Gas-filled electron diode based on a glow discharge

Stable ignition and sustention of a pulsed discharge with a current of up to 180 A and duration of 12 μs at a pressure of 10⁻¹–10⁻² Pa are achieved in a glow-discharge plasma cathode with the help of an auxiliary initiating discharge. An electron emission current density of up to 100 A/cm² and accelerating voltageof 15 kV are obtained in a gas-filled diode based on this type of a plasma cathode. An electron beam witha neutralized space charge can be transported almost without losses in a weak axial magnetic field alonga plasma channel formed due to the gas ionization by the accelerated electrons over a distance of up to 30 cm.     

Cold-hollow-cathode arc discharge in crossed electric and magnetic fields

A crossed-field cold-hollow-cathode arc is stable at low working gas pressures of 10⁻²–10⁻¹ Pa, magnetic-field-and gas-dependent arcing voltages of 20–50 V, and discharge currents of 20–200 A. This is because electrons come from a cathode spot produced on the inner cathode surface by a discharge over the dielectric surface. The magnetic field influences the arcing voltage and discharge current most significantly. When the plasma conductivity in the cathode region decreases in the electric field direction, the magnetic field increases, causing the discharge current to decline and the discharge voltage to rise. The discharge is quenched when a critical magnetic field depending on the type of gas is reached. Because of the absence of heated elements, the hollow cathode remains efficient for long when an arc is initiated in both inert and chemically active gases.     

Generation of a pulsed high-current low-energy beam in a plasma electron source with a self-heated cathode

The transition of a low-current discharge with a self-heated hollow cathode to a high-current discharge is studied, and stability conditions for the latter in the pulsed–periodic mode with a current of 0.1–1.0 kA, pulse width of 0.1–1.0 ms, and a pulse repetition rate of 0.1–1.0 kHz are determined. The thermal conditions of the hollow cathode are analyzed, and the conclusion is drawn that the emission current high density is due to pulsed self-heating of the cathode’s surface layer. Conditions for stable emission from a plasma cathode with a grid acting as a plasma boundary using such a discharge are found at low accelerating voltage (100–200 eV) and a gas pressure of 0.1–0.4 Pa. The density of the ion current from a plasma generated by a pulsed beam with a current of 100 A is found to reach 0.1 A/cm². Probe diagnostics data for the emitting and beam plasmas in the electron source are presented, and a mechanism behind the instability of electron emission from the plasma is suggested on their basis.     

Discharge and emission parameters of a plasma electron source based on a discharge in crossed E × H fields with various cathode materials

The possibility of using a plasma electron source (PES) with a discharge in crossed E × H field for compensating the ion beam from an end-Hall ion source (EHIS) is analyzed. The PES used as a neutralizer is mounted in the immediate vicinity of the EHIS ion generation and acceleration region at 90° to the source axis. The behavior of the discharge and emission parameters of the EHIS is determined for operation with a filament neutralizer and a plasma electron source. It is found that the maximal discharge current from the ion source attains a value of 3.8 A for operation with a PES and 4 A for operation with a filament compensator. It is established that the maximal discharge current for the ion source strongly depends on the working gas flow rate for low flow rates (up to 10 ml/min) in the EHIS; for higher flow rates, the maximum discharge current in the EHIS depends only on the emissivity of the PES. Analysis of the emission parameters of EHISs with filament and plasma neutralizers shows that the ion beam current and the ion current density distribution profile are independent of the type of the electron source and the ion current density can be as high as 0.2 mA/cm² at a distance of 25 cm from the EHIS anode. The balance of currents in the ion source-electron source system is considered on the basis of analysis of operation of EHISs with various sources of electrons. It is concluded that the neutralization current required for operation of an ion source in the discharge compensation mode must be equal to or larger than the discharge current of the ion source. The use of PES for compensating the ion beam from an end-Hall ion source proved to be effective in processes of ion-assisted deposition of thin films using reactive gases like O₂ or N₂. The application of the PES technique makes it possible to increase the lifetime of the ion-assisted deposition system by an order of magnitude (the lifetime with a Ti cathode is at least 60 h and is limited by the replacement life of the deposited cathode insertion).     

Neutralization of an ion beam from the end-Hall ion source by a plasma electron source based on a discharge in crossed E × H fields

The possibility of using a plasma electron source (PES) with a discharge in crossed E × H field for compensating the ion beam from an end-Hall ion source (EHIS) is analyzed. The PES used as a neutralizer is mounted in the immediate vicinity of the EHIS ion generation and acceleration region at 90° to the source axis. The behavior of the discharge and emission parameters of the EHIS is determined for operation with a filament neutralizer and a plasma electron source. It is found that the maximal discharge current from the ion source attains a value of 3.8 A for operation with a PES and 4 A for operation with a filament compensator. It is established that the maximal discharge current for the ion source strongly depends on the working gas flow rate for low flow rates (up to 10 ml/min) in the EHIS; for higher flow rates, the maximum discharge current in the EHIS depends only on the emissivity of the PES. Analysis of the emission parameters of EHISs with filament and plasma neutralizers shows that the ion beam current and the ion current density distribution profile are independent of the type of the electron source and the ion current density can be as high as 0.2 mA/cm² at a distance of 25 cm from the EHIS anode. The balance of currents in the ion source-electron source system is considered on the basis of analysis of operation of EHISs with various sources of electrons. It is concluded that the neutralization current required for operation of an ion source in the discharge compensation mode must be equal to or larger than the discharge current of the ion source. The use of PES for compensating the ion beam from an end-Hall ion source proved to be effective in processes of ion-assisted deposition of thin films using reactive gases like O₂ or N₂. The application of the PES technique makes it possible to increase the lifetime of the ion-assisted deposition system by an order of magnitude (the lifetime with a Ti cathode is at least 60 h and is limited by the replacement life of the deposited cathode insertion).     

Spectroscopic study of a brush cathode plasma in a magnetic field

The brush cathode helium discharge in the magnetic field has been operated stably at discharge currents larger than those without magnetic field. The diameter of the plasma column has been determined by the configuration of the magnetic field. The measurements of the spectral intensities of the recombination continuum followed by the 2³S-n³P series reveals that the electron density is 1·8 × 10¹³ cm^-3 and the electron temperature is 0·17 eV at a discharge current of 500 mA and a pressure of 0·9 torr for a magnetic flux density of 1·3 kG. The principal quantum number for line merging is 20.     

Generation and transport of high-current, low-energy electron beams in a system with a gas-filled diode

Investigations of the generation and transport of a high-current, low-energy electron beam are performed in a system with a gas-filled diode based on a plasma cathode. At accelerating voltages of up to 20 kV and pressures of (1–5)×10⁻¹ Pa, a beam with an emission current of 600 A, emission current density of 12 A/cm² and pulse duration of 30 μs if obtained in a diode with a grid-stabilized emission opening having a diameter equal to 8 cm. The beam is transported in the absence of an external magnetic field over a distance of 20 cm. The beam is compressed by its self-magnetic field, and the current density at the collector reaches 100 A/cm² when the beam diameter is 3 cm. Zh. Tekh. Fiz. 68, 44–48 (January 1998)     

Experimental Studies on Low-Pressure Plane-Parallel Hollow Cathode Discharges

Hollow cathode discharge (HCD) is widely used in material processing and plasma emission spectroscopy due to several advantages over other plasma sources. Basically, the HCD consists of a cathode with a hollow structure (cavity, hole, or parallel faces) and an anode of arbitrary shape. In this investigation, experimental studies on low-pressure plane-parallel HCD operated at different process conditions are reported. Herein, we investigate the dependence of the discharge current on the product of the gas pressure and inter-cathode distance (pD). In addition, the electron temperature and density were inferred from the current-voltage characteristics of a single cylindrical Langmuir probe positioned between the cathodes, on the discharge axis. The measurements were carried out at different gas pressures, magnetic field intensities, working gases, inter-cathode distances, cathode materials, and discharge voltages. The results showed that, at different gas pressures, the maximum discharge current (I_d,max) is not only a function of the product pD, but also of the pressure itself. Application of a uniform longitudinal magnetic field improved plasma confinement between cathodes, leading to a substantial increase in I_d,max in most of the situations considered in this study. However, for oxygen discharge, a strong discharge current reduction after the application of the magnetic field was observed. In relation to the Langmuir probe studies, it was observed that the uniform longitudinal magnetic field reduced the electron temperature, but this behavior depends strictly on pD. The typical values of electron density and electron temperature in the case of the nitrogen discharge were n_e?=?10¹⁷ m^?3 and T_e?=?2.5 eV, respectively. Finally, our experiments showed that the pD range for hollow cathode effects was between 0.2–5 Pa m.     

直流电源耦合高功率脉冲非平衡磁控溅射电离特性

采用直流电源放电形成高功率脉冲非平衡磁控溅射(dc-high power impulse unbalanced magnetron sputtering,dc-HPPUMS 或dc-HiPiUMS),利用雪崩放电的击穿机理形成深度自触发放电,同轴线圈和空心阴极控制放电特性和提高功率密度.磁阱俘获雪崩放电形成的二次电子和形成漂移电流,形成了大电流脉冲放电,放电脉冲电流密度峰值超过100 A/cm²,脉冲频率小于40 Hz.由于放电等离子体远没有达到平衡状态,放电电流主要受到空间电荷效应 关键词： 放电 脉冲技术     

Production of copper vapor in a pulsed hollow cathode discharge

Spectral emission from a pulsed Cu hollow cathode was investigated in relation to discharge current to gain information on the density of the sputtered Cu vapor and on the persistence time of the metastable and ground-state atoms. The cathode was excited with 250 μsec discharge pulses at current densities up to 1 A/cm², using He, Ne and Ar as buffer gases. The intensities of the emitted Cu I lines were found to depend strongly on the simmer current. In atmospheres of Ne or Ar, the intensities of the resonance lines exhibited characteristic maxima during the initial 20 μsec of the discharge pulses. The density of the sputtered Cu atoms was determined by absorption measurements using a second Cu hollow cathode as alight source.     

Penetration of a low-pressure reflex-discharge plasma into a hollow electrode

It is shown experimentally that the plasma of a hollow-cathode reflex discharge is characterized by a nonequilibrium electron velocity distribution. The parameters of the electron distribution, which is approximated by a superposition of two Maxwellian distributions with different temperatures, are estimated. The penetration of the discharge plasma into the hollow cathode at various cathode potentials and a gas pressure of ∼10^{\t− 2} Pa is studied. It is shown that the plasma parameters in the hollow electrode depend not only on the parameters of the reflex-discharge plasma, but also on the magnitude and configuration of the magnetic and electric fields in the plasma expansion region. It is shown that the plasma penetration can be accompanied by quasineutrality violation and the formation of space-charge double layers. Experiments confirm that the ion current from the nonequilibrium plasma exceeds the Bohm current.     

Characteristics of an ion source with a plasma cathode and a multipole magnetic system for confining fast electrons

Parameters and ion-emission characteristics of the plasma generated in the anode stage of an ion source with a hollow glow-discharge plasma cathode are studied. To decrease the minimum operating gas pressure to 5×10³ Pa, a multipole magnetic system was installed on the surface of the hollow cathode and the peripheral magnetic field was enhanced in the anode stage of the source. The effect of the gas pressure, the plasma-cathode current, and the voltage between the electrodes of the anode stage on the value of the ion current extracted from the plasma is investigated. It is found that the size of the exit aperture of the hollow cathode substantially affects the efficiency of ion extraction. The potential (1–5 V) and the electron temperature (1–8 eV) of the anode-stage plasma are measured by the probe method. The conditions are determined that ensure the maximum ion-emission current from the plasma at low gas pressures.     

Generation of a submillisecond electron beam with a high-density current in a plasma-emitter diode under the conditions of open plasma boundary emission

The generation of a 250-μs-wide electron beam in a plasma-emitter diode is studied experimentally. A plasma was produced by a pulsed arc discharge in hydrogen. The electron beam is extracted from a circular emission hole 3.8 mm in diameter under open plasma boundary conditions. The beam accelerated in the diode gap enters into a drift space in the absence of an external magnetic field through a hole 4.1 mm in diameter made in the anode. The influence of electron current deposition at the edge of the anode hole on the beam’s maximum attainable current, above which the diode gap breaks down, is studied for different accelerating voltages and diode gaps. The role of processes occurring on the surface of the electrodes is shown. For an accelerating voltage of 32 kV, a mean emission current density of 130 A/cm² is achieved. The respective mean strength of the electric field in the acceleration gap is 140 kV/cm. Using the POISSON-2 software package, the numerical simulation of the diode performance is carried out and the shape of steady plasma emission boundaries in the cathode and anode holes is calculated. The influence of the density of the ion current from the anode plasma surface on the maximum attainable current of the electron beam is demonstrated.     

Probe measurements in a discharge with liquid nonmetallic electrodes in air at atmospheric pressure

Discharges with liquid nonmetallic electrodes of much interest for applications are investigated. It is found that a dc discharge between two streams of tap water in air at atmospheric pressure is stable at a currentof 40≤I≤100 mA. The discharge exists in the diffuse (volume) form with a relatively low current density (∼0.2 A/cm²) and a high (above one kilovolt) voltage drop across the air gap (∼1 cm) between the water electrodes. The current density and voltage depend only slightly on the discharge current. Probe measurements show that three regions can be distinguished in the discharge: two electrode regions (1–2 mm in length) and a discharge column with a constant electric field of ≈0.8 kV/cm (i.e., E/N≈20 Td, because the gas in the discharge is heated up to 1500–2000 K). The average electric field strength near the electrodes is E≈2–3×10³ V/cm (E/N≈60–80 Td). The charged particle density in the column is n ∼ 10¹² cm⁻³. The probe measurements of n agree with the previous microwave absorption measurements. The water vapor concentration in the column is also estimated from probe measurements.     

Use of a Glow Discharge in a Magnetic Field for Production of Broad Ion Beams for Technological Applications

The results of investigations of the conditions of existence and ion-emission properties of a plasma of the high-current variety of a low-pressure glow discharge with a hollow cathode in a magnetic field are given. It has been shown that an applied weak magnetic field (10^–3 T) not only reduces the minimum threshold gas pressure, but also makes the radial distribution of the plasma density more uniform (10%). A decrease in statistical straggling of the delay time to breakdown (10² times) and in discharge formative time (10 times) with increasing pulse repetition rate has been revealed to occur as a result of the transition to multielectron discharge initiation. The mass constitution of the discharge and the charge state of ions have been investigated and ways of lowering the content of the basic types of impurities have been determined. The influence of the parameters of the space charge cathode layer on the beam formation by electrostatic ion optics was investigated. The design of a source of gas ions possessing an increased lifetime and high reliability is described. The source is capable of producing an ion beam of cross section 100 cm² with an energy of ions of up to 40 keV at an average current density of up to 1 mA/cm².     

Plasma-volume generation of H<Superscript>−</Superscript> ions in a low-voltage xenon-hydrogen discharge. II

A low-voltage xenon-hydrogen discharge is considered theoretically at an interelectrode distance of L = 1 cm and cathode emission current densities of j _s = 2–20 A/cm². Basic parameters of the discharge plasma, in particular, the total hydrogen and xenon densities, are optimized to attain the maximum possible density of negative hydrogen ions \(N_{H^ - } (L)\) at the plasma-anode boundary. The distributions of the plasma parameters over the discharge gap are calculated for optimized regimes. According to calculations, at intermediate cathode emission current densities (j _s ≈ 5–10 A/cm²) in optimized discharge regimes, the density of negative hydrogen ions in the anode region of the plasma is \(N_{H^ - } (L)\) ≈ (1.5–2.5) × 10¹² cm^?3 and the total plasma pressure is p ₀ = 0.5–0.6 Torr.     

Nonself-sustained arc discharge in anode material vapors

The basic characteristics of the nonself-sustained arc discharge in a vapor of the anode material are studied. The influence of thermoemission parameters of the cathode on volt-ampere characteristics of the discharge is described. It is established that in a free mode of the discharge cathode operation, when the discharge current I_D is lower than the current of the thermoelectron emission from the discharge cathode I_C, the deposition rate of the films q is directly proportional to the discharge current I_D. In the compelled mode of the cathode operation, when I_D>I _C, q~W_D², where W_D=I_D U_D with U_D being the discharge voltage. It is shown that the magnetic field increases the plasma density and changes the density profile from n(x)-1/x² to n(x)-1/x with x being a distance along the flow. The motion of created plasma flow is shown to have a noncollisional character with constant electron temperature of 5-7 eV along the flow. The values of plasma potential and electric field in the flow are determined; the values of cathodic and anodic potential drops in the discharge are evaluated. The angular distributions of ion and neutral fluxes in the created plasma flow are described. It is shown that the plasma flows parameters depend substantially on the working material. With use of crossed electric and magnetic fields, the flow ionization coefficient was enhanced up to 85% for the discharge in Ti vapors, and 35% for the discharge in Cu vapors     

太赫兹源场致发射电子源

通过粒子模拟(PIC)软件模拟计算了在ps级别下二极与三极结构碳纳米管场致发射的电流密度与电子注聚焦性能。阳极电压在2 kV时,二极结构下电流密度达到1.85 A/cm2;三极结构下,栅压700 V时发射电流密度达到2.3 A/cm2,且在一定的三极结构参数与电极电压下,可以获得较好的电子注聚束效果。通过碳纳米管二极管发射实验,获得了6.6 A/cm2的发射电流密度,总发射电流达到52.1 mA,可以为太赫兹器件提供连续发射的电子注。     

A cw uv copper hollow cathode laser in the 260 nm region

A cw uv copper hollow cathode laser is described, which could be operated for a longer time duration with an output power of 7 mW in the 260 nm region. A double-cathode configuration with a protection for the mirrors from metal-vapour deposition is presented. Characteristics of the laser output power, the spontaneous emission, and the ion densities in the negative glow were measured as depending on the discharge current, the neon gas pressure, and the size of the cathode slit. The observed saturation of the laser output power at high discharge current (1 A/cm²) and the optimum slot size are discussed.     

感应磁场压缩下氢等离子体中巴耳末系谱线的斯塔克加宽

本工作研究感应磁场压缩下,氢等离子体中的巴耳末系谱线的斯塔克加宽。电容器对围绕在放电管外部的线圈放电,产生交变轴向磁场,使放电管中氢气离化、压缩与加热。放电周期14微秒,放电电压20千伏,最大电流165千安,初始工作气压2.0×10^-1毫米汞高。用照相方法研究H_β和H_γ的轮廓。这些谱线有显著的加宽。在整个发光阶段中,H_β的平均半宽度为14—16(埃),H_γ为18—19(埃),相应的离子密度为1.7—2.5×10¹⁶厘米^-3。实验轮廓与Griem,Kolb和Shen的理论较为接近,与Holtsmark理论相差较远。光电测量进一步表明:H_β的轮廓随着时间而改变,相应的离子密度亦在改变。在放电的第三半周期初级电流极大时,离子密度最大,达到3.2×1O¹⁶厘米^-3,为初始氢原子密度的2.2倍。