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1.
The purpose of this study is to pattern the fluorine-doped tin oxide thin film deposited on the soda-lime glass substrates for touch screen applications by ultraviolet laser. The patterned film structures provide the electrical isolation and prevent the electrical contact from each region for various touch screens. The surface morphology, edge quality, three-dimensional topography, and profile of isolated lines and electrode structures after laser patterning were measured by a confocal laser scanning microscope. Moreover, a four-point probe instrument was used to measure the sheet resistance before and after laser patterning on film surfaces and also to discuss the electrical property at different laser spot overlaps. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surfaces that could obtain an excellent machined quality of edge profile. All sheet resistance values of film surfaces near the isolated line edge were larger than the original ones. Moreover, the sheet resistance values increased with increasing laser spot overlapping area.  相似文献   

2.
To accomplish an electrode patterning in large area, we present a high speed stitching technique used in an ultraviolet laser processing system and investigate the interaction between laser beams and indium tin oxide (ITO) thin films deposited on glass substrates. After optimizing the process parameters of the laser direct imaging (LDI) for the large-area electrode patterning, the ablated lines looked like regularly fish-scale marks of about a 40 μm diameter and a 120 nm depth around the processing path. The parameters includes the laser power of 1W, the scanning speed of galvanometers of 800 mm/s, and the laser pulse repetition frequency of 50 kHz. Moreover, the resistance value of the ablated ITO thin film is larger than 200MΩ that is electrically insulated from the other regions of electrode structure. LDI technology with UV laser beam has great potential applications in patterning on wafer or sapphire substrates and patterning a conductive layer deposited on the touch panels for semiconductor and optoelectric industries, respectively.  相似文献   

3.
Laser dry etching by a laser driven direct writing apparatus has been extensively used for the micro- and nano-patterning on the solid surface. The purpose of this study is to pattern the PEDOT:PSS thin film coated on the soda-lime glass substrates by a nano-second pulsed ultraviolet laser processing system. The patterned PEDOT:PSS film structure provides the electrical isolation and prevents the electrical contact from each region for capacitive touch screens. The surface morphology, geometric dimension, and edge quality of ablated area after the variety of laser patternings were measured by a 3D confocal laser scanning microscope. After the single pulse laser irradiation, the ablation threshold of the PEDOT:PSS film conducted by the nano-second pulsed UV laser was determined to be 0.135±0.003 J/cm2. The single pulse laser interacted region and the ablated line depth increased with increasing the laser fluence. Moreover, the inner line width of ablated PEDOT:PSS films along the patterned line path increased with increasing the laser fluence but the shoulder width increased with decreasing fluence, respectively. The clean, smooth, and straight ablated edges were accomplished after the electrode patterning with the laser fluence of 1.7 J/cm2 and 90 % overlapping rate.  相似文献   

4.
The beam of a nanosecond pulse laser tightly focused to a line was applied for the back-side ablation of the chromium thin film on a glass substrate. The stripe ablated with a single laser pulse had sharp edges on both sides and ridges of the melted metal around it. The partially overlapping pulses formed a wide cleaned area with a complicated structure made of the metal remaining from the ridges. Regular structures, ripples, were developed when laser fluence was slightly above the single-pulse removal threshold and the shift between pulses was less than half width of the line ablated with a single laser pulse. The ripples were located periodically (∼4 μm) and were orientated perpendicularly to the long axis of the beam spot. Their orientation did not depend on the laser beam polarization. Different models of the ripple formation in the thin metal film were considered, and instability of the moving vapor-liquid-solid contact line during evaporation of thin liquid films appears to be the most probable process responsible for the observed phenomena. Formation of regular gratings with the unlimited line length was experimentally implemented by using the above-mentioned technique.  相似文献   

5.
Maskless laser patterning of indium tin oxide (ITO) thin films was studied by the use of a diode-pumped Q-switched Nd:YLF laser. The ITO films were sputter-deposited either on lime glass, the standard substrate material for flat panel display applications, or fused quartz so that the efficiency of laser patterning as a function of substrate absorption could be studied. The laser wavelength was varied among infrared (5=1047 nm), visible (5=523 nm), and ultraviolet (5=349 nm and 5=262 nm). It is observed that strong light absorption by the substrate is a crucial requirement for a residue-free patterning of the ITO film. Observations and numerical calculations of the laser-induced surface temperature indicate that material removal occurs via thermal vaporization and that other mechanisms such as photochemical decomposition or spallation can be neglected.  相似文献   

6.
Steam laser patterning of thin films and/or solid surfaces has been studied by jetting a beam of steam, such as water vapor, onto a sample surface to form a thin liquid film on it and patterning the sample by laser etching along predetermined path. In steam laser patterning, bubbles are formed in a thin liquid film on a sample surface irradiated by a pulsed laser. When the collapsed shock wave generated at the moment of bubble collapse and the high-speed liquid jet formed during bubble collapse are strong enough, cavitation erosion of the sample surface takes place. Compared to dry laser patterning, the etching rate can be greatly enhanced and no shoulder-like structure is formed at the rim of the laser-irradiated spot in steam laser patterning due to this cavitation erosion effect. PACS 81.65.cf; 52.38.Mf; 79.20.Ds; 42.62.-b; 62.50.+p  相似文献   

7.
Selective laser patterning of thin films in a multilayer structure is an emerging technology for the fabrication of MEMS devices. A 775-nm Ti:sapphire laser (130 fs, 1 kHz) was used to irradiate thin-film stacks with variations in the process parameters, such as the pulse energy, feed rate, and numerical aperture of the objective lens. The two layers of the Au/Cr film have the same thickness, which is about 1000 nm. They were coated on a glass substrate. By SEM, an AFM and an optical surface profiler, we investigate the morphology of a pattern including the line width, groove depth, and laser-induced periodic surface structures (LIPSSs). The ablation depth was observed to depend on the pulse energy. In addition, from the energy spectrum, we find which layer was removed completely. The experimental results show that precise micromachining with a desired stability and reproducibility can be achieved by controlling the ablation energy and the feed rate. With a different energy and feed rate, we have processed the gating and the circle, which with the smooth cutting edge and groove was consistent with the beam spatial distribution.  相似文献   

8.
This study presents an alternative method for micron-resolution patterning of a sapphire surface utilizing the characteristic of an ultra-short pulse (10?15 s) from ytterbium (Yb) femtosecond laser (FS-laser) irradiation. Conventional processes often involve several steps, such as wet chemical or dry etching, for surface structuring of sapphire. In this study, two-dimensional array patterns on the sapphire surface with an area of 5×5 mm2 and a depth of 1.2±0.1 μm can be directly and easily fabricated by a single step of the FS-laser process, which involves 350-fs laser pulses with a wavelength of 517 nm at a repetition rate of 100 kHz. The measured ablation depths on the sapphire surface display that the proposed process can be under well-controlled conditions. Based on the design changes for being quickly implemented in the micromachining process, a FS laser can be a promising and competitive tool for patterning sapphire with an acceptable quality for industrial usage.  相似文献   

9.
Results are presented on the surface damage thresholds of ITO thin films induced by single- and multi-pulse laser irradiation at a pulse duration of 10 ps and a wavelength of 1064 nm. For multi-pulse ablation the incubation effect results in a reduction of the damage threshold, especially apparent at low pulse numbers and very small film thicknesses. The incubation effect attributes to the accumulation of defect sites and/or the storage of thermal stress-strain energy induced by the incident laser pulses. An incubation coefficient of S=0.82 has been obtained which is independent on the film thickness in the range of 10–100 nm. In practical applications, the incubation effect determines the laser patterning structure of ITO films while increasing the pulse overlapping rate. The width of the patterned line can be predicted by the proposed model involving the laser fluence, the overlapping rate and the incubation coefficient.  相似文献   

10.
Gabriel Kerner 《Surface science》2006,600(10):2091-2095
A weakly bound buffer material is structured on a surface by interfering low power laser beams, as a template for patterning metallic thin films deposited on top. The excess buffer material and metal layer are subsequently removed by a second uniform laser pulse. This laser pre-structured buffer layer assisted patterning procedure is demonstrated for gold layer forming a grating on a single crystal Ru(1 0 0) under UHV conditions, using Xe as the buffer material. Millimeters long, submicron (0.65 μm) wide wires can be obtained using laser wavelength of 1.064 μm with sharp edges of less than 30 nm, as determined by AFM. This method provides an all-in-vacuum metallic film patterning procedure at the submicron range, with the potential to be developed down to the nanometer scale upon decreasing the patterning laser wavelength down to the UV range.  相似文献   

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