Functional effects of spinocerebellar ataxia type 13 mutations are conserved in zebrafish Kv3.3 channels

Background  

The zebrafish has been suggested as a model system for studying human diseases that affect nervous system function and motor output. However, few of the ion channels that control neuronal activity in zebrafish have been characterized. Here, we have identified zebrafish orthologs of voltage-dependent Kv3 (KCNC) K⁺ channels. Kv3 channels have specialized gating properties that facilitate high-frequency, repetitive firing in fast-spiking neurons. Mutations in human Kv3.3 cause spinocerebellar ataxia type 13 (SCA13), an autosomal dominant genetic disease that exists in distinct neurodevelopmental and neurodegenerative forms. To assess the potential usefulness of the zebrafish as a model system for SCA13, we have characterized the functional properties of zebrafish Kv3.3 channels with and without mutations analogous to those that cause SCA13.     

Investigation of an AlInAs/GaInAs superlattice-emitter resonant tunneling bipolar transistor (SE-RTBT)

A new bipolar transistor with a 20-period i-AlInAs/n⁺-InGaAs superlattice, prepared by metal organic chemical vapour deposition, has been fabricated and demonstrated. This superlattice is used as a confinement barrier for holes and a resonant tunneling (RT) route for electrons. Due to the RT effect within the 20-period superlattice near emitter–base p–n junction region, the N-shaped negative-differential-resistance (NDR) phenomena are observed under normal operation. A transistor action with a common-emitter current gain of 13 and a small offset voltage (90 mV) is achieved at room temperature.     

Electrical interfacing of neurotransmitter receptor and field effect transistor

The interfacing of a ligand-gated ion channel to a transistor is studied. It relies on the transduction of ion current to a voltage in a cell-transistor junction. For the first time, a genetically modified cell is used without external driving voltage as applied by a patch-pipette. Using a core-coat conductor model, we show that an autonomous dynamics gives rise to a signal if a driving voltage is provided by potassium channels, and if current compensation is avoided by an inhomogeneous activation of channels. In a proof-of-principle experiment, we transfect HEK293 cells with the serotonin receptor 5-HT3A and the potassium channel Kv1.3. The interfacing is characterized under voltage-clamp with a negative transistor signal for activated 5-HT3A and a positive signal for activated Kv1.3. Without patch-pipette, a biphasic transient is induced by serotonin. The positive wave is assigned to 5-HT3A receptors in the free membrane that drive a potassium outward current through the adherent membrane. The negative wave is attributed to 5-HT3A receptors in the adherent membrane that are activated with a delay due to serotonin diffusion. The implementation of a receptor-cell-transistor device is a fundamental step in the development of biosensors that combine high specificity and universal microelectronic readout.     

Opening of K+ channels by capacitive stimulation from silicon chip

The development of stable neuroelectronic systems requires a stimulation of nerve cells from semiconductor devices without electrochemical effects at the electrolyte/solid interface and without damage of the cell membrane. The interaction must rely on a reversible opening of voltage-gated ion channels by capacitive coupling. In a proof-of-principle experiment, we demonstrate that Kv1.3 potassium channels expressed in HEK293 cells can be opened from an electrolyte/oxide/silicon (EOS) capacitor. A sufficient strength of electrical coupling is achieved by insulating silicon with a thin film of TiO₂ to achieve a high capacitance and by removing NaCl from the electrolyte to enhance the resistance of the cell-chip contact. When a decaying voltage ramp is applied to the EOS capacitor, an outward current through the attached cell membrane is observed that is specific for Kv1.3 channels. An open probability up to fifty percent is estimated by comparison with a numerical simulation of the cell-chip contact. PACS 73.40.Mr; 82.45.Vp; 87.16.Uv; 87.19.Nn     

Origin of the defect states at ZnS/Si interfaces

Electrical characterisation of silicon surfaces contaminated by a zinc-sulphide overlayer has been carried out by forming Schottky diodes on the silicon after the ZnS has been etched off. The techniques include current-voltage, capacitance-voltage, and deep-level transieni spectroscopy. The Schottky diodes show clear memory of the presence of the ZnS overlayer and the electrical characteristics are far from ideal. Five deep levels in the sub-surface region of the silicon are detected, corresponding to the Zn⁺, Zn⁺⁺, S^–, S^–– states and probably to a Zn–B complex (p-type). Diffusion of the zinc and sulphur into the silicon is therefore confirmed and this diffusion is thought to create a compensated layer at the interface. These impurity states control the electrical characteristics of the surface in these diodes.     

Membrane transistor with giant lipid vesicle touching a silicon chip

Lipid bilayers on silicon may become the matrix of future bioelectronic devices if the junction is sufficiently insulating. We touched the open gate of a field-effect transistor with a preformed giant lipid vesicle and bound the membrane by means of polyelectrolyte interaction. The sheet resistance along the junction was 100 GΩ and the membrane resistance was above 100 GΩ at a contact area of 1000 μm². The bilayer was fluid and smoothly followed the surface profile of the chip. The compound lipid–silicon structure is suitable to couple semiconductor and electroactive proteins. Received: 12 August 1999 / Accepted: 16 August 1999 / Published online: 6 October 1999     

Possible molecular effect related to the reception of low-intensity IR radiation: Role of Src-kinase

The patch-clamp technique has been used to demonstrate that low-intensity IR irradiation affects the effective charge of the activation gating system of slow sodium channels in the nociceptive neuron membrane. IR photons are absorbed by ATP molecules bound to Na⁺,K⁺-ATPase at their hydrolysis site. Na⁺,K⁺-ATPase is a transducer of signal that is further delivered to slow sodium channels and cell genome. It is demonstrated that the irradiation does not modulate the response of a sensory neuron in the presence of PP2, an inhibitor of Src-kinase. The results show that Src-kinase is a series unit involved in the intracellular cascade processes triggered by low-intensity radiation of CO₂ laser.     

Nanostructuring Si surface and Si/SiO2 interface using porous-alumina-on-Si template technology. Electrical characterization of Si/SiO2 interface

In this work, anodic porous alumina thin films with pores in the nanometer range are grown on silicon by electrochemistry and are used as masking material for the nanopatterning of the silicon substrate. The pore diameter and density are controlled by the electrochemical process. Through the pores of the alumina film chemical oxidation of the silicon substrate is performed, leading to the formation of regular arrays of well-separated stoichiometric silicon dioxide nanodots on silicon, with a density following the alumina pores density and a diameter adjustable by adjusting the chemical oxidation time. The alumina film is dissolved chemically after the SiO₂ nanodots growth, revealing the arrays of silicon dioxide dots on silicon. In a next step, the nanodots are also removed, leaving a nanopatterned bare silicon surface with regular arrays of nanopits at the footprint of each nanodot. This silicon surface structuring finds interesting applications in nanoelectronics. One such application is in silicon nanocrystals memories, where the structuring of the oxidized silicon surface leads to the growth of discrete silicon nanocrystals of uniform size. In this work, we examine the electrical quality of the Si/SiO₂ interface of a nanostructured oxidized silicon surface fabricated as above and we find that it is appropriate for electronic applications (an interface trap density below 1–3×10¹⁰ eV⁻¹ cm⁻² is obtained, indicative of the high quality of the thermal silicon oxide).     

A germanium photodetector array for the near infrared monolithically integrated with silicon CMOS readout electronics

Near infrared (NIR) detectors, operating in the 1.3–1.6 μm region, are key elements in a number of applications ranging from optical communications to remote sensing. InGaAs and Ge are currently the materials of choice for the fabrication of NIR detectors due to their good absorption and transport properties. However, as the required performances increase (bit-rate in optical communications, number of pixels in imaging, etc.), it becomes more and more important to reduce the separation from detectors and driving/biasing and amplifying electronics, by integrating the two components on the same chip.We demonstrate an array of NIR detectors monolithically integrated with standard silicon CMOS readout electronics. The employed low temperature process allowed the integration of the detectors as the last step of chip fabrication. The integrated micro-system consists of a linear array of 120×120 μm² pixels, an analog CMOS multiplexer and a transimpedance amplifier. The chip exhibits a good photoresponse in the NIR, with responsivities as high as 43 V/W at 1.3 μm, dark currents of 1 mA/cm² and inter-pixel cross-talk better than −20 dB.     

Kaon interferometry in heavy-ion collisions at the CERN SPS

K⁺K⁺ and K^–K^– correlations from S+Pb collisions at 200 GeV/c per nucleon and K⁺K⁺ correlations from p+Pb collisions at 450 GeV/c per nucleon, are presented as measured by the focusing spectrometer of the NA44 experiment at CERN. Multidimensional fits are performed in order to characterize the kaon-emission volume, which is found to be smaller than the pion-emission volume.     

Influence of self-assembly monolayers on the characteristics of copper phthalacyanine thin film transistor

Self-assembly monolayers (SAMs) of octadecyltrichlorosilane (OTS) on a silicon dioxide substrate were formed in solution, or by vacuum vapor methods, and characterized by Fourier transform infrared (FTIR) spectroscopy. We found that the OTS SAMs on SiO₂ substrates greatly affect the order and connectivity of evaporated copper phthalocyanine (CuPc) thin films, as confirmed by an atomic force microscopy (AFM) and X-ray diffraction analysis. The performance of the organic CuPc thin film transistor comprising OTS SAMs interposed between a gate dielectric and an organic semiconductor layer could be effectively enhanced as a result of improvements in the quality both of the organic/dielectric interface and the evaporated CuPc thin films. The deposition of an OTS SAM leads to a mobility of 1.48×10^-3 cm²/Vs, 1–2 orders higher than that of bare silicon dioxide. PACS 73.61.Ph; 85.30.Tv; 78.66.Tr     

Modulation bandwidth and noise limit of photoconductive gates

The modulation bandwidth and noise limit of a photoconductive sampling gate are studied by reducing the parasitic capacitance and leakage current of the sampling circuit using an integrated junction field-effect transistor (JFET) source follower. The modulation bandwidth of the photoconductive sampling gate is limited by the external parasitic capacitance, and its efficiency is found to saturate at a laser gating power of about 1 mW. It is determined that the noise of the photoconductive sampling gate is dominated by the photovoltaic current due to the gating laser amplitude fluctuation. A minimum noise level of 4 nV Hz^–1/2 has been measured, and an enhancement in signal-to-noise ratio by a factor of >45 has been achieved after the integration of the source follower with the photoconductive sampling gate. The JFET source follower serves to increase the modulation bandwidth of the photoconductive sampling gate by about 15 times and buffer the charge of the measured signal using its extremely high gate input impedance. The performance of the photoconductive sampling gate in regard to invasiveness and gating efficiency has been optimized, while a picosecond temporal resolution has been maintained and the signal-to-noise performance has been enhanced using a gating laser power as low as 10 W.     

Laser printing of polythiophene for organic electronics

We report on the development of hybrid organic/inorganic thin-film transistors using regioregular poly-3-hexylthiophene (P3HT) semiconductor material deposited by means of the solid-phase Laser Induced Forward Transfer (LIFT) technique. P3HT pixels were LIFT-printed onto Au/Ti source and drain electrodes formed on silicon dioxide/p⁺-type Si substrate. Deposition of the P3HT pixels was investigated as a function of the laser fluence using donor substrates with and without a dynamic release layer. Device electrical characterization reveals efficient field-effect action of the bottom gate on the organic channel. The transfer I_DS-V_GS characteristics exhibit well-defined sub-threshold, linear and saturation regimes designating LIFT as a promising technique for hybrid organic/inorganic transistor technology.     

Role of Carbon in the Electric Forming of Metal–Dielectric–Metal Systems

Thin-film Mo–SiO₂ + C–Al systems are investigated. It is demonstrated that the electrical properties of these systems depend strongly on the percentage of carbon in a composite Si + C target at the stage of preparing the dielectric. The results obtained are interpreted in the context of the chemical interaction of carbon with silicon dioxide.     

Diffusion of silicon in titanium nitride films. Efficiency of TiN barrier layers

Two kinds of reactively evaporated titanium nitride films with columnar (B ₀ films) and fine-grained film structure (B ₊ films) have been examined as diffusion barriers, preventing the silicon diffusion in silicon devices. The silicon diffusion profiles have been investigated by 2 MeV ⁴He⁺ Rutherford backscattering spectrometry (RBS) after annealing at temperatures up to 900° C, in view of application of high-temperature processes. The diffusivity from 400 to 900° C: D (m² s^–1)=2.5×10^–18 exp[–31 kJ/mol/(RT)] in B ₀ layers and D (m² s^–1)=3×10^–19 exp[–26 kJ/mol/(RT) in B ₊ TiN layers. The diffusivities determined correspond to grain boundary diffusion, the difference being due to the different microstructure. The very low diffusivity of silicon in B ₊ TiN layer makes it an excellent high-temperature barrier preventing silicon diffusion.     

Development of surface-textured hydrogenated ZnO:Al thin-films for μc-Si solar cells

This study addresses the optimization of rf magnetron-sputtered hydrogenated ZnO:Al (HAZO) films as front contacts in microcrystalline silicon solar cells. The front contact of a solar cell has to be highly conductive and highly transparent to visible and infrared radiation. Furthermore, it has to scatter the incident light efficiently in order for the light to be effectively trapped in the underlying silicon layers. In this research, HAZO films were rf-magnetron-sputtered on glass substrates from a ceramic (98 wt% ZnO, 2 wt% Al₂O₃) target. Various compositions of AZO films on glass substrates were prepared by changing the H₂/(Ar + H₂) ratio of the sputtering gas. The resulting smooth films exhibited high transparencies (T  85% for visible light including all reflection losses) and excellent electrical properties (ρ = 2.7 × 10⁻⁴ Ω · cm). Depending on their structural properties, these films developed different surface textures upon post-deposition etching using diluted hydrochloric acid. The light-scattering properties of these films could be controlled simply by varying the etching time. Moreover, the electrical properties of the films were not affected by the etching process. Therefore, within certain limits, it is possible to optimize the electro-optical and light-scattering properties separately. The microcrystalline silicon (μc-Si:H)-based p–i–n solar cells prepared using these new texture-etched AZO:H substrates showed high quantum efficiencies in the long wavelength range, thereby demonstrating effective light trapping. Using the optimum AZO:H thin-film textured surface, we achieved a p–i–n μc-Si solar cell efficiency of 7.78%.     

Thermodynamics of nucleation in an internal oxide getter in silicon

Nucleation of precipitates of silicon dioxide is studied theoretically within the framework of the classical theory of nucleation. Elastic stresses, accompanying nucleation, are taken into account under the assumption that the nucleus and matrix are incoherent and the silicon is elastically isotropic. The results of a numerical calculation of the form and dimensions of the critical nucleus, the free energy of its formation, and the rate of nucleation as a function of the annealing temperature in the range 773–1473 K for oxygen concentrations in the starting single crystal of (0.4–1.4)·10¹⁸ cm^–3 are presented. It is shown that homogeneous nucleation of precipitates is, in principle, possible. The magnitude of the specific free energy of the interphase boundary is estimated based on the data obtained.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 8, pp. 25–29, August, 1988.     

Effect of deep dislocation levels in silicon on the properties of p-n junctions

We present the results of studies on the influence of deep levels, due to dislocations in electronic-grade silicon, on the lifetime of minority carriers and on the current-voltage and capacitance-voltage characteristics of p-n junctions. The parameters of the deep levels were determined by means of dynamic spectroscopy. The carrier lifetime in the high-resistance region of the p-n junction correlates well with the dislocation density and varies from 10^–7 sec to 3 · 10^–8 sec when the dislocation density N_d varies from 10⁷ cm^–2 to 5 · 10³ cm^–2. The voltage across the p-n junction at a high level of injection varies 1.6 to 6.2 v as a function of N_d. The ionization energy of deep levels associated with dislocation in silicon is 0.44 and 0.57 eV, measured from the bottom of the conduction band.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 81–84, January, 1988.     

The Kv2.1 K<Superscript>+</Superscript> channel targets to the axon initial segment of hippocampal and cortical neurons in culture and <Emphasis Type="Italic">in situ</Emphasis>

Background  

The Kv2.1 delayed-rectifier K⁺ channel regulates membrane excitability in hippocampal neurons where it targets to dynamic cell surface clusters on the soma and proximal dendrites. In the past, Kv2.1 has been assumed to be absent from the axon initial segment.     

Quantitative infrared study of ultrathin MIS structures by grazing internal reflection

A very sensitive reflection technique well suited for infrared investigations of thin MIS structures is introduced. With this technique a nearly saturating reflectance drop from the Si-O vibration of a 1.3 nm oxide on silicon within a MIS structure was measured at 1240 cm^–1. The analytic discussion of the sensitivity amplification of this technique shows that for silicon oxide a sensitivity amplification by a factor of 600 per reflection is feasible over the sensitivity of a transmission measurement. The analytic discussion is verified experimentally for the case of 12 nm silicon nitride film. A method that allows one to determine bond concentrations of thin films within MIS structures is given and tested for the case of hydrogen bonds in silicon nitride.