CO和O2分子与TiO2(110)表面负载Pt单原子的相互作用

Pt单原子在低温CO氧化反应中具有很高的催化活性. 利用扫描隧道显微术与密度泛函理论，研究了Pt单原子在还原性TiO₂(110)表面的吸附行为及其与CO和O₂分子的相互作用. 研究发现在80 K低温下，TiO₂表面的氧空位缺陷是Pt单原子的最优吸附位. 将CO和O₂分子分别通入Pt单原子吸附后的TiO₂表面，研究相应的吸附构型. 实验表明在低覆盖度下，单个Pt原子会俘获一个CO分子，CO分子同时与表面次近邻的五配位Ti原子(Ti_5c)成键，进而形成非对称的Pt-CO 复合物构型. 将样品从80 K升温到100 K后，TiO₂表面的CO分子会迁移到Pt-CO处形成Pt-(CO)₂的复合结构. 对于O₂分子，单个Pt原子同样会吸附一个O₂分子，O₂分子也会与最近邻或次近邻的Ti_5c原子成键形成两种Pt-O₂构型. 这些结果在单分子尺度上揭示了CO和O₂与Pt单原子的相互作用，呈现了CO与O₂反应中的初始状态.     

Ni(111)表面C原子吸附的密度泛函研究

基于密度泛函理论的第一性原理计算,对过渡金属Ni晶体与Ni (111)表面的结构和电子性质进行了研究, 并探讨了单个C原子在过渡金属Ni (111)表面的吸附以及两个C原子在Ni(111)表面的共吸附. 能带和态密度计算表明, Ni晶体及Ni (111)表面在费米面处均存在显著的电子自旋极化. 通过比较Ni (111)表面各位点的吸附能,发现单个C原子在该表面最稳定的吸附位置为第二层Ni原子上方所在的六角密排洞位, 吸附的第二个C原子与它形成碳二聚物时最稳定吸附位为第三层Ni原子上方所在的面心立方洞位. 电荷分析表明,共吸附时从每个C原子上各有1.566e电荷转移至相邻的Ni原子, 与单个C原子吸附时C与Ni原子间的电荷转移量(1.68e)相当. 计算发现两个C原子共吸附时在六角密排洞位和面心立方洞位的磁矩分别为0.059μ_B和 0.060μ_B,其值略大于单个C原子吸附时所具有的磁矩(0.017μ_B).     

Ca掺杂的氧化铍纳米管吸附H2O和NH3的选择传感特

通过密度泛函计算, 借助NH₃和H₂O分子对未掺杂以及钙掺杂的BeO碳纳米管的结构和电传导性进行了研究. 结果发现,NH₃和H₂O分子可以吸附在纳米管侧壁的Be原子上,吸附能分别为约36.1和39.0 kcal/mol. 态密度分析显示BeO纳米管的电传导性在吸附后稍有变化. 对于NH₃和H₂O分子,纳米管表面的钙原子替换Be原子可使吸附能分别增加约7.4和14.7 kcal/mol. 与未掺杂纳米管不同的是,钙掺杂BeONT吸附NH₃和H₂O分子的电传导性更加敏感,且H₂O分子比NH₃分子更敏感.     

B12N12纳米笼：潜在的二氧化氮检测传感器

利用密度泛函理论通过计算吸附能量、HOMO/LUMO能隙变化、电荷转移、结构扭曲等研究二氧化氮分子在B12N12纳米笼的吸附．此外,通过计算B₁₂N₁₂的电子结合能、Gibbs自由能、态密度和分子表面的静电势研究其稳定性和其它特性．B₁₂N₁₂纳米笼吸附二氧化氮显示三种构型．B₁₂N₁₂团簇的HOMO/LUMO能隙变化对二氧化氮分子的存在非常敏感,从自由团簇的6.84 eV降为NO₂/团簇稳定团簇的3.23 eV．团簇的导电性被极大地提高,表明B₁₂N₁₂纳米簇可能是潜在的二氧化氮气体分子检测传感器.     

Mo(CO)6在清洁的和氧化的Si(111)表面上吸附的对比

采用高分辨电子能量损失谱对比研究Mo(CO)₆在清洁的、预吸附氧的和深度氧化的Si(111)表面上的吸附行为. 吸附Mo(CO)₆的C-O伸缩振动模式向低频方向移动,说明Mo(CO)₆与清洁Si(111)和SiO₂/Si(111)表面发生了不同的相互作用,前者较弱而后者较强. 与SiO₂/Si(111)表面的强相互作用可能引起Mo(CO)₆部分解离,形成部分分解的羰基钼物种.     

臭氧修饰(001)晶面TiO2纳米片及其光催化降解甲苯研究

本文系统研究了臭氧修饰对(001)主导晶面锐钛矿型TiO₂光催化剂降解甲苯性能的影响. 利用自行搭建的光催化VOCs降解装置对催化剂光降解甲苯的性能进行了测试. 通过多种表征手段，结合原位DRIFTS和DFT计算研究了臭氧表面修饰及甲苯吸附和降解机理. 结果表明，用臭氧进行表面修饰可以显著提高(001)主导晶面TiO₂光催化降解甲苯的性能. (001)晶面上丰富的5c-Ti不饱和配位是臭氧分子的吸附位点，其解离后形成的Ti-O键与H₂O分子结合，在表面生成大量孤立的Ti_5c-OH. Ti_5c-OH 是甲苯分子的吸附位，它的形成显著提高了对甲苯分子的吸附能力. 在光照下Ti_5c-OH与光生空穴结合能形成·OH自由基. 通过臭氧解离产生的O₂也可以与光生电子结合形成超氧自由基. 这些具有强氧化性活性自由基的形成促进了对气相甲苯的光催化降解速率.     

α-Al2O3(0001)表面原子缺陷对ZnO吸附影响

采用基于密度泛函理论的分子动力学方法，对α-Al₂O₃(0001)表面 Al，O原子空位缺陷及其对ZnO吸附进行了理论计算.电子局域函数显示了表面空位处的电子密度变化，表面Al原子空缺处有非常明显的缺电子区域，悬挂键临近O的电子密度增大，有利于对Zn的吸附；O原子空缺处的Al原子处存在孤立电子，其ELF值为005—03，将有利于同电负性较大的O或O^2-结合.通过吸附动力学模拟与体系能量的计算发现，表面缺陷显著增强了表面 的化学吸附，空缺原子处都被吸附原子填补，吸附结合能远大于单晶表面的情况.在Al空缺的表面，由于ZnO的O与表面O形成双键，破坏了α-Al₂O₃(0001)表面O六 角对称结构，减小了 O的表面扩散，从而不利于规则的ZnO薄膜生长.相反，O的空缺表面，弥补了α-Al_{2O3(0001)表面O空位缺陷，不影响基片表面O六角对称结构.}     

有机金属化学气相沉积法制备的Ni/Al2O3纳米复合材料的氢吸附

研究了通过有机金属化学气相沉积技术及单源分子前躯体方法制备的Ni/Al₂O₃纳米复合材料的氢吸附(存储). 在冷壁的有机金属化学气相沉积反应器中,通过降解Ni(acac)₂粉末基底上的[H₂Al(OtBu)]₂制备的Ni/Al₂O₃纳米复合材料. 通过X射线粉末衍射、扫描电镜、透射电镜以及能量色散型X射线荧光光谱等技术表征该复合材料. 采用自制Sievert's设备研究该复合材料的氢吸附(存储),可以储存约2.9%(重量比)的氢.     

S在Pt皮肤Pt3Ni(111)面吸附的第一性原理研究

采用基于密度泛函理论的第一性原理方法,计算并分析了S原子在 Pt皮肤Pt3Ni(111)面不同位置的吸附特性.结果表明：S原子在Pt皮肤Pt3Ni的fcc位吸附最强,吸附能为5. 49 eV;与S原子在纯净Pt(111)表面的吸附相比,S原子在Pt皮肤Pt3Ni表面相应吸附位置的吸附能变小、与近邻的Pt原子形成的S-Pt键变长,表明掺杂的Ni会减小相应位点S原子的吸附能,降低体系对S原子的吸附能力,进而减弱S吸附对体系催化能力的影响;态密度分析发现, S原子的吸附使得Pt基催化剂的催化活性降低,主要是S的2p电子引起的;这些结果将为后续研究Pt基合金电极抗S中毒效果以及探究S原子吸附后Pt3Ni的活性位提供依据.     

S在Pt皮肤Pt_3Ni(111)面吸附的第一性原理研究

采用基于密度泛函理论的第一性原理方法,计算并分析了S原子在Pt皮肤Pt3Ni(111)面不同位置的吸附特性.结果表明:S原子在Pt皮肤Pt3Ni的fcc位吸附最强,吸附能为5.49eV;与S原子在纯净的Pt(111)表面吸附相比较,S原子在Pt皮肤Pt3Ni(111)面相应吸附位置的吸附能变小,与近邻Pt原子形成的S-Pt键变长,表明掺杂的Ni会减小相应位点S原子的吸附能,降低体系对S原子的吸附能力,进而减弱S吸附对体系催化能力的影响;态密度分析发现,S原子的吸附使得Pt基催化剂的催化活性降低,主要是S的2p电子引起的;这些结果将为后续研究Pt基合金电极抗S中毒效果以及探究S原子吸附后Pt3Ni的活性位提供依据.     

First-principles calculations of ammonia decomposition on Ni(110) surface

First-principles calculations based on density functional theory (DFT) have been performed to study the adsorption and decomposition of NH₃ on Ni(110). The adsorption sites, the adsorption energies, the transition states and the activation energies of the stepwise dehydrogenation of NH₃ and the associative desorption of N are determined, and the zero point energy correction is included, which makes it possible to compute the rate constants of the elementary steps in NH₃ decomposition. Combined DFT calculations and kinetic analysis at 350 K indicate that the associative desorption of N has a reaction rate lower than NH_x dehydrogenation and is therefore the rate determining step. The distinctly different rate constants over Ni(110), Ni(111) and Ni(211) imply that ammonia decomposition over Ni-based catalyst is a structure-sensitive reaction.     

NH3 adsorption on Ni(110) and the production of the NH2 species by electron irradiation

The adsorption of NH₃ on Ni(110) has been examined using electron stimulated desorption ion angular distribution (ESDIAD), low energy electron diffraction (LEED) and thermal desorption spectrometry (TDS). At ～ 85 K the NH₃ molecule enters into a series of chemisorption and physisorption states whose structures have been partially characterized by means of ESDIAD and LEED. Upon heating, these NH₃ states desorb without dissociation; for adsorption below 300 K there is essentially no thermal decomposition. The ammonia adiayer was found to be extremely sensitive to electron irradiation effects. Evidence was found to support the irradiation induced conversion of NH₃(ads) to an amido intermediate, nh_2(ads). The NH₂ adsorbs with its C_2v axis normal to the surface and its NH bonds aligned along the [001] and [001?] directions. In the absence of further electron irradiation the nh_2(ads) species is stable to 375 K whereupon it dissociates to N_(ads)and H_2(g). The remaining N_(ads) desorbs near 750 K with significant attractive N…N interaction. No evidence is found for an imido intermediate, nh_(ads). nh_2(ads) also undergoes a disproportionation/recombination reaction upon heating to produce an additional NH₃ desorption state. A significant isotope effect for NH versus ND scission, sensitive to the adsorption state of the ammonia, is found to occur upon electron irradiation.     

Theoretical study for magnetic effect in dissociative adsorption of oxygen to a platinum monolayer on Ni(110) surface

We investigate oxygen dissociative adsorption to a platinum monolayer on Ni(110) surface (Pt/Ni(110)) by density functional theory. We have shown that the activation barrier on Pt/Ni(110) is lower than that on a clean Pt(001) surface. This may be due to the effect of magnetization of Pt surface. The reason of decrease of activation barrier can be attributed to the flow of electrons from oxygen to platinum surface because the d orbitals have spin polarization at the Fermi level where the down spin d orbitals are unoccupied.     

TPD, HREELS and UPS study of the adsorption and reaction of methyl nitrite (CH3ONO) on Pt(111)

The adsorption and reaction of methyl nitrite (CH₃ONO, CD₃ONO) on Pt(111) was studied using HREELS, UPS, TPD, AES, and LEED. Adsorption of methyl nitrite on Pt(111) at 105 K forms a chemisorbed monolayer with a coverage of 0.25 ML, a physisorbed second layer with the same coverage that desorbs at 134 K, and a condensed multilayer that desorbs at 117 K. The Pt(111) surface is very reactive towards chemisorbed methyl nitrite; adsorption in the monolayer is completely irreversible. CH₃ONO dissociates to form NO and an intermediate which subsequently decomposes to yield CO and H₂ at low coverages and methanol for CH₃ONO coverages above one-half monolayer. We propose that a methoxy intermediate is formed. At least some C–O bond breaking occurs during decomposition to leave carbon on the surface after TPD. UPS and HREELS show that some methyl nitrite decomposition occurs below 110 K and all of the methyl nitrite in the monolayer is decomposed by 165 K. Intermediates from methyl nitrite decomposition are also relatively unstable on the Pt(111) surface since coadsorbed NO, CO and H are formed below 225 K.     

Dynamics of interaction of H2 and D2 with Ni(110) and Ni(110) surfaces

Elastic and direct-inelastic scattering as well as dissociative adsorption and associative desorption of H₂ and D₂ on Ni(110) and Ni(111) surfaces were studied by molecular beam techniques. Inelastic scattering at the molecular potential is dominated by phonon interactions. With Ni(110), dissociative adsorption occurs with nearly unity sticking probability s₀, irrespective of surface temperature T_s and mean kinetic energy normal to the surface 〈 E_⊥ 〉. The desorbing molecules exhibit a cos θ_e angular distribution indicating full thermal accommodation of their translation energy. With Ni(111), on the other hand, s₀ is only about 0.05 if both the gas and the surface are at room temperature. s₀ is again independent of T_s, but increases continuously with 〈 E⊥ 〉 up to a value of ～0.4 for 〈 E⊥ 〉 = 0.12 eV. The cos⁵θ_e angular distribution of desorbing molecules indicates that in this case they carry off excess translational energy. The results are qualitatively rationalized in terms of a two-dimensional potential diagram with an activation barrier in the entrance channel. While the height of this barrier seems to be negligible for Ni(110), it is about 0.1 eV for Ni(111) and can be overcome through high enough translational energy by direct collision. The results show no evidence for intermediate trapping in a molecular “precursor” state on the clean surfaces, but this effect may play a role at finite coverages.     

Angular-resolved photoemission from NH3 on Ni(110)

NH₃ adsorbed on Ni(110) at a temperature of 100 K has been studied by angular-resolved ultraviolet photoelectron spectroscopy (ARUPS) using synchrotron radiation in the energy range 10 ? ? ω ? 35 eV. From ARUPS it is concluded that NH₃ bonds via its nitrogen lone-pair orbital with its molecular axis normal to the surface. For both the 3a₁ and 1e level dispersion has been found indicating lateral interactions within a compact NH₃ layer. Increasing the NH₃ coverage beyond the chemisorbed monolayer produces a physisorbed monolayer followed by a multilayer deposition of NH₃ phase on top which has been identified by photoemission and thermal desorption. Desorption and partial decomposition result from annealing. At 300 K NH₃ or NH is left at the surface which desorbs almost completely by annealing to 400 K.     

Decomposition of NH3 on Ir(110): A first-principle study

The adsorption and dehydrogenation of NH₃ on Ir(110) have been investigated using periodic density functional calculations. The adsorption sites, the adsorption energies, the predominant adsorption configurations and the transition states of the stepwise dehydrogenation of NH₃ were identified. The results show that the NH₃ prefers the top site with inclining 68.6° of N―Ir bond relative to the surface, while NH₂, NH, N and H favor the short bridge position. The NH decomposition to N and H or recombination with H to form NH₂ shares the similar and relatively high reaction energy barrier, implying that NH will be the main surface species in the NH₃ dehydrogenation processes. N―N bond formation possesses the highest energy barrier of 1.75 eV, indicating that it is the rate-limiting step for NH₃ decomposition. Barrier decomposition analysis reveals that the deformation and the binding to the surface of the reactants and the interaction among binding species in transition states will increase the activation energy while the bonding to the surface of the species in transition state will decrease the energy barrier.     

SO2/Ni(111)吸附系统局域结构的多重散射团簇理论研究

用多重散射团族方法对SO₂/Ni(111)吸附系统的S原子ls近边X射线吸收精细结构进行了详细的计算和分析,求得吸附系统的局域结构。研究结果证实了SO₂分子在Ni(111)表面是平铺吸附的,其最佳吸附位为fcc三度芯位。吸附分子的S—O键长比气体状态时增长了(0.007±0.002)nm,分子键角∠OSO减小了10°,SO₂距衬底的吸附高度为(0.20±0.02)nm。理论计算与两组实验结果进行了直接比较。 关键词： 局域吸附结构 X射线吸收精细结构 2/Ni(111)')" href="#">吸附系统SO₂/Ni(111) 多重散射团簇方法     

Field emission study of ammonia adsorption and catalytic decomposition on individual molybdenum planes

A probe-hole field emission microscope was used to investigate the crystallographic specificity of ammonia adsorption at 200 and 300 K on (110), (100), (211) and (111) molybdenum crystal planes. Chemisorbed NH₃ causes a large work function decrease, especially at 200 K in agreement with an associative adsorption model which can also explain that this decrease is more important on the crystal planes of highest work function (At 200 K, Δφ = ?2.25 eV on Mo(110) compared to Δφ = ?1.55 eV on Mo (111). The decomposition of NH₃ was followed by measuring the work function changes for stepwise heating of the Mo tip covered with NH₃ at 200 K. On the four studied planes NH₃ decomposition and H₂ desorption are completed at about 400 K. Δφ changes above 400 K depend on the crystal plane and have been related to two different nitrogen surface states. No inactive plane towards NH₃ adsorption and decomposition has been found but the noted crystallographic anisotropy in this low pressure study is relevant to the structure sensitive character of the NH₃ decomposition and synthesis reactions.