多层结构双自旋过滤隧道结中的电子输运特性

在转移矩阵方法及Mireles和Kirczenow的量子相干输运理论的基础上,研究了正常金属层/磁性半导体层/非磁绝缘层/磁性半导体层/正常金属层型双自旋过滤隧道结中Rashba自旋轨道耦合效应和自旋过滤效应对自旋相关输运的影响.讨论了隧穿磁电阻（TMR）、隧穿电导与各材料层厚度、Rashba自旋轨道耦合强度以及两磁性半导体中磁矩的相对夹角θ之间的关系.研究表明：含磁性半导体层的双自旋过滤隧道结由于磁性半导体层的自旋过滤效应和Rashba自旋轨道耦合作用可获得极大的TMR值.另外TMR和隧穿电导随着Rashba自旋轨道耦合强度的变化而振荡,振荡周期随Rashba自旋轨道耦合强度的增大逐渐减小. 关键词： 双自旋过滤隧道结 Rashba自旋轨道耦合 隧穿磁电阻 隧穿电导     

双自旋过滤隧道结中的隧穿时间

基于自由电子近似和Winful的隧穿时间模型,研究了普通金属/自旋过滤层/非磁绝缘层/自旋过滤层/普通金属(NM/SF/I/SF/NM)双自旋过滤隧道结中自旋相关的居留时间(dwell time)和相位时间(phase time).分别以居留时间和相位时间随入射电子能量、势垒高度和势垒宽度、以及分子场大小的变化情况做了讨论.计算结果表明:在低能隧穿区域(入射电子的能量小于势垒高度),由于自旋相关的自相干项的影响,不同自旋方向电子的相位时间总是大于居留时间;在高能隧穿区域(入射电子的能量大于势垒高度),自旋相关的自相干项的影响减小,不同自旋方向电子的相位时间和于居留时间趋于一致.NM/SF/I/SF/NM双自旋过滤隧道结中的居留时间和相位时间基本不受非磁绝缘层势垒高度和宽度变化的影响,该现象不同于常规的铁磁金属/非磁绝缘层/铁磁金属(FM/I/FM)隧道结.但当非磁绝缘层势垒高度低于自旋过滤层势垒高度时,改变非磁绝缘层的势垒高度和宽度会使居留时间和相位时间出现相峰值,该峰值的出现与不同自旋方向电子的共振隧穿有关.自旋过滤层的势垒高度的变化对NM/SF/I/SF/NM双自旋过滤隧道结中的居留时间和相位时间影响大,但宽度变化的影响较小.自旋过滤层中分子场的变化对不同自旋方向的电子的居留时间和相位时间有明显影响,且上自旋电子的居留时间和相位时间随分子场的增大而减少,而下自旋电子的情况刚好相反.     

第五讲 自旋极化输运及隧道巨磁电阻效应

简要回顾了利用量子隧道效应测定铁磁金属传导电子自旋极化率的研究历史，综述了自旋极化电子隧穿产应导致的“铁磁金属／非磁绝缘体／铁磁金属”三层平面型隧道结中的巨磁电阻效应以及“铁磁金属／非磁绝缘体”颗粒膜系统中的隧穿类型巨磁电阻效应的研究进展。     

双势垒磁性隧道结的磁电阻效应及其在自旋晶体管中的应用

利用磁控溅射方法沉积双势垒磁性隧道结多层膜, 其中Al-O势垒层由等离子体氧化1 nm厚的 金属铝膜方式制备，然后采用深紫外光曝光和Ar离子刻蚀技术、微加工制备出长短轴分别为 6和3 μm大小的椭圆形双势垒磁性隧道结（DBMTJ），并在室温和低温下对其自旋电子输运 特性进行了研究. DBMTJ的隧穿磁电阻(TMR)比值在室温和42 K分别达到27％和423％， 结电阻分别为136 kΩ·μm²和175 kΩ·μm²，并在实验中观 察到平行状 态下存在低电阻态及共振隧穿效应，反平行态下呈现高电阻态以及TMR随外加偏压或直流电 流的增加而发生振荡现象. 由此，设计了一种基于这种双势垒磁性隧道结隧穿特性的自旋晶 体管. 关键词： 双势垒磁性隧道结 隧穿磁电阻 共振隧穿效应 自旋晶体管     

磁电子学讲座 第五讲 自旋极化输运及隧道巨磁电阻效应

简要回顾了利用量子隧道效应测定铁磁金属传导电子自旋极化率的研究历史．综述了自旋极化电子隧穿效应导致的“铁磁金属／非磁绝缘体／铁磁金属”三层平面型隧道结（简称ＦＭ／Ｉ／ＦＭ隧道结）中的巨磁电阻效应以及“铁磁金属／非磁绝缘体”颗粒膜系统中的隧穿类型巨磁电阻效应的研究进展．     

双势垒抛物势阱磁性隧道结隧穿磁阻及自旋输运性质的研究

采用相干量子输运理论和传递矩阵的方法,在抛物势阱磁性隧道结(F/PW/F)的铁磁和半导体势阱间插入另一种半导体作为势垒,构造具有双势垒的抛物势阱磁性隧道结作为研究对象,研究了抛物势阱宽度、自旋轨道耦合效应、角度效应及插入势垒厚度对隧穿磁阻及自旋输运性质的影响计算结果表明,通过适当调节Rashba自旋轨道藕合强度和插入势垒的厚度,可以实现隧穿磁阻(TMR)的调制,能获得较大的TMR值,这些特点有助于促进新型磁性隧道结的开发和应用.     

对称抛物势阱磁性隧道结中的自旋输运及磁电阻效应

研究了两端具有铁磁接触的对称抛物势阱磁性隧道结(F/SPW/F)中自旋相关的隧穿概率和隧穿磁电阻,讨论了量子尺寸效应和Rashba 自旋轨道耦合作用对自旋极化输运特性的影响.研究结果表明:隧穿概率和隧穿磁电阻随抛物势阱宽度的增加发生周期性的振荡.抛物势阱深度的增加减小了隧穿概率和隧穿磁电阻的振荡频率.Rashba 自旋轨道耦合强度的增加加大了隧穿概率和隧穿磁电阻的振荡频率.隧穿概率和隧穿磁电阻的振幅和峰谷比强烈依赖于两铁磁电极中磁化方向的夹角. 关键词： 磁性隧道结 Rashba 自旋轨道耦合 隧穿概率 隧穿磁电阻     

磁量子结构中二维自旋电子的隧穿输运

研究了零偏压和偏置电压作用下磁量子结构中自旋电子的隧穿输运性质. 结果表明电子自旋 输运的性质不仅取决于磁量子结构的构型、入射电子的能量和波矢, 而且取决于偏置电压. 在零偏压下, 由等同的磁垒磁阱构成的磁量子结构不具有自旋过滤的特点, 而由不等同的磁 垒磁阱构成的磁量子结构却具有较好的自旋过滤特点. 偏置电压极大地改变了磁量子结构中 电子的极化程度, 使得电子隧穿等同的磁垒磁阱构成的磁量子结构的输运性质也显著地依赖 于电子的自旋指向. 关键词： 磁量子结构 自旋电子 隧穿输运 自旋极化     

磁性隧道结自旋极化电子的隧穿特性

铁磁金属间通过中间层的自旋极化电子隧穿产生的磁性耦合,在自旋电子器件中有许多潜在的应用.考虑由一平面磁性势垒层隔开的两铁磁性金属电极构成的磁性隧道结,针对中间层形成的矩形势垒,在近自由电子模型的基础上,计算零偏压下的隧穿电导、自旋极化率和隧穿磁阻比率,分析势垒层特性、分子场强弱、分子场相对取向等对隧道结自旋极化电子隧穿特性的影响.计算结果对自旋电子器件的设计具有一定的指导意义.     

自旋电子学材料、物理和器件设计原理的研究进展

文章介绍了作者所在实验室在巨磁电阻(GMR)、隧穿磁电阻(TMR)、庞磁电阻(CMR)和反铁磁钉扎薄膜材料以及单晶金属氧化物、高自旋极化率材料、P-N异质结和纳米环磁随机存储器原理型演示器件设计等研究方面取得的一些重要研究成果和进展.例如:在Al-O势垒磁性隧道结材料体系里,获得室温磁电阻超过80%的国际最好结果;获得两种高性能层状反铁磁钉扎材料体系;发现具有大的电致电阻效应的CMR薄膜材料,并可期望用于电流直接进行磁信息写和读操作的磁存储介质;发现双势垒磁性隧道结中的量子阱态共振隧穿和磁电阻振荡效应,以及纳米器件体系中自旋翻转长度的观测新方法,可用于新型自旋电子学材料及相关器件的人工辅助设计;利用电子自旋共振谱探测和研究了金属氧化物的微观自旋结构和各向异性;在[CoFe/Pt]n磁性金属多层膜中,观测到超高灵敏度的反常霍尔效应;利用纳米环状磁性隧道结作为存储单元,研制出一种新型纳米环磁随机存储器MRAM原理型演示器件.     

Tunneling magnetoresistance of the double spin-filter junctions at nonzero bias

A recent theoretical estimation indicated that the NM/FI/FI/NM double spin-filter junction (DSFJ, here the NM and FI represent the nonmagnetic electrode and the ferromagnetic insulator (semiconductor) spacer, respectively) could have very high tunneling magnetoresistance (TMR) at zero bias. To meet the requirement in research and application of the magnetoresistance devices, we have calculated the dependences of tunneling magnetoresistance of DSFJ on the bias (voltage), the thicknesses of ferromagnetic insulators (semiconductors) and the average barrier height. Our results show that except its very high value, the TMR of DSFJ does not decrease monotonously and rapidly with rising bias, but increase slowly at first and decrease then after having reached a maximum value. This feature is in distinct contrast to the ordinary magnetic tunnel junction FM/NI/FM (FM and NI denote the ferromagnetic electrode and the nonmagnetic insulator (semiconductor) spacer, respectively), and is of benefit to the use of DSFJ as a magnetoresistance device.     

The effect of the ferromagnetic metal layer on tunnelling conductance and magnetoresistance in double magnetic planar junctioins

Based on the free-electron approximation,we investigate the effect of the ferromagnetic metal layer on the tunnelling magnetoresistance(TMR) and tunnelling conductance(TC)in the double magnetic tunnel junctions(DMTJs) of the structure NM/FM/I(S)/NM/I(S)/FM/NM,where FM,NM and I(S) represent the ferromagnetic metal,nonmagetic metal and insulator(Semiconductor),respectively,The FM,I(S)and inner NM layers are of finite thickness,while the thickness of the outer NM layer is infinite.The calculated results show that,due to the spin-dependent interfacial potential barriers caused by electronic band mismatch between the various magnetic and nonmagnetic layers,the dependences of the TMR and TC on the thicknesses of the FM layers exhibit oscillations,and a much higher TMR can be obtained for suitable thicknesses of FM layers.     

Possible mechanism for tunneling magnetoresistance in La0.9Ba0.1MnO3/Nb-doped SrTiO3 p-n junctions

The observed tunneling magnetoresistance (TMR) effect in La_0.9Ba_0.1MnO₃ (LBMO)/Nb-doped SrTiO₃ (Nb-STO) p⁺-n junctions is investigated and a possible mechanism responsible for the TMR generation is proposed by taking into account the dynamic spin accumulation and paramagnetic magnetization in the Nb-STO layer. Because of carrier diffusion across the dynamic domain boundaries in the Nb-STO layer and spin disordering in the LBMO layer, the tunneling resistance through the junction is high at zero magnetic field. The spin disordering is suppressed upon applying a non-zero magnetic field, which results in the spin-polarized tunneling in this ferromagnetic/depletion layer/dynamic ferromagnetic sandwiched structure and thus the observed TMR effect. The dependence of the TMR effect on the domain size in the LBMO layer, the tunneling current and temperature as well is explained, qualitatively consistent with the experimental observation.     

磁性多层膜的巨磁电阻随铁磁和非磁层厚度变化的唯象理论计算

根据唯象理论，并采用以铁磁─非磁混合层代替铁磁／非磁层界面的理论方法，计算了Ｆｅ／Ｃｒ多层膜的巨磁电阻随铁磁和非磁层厚度的变化关系与实验结果做了比较，发现它们符合得较好．还绘出了巨磁电阻随铁磁和非磁层厚度变化的二元函数图 关键词：     

Quantum modulation effect in a graphene-based magnetic tunnel junction

The electronic (quantum) transport in a NG/F_B/FG tunnel junction (where NG, F_B and FG are a normal graphene layer, a ferromagnetic barrier connected to a gate and a ferromagnetic graphene layer, respectively) is investigated. The motions of the electrons in the graphene layers are taken to be governed by the Dirac Equation. Parallel (P) and antiparallel alignment (AP) of the magnetizations in the barrier and in the ferromagnetic graphene are considered. Our work focuses on the oscillation of the electrical conductance (Gq), of the spin conductance (Gs) and of the tunneling magneto resistance (TMR) of this magnetic tunnel junction. We find that, the quantum modulation due to the effect of the exchange field in F_B will be seen in the plots the conductance and of the TMR as functions of the thickness of ferromagnetic barrier (L). The period of two multiplied sinusoidal terms of the modulation are seen to be controlled by varying the gate potential and the exchange field of the F_B layer. The phenomenon, a quantum beating, is built up with two oscillating spin conductance components which have different periods of oscillation related to the splitting of Dirac's energies in the F_B region. The amplitudes of oscillations of Gq, Gs and TMR are not seen to decrease as the thickness increases. The decaying behaviors seen in the conventional transport through an insulator do not appear.     

TUNNEL MAGNETORESISTANCE IN THE FERROMAGNETIC TUNNEL JUNCTION WITH FERROMAGNETIC LAYERS OF FINITE THICKNESS SUBJECTED TO AN ELECTRIC FIELD

Based on the two-band model, we investigate the tunnel magnetoresistance(TMR) in ferromagnet/insulator (semiconductor)/ferromagnet(FM/I(S)/FM) tunnel junction covered on both sides by nonmagnetic metal layers subjected to an electric field. Our results show that TMR oscillates with the thickness of ferromagnetic layers owing to the quantum-size effect and can reach very large value under suitable conditions, which may in general not be reached in FM/I(S)/FM with infinitely thick ferromagnetic layer. Although the electric field causes the change of the oscillation period, phase and amplitude of the TMR, a large TMR is still obtained in some situations with the electric field. Furthermore, the electric field does not change the feature that TMR varies monotonously with the change of magnetization angle of the middle ferromagnetic layer.     

Electrical control of valley and spin polarized current and tunneling magnetoresistance in a silicene-based magnetic tunnel junction

We investigate the electronic transport in a silicene-based ferromagnetic metal/ferromagnetic insulator/ferromagnetic metal tunnel junction. The results show that the valley and spin transports are strongly dependent on local application of a vertical electric field and effective magnetization configurations of the ferromagnetic layers. In particular, it is found that the fully valley and spin polarized currents can be realized by tuning the external electric field. Furthermore, we also demonstrate that the tunneling magnetoresistance ratio in such a full magnetic junction of silicene is very sensitive to the electric field modulation.     

Universal behaviors of magnon-mediated spin transport in disordered nonmagnetic metal-ferromagnetic insulator heterostructures

We numerically investigate magnon-mediated spin transport through nonmagnetic metal/ferromagnetic insulator (NM/FI) heterostructures in the presence of Anderson disorder, and discover universal behaviors of the spin conductance in both one-dimensional (1D) and 2D systems. In the localized regime, the variance of logarithmic spin conductance σ²(lnG_T) shows a universal linear scaling with its average ⟨lnG_T⟩, independent of Fermi energy, temperature, and system size in both 1D and 2D cases. In 2D, the competition between disorder-enhanced density of states at the NM/FI interface and disorder-suppressed spin transport leads to a non-monotonic dependence of average spin conductance on the disorder strength. As a result, in the metallic regime, average spin conductance is enhanced by disorder, and a new linear scaling between spin conductance fluctuation rms(G_T) and average spin conductance G_T is revealed which is universal at large system width. These universal scaling behaviors suggest that spin transport mediated by magnon in disordered 2D NM/FI systems belongs to a new universality class, different from that of charge conductance in 2D normal metal systems.     

Magnetoresistance in the ferromagnet/insulator/ferromagnet tunnel junction

Recently experiments and theories show that the tunnel magnetoresistance （TMR） does not only depend on the ferromagnetic metal electrodes but also on the insulator. Considering the rough-scattering effect and spin-flip effect in the insulator, this paper investigates the TMR ratio in a ferromagnet/insulator/ferromagnet （FM/I/FM） tunnelling junction by using Slonczewsik＇s model. A more general expression of TMR ratio as a function of barrier height, interface roughness and spin-flip effect is obtained. In lower barrier case, it shows that the TMR ratio depends on the roughscattering effect and spin-flip effect.