蓝光发射多孔硅RTO过程中的尺寸分离效应

对用水热腐蚀技术制备的、具有蓝光发射的多孔硅样品在快速热氧化(RTO)处理前后其光致发光谱、硅纳米颗粒的大小及尺寸分布变化进行了研究.实验发现,新鲜多孔硅样品经过RTO处理后,其光致发光谱整体蓝移并由单发光峰分裂为两个发光峰;与此对应,样品中的硅纳米颗粒在整体减小的同时出现尺寸分离现象.这一结果表明,多孔硅中的短波长发射也具有强烈的尺寸相关性. 关键词：     

多孔硅蓝光发射与发光机制

在制备出光致发光能量为２．７ｅＶ的发射蓝光多孔硅的基础上对它进行了较系统的研究：测量了它的光致发光时间分辨光谱，用傅里叶交换红外光谱分析了其表面吸附原子的局域振动模，研究了γ射线辐照对其发光的影响，并与发红、黄光的多孔硅作了对比，通过空气中长期存放、激光和紫外线照射的方法，研究了光致发光峰能量为２．７ｅＶ的多孔硅发光稳定性．我们及其它文献中报道的多孔硅蓝光发射的实验结果与量子限制模型矛盾，但能用量子限制／发光中心模型解释．我们认为多孔硅的２．７ｅＶ发光是多孔硅中包裹纳米硅的ＳｉＯ_x层中某种特征发光中心引起的． 关键词：     

激光辅助阳极化制备多孔硅的蓝光发射与红外研究

发现由n型单晶硅光照辅助阳极化制备的多孔硅在经过较长时间室温空气中放置氧化后，部分样品出现了蓝色光致荧光.荧光及红外透射、反射测量表明，在较强的氩离子488nm激光照射下制备的样品，经放置氧化后形成氧化层的组织较好，即氧化层中的应力较小、非晶程度相对较低、Si-O-Si的网络结构比较完整.而这样的氧化层是有利于多孔硅光致荧光中的蓝光发射的. 关键词：     

多孔氧化硅薄膜阴极射线谱的研究

采用近常压下等离子体增强化学气相沉积的方法制备得到多孔氧化硅薄膜,并在沉积区域加载偏压对薄膜形貌和性质进行调制。扫描电镜显示偏压条件下沉积的薄膜更加蓬松多孔,常温下阴极射线谱表明:增大偏压的占空比,CL谱中发光峰的位置并不改变,但谱线强度增大。发光峰的位置说明薄膜中的主要成分是Si-O-Si基团,且该种基团以非桥键的形式存在,薄膜中还存在少量的Si-H键,这与红外光谱测试结果一致。X射线衍射结果表明薄膜中的SiO2是非晶态的。     

新型硅基蓝光材料—多孔β—SiC

硅基蓝光发射是集成化全色固态显示和光电子集成的基础材料，是发光材料研究的前沿课题。利用离子注入技术，将碳离子注入到硅中，直接形成硅基纳β－ＳｉＣ，多孔化后，由于量子限制效应，它将发射稳定的蓝光，并且可以直接制成发光图形，这是一种具有极好应用前景的硅基蓝光发射材料。     

多孔硅中的1.54μm光发射

本文报道了利用离子注入技术制备多孔硅中Er³⁺的1.54μm光发射发光材料的实验,并对样品的低温光致发光特性进行了实验研究。实验表明多孔硅中的Er³⁺发光与单晶硅中的Er³⁺发光(同样注入条件,退火工艺制备)相比,发光强度有成数量级的提高,同时发光峰更宽,伴线更丰富。     

离子注入对多孔硅可见光发射特性的影响

本文在前期对多孔硅发光机理研究的基础上,研究了离子注入对多孔硅光致发光的影响.实验表明离子注入除了可以降低多孔硅光致发光的强度外,还将使多孔硅的光致发光光谱谱峰产生蓝移、半高宽展宽,并在多孔硅发光谱带中产生一些发光减弱区和次峰结构.文中最后对实验现象做了解释.     

C-ZnSe:Ga的室温蓝色注入式发光

本文首次报导了C-ZnSe:Ga的室温蓝色注入式发光,测量了有关特性并讨论了发光机理.电致发光光谱具有强的4800A的蓝峰和弱的6300A的红峰.随着正向电压的增加,6300A的自激活发射相对减弱,而4800A的蓝色边缘发射逐渐增强.因此,当电压增加时,发光颜色由红色经黄色和绿色,逐渐变成纯蓝色.在明亮的房间里可以观察到鲜明的蓝色发射.文末提出了ZrSe多色显示的设想.     

nc-Si/SiO2多层膜的制备及蓝光发射

在等离子体增强化学气相淀积(PECVD)系统中，采用a-Si∶H层淀积与原位等离子体氧化相结合的逐层生长的方法成功制备出a-Si∶H/SiO2多层膜 (ML)；利用限制性结晶原理通过两步退火处理使a-Si∶H层晶化获得尺寸可控的nc-Si/SiO2 ML，并观察到室温下的蓝光发射；结合Raman散射和剖面透射电子显微镜技术分析了nc-Si/SiO2 ML的结构特性；通过对晶化样品光致发光谱和紫外-可见光吸收谱的研究，探讨了蓝光发射的起源. 关键词： 纳米硅多层膜 等离子体氧化 蓝光发射 热退火     

多孔硅光致发光峰半峰全宽的压缩

硅发光对于在单一硅片上实现光电集成是至关重要的.目前已有的使硅产生发光的方法有:掺杂深能级杂质、掺稀土离子、多孔硅、纳米硅以及Si/SiO₂超晶格.声空化所引发的特殊的物理、化学环境为制备光致发光多孔硅薄膜提供了一条重要的途径.实验表明,声化学处理对于改善多孔硅的微结构,提高发光效率和发光稳定性都是一项非常有效的技术.超声波加强阳极电化学腐蚀制备发光多孔硅薄膜,比目前通用的常规方法制备的样品显示出更优良的性质.这种超声波的化学效应源于声空化,即腐蚀液中气泡的形成、生长和急剧崩溃.在多孔硅的腐蚀过程中,由于超声波的作用增加了孔中氢气泡的逸出比率和塌缩,有利于孔沿垂直方向的腐蚀,使多孔硅光致发光峰的半峰全宽压缩到了3.8nm.     

台湾蓝玉髓的振动光谱表征

蓝玉髓是中国台湾所产的名贵宝石之一,素有"台湾蓝宝"的美誉.文章通过红外吸收光谱和激光拉曼光谱,对不同颜色及质地的台湾蓝玉髓的振动光谱特征进行了研究.结果表明,台湾蓝玉髓均显示典型的石英质玉石的振动光谱特征.其红外吸收光谱主要表现为:1 250～1 110 cm-1为最强吸收区,属Si-O非对称伸缩振动,800～600 cm-1间中等强度的吸收窄带,由Si-O-Si对称伸缩振动致,Si-O弯曲振动位于600～300 cm-1内.台湾蓝玉髓样品的激光拉曼光谱散射峰主要分布在499 cm-1,464 cm-1和214～208cm-1处,分别归属为"Moganite"石英中的Si-O对称弯曲振动、Si-O弯曲振动和[SiO4]的旋转振动或平移振动.     

一种多层白色磷光有机电致发光器件的制备及性能研究

制备了一种结构为ITO/NPB/NPB:Ir(piq)₂(acac)/CBP:TBPe/BAlq:rubrene/BAlq/Alq₃/Mg:Ag的白色磷光有机电致发光器件.其中空穴传输型主体NPB掺杂磷光染料Ir(piq)₂(acac)作为红色发光层,双载流子传输型主体4,4′-N,N′-dicarbazole-biphenyl (CBP)掺杂TBPe作为蓝色发光层,电子传输型主体材料BAlq掺杂rubrene作为绿色发光层.以上发光层夹于 关键词： 电致发光 磷光染料 异质结 白光     

Tb3+和Na2WO4共掺杂SiO2材料的制备及其发光性质

通过溶胶-凝胶技术制备了稀土离子Tb3 和Na2WO4共掺杂的SiO2材料,利用DTA-TG,IR,XRD等测试手段研究了材料的结构。材料属于非晶态,800℃退火后Tb3 和Na2WO4共掺杂样品的主要结构为SiO2的网状结构。通过三维荧光光谱,荧光激发光谱和发射光谱,分析探讨了Na2WO4对掺稀土离子的SiO2体系发光性质的影响。结果显示,在230nm激发下,样品显示Tb3 的5D4—7Fj(j=4,5,6)和5D3—7Fj(j=4,5,6)发射光谱,在紫外灯的照射下,发射均匀的蓝绿色荧光,说明样品掺杂均匀且分散性较好。Na2WO4的掺入,并不影响Tb3 在SiO2基质中的发射峰的主要位置,但对发光强度有很大的影响,敏化了5D4—7F6蓝色跃迁而猝灭了5D4—7F5绿色跃迁,使材料发射蓝绿色荧光。文章通过所得的能级图,对样品的跃迁机理进行了分析。     

Local chemical states and microstructure of photoluminescent porous silicon studied by means of EELS and TEM

Photoluminescent porous Si (PS) layers were formed on low resistivity p-type Si(100) wafers by anodization at a current density (Ia) of 100-350 mA cm(-2) at room temperature. The local chemical states and the microstructures of the PS layers were studied by means of electron energy loss spectroscopy (EELS) and transmission electron microscopy (TEM), and were correlated to the red photoluminescence (PL). The PS layer consists of sponge-like and tree-like structures. The tree-like structure becomes finer with increase of Ia. The fine tree-like structure is shown to be favorable for intensive PL. The EELS analysis reveals that the Si-4O structure, namely the basic structure of SiO2, and Si crystals coexist in the PS layers. The relative content of SiO2 to Si crystallites (R) increases with increase in Ia and decreases with the depth from the top surface of the PS layer. High R corresponds to intensive PL. These results suggest that PL may be connected with some kind of defects in SiO2 and/or defects in the boundary between Si crystallites and SiO2 structure in anodized PS layers, and that PL may be mainly emitted from the layer near the top surface of the PS layers.     

微波法合成红色长余辉发光材料Gd2O2S:Eu,Mg,Ti及其发光特性

用微波辐射法首次合成了Gd2O2S:Eu,Mg,Ti红色磷光化合物,用X射线粉末衍射(XRD)、扫描电镜(SEM)、荧光分光光度计等对合成产物进行了分析和表征.结果表明:材料的晶体结构为六方晶系,与Gd2O2S的相同.颗粒的形貌为类球形,分散性较好,尺寸在1～2 μm之间.Gd2O2S:Eu,Mg,Ti的激发光谱呈带状,激发光谱主峰位于360 nm,另外在400,422,472 nm等处也有激发峰存在;发射光谱为线状光谱,归属于Eu3 的5DJ(J=0,1,2)到7FJ(J=O,1,2,3,4)的跃迁.随着Eu浓度的增加,位于蓝绿区的586,557,541,513,498,471,468 nm处的发射峰逐渐减弱,而主峰位于627 nm处的红光发射明显增强.当Eu浓度为6 mol%时,红光发射最强.Mg,Ti共掺杂可显著改善其余辉性质.     

以蓝色发光材料DPVBi为基质的白色发光器件

白色有机发光器件是实现彩色平板显示的重要方案之一。利用蓝色发光材料DPVBi[4，4′—(2，2—苯乙烯基)—1，1′—联苯]掺杂红光染料DCJTB[4—氰甲烯基—2—叔丁基—6—(1，1，7，7—四甲基久洛尼定基—9—烯炔基—4H—吡喃)]作发光层制备了白色发光器件。研究了DPVBi掺杂不同浓度IDCJTB薄膜的光致发光性质，根据光致发光结果，制备了以DPVBi掺杂不同浓度DCJTB作发光层的电致发光器件，其结构为ITO／GuPc／NPB／DPVBi：DCJTB／Alq3／LiF／Al。当DCJTB质量分数为0．0008时，器件实现了白色发光(色度x=0．25，y=0．32)，电致发光和光致发光的掺杂比例基本相符，表明器件的白色发光主要是由基质DPVBi向掺杂剂DCJTB的能量传递产生的。研究还发现：白色器件随电压升高，光谱中蓝色成分相对于红色成分的比例略有增加，文章对此现象进行了分析。该白光器件在14V时达到最高亮度7822cd／cm^2，在20mA／cm^2电流密度下的亮度为-489cd／cm^2，最大流明效率为1．75lm／W。     

Organic LED device based on PtOEP phosphor without doping in host material

Electroluminescence (EL) and photoluminescence (PL) have been studied on multi-layer organic light-emitting diode (OLED) devices based on phosphorescent platinum octaethyl porphine (PtOEP) molecule. A multi-layer OLED (called Pt5) which has 100% PtOEP without doping in host as the emitting layer is investigated and compared its EL and PL characteristics with those of the other OLEDs (Pt2 and Pt3) with emitting layer of PtOEP doped in 4,4′-N,N′-dicarbazole-biphenyl (CBP) host material. It is observed that Pt5 shows a lower EL efficiency than Pt2 and Pt3. Three broad EL bands are observed at 500, 527 and 570 nm in the multi-layer device in addition to red sharp EL band due to PtOEP in Pt5, while only the red PtOEP EL is observed in Pt2 and Pt3. The 500, 527 and 570 nm EL peaks arise from absorption of the broad 525 nm Alq₃ emission band by PtOEP layer. The emission from the Alq₃ electron-transport layer is caused by the carrier leakage from the hole-blocking BAlq layer. The intensity of red EL due to PtOEP is much weaker in Pt5 than in Pt2. Taking into account the result of PL, it is suggested that highly efficient energy transfer from CBP host to PtOEP guest occurs in Pt2 and Pt3, giving rise to higher PtOEP luminance, while concentration quenching occurs in PtOEP layer in Pt5.     

Radiation induced defects in SiO 2

The main luminescent centers in SiO 2 films are the red luminescence R (650 v nm; 1.85 v eV) of the non-bridging oxygen hole center (NBOHC) and the twofold-coordinated (divalent) silicon with a blue B (460 v nm; 2.7 v eV) and a UV band (285 v nm; 4.4 v eV). Especially the latter ones are produced under irradiation, but from existing precursors assumed as silicon related oxygen deficient centers (SiODC). Therefore, in order to prove these models we compare a direct oxygen implantation with a direct silicon implantation into SiO 2 layers. The main result is: implanting oxygen increases the red band R but does not affect the blue band B. Silicon surplus increases the amplitude of the blue (B) luminescence, but reduces the amplitude of the red (R) one. Studying the cathodoluminescence dose dependence of these blue and red bands we have established defect transformation kinetics in SiO 2 including six main defects and precursors as well as the mobile oxygen as the main transmitter between precursors and the radiation induced defects. The kinetics is described by eight rate equations which predict the dose dependence of the red (R) and blue (B) luminescence intensities and their temperature dependences very well.     

一种新型平板彩色显示器件的制备和光谱分析

以MEH-PPV(聚[2-甲氧基-5-(2'-乙基己氧基-对苯乙烯)])和Alq3作为发光层,成功制备出ITO/SiO2/MEH-PPV/SiO2/Al结构和ITO/SiO2/Alq3/SiO2/Al结构的固态阴极射线器件.通过分析SSCL光谱,认为这些高速电子激发有机材料后形成Frenkel激子.当器件两个电极之间加的电压比较低时,有机薄膜层的场强也比较低,这些激子被解离的概率很小,从而产生的是激子发光的长波发射;当器件两个电极之间加的电压比较高时,有机薄膜层的场强很高,在有机层形成的激子大部分被解离,解离后的电子直接跃迁至LUMO(lowest unoccupancied molecular orbit),这些电子弛豫后从LUMO能级到HOMO(highest occupancied molecular orbit)能级直接辐射跃迁,接着重新复合发光,从而产生短波发射.制作的固态阴极射线器件可以实现全色发光,提高发光效率和加强蓝光发射.作者可以预期所研制出的这种SSCL器件必将引发平板显示领域一场新的革命性变革.     

Photoluminescence excitation properties of porous silicon with and without Er-Yb-containing complex

Two bands in the photoluminescence excitation spectra have been studied for the red, blue, and IR emission of oxidized porous silicon (PS) and PS with Er³⁺- and Yb³⁺-containing gadolinium oxychloride complex (PS:Er,Yb), introduced by thermal diffusion. These two spectral bands were shown to reflect contributions of two different mechanisms of excitation-emission processes. The UV band for the IR emission of PS:Er,Yb rose sharply at about 290 nm and was explained by the direct photoemission of carriers from the valence band of Si crystallites into the conduction band of the oxide shell. The second band was found to be common for the red and blue emission and assosiated with the carriers photoexcitation inside the Si crystallites. Lifetimes for both bands were measured and the structure of the blue emission from PS:Er,Yb with peaks at 416, 440, 466, and 500 nm from PS:Er,Yb was observed.