蚀刻衍射光栅波分复用器件的设计与模拟

近年来光通信飞速发展,波分复用技术(WDM)是满足要求的有效手段.密集波分复用技术已经得到成功商用,其扩展信息传输容量的能力也在不断增强.作为波分复用中最关键的器件,蚀刻衍射光栅(EDG)是平面波导密集波分复用器件中很有发展潜力的一种.本文分析了EDG器件的解复用原理,参量设计,工艺过程.文章最后,建立了一个光栅干涉的简单模型,对设计好的器件参量进行模场形状、谱响应、色散等光栅性能的模拟,得到基本的器件解复用特性,并加以分析.     

大角度蚀刻衍射光栅的模拟

研究了平面波导密集波分复用器件中很有发展潜力的蚀刻衍射光栅(EDG).小角度范围光栅的模拟通常采用高斯近似的输入光场,由于近轴的高斯光场接近实际光场,所以模拟结果很准确.但这种方法应用于大角度范围的光栅则有偏差.本文提出了大角度蚀刻衍射光栅的模拟方法,分析了这种偏差并给出了模拟结果.事实上这种方法也适合于实际任意输入光场的模拟.     

阵列波导光栅波分复用/解复用器光谱响应效率的理论模型

基于单模光波导的本征模场分布，瑞利－索末菲衍射积分公式和天线原理的互易定理，给出耦合器中两个非接触平面光波导耦合特性的描述.基此，根据等光程差不等振幅多光束干涉的光场叠加原理，推导出新颖的阵列波导光栅波分复用/解复用器的光谱响应效率的解析函数表达式，这些表达式可为快速精确分析阵列波导光栅波分复用/解复用器的特性提供理论基础.同时,介绍了一个计算阵列波导光栅波分复用/解复用器特性的例子，给出其光谱响应度和信号通道串扰.     

一种通带平坦的粗波分复用/解复用器件的研制

随着粗波分复用(CWDM)系统在城域网和接入网中日益广泛的应用,人们对粗波分复用／解复用器的研究也逐渐展开。报道了一种8通道波长间隔为20nm的粗复用／解复用器。该器件基于阵列波导光栅(AWG)原理设计,利用平面光波导技术(PLC)制作,采用多模干涉输入结构和“S”形阵列波导结构,实现了较宽的通带宽度和较低的串扰。实验测得1dB带宽大于10nm,相邻串扰大于24dB,非相邻串扰大于32dB。介绍了其设计原理和制作过程,给出了光束传播法(BPM)数值模拟结果,并和实验结果进行了对比。     

平面波导阵列布喇格光栅及其光辐照制作方法

本文提出了一种新的平面波导阵列布喇格光栅结构,并给出了在光敏感材料中制作这种波导光栅结构的全息光辐照方法.以LiNbO3:Fe晶体作为光敏感材料,用不同空间频率的双光束干涉条纹辐照后,通过数字全息技术对晶体的光致折射率分布测量和进行的导波衍射测试结果表明,利用这种光辐照方法在光敏感材料中制作平面波导阵列全息布喇格光栅是完全可行的.其显著的导波衍射现象表明,如果在平面波导阵列中制作多重布喇格光栅,有可能使其成为超密集波分复用（UDWDM）系统中波长复用/解复用的核心器件.     

平面弯曲波导耦合器的特性分析

根据耦合模理论和弯曲波导耦合器的结构特点，对平面弯曲波导耦合器的特性进行了分析，结果表明弯曲波导耦合器的弯曲半径和最小间距两个可调变量，增加了波导器件设计的灵活性；同时由于等效耦合长度的调制作用使得弯曲波导耦合器在波分复用/解复用中比平行直波导耦合器具有更大的复用带宽；分析了弯曲半径和最小间距对弯曲波导耦合器复用带宽的影响，为实际波导器件的设计制作提供了一定的理论依据.     

阵列波导光栅线性系统理论分析及优化设计

运用线性系统理论分析了阵列波导光栅的模场特性 ,导出器件传输的数学模型即光栅方程。提出了设计阵列波导光栅阵列波导数M的新方法 ,该方法综合考虑了降低器件串扰以及收集发散光场的能力 ,与文献 [1 ]的方法相比简单且准确。分析了造成器件衍射损耗的原因 ,提出了降低器件衍射损耗的方法。给出了 8× 0 .8nm ,中心波长为 1 550nm的阵列波导光栅波分复用器的设计实例 ,并进行了数值模拟计算验证了文中所提方法的准确性。     

硅基二氧化硅阵列波导光栅制作工艺的研究

硅基二氧化硅阵列波导光栅是集成化波分复用光网络中的核心器件之一.对其制作工艺的研究对提高器件的性能具有重大意义.提出一种在波导上包层使用硼锗共掺高温退火的工艺方法,成功实现阵列波导间空隙的填充,并将阵列波导光栅的插入损耗成功降低约2 dB.相对于传统的硼磷硅玻璃工艺,此方法避免了剧毒气体磷烷的使用,工艺简便安全,同时降...     

两点法设计平场型EDG波分复用器件

利用两点法(two stigmatic points method)对平场型蚀刻衍射光栅(EDG)波分复用器件进行了优化设计.与传统EDG相比,该方法以较小的性能损失为代价,极大简化了制作工艺.通过标量波动衍射理论对16通道的该型器件进行了数值模拟,结果表明:在用光探测器陈列接收的情况下,额外的功率损耗约为1dB,信道间的不均匀性小于0.3dB,串绕小于-30dB.     

三平行光子晶体单模波导的耦合特性及其应用

将三光子晶体单模波导的相互耦合看成一个多模干涉系统.本征模的色散曲线相交或近于相交并出现简并模，简并模之间存在强烈耦合并导致模式的分布方式发生转变.多模干涉系统中，不同波长的光波能量在传输过程中由于相干而具有不同的空间输出行为，在近简并点处多模之间的相干解除，能流限制在原输入方向，不发生转移.三光子晶体单模光波导的这种特性可用来制作波分复用或解复用器件. 关键词： 光子晶体波导 简并模 多模干涉 波分复用或解复用     

刻蚀衍射光栅色散特性分析

对作为波分复用关键器件之一的刻蚀衍射光栅(EDG)的色散特性提出了一种完整的计算方案,分析了器件强度响应和相位响应之间的内在关系.同时通过模拟计算提出并验证了平坦化的同时加剧了色散,以及适当改善频谱响应带通纹波大小可以在一定程度上降低器件的色散.最终指出了使用渐变的抛物线结构多模干涉更有利于得到综合性能最优的平坦频谱.     

Parameter optimization and structural design of polymer arrayed waveguide grating multiplexer

First some important parameters are optimized for the structural design of a polymer arrayed waveguide grating (AWG) multiplexer around the central wavelength of 1.55 μm with the wavelength spacing of 1.6 nm. These parameters include the thickness and width of the guide core, mode effective refractive indices and group refractive index, diffraction order, pitch of adjacent waveguides, length difference of adjacent arrayed waveguides, focal length of slab waveguides, free spectral range (FSR), the number of input/output (I/O) channels, and that of arrayed waveguides. Then the bent angles, radii and lengths of all the input/output channels and arrayed waveguides are determined. Finally, a schematic waveguide layout of this device is presented, which contains 2 slabs, 11 input channels, 11 output channels, and 91 arrayed waveguides.     

短程透镜-光栅型集成波分复用器

制备了一种短程透镜——光栅型集成光学波分复用器。本文简述了波分复用器的原理和制备工艺,描述了其中的关键元件光波导光栅和光波导透镜的设计及特性测量,给出了波分特性的实验结果.     

Reduced back reflection design for an etched diffraction grating based planar demultiplexer

A design for a planar etched diffraction grating (EDG) demultiplexer is presented to reduce the back reflection. By reducing the diffracted field at the input waveguide, the present design makes the best effort to reduce the optical return loss. A design example is given to verify the performance. The spectral response at the input waveguide is simulated and the results show that at the wavelengths that cause back reflection, the reduced back reflection design only receives –47.7 dB of the input power, whereas the design without reduced back reflection receives –3.7 dB of the input power.     

高斯光束计算平板波导自由传输区远场分布及其修正

对近轴近似条件下求解亥姆霍兹方程得到的高斯光束显式传播公式做了分析，同时，基于基尔霍夫衍射理论，在菲涅耳近似的条件下给出了相应的高斯光束在远场的传播公式，在此基础上，对近轴近似条件做出了定量分析，给出了这个近似条件引入的误差，提出了一种计算高斯光束远场分布的修正方法，并采用有限差分-光束传播方法(FD-BPM)来检验各种方法的准确性。把这种修正方法应用到平面光集成波导器件，如阵列波导光栅(AWG)、蚀刻衍射光栅(EDG)等器件的设计和模拟中，可以大大降低工作的复杂性，同时可以得到精确的结果。     

Polarization-independent triangular-groove fused-silica gratings with high efficiency at a wavelength of 1550 nm

We describe polarization-independent triangular-groove fused-silica gratings illuminated by incident lights in the C + L bands as (de)multiplexers for dense wavelength division multiplexing (DWDM) application. The physical mechanisms of the grating can be shown clearly by using the simplified modal method with consideration of the corresponding accumulated average phase difference of two excited propagating grating modes, which illustrates that the grating structure depends mainly on the ratio of the average effective indices difference to the incident wavelength. Exact grating profile is optimized by using the rigorous coupled-wave analysis (RCWA). With the optimized grating parameters, the grating exhibits diffraction efficiencies of greater than 90% under TE- and TM-polarized incident lights for 101 nm spectral bandwidths (1500-1601 nm) and it can reach an efficiency of more than 99% for both polarizations at a wavelength of 1550 nm. Without loss of metal absorption, coating of dielectric film layers, the designed triangular-groove fused-silica grating should be of great interest for DWDM application.     

Configurable coarse wavelength division demultiplexers based on planar reflective gratings

Configurable coarse wavelength division multiplexing filters were realized using a planar reflective grating architecture utilizing small diffraction angles. The novel architecture yielded a 10-fold reduction in the chip size compared to previously reported filter configurations. The proposed design was manufactured using a standard silica-on-silicon process with a waveguide refractive index contrast of 0.82%. Polarization dependent losses of less than 0.2 dB were achieved without any post-processing steps. Fabricated filters showed insertion losses of 2.4 dB and remarkably broad free spectral ranges of more than 500 nm. The combination of single-mode input and multi-mode output guides resulted in box-like passband responses with bandwidth of 14.2 nm. Applications of the filters for integrated coarse wavelength division receivers and monitors are discussed.     

A flat-topped etched diffraction grating demultiplexer with low polarization-dependent loss using a tapered MMI structure

A flat-topped etched diffraction grating(EDG)demultiplexer with a low polarization-dependent loss(PDL)is designed.A design and simulation method based on the method of moment(MoM)is proposed.A 65-channel EDG demultiplexer with channel spacing of 100 GHz is considered as a design example.A tapered multi-mode interferometer(MMI)is used to flatten the passband of the EDG demultiplexer.The numerical results show that the exit width of the tapered waveguide impacts the loss of the TE case more than that of the TM case.Based on this fact,the exit width of the taper is optimized to obtain the lowest PDL.The tapering angle is also optimized where the minimal ripple is obtained.The designed EDG demultiplexer has an excellent flat-topped spectral response and a very low PDL.