Twin—layer films of copper phthalocyanine and amorphous titanyl or vanadyl phthalocyanine

Metallophthalocyanine (MPc) twin-layer thin films on glass substrates, consisting of copper phthalocyanine (CuPc) overlayer and amorphous vanadyl phthalocyanine (VOPc) as well as titanyl phthalocyanine (TiOPc) buffers, were found to have different gas sensing characteristics. These twin-layer thin films were studied using x-ray photoemission spectroscopy. Photoelectrons of either V or Ti core levels were found to be present at the surface, indicating the existence of possible molecular migrations. The stability of the twin-layers under thermal annealing up to a maximum temperature of 250℃ and low-energy Ar ion bombardment was also examined and compared with that of CuPc directly grown on the substrates. We concluded that the twin-layer structures were thermally fairly stable. Ar ion bombardment, however, caused substantial damage to the Pc ligands and a reduction of the valence state of the central Cu atoms.     

Micro—structural analysis of YBa2Cu3O7—x thin films grown on different substrates by X—ray techniques

YBa2Cu3Ox(YBCO) thin films grown on different substrates with and/or without Eu2CuO4(ECO) buffer layer were investigated by X-ray wide angle diffraction,reflection,diffuse scattering and topography.Theresults show that for the yttria stabilized ZrO2(YSZ) substrate,the presence of an ECO buffer layer improves the crystalline quality of the YBCO film,while a negative effect is observed for the SrTiO3(STO) substrate.The lateral correlation length for a sample grown on a YSZ substrate with ECO buffer Layer is much greater than grown on an STO subetrate.The STO substrate used has mosaic structure.2001 Elsevier Science B.V.All rights reserved.     

X-ray diffraction study of effect of deposition conditions on α--β phase transition and stress evolution in sputter-deposited W coatings

Pure W and W-Cu-W trilayer coatings were deposited on an Fe substrate by d.c. magnetron sputtering. The α-β phase evolution, intragranular stress evolution in sputter-deposited W layer were investigated by x-ray diffraction. They are directly related to the film microstructure, density and adhesion. Therefore, control of the film stress and phase component transition is essential for its applications. The phase component transition from β-W to α-W and intragranular stress evolution from tensile to compressive strongly depend on the deposition parameters and can be induced by lowering Ar pressure and rising target power. The compressively stressed films with α-W phase have a dense microstructure and high adhesion to Fe substrate.     

Influence of Oxygen Pressure on Structural and Sensing Properties of β-Ga2O3 Nanomaterial by Thermal Evaporation

We prepare the gallium oxide （β-Ga2O3） nanomaterials from gallium and oxygen by thermal evaporation in the argon atmosphere and research their oxygen sensing under UV illumination with different oxygen pressures. X-ray diffraction reveals that the synthesized product is monoclinic gallium oxide, it is further confirmed by electron diffraction of transmission electron microscope, and its morphology through the observation using scanning electron microscope reveals thatβ-Ga2O3 nanobelts with a breadth less than lOOnm and length of severai micrometers are synthesized under low oxygen pressure, while the nano/microbelts are synthesized under high oxygen pressure. Room-temperature oxygen sensing is tested under at 254 nm illumination and it is found that the current decreases quickly first and then slowly with oxygen pressure from low to high.     

Preparation and Structural Characterization of Superionic Conductor RbAg4I5 Crystalline Grain Film

Superionic conductor RbAg4I5 crystalline grain films were prepared by vacuum thermal evaporation on NaCi crystalling substrates.The surface morphology,microstructure and the electronic energy states of the films were examined by stomic force microscopy,transmission-electron microscopy,x-ray diffraction and x-ray photoelectron spectroscopy.The results show that the obtained RbAg4I5 layer has an epitaxial film of prefect crystalline structure,and the unit cell of crystalline grain RbAg4I5 films belongs to cubic crystal system.The principal x-ray diffraction peaks at d=3.7447 and 1.8773A are related to the structure of ternary compound RbAg4I5 films.     

Structural and Optical Characterization of Zn1—xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering

Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron supttering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x≤0.6. For x=0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO(x=0.2) thin film has a redshift of 0.14eV from that of ZnO reported previously.     

Preparation and characterization of nanosized GdxBi0.95-xVO4：0.05Eu3＋ solid solution as red phosphor

A complete solid solutions with monophasic zircon-type structure of vanadates of formula GdxBio.95-xVO4：0.05Eu3＋ （x = 04）.95） are synthesized by combined method of co-precipitation and hydrothermal synthesis. Their microstructures and morphologies are characterized by X-ray powder diffraction and transmission electronic microscope, and the results show that each of all the samples has a monophasic zircon-type structure. The absorption spectrum of the prepared phosphor shows a blue-shift of the fundamental absorption band edge with increasing the gadolinium content. Under UV-light and visible-light excitation, all the prepared phosphors show the typical luminescence properties of Eu3＋ in the zircon-type structure. The emission intensity of GdxBi0.95-xVO4：0.05Eu3＋ （x = 0.55） is strongest in all samples under UV-light and visible-light excitations. Finally, the mechanisms of luminescence of Eu3＋ in the GdxBi0.95-xVO4：0.05Eu3＋ （x = 0-0.95） solid solutions are analyzed and discussed.     

Study of Ni80Fe20／Fe50Mn50 superlattice microstructures by transmission electron microscopy and x—ray diffraction

The detailed microstructures of Ni80Fe20/Fe50Mn50 superlattices have been characterized using both x-ray diffraction techniques and transmission electron microscopy.The obrivous layered structure,typical column structure and twins which exist in Ni80Fe20/Fe50Mn50 superlattices were observed through performing transmission microscopy.By combining the technique of lowangle x-ray reflectivity(specular and off-specular scans)with the anomalous scattering effect and high-angle x-ray diffraction(using conventional x-ray),wequantitatively analysed the microstructural variation as a function of annealing temperature.It is found that the lateral correlation length,the(111)peak intensity of the superlattices and the average multilayer coherence length all increase with a rise in annealing temperature annealing can decrease the rootmean-square roughness at the interfaces of Ni80Fe20/Fe50Mn50 superlattices.the obtained microstructural knowledge will be helpful in understanding the magnetic properties of the ni80Fe20/Fe50Mn50 exchange bias system.     

附着铜膜的内应力及屈服强度

用X-射线衍射和热循环基片弯曲方法测量了附着在基体上纯铜膜的内应力和屈服强度。内应力为张应力且随工作气体（氩气）压强的增加而减小但随膜厚的增加而增加。钢基体上铜膜的张屈服强度与膜厚的倒数成反比。压屈服强度也同样依赖于膜厚,即膜越薄,压屈服强度越高。     

Improvement of copper plating adhesion on silane modified PET film by ultrasonic-assisted electroless deposition

Copper thin film on silane modified poly(ethylene terephthalate) (PET) substrate was fabricated by ultrasonic-assisted electroless deposition. The composition and topography of copper plating PET films were characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. Peel adhesion strength, as high as 16.7 N/cm, was achieved for the planting copper layer to the modified PET substrate with ultrasonic-assisted deposition; however, a relative low value as 11.9 N/cm was obtained for the sample without ultrasonic vibration by the same measurement. The electrical conductivity of Cu film was changed from 7.9 × 10⁴ to 2.1 × 10⁵ S/cm by using ultrasonic technique. Ultrasonic operation has the significant merits of fast deposition and formation of good membranes for electroless deposition of Cu on PET film.     

薄膜和多层膜的X射线散射方法与应用

文章主要介绍了几种X射线散射技术，包括X射线小角反射技术、X射线漫散射技术、掠入射X射线衍射和多晶薄膜的小角衍射技术。通过具体的事例说明这些X射线散射方法在薄膜研究中的应用。     

纳米多晶铜微观结构的分子动力学模拟

基于EAM镶嵌原子势函数,采用分子动力学模拟了零温下纳米多晶铜的微观结构.首先用Voronoi几何方法构造了5个纳米多晶铜数值模型,在300K弛豫50ps并退火至0K.然后分析零温下弛豫模型的径向分布函数、原子能量、配位数、原子Voronoi体积、以及本征应力分布关键词：纳米多晶铜微观结构分子动力学     

薄膜和多层膜的X射线散射方法与应用

文章主要介绍了几种X射线散射技术,包括X射线小角反射技术、X射线漫散射技术、掠入射X射线衍射和多晶薄膜的小角衍射技术。通过具体的事例说明这些X射线散射方法在薄膜研究中的应用。     

用金刚石车削技术制备EOS实验用铝薄膜和铜薄膜

具有材料理论密度的金属薄膜对于材料高压状态方程(EOS)研究而言具有重要的意义。本文提出采用金刚石车削技术,利用超精密金刚石车床、金刚石圆弧刀具及真空吸附夹持技术,对纯铝和无氧铜进行端面车削,完成了EOS实验用铝薄膜和铜薄膜的车削加工,实现了薄膜密度接近材料理论密度。精加工工艺参数为：进给量0.001 mm/r,主轴转速3000 r/min,切削深度1 μm。采用Form Talysurf series 2型触针式轮廓仪进行测量,结果表明：铝薄膜、铜薄膜厚度可以达到小于10 μm水平,表面均方根粗糙度小于5 nm,原始最大轮廓峰-谷高度小于50 nm,厚度一致性好于99%。     

IR Absorption Anisotropy of Films of Copper Phthalocyanine and Composites Based on It in the Region of γ-(CH) Oscillations

By the IR spectrophotometric method, metastable vacuum-deposited films of copper phthalocyanine and composites based on it have been investigated. For copper phthalocyanine films, an intense absorption band in the region of 729 cm^–1, which appears at oblique incidence of linearly polarized radiation with oscillations lying in the incidence plane, has been established. Its origin is associated with the features of the supermolecular architecture of polycrystalline films particular, with the character of packing of copper phthalocyanine microcrystallites.     

强激光辐照下纳米晶体铜薄膜层裂破坏的实验研究

采用强激光辐照加载技术和激光速度干涉(VISAR)测试技术,对纳米晶体铜薄膜的层裂特性进行实验测量和分析.基于VISAR实测的自由面速度波形,计算得到纳米晶体铜薄膜在超高拉伸应变率下的层裂强度高达3 GPa,明显高于多晶铜的层裂强度, 其原因归咎于纳米晶体材料中存在大量晶界阻碍了位错运动.关键词：纳米晶体铜薄膜层裂激光辐照