Femtosecond laser microstructuring: an enabling tool for optofluidic lab‐on‐chips

This paper provides an overview of the rather new field concerning the applications of femtosecond laser microstructuring of glass to optofluidics. Femtosecond lasers have recently emerged as a powerful microfabrication tool due to their unique characteristics. On the one hand, they enable to induce a permanent refractive index increase, in a micrometer‐sized volume of the material, allowing single‐step, three‐dimensional fabrication of optical waveguides. On the other hand, femtosecond‐laser irradiation of fused silica followed by chemical etching enables the manufacturing of directly buried microfluidic channels. This opens the intriguing possibility of using a single laser system for the fabrication and three‐dimensional integration of optofluidic devices. This paper will review the state of the art of femtosecond laser fabrication of optical waveguides and microfluidic channels, as well as their integration for high sensitivity detection of biomolecules and for cell manipulation.     

Three-dimensional microfluidic channel with arbitrary length and configuration fabricated inside glass by femtosecond laser direct writing

We demonstrate, for the first time to the best of our knowledge, fabrication of three-dimensional microfluidic channels with arbitrary lengths and configurations inside glass by femtosecond laser direct writing. The main fabrication process includes two steps: (1) direct formation of hollow microchannels in a porous glass substrate immersed in water by femtosecond laser ablation and (2) postannealing of the glass substrate at ～1150°C by which the porous glass can be consolidated. We show that a square-wavelike channel with a total length of ～1.4 cm and a diameter of ～64 μm can be easily produced ～250 μm beneath the glass surface.     

Three-dimensional opto-fluidic devices fabricated by ultrashort laser pulses for high throughput single cell detection and processing

Three-dimensional flow-through microchannels were fabricated inside bulk fused silica glass via ultrashort pulsed laser direct writing. The device fabrication sequence takes advantage of the nonlinear volumetric absorption in glass and the subsequent preferential chemical etching process. Optical waveguides were also written into the glass specimen and integrated with the fluidic conduits. Flow tests using both fluorescent particles and red blood cells (RBCs) were conducted on various three-dimensional channel configurations. Experiments showed the possibility for laser-induced cell processing inside the microchannels. To evaluate cytometer functionality, RBCs were detected inside the manufactured microchannel via both transmission and fluorescence probing.     

Three-dimensional hole drilling of silica glass from the rear surface with femtosecond laser pulses

By moving silica glass in a preprogrammed structure, we directly produced three-dimensional holes with femtosecond laser pulses in single step. When distilled water was introduced into a hole drilled from the rear surface of the glass, the effects of blocking and redeposition of ablated material were greatly reduced and the aspect ratio of the depth of the hole was increased. Straight holes of 4-mu;m diameter were more than 200 microm deep. Three-dimensional channels can be micromachined inside transparent materials by use of this method, as we have demonstrated by drilling a square-wave-shaped hole inside silica glass.     

Void recording in silica

We report on the formation of voids of 200–300 nm in diameter by single femtosecond pulses (800 nm/150 fs/ <100 nJ) inside silica glass. The mechanism of void formation can be understood in terms of dielectric breakdown and shock wave formation. The voids were recorded below the threshold of self-focusing. Diffraction efficiency of gratings recorded by arranging voids into a pattern of open core channels have shown an interesting tendency of an increasing efficiency for the first five diffraction orders. It is demonstrated by numerical simulation using the finite difference time domain (FDTD) algorithm that such anomalous diffraction is indeed caused by empty core channels surrounded by densified shells inside silica. PACS 81.40.-z; 62.50.+p; 81.07.-b; 47.40.Nm     

Effect of boron concentration on the UV photosensitivity of silica glass film for planar lightwave circuit

The photosensitivity dynamics in SiO₂ glass with a composition similar to that of silica planar lightwave circuit (PLC) devices was investigated as a fundamental study prior to device fabrication. Silica bulk glasses with similar composition to the core layer of PLC devices were prepared with various concentrations of B₂O₃. The photosensitivity in boron and germanium co-doped amorphous SiO₂ yields a refractive index change Δn as high as 10⁻³ after irradiation with a KrF UV laser beam. The index modulation disappeared after thermal annealing. The result of annealing experiment and UV absorption/Raman spectra revealed that the molar volume change by UV irradiation is responsible for the index variation in the material.     

Tunable narrowband filter based on a combination of Fabry-Perot etalon and volume Bragg grating

A new type of tunable narrowband filter is proposed. This filter is a combination of a Fabry-Perot etalon, which permits the selection of a comb of discrete narrow bands, and a high-efficiency rotating volume Bragg grating recorded in photo-thermo-refractive glass, which permits tuning between the Fabry-Perot resonances. A tunable filter for fixed wavelengths in the region of 1.5 mum with a spectral width of 220 pm (FWHM), separation between channels of 800 pm, and throughput of 95% (losses <0.2 dB) is demonstrated.     

Fabrication of Micro -Optical Devices by a Femtosecond Laser

Femtosecond laser is a perfect laser source for materials processing when high accuracy and small structure size are required. Due to the ultra short interaction time and the high peak power, the process is generally characterized by the absence of heat diffusion and, consequently molten layers. Various induced structures have been observed in materials after the femtosecond laser irradiation. Here, we report on fabrication of micro-optical devices by the femtosecond laser. 1) formation of optical waveguide with internal loss less than 0.5dB/cm in the wavelength region from 1.2 to 1.6 mm, by translating a silica glass perpendicular to the axis of the focused femtosecond laser beam; 2) nano-scale valence state manipulation of active ions inside transparent materials; 3) space-selective precipitation and control of metal nanoparticles inside transparent materials; The mechanisms and applications of the femtosecond laser induced phenomena were also discussed.     

The fabrication of 3-D nanostructures by a low- voltage EBL

Three-dimensional (3-D) structures are used in many applications, including the fabrication of opto-electronic and bio-MEMS devices. Among the various fabrication techniques available for 3-D structures, nano imprint lithography (NIL) is preferred for producing nanoscale 3-D patterns because of its simplicity, relatively short processing time, and high manufacturing precision. For efficient replication in NIL, a precise 3-D stamp must be used as an imprinting tool. Hence, we attempted the fabrication of original 3-D master molds by low-voltage electron beam lithography (EBL). We then fabricated polydimethylsiloxane (PDMS) stamps from the original 3-D mold via replica molding with ultrasonic vibration.First, we experimentally analyzed the characteristics of low-voltage EBL in terms of various parameters such as resist thickness, acceleration voltage, aperture size, and baking temperature. From these e-beam exposure experiments, we found that the exposure depth and width were almost saturated at 3 kV or lesser, even when the electron dosage was increased. This allowed for the fabrication of various stepped 3-D nanostructures at a low voltage. In addition, by using line-dose EBL, V-groove patterns could be fabricated on a cured electron resist (ER) at a low voltage and low baking temperature. Finally, the depth variation could be controlled to within 10 nm through superposition exposure at 1 kV. From these results, we determined the optimum electron beam exposure conditions for the fabrication of various 3-D structures on ERs by low-voltage EBL. We then fabricated PDMS stamps via the replica molding process.     

Rapid micromachining of high aspect ratio holes in fused silica glass by high repetition rate picosecond laser

We present multiple methods of high aspect ratio hole drilling in fused silica glass, taking advantage of high power and high repetition rate picosecond lasers and flexible beam delivery methods to excise deep holes with minimal collateral damage. Combinations of static and synchronous scanning of laser focus were explored over a range of laser repetition rates and burst-train profiles that dramatically vary laser plume interaction dynamics, heat-affected zone, and heat accumulation physics. Chemically assisted etching of picosecond laser modification tracks are also presented as an extension from femtosecond laser writing of volume nanograting to form high aspect ratio (77) channels. Processing windows are identified for the various beam delivery methods that optimize the laser exposure over energy, wavelength, and repetition rate to reduce microcracking and deleterious heating effects. The results show the benefits of femtosecond laser interactions in glass extend into the picosecond domain, where the attributes of higher power further yield wide processing windows and significantly faster fabrication speed. High aspect ratio holes of 400 μm depth were formed over widely varying rates of 333 holes per second for mildly cracked holes in static-focal positioning through to one hole per second for low-damage and taper free holes in synchronous scanning.     

Flexible 3D deep microstructures of silica glass by laser-induced backside wet etching

The well-controlled fabrication of microtrenches including inclined features using normal incidence with gradual shifting of the irradiated area was demonstrated. Based on the variation of trench width depending on the laser fluence, the existence of gaps between the edge of the irradiated area and sidewall of the trench was shown. Because of these gaps, the shifted laser pulse can stay at the bottom of the trenches in the fabrication of the inclined features. In laser-induced backside wet etching (LIBWE), the photo-activated region generated within organic solution would act on the glass surface and results in etching. It was indicated that the photo-activated region generated at the bottom of the trenches acted not only on the bottom of the trench but also on the sidewalls. Based on such etching of the sidewall, fabrication of inclined features becomes possible. In this method, the tilting angle can be changed within one deep trench. Flexible structure formation deep inside the silica glass can be achieved.     

Photosensitive, all-glass AgPO3/silicaphotonic bandgap fiber

Photonic bandgap (PBG) guidance is observed in a solid core photonic crystal fiber (PCF) consisting of silver metaphosphate (AgPO(3)) glass embedded into a silica cladding, realized by vacuum-assisted infiltration of the molten glass into the hollow channels of a commercial silica PCF. Morphologic analysis of the cladding microstructure by optical and scanning electron microscopy reveals the formation of highly homogeneous glass strands along the PCF length. The characteristic transmission spectrum of the fiber shows PBG guidance in the range between 350 and 1650 nm. The exposure of the cladding glass matrix, using 355 nm, 150 ps laser irradiation, allows photo-induced enhancement of the transmission-to-stop-band extinction ratio by ～60 dB/cm and bandwidth tuning. Numerical calculations of the transmission pattern of the fabricated AgPO(3)/silica bandgap fiber are in good agreement with experiments.     

In situ observation of photoinduced refractive-index changes in filaments formed in glasses by femtosecond laser pulses

We investigated the relationship between the formation of filaments and local refractive-index changes induced by femtosecond laser pulses in silica glass. In situ observation revealed that the location of a filament coincided with that of the refractive-index change. Observation also showed that the region of refractive-index change was elongated toward the upstream direction of the laser pulses with increasing exposure time. The region of refractive-index change was several hundred micrometers long, and its diameter was smaller than 2 mum. The refractive-index change was confirmed by two of three different methods to be as large as 0.8 x 10(-2).     

Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

We investigate the use of infrared femtosecond laser pulses to induce highly localized refractive-index changes in fused-silica glasses. We characterize the magnitude of the change as a function of exposure and measure index changes as large as 3x10(-3) and 5x10(-3) in pure fused silica and boron-doped silica, respectively. The potential of this technique for writing three-dimensional photonic structures in bulk glasses is demonstrated by the fabrication of a Y coupler within a sample of pure fused silica.     

Modification of the fused silica glass network associated with waveguide fabrication using femtosecond laser pulses

Atomic-scale structural changes have been observed in the glass network of fused silica after modification by tightly focused 800-nm, 130-fs laser pulses at fluences between 5 and 200 J cm^-2. Raman spectroscopy of the modified glass shows an increase in the 490 and 605-cm^-1 peaks, indicating an increase in the number of 4- and 3-membered ring structures in the silica network. These results provide evidence that densification of the glass occurs after exposure to fs pulses. Fluorescence spectroscopy of the modified glass shows a broad fluorescence band at 630 nm, indicating the formation of non-bridging oxygen hole centers (NBOHC) by fs pulses. Waveguides that support the fundamental mode at 633 nm have been fabricated inside fused silica by scanning the glass along the fs laser beam axis. The index changes are estimated to be approximately 0.07×10^-3. Received: 17 December 2001 / Accepted: 9 July 2002 / Published online: 25 October 2002 RID="*" ID="*"Corresponding author. Fax: +1-925/423-2463, E-mail: dmkrol@ucdavis.edu     

Structural changes in fused silica after exposure to focused femtosecond laser pulses

Using in situ Raman scattering in a confocal microscopy setup, we have observed changes in the network structure of fused silica after modifying regions inside the glass with tightly focused 800-nm 130-fs laser pulses at fluences of 5-200 J cm(-2). The Raman spectra show a large increase in the peaks at 490 and 605cm(-1), owing to 4- and 3-membered ring structures in the silica network, indicating that densification occurs after exposure to the femtosecond laser pulses. The results are consistent with the formation of a localized plasma by the laser pulse and a subsequent microexplosion inside the glass.     

A microfluidic chip integrated with a microoptical lens fabricated by femtosecond laser micromachining

We report on the integration of microlens and microfluidic channels in fused silica glass chip using femtosecond laser micromachining. The main process includes three procedures: (1) femtosecond laser scanning for forming a hemispherical surface and a Y-shaped channel in the fused silica glass; (2) chemical etching of the sample for removal of the modified areas; and (3) oxyhydrogen (OH) flame polish for smoothening the surface of the microlens. In addition, we demonstrate that the fabricated microlens exhibits good imaging performance with a 5× magnification, showing great potential in future lab-on-a-chip applications.     

Planar defects in three-dimensional chalcogenide glass photonic crystals

Here we report on the direct laser writing fabrication of Fabry-Perot-type planar microcavities in a three-dimensional (3D) photonic crystal (PhC) embedded within a high-refractive nonlinear chalcogenide glass (ChG) film. The fabricated planar microcavities in a nonlinear ChG 3D PhC facilitate the observation of resonant modes inside the stop gap. The experimental results show that the length of the planar cavity can be well controlled by the fabrication power and thus be used to tune the defect modes. The tunability of the observed defect modes is confirmed by the theoretical prediction.     

强飞秒激光烧蚀石英玻璃的超快时间分辨光学诊断

采用超快时间分辨的光学诊断技术对飞秒激光脉冲烧蚀石英玻璃的动态过程进行了实验研究.首先,对烧蚀过程中石英玻璃外部的物质喷射进行了数字全息记录,获得了不同延迟时间下探测光的二维相位差分布图,并由此推断出了喷射物的成分和结构.此外,对石英玻璃内部的现象进行了时间分辨阴影图记录,从阴影图中观察到了石英玻璃内部的两个应力波的演化过程.这两个应力波与目标靶外部的两次物质喷射相关. 关键词： 脉冲数字全息 飞秒激光烧蚀 超快时间分辨 应力波