photoelectrons of either V or Ti core levels were found to be present at the surface, indicating the existence of possible molecular migrations. The stability of the twin-layers under thermal annealing up to a maximum temperature of 250℃ and low-energy Ar ion bombardment was also examined and compared with that of CuPc directly grown on the substrates. We concluded that the twin-layer structures were thermally fairly stable. Ar ion bombardment, however, caused substantial damage to the Pc ligands and a reduction of the valence state of the central Cu atoms.     

Micro—structural analysis of YBa2Cu3O7—x thin films grown on different substrates by X—ray techniques

YBa2Cu3Ox(YBCO) thin films grown on different substrates with and/or without Eu2CuO4(ECO) buffer layer were investigated by X-ray wide angle diffraction,reflection,diffuse scattering and topography.Theresults show that for the yttria stabilized ZrO2(YSZ) substrate,the presence of an ECO buffer layer improves the crystalline quality of the YBCO film,while a negative effect is observed for the SrTiO3(STO) substrate.The lateral correlation length for a sample grown on a YSZ substrate with ECO buffer Layer is much greater than grown on an STO subetrate.The STO substrate used has mosaic structure.2001 Elsevier Science B.V.All rights reserved.     

X-ray diffraction study of effect of deposition conditions on α--β phase transition and stress evolution in sputter-deposited W coatings

Pure W and W-Cu-W trilayer coatings were deposited on an Fe substrate by d.c. magnetron sputtering. The α-β phase evolution, intragranular stress evolution in sputter-deposited W layer were investigated by x-ray diffraction. They are directly related to the film microstructure, density and adhesion. Therefore, control of the film stress and phase component transition is essential for its applications. The phase component transition from β-W to α-W and intragranular stress evolution from tensile to compressive strongly depend on the deposition parameters and can be induced by lowering Ar pressure and rising target power. The compressively stressed films with α-W phase have a dense microstructure and high adhesion to Fe substrate.     

Preparation and Structural Characterization of Superionic Conductor RbAg4I5 Crystalline Grain Film

Superionic conductor RbAg4I5 crystalline grain films were prepared by vacuum thermal evaporation on NaCi crystalling substrates.The surface morphology,microstructure and the electronic energy states of the films were examined by stomic force microscopy,transmission-electron microscopy,x-ray diffraction and x-ray photoelectron spectroscopy.The results show that the obtained RbAg4I5 layer has an epitaxial film of prefect crystalline structure,and the unit cell of crystalline grain RbAg4I5 films belongs to cubic crystal system.The principal x-ray diffraction peaks at d=3.7447 and 1.8773A are related to the structure of ternary compound RbAg4I5 films.     

Structural and Optical Characterization of Zn1—xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering

Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron supttering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x≤0.6. For x=0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO(x=0.2) thin film has a redshift of 0.14eV from that of ZnO reported previously.     

Preparation and characterization of nanosized GdxBi0.95-xVO4：0.05Eu3＋ solid solution as red phosphor

A complete solid solutions with monophasic zircon-type structure of vanadates of formula GdxBio.95-xVO4：0.05Eu3＋ （x = 04）.95） are synthesized by combined method of co-precipitation and hydrothermal synthesis. Their microstructures and morphologies are characterized by X-ray powder diffraction and transmission electronic microscope, and the results show that each of all the samples has a monophasic zircon-type structure. The absorption spectrum of the prepared phosphor shows a blue-shift of the fundamental absorption band edge with increasing the gadolinium content. Under UV-light and visible-light excitation, all the prepared phosphors show the typical luminescence properties of Eu3＋ in the zircon-type structure. The emission intensity of GdxBi0.95-xVO4：0.05Eu3＋ （x = 0.55） is strongest in all samples under UV-light and visible-light excitations. Finally, the mechanisms of luminescence of Eu3＋ in the GdxBi0.95-xVO4：0.05Eu3＋ （x = 0-0.95） solid solutions are analyzed and discussed.     

Study of Ni80Fe20／Fe50Mn50 superlattice microstructures by transmission electron microscopy and x—ray diffraction

The detailed microstructures of Ni80Fe20/Fe50Mn50 superlattices have been characterized using both x-ray diffraction techniques and transmission electron microscopy.The obrivous layered structure,typical column structure and twins which exist in Ni80Fe20/Fe50Mn50 superlattices were observed through performing transmission microscopy.By combining the technique of lowangle x-ray reflectivity(specular and off-specular scans)with the anomalous scattering effect and high-angle x-ray diffraction(using conventional x-ray),wequantitatively analysed the microstructural variation as a function of annealing temperature.It is found that the lateral correlation length,the(111)peak intensity of the superlattices and the average multilayer coherence length all increase with a rise in annealing temperature annealing can decrease the rootmean-square roughness at the interfaces of Ni80Fe20/Fe50Mn50 superlattices.the obtained microstructural knowledge will be helpful in understanding the magnetic properties of the ni80Fe20/Fe50Mn50 exchange bias system.     

Yield strength of attached copper film

Variation of stress in attached copper film with an applied strain is measured by X-ray diffraction combined with a four-point bending method.A lower slope of the initial elastic segment of the curve of X-ray measured stress versus applied strain results from incomplete elastic strain transferred from the substrate to the film due to insufficiently strong interface cohesion.So the slope of the initial elastic segment of the X-ray stress (or X-ray strain directly) of the film against the substrate applied strain may be used to measure the film-substrate cohesive strength.The yield strength of the attached copper film is much higher than that of the bulk material and varies linearly with the inverse of the film thickness.     

附着铜膜的内应力及屈服强度

用X-射线衍射和热循环基片弯曲方法测量了附着在基体上纯铜膜的内应力和屈服强度。内应力为张应力且随工作气体（氩气）压强的增加而减小但随膜厚的增加而增加。钢基体上铜膜的张屈服强度与膜厚的倒数成反比。压屈服强度也同样依赖于膜厚，即膜越薄，压屈服强度越高。     

Secondary electron emission characteristics of graphene films with copper substrate

For modern and future circular accelerators, especially high-intensity proton synchrotrons or colliders, the electron cloud effect is a key issue. So, in order to reduce the electron cloud effect, exploring very low secondary electron yield (SEY) material or coating used in vacuum tubes becomes necessary. In this article, we studied the SEY characteristics of graphene films with different thicknesses which were deposited on copper substrates using chemical vapor deposition. The SEY tests were done at temperatures of 25℃ and vacuum pressure of (2-6)×10^-9 torr. The properties of the deposited graphene films were investigated by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The SEY curves show that the number of graphene layers has a great effect on the SEY of graphene films. The maximum SEY of graphene films decreases with the increase of the number of layers. The maximum SEY of 6-8 layers of graphene film is 1.25. These results have a great significance for next-generation particle accelerators.     

Effect of stress in copper ferrite thin films

Cubic copper ferrite thin films, obtained by rf sputtering on quartz and subsequent post-annealing and quenching, show a large coercivity of about 300–600 Oe. Stress measurements using X-ray diffraction show high value of stress of about 400–1000 MPa. Both the stress and coercivity are found to increase with the decrease of the thickness of the films. There appears to be a contribution of the stress to the coercivity of the films, in the in-plane M–H loops.     

二氧化硅增透膜微观结构与激光损伤阈值的调控

采用溶胶-凝胶技术制备了二氧化硅增透膜,通过向溶胶中添加高分子聚乙烯醇缩丁醛（PVB）,调控胶体的粒径,进而控制膜层微观结构,研究膜层微观结构与激光损伤阈值的关系。纳米粒度仪和扫描探针显微镜测试表明：PVB加入溶胶后,控制了二氧化硅胶粒的生长,使二氧化硅胶粒生长更均匀,因而膜层的微观结构更均匀。当PVB质量分数为1%时,胶体粒径为15 nm,分散系数小于0.1。用该胶体镀膜,膜层均匀,表面粗糙度小于3.25 nm。并且PVB加入后增加了膜层胶粒间的黏附性,使得膜层强度增大。PVB加入使膜层的激光损伤阈值有所增加。当PVB的添加量为1%时,膜层的激光损失阈值从30.0 J/cm2增加到40.1 J/cm2。膜层激光损伤阈值的增加与膜层微观均匀性和物理强度的增加有关。     

二氧化硅增透膜微观结构与激光损伤阈值的调控

采用溶胶-凝胶技术制备了二氧化硅增透膜,通过向溶胶中添加高分子聚乙烯醇缩丁醛（PVB）,调控胶体的粒径,进而控制膜层微观结构,研究膜层微观结构与激光损伤阈值的关系。纳米粒度仪和扫描探针显微镜测试表明:PVB加入溶胶后,控制了二氧化硅胶粒的生长,使二氧化硅胶粒生长更均匀,因而膜层的微观结构更均匀。当PVB质量分数为1%时,胶体粒径为15 nm,分散系数小于0.1。用该胶体镀膜,膜层均匀,表面粗糙度小于3.25 nm。并且PVB加入后增加了膜层胶粒间的黏附性,使得膜层强度增大。PVB加入使膜层的激光损伤阈值有所增加。当PVB的添加量为1%时,膜层的激光损失阈值从30.0 J/cm2增加到40.1 J/cm2。膜层激光损伤阈值的增加与膜层微观均匀性和物理强度的增加有关。     

Surfactant-assisted synthesis of Ag nanostructures and their self-assembled films on copper and aluminum substrate

In this paper, silver nanostructures with controlled morphologies, such as plates, rods, belts, sheets and their self-assembled films have been prepared on copper and aluminum substrates by a surfactant-assisted colloidal chemical method. The X-ray powder diffraction (XRD) and the selected area electron diffraction (SAED) patterns indicated that the Ag nanostructures grew on the substrates with cubic symmetry and single-crystalline in nature. An oriented attachment with surfactant-assisted mechanism and a cooperative effect of surfactant and chloride ion on the morphology of Ag nanostructures were investigated systematically and synthetically.     

Electronic and optical properties in ZnO:Ga thin films induced by substrate stress

The effects of biaxial stress in ZnO:Ga thin films on different substrates, e.g., sapphire(0001), quartz, Si(001), and glass have been investigated by X-ray diffraction, atomic force microscopy, and electrical transport and ellipsometric measurements. A strong dependence of orientation, crystallite size, transport, and electronic properties upon the substrate-induced stress has been found. The structural properties indicate that a tensile stress exists in epitaxial ZnO:Ga films grown on sapphire, Si, and quartz, while a compressive stress appears in films grown on glass. The resistivity of the films decreased with increasing biaxial stress, which is inversely proportional to the product of the carrier concentration and Hall mobility. The refractive index n was found to decrease with increasing biaxial stress, while the optical band gap E₀ increased with stress. These behaviors are attributed to lattice contraction and the increase in the carrier concentration that is induced by the stress. Our experimental data suggest that the mechanism of substrate-induced stress is important for understanding the properties of ZnO:Ga thin films and for the fabrication of devices which use these materials.     

Al/Cu薄膜真空扩散连接技术

针对惯性约束聚变（ICF）物理实验要求,提出并采用真空扩散连接技术,在高温环境下对Al/Cu薄膜进行连接研究。利用扫描电子显微镜（SEM）、X射线衍射（XRD）仪以及台阶仪等方法对连接样品基体组织和表面质量进行分析。结果表明：铝铜薄膜通过界面原子间的范德华力、冶金结合以及界面反应实现无胶连接。     

Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

Thin oxidized copper films in various thickness values are deposited onto quartz glass substrates by electron beam evaporation. The ellipsometry parameters and transmittance in a wavelength range of 300 nm–1000 nm are collected by a spectroscopic ellipsometer and a spectrophotometer respectively. The effective thickness and optical constants, i.e.,refractive index n and extinction coefficient k, are accurately determined by using newly developed ellipsometry combined with transmittance iteration method. It is found that the effective thickness determined by this method is close to the physical thickness and has obvious difference from the mass thickness for very thin film due to variable density of film.Furthermore, the thickness dependence of optical constants of thin oxidized Cu films is analyzed.