基于量子点-CBP混合层的量子点LED的制备

采用一锅法制备出高质量的具有核壳结构的Cd Se@Zn S、Cd Zn S/Zn S量子点。将量子点混入空穴传输材料CBP中形成复合的有源材料,经过几步简单的旋涂操作,制备出相应的绿光、蓝光量子点LED器件。这种方法利用了油溶性量子点和CBP材料的相容性,减少了旋涂操作的步骤,有利于快速制备基于量子点的电致发光器件。基于两步旋涂操作制备的量子点LED,由于阴极与复合有源层之间的能级差较大,导致需要较高的开启电压。在CBP材料中,注入的载流子有可能会被量子点表面缺陷捕获,形成表面态的发光。表面态发光的相对强度依赖于载流子浓度。     

基于Cu掺杂ZnInS和ZnCdS量子点的高显色性白光LED

利用胶体化学方法合成了发光波长可调的Cu掺杂量子点, 其波长范围可从绿光到深红光连续调节.通过将绿光ZnInS :Cu和红光ZnCdS :Cu量子点与蓝光GaN芯片相结合, 制备了高显色性的白光LED, 其流明效率为71 lm·W^-1, 色温为4 788 K, 显色指数高达94, CIE色坐标为(0.352 4, 0.365 1).通过测量Cu掺杂量子点的荧光衰减曲线, 发现不存在从绿光ZnInS :Cu到红光ZnCdS :Cu量子点的能量传递过程, 因为红光ZnCdS :Cu量子点在绿光波段没有吸收. 实验结果表明, Cu掺杂量子点有望应用于固态照明领域.     

Simulation of electroluminescence of quantum dot-based microcavity light-emitting device

We present a detailed analysis and computations of the emitted radiation spectrum for quantum dots (QDs) microcavity light-emitting device, where the total physical thickness of the cavity spacer was kept at 254 nm which corresponds to the wavelength of the mode number (m) = 1 resonant mode of the cavity. Our calculation gives good results for QD diameter only from 1.2 to 6.4 nm. The computations are used to examine how the emitted radiation spectrum can be optimized by varying the position of the light-emitting layer, the type of cathode material, the choice of hole transport layer material, and the thickness of electron transport layer, QD layer, and hole transport layer. These studies showed that the variation of layers geometry and the position of the light-emitting layer will optimize the output intensity and the radiation spectrum and varying the ETL and QD layer thickness will have a more effect on the emitted spectrum than varying HTL thickness. In addition, we have examined the effect of using different quantum dots sizes in emission layer. On the other hand, we have investigated the difference between the electroluminescence (EL) emissions for microcavity device in comparison with the non-cavity device, and we have found that the full width at half maximum (FWHM) of the EL is reduced from 45 nm for the QD non-cavity LED to 30 nm for the output of a resonant microcavity device. Finally, we have investigated the compatibility between our calculation and the experimental results and found a fairly good agreement between them.     

NPB厚度对异质结OLED载流子复合区域的调控

通过调控p型半导体N,N′-bis(naphthalen-1-y)-N,N′-bis(phenyl)benzidine(NPB)层的厚度,制备了结构为ITO/NPB/aluminum(Ⅲ)bis(2-methyl-8-quinolinato)-4-phenylphenolate(BAlq)/NPB(0~18nm)/tri-(8-hydroxyquinoline)-aluminum(Alq₃)/Mg:Ag的多层有机电致发光器件.分析结果表明,在该类异质结器件中,NPB不仅可以作为空穴传输材料,在适当的厚度范围内,它还可以起到调控载流子复合区域的作用;当NPB厚度在0~18nm之间变化时,随着其厚度增加器件发光颜色可由蓝色变为绿色.通过器件发光光谱的表征可以得知,器件的载流子复合区域相应地由BAlq层转移至Alq₃层.     

Si quantum dot structures and their applications

This paper presents briefly the history of emission study in Si quantum dots (QDs) in the last two decades. Stable light emission of Si QDs and NCs was observed in the spectral ranges: blue, green, orange, red and infrared. These PL bands were attributed to the exciton recombination in Si QDs, to the carrier recombination through defects inside of Si NCs or via oxide related defects at the Si/SiOx interface. The analysis of recombination transitions and the different ways of the emission stimulation in Si QD structures, related to the element variation for the passivation of surface dangling bonds, as well as the plasmon induced emission and rare earth impurity activation, have been presented.The different applications of Si QD structures in quantum electronics, such as: Si QD light emitting diodes, Si QD single union and tandem solar cells, Si QD memory structures, Si QD based one electron devices and double QD structures for spintronics, have been discussed as well. Note the significant worldwide interest directed toward the silicon-based light emission for integrated optoelectronics is related to the complementary metal-oxide semiconductor compatibility and the possibility to be monolithically integrated with very large scale integrated (VLSI) circuits. The different features of poly-, micro- and nanocrystalline silicon for solar cells, that is a mixture of both amorphous and crystalline phases, such as the silicon NCs or QDs embedded in a α-Si:H matrix, as well as the thin film 2-cell or 3-cell tandem solar cells based on Si QD structures have been discussed as well. Silicon NC based structures for non-volatile memory purposes, the recent studies of Si QD base single electron devices and the single electron occupation of QDs as an important component to the measurement and manipulation of spins in quantum information processing have been analyzed as well.     

Assessing Carrier Recombination Processes in Type‐II SiGe/Si(001) Quantum Dots

In this work, it is shown how different carrier recombination paths significantly broaden the photoluminescence (PL) emission bandwidth observed in type‐II self‐assembled SiGe/Si(001) quantum dots (QDs). QDs grown by molecular beam epitaxy with very homogeneous size distribution, onion‐shaped composition profile, and Si capping layer thicknesses varying from 0 to 1100 nm are utilized to assess the optical carrier‐recombination paths. By using high‐energy photons for PL excitation, electron‐hole pairs can be selectively generated either above or below the QD layer and, thus, clearly access two radiative carrier recombination channels. Fitting the charge carrier capture‐, loss‐ and recombination‐dynamics to PL time‐decay curves measured for different experimental configurations allows to obtain quantitative information of carrier capture‐, excitonic‐emission‐, and Auger‐recombination rates in this type‐II nano‐system.     

Long-wavelength light emission from InAs quantum dots covered by GaAsSb grown on GaAs substrates

We fabricated InAs quantum dots (QDs) with a GaAsSb strain-reducing layer (SRL) on a GaAs(0 0 1) substrate. The wavelength of emission from InAs QD is shown to be controllable by changing the composition and thickness of the SRL. An increase in photoluminescence intensity with increasing compositions of Sb and thickness of the GaAsSb SRL is also seen. The efficiency of radiative recombination was improved under both conditions because the InAs/GaAsSb/GaAs hetero-interface band structure more effectively suppressed carrier escape from the InAs QDs.     

Recombination zone shift in phosphorescent white organic light-emitting devices with single host structure of multi-emission layers

We have investigated the recombination zone in the phosphorescent white organic light-emitting devices with single host structure of multi-emission layers. Blue, green, and orange-red phosphorescent emitters were doped into the separate layers of single host material for fabricating the white devices with multi-emission layers. The electroluminescence spectrum was substantially modified by the shift of the recombination zone that was dependent upon the thickness of the electron transport layer. We investigated the recombination zone shift in terms of electric field distribution and carrier injection. A maximum external quantum efficiency of 15.9% and a maximum power efficiency of 28.9 lm/W were achieved by optimizing the recombination zone.     

Tailoring of the Wave Function Overlaps and the Carrier Lifetimes in InAs/GaAs1−xSbx Type-II Quantum Dots

Effects of thermal annealing on the emission properties of type-II InAs quantum dots (QDs) covered by a thin GaAs_1−xSb_x layer are investigated by photoluminescence (PL) and time-resolved PL measurements. Apart from large blueshifts and a pronounced narrowing of the QD emission peak, the annealing induced alloy intermixing also leads to enhanced radiative recombination rates and reduced localized states in the GaAs_1−xSb_x layer. We find that the type-II QD structure can sustain thermal annealing up to 850 °C. In particular, we find that it is possible to manipulate between type-I and type-II recombinations in annealed QDs by using different excitation powers. We demonstrate that postgrowth thermal annealing can be used to tailor the band alignment, the wave function overlaps, and hence the recombination dynamics in the InAs/GaAs_1−xSb_x type-II QDs.     

有机/无机复合双层电子传输层的量子点发光二极管

采用有机/无机复合双层电子传输层（ETL）研制绿色QLEDs,其中有机ETL采用OLED中常见的ETL材料,无机ETL采用ZnO纳米颗粒,并通过调控有机ETL厚度改变电子注入,使电子/空穴达到平衡。制备的器件结构为:ITO/PEDOT:PSS/TFB/QDs/ZnO NPs/TPBI:Liq/Al,其中有机电子传输层TPBI:Liq采用真空蒸镀沉积。与仅采用ZnO电子传输层的器件相比,可以使器件性能得到大幅提升:器件的最大电流效率从11.53 cd/A提升到22.77 cd/A,同时器件的启亮电压、电致发光光谱无明显变化。判断有机ETL的主要作用是抑制了过量电子的注入和传输,在发光亮度变化不大的情况下,降低了器件的无效复合（例如俄歇复合）电流,从而使电流效率明显提升。     

氧化锌锡作为电子传输层的量子点发光二极管

本文研究了以胶状量子点作为发光层和有机/无机混合材料作 为电子-空穴传输层的电致发光二极管器件. CdSe 量子点以薄膜的形式夹在无机氧化锌锡电子传输层和有机TPD空穴传输层中间构成三明治结构. 氧化锌锡电子传输层采用磁控溅射实现, 有机TPD空穴传输层和量子点发光层则采用旋涂的方法制备, 得到的QD-LEDs器件结构界面陡峭、表面平整. 光电特性表征结果显示器件的电致发光具有良好的单色性、低的开启电压, 利 用具有高电子迁移率和低载流子浓度的无机氧化锌锡薄膜作为电子传输层可 以实现器件在大气环境下稳定、明亮的电致发光. 本文分析了器件的工作机理并通过改变氧化锌锡的电导率达到控制器件中电子和空穴的注入比的目的, 优化了器件的光电性能. 关键词： 量子点 氧化锌锡 电致发光 电子传输层     

White light electroluminescence from poly(9-vinylcarbazole) (PVK)/ZnO NRs/poly(2-methoxy-5-(2-ethylhexyloxy)-1, 4-phenylenevinylene) (MEH-PPV) dual heterojunctions

In this paper, we fabricated a p-PVK/n-ZnO nanorods (NRs)/p-MEH-PPV dual heterojunctions white light-emitting diode. Relative to previously reported p–n heterojunction structure including ZnO NRs and polymer, the device exhibits a low turn-on voltage of 7 V. An obviously broad electroluminescence emission band, originated from the overlap of PVK emission and ZnO defects emissions, was observed extending from 360 up to 700 nm. The influence of the two introduced p-type polymer layers on the device characteristic is discussed. With its hole conductivity, the p-PVK layer cannot only improve the holes tunnel into ZnO NRs layer, but also lower the barrier between ITO and the valance band of ZnO NRs. On the other hand, p-MEH-PPV could be regarded as block layer for the injection of electrons from the Al electrode. Both of two p-type polymers dramatically improve the injection balance of carriers, leading to a low turn-on voltage. Meanwhile, the carrier transport mechanism of the device under different forward bias region was discussed on the basis of current–voltage curve.     

InAs/GaAs单量子点中电子/空穴自旋弛豫

利用分子束外延制备了三种类型量子点样品,它们分别是:未掺杂样品、n型Si调制掺杂样品和p型Be调制掺杂样品。在5 K温度下,采用共聚焦显微镜系统,测量了单量子点的光致发光谱和时间分辨光谱, 研究了单量子点中三种类型激子(本征激子、负电荷激子和正电荷激子)的电子/空穴自旋翻转时间。它们的自旋翻转时间常数分别为: 本征激子的自旋翻转时间约16 ns, 正电荷激子中电子的自旋翻转时间约2 ns, 负电荷激子中空穴的自旋翻转时间约50 ps。     

Influence of annealing temperature on the photoluminescence properties of ZnO quantum dots

The properties of ZnO quantum dots (QDs) synthesized by the sol-gel process are reported. The primary focus is on investigating the origin of the visible emission from ZnO QDs by the annealing process. The X-ray diffraction results show that ZnO QDs have hexagonal wurtzite structure and the QD diameter estimated from Debye-Scherrer formula is 8.9 nm, which has a good agreement with the results from transmission electron microscopy images and the theoretical calculation based on the Potential Morphing Method. The room-temperature photoluminescence spectra reveal that the ultraviolet excitation band has a red shift. Meanwhile, the main band of the visible emission shifts to the green luminescence band from the yellow luminescence one with the increase of the annealing temperature. A lot of oxygen atoms enter into Zn vacancies and form oxygen antisites with increasing temperature. That is probably the reason for the change of the visible emission band.     

三波段白光有机电致发光器件及其色稳定性的控制

制备并研究了基于3种小分子荧光材料的白光有机电致发光器件。发光层采用红色发光材料DCJTB掺杂绿光材料Alq3构成混合发光层,与OXD-7构成的蓝色发光层形成异质结的结构,并以NPB为空穴注入层。通过改变结构参数详细研究了发射光谱及其色坐标的电场依赖性。通过分析载流子注入/传输特性,控制激子的复合区域等措施得到了色坐标稳定性好、光谱丰富的高性能白光电致发光器件。经过优化的器件结构可以覆盖更大的可见光区域,当电压从9 V增加到13 V时,色坐标仅从CIE(x,y)=(0.364,0.314)偏移到CIE(x,y)=(0.332,0.291),具有较好的色稳定性。     

含噻二唑聚芴类白光聚合物的合成与发光性能研究

通过Suzuki偶联反应将2,7-二溴-9,9-二辛基芴（Br-DOF）、2,7-二硼酸-9,9-二辛基芴（B-DOF）和4-（8-（2,7-二溴-9-辛基芴）辛氧基）-N-4-（7-（4-（二苯胺基）苯基）苯并噻二唑）苯基-二苯胺（Br-TAF）共聚,合成了白光聚合物PDOF-TAF。以PDOF-TAF为发光层,溶液旋涂制备了非掺杂型单层白光有机电致发光二极管,色坐标为（0.23,0.18）。通过插入电子传输层TPBI和空穴传输层PVK得到的白光器件发射光谱覆盖了410~700 nm区域,色坐标从（0.23,0.18）调整到（0.24,0.32）,亮度达到2 020 cd/m²,电流效率达到1.4 cd/A。实验结果表明,PDOF-TAF是一种很好的白光聚合物发光材料,在WOLED中将有很好的应用前景。     

含有量子点的双波长LED的光谱调控

本文通过对含有高In组分量子点的双波长LED进行了模拟计算, 并对器件的能带结构、载流子浓度、复合速率和辐射光谱进行了研究. 通过对器件结构的调整与对比, 发现蓝绿双波长LED的绿光量子阱中加入高In组分量子点后可以拓宽辐射光谱, 使LED光谱具有更高的显色指数, 为实现无荧光粉的白光LED提供指导. 量子点对载流子具有很强的束缚能力, 并且载流子在量子点处具有更短的寿命, 载流子优先在量子点处复合, 量子点处所对应的黄光与量子阱润湿层所对应的绿光的比例随量子点浓度的增大而增大, 载流子浓度较低时以量子点处的黄光辐射为主, 载流子浓度变大后, 量子点复合逐渐达到饱和, 绿光辐射开始占据主导. 对间隔层厚度和间隔层掺杂浓度的调节可以很方便地调控载流子的分布, 从而实现对含有量子点的双波长LED两个活性层辐射速率的调控. 结果表明, 通过对量子点浓度、间隔层厚度、间隔层掺杂浓度的控节可以很好地实现对LED辐射光谱的调控作用. 关键词： GaN 量子点 光谱调控 双波长LED     

Alq3和CdSeS量子点掺杂体系的载流子输运性质的研究

利用飞行时间法(time-of-flight)测定了有机小分子发光材料8-羟基喹啉铝(Alq₃)与CdSeS量子点掺杂体系的载流子迁移率.研究了Alq₃和CdSeS混合薄膜的载流子迁移率与外加电场强度和量子点浓度的变化关系.研究结果表明,CdSeS量子点的掺杂浓度的增加会引起薄膜样品位置无序的增加.除此之外,Alq₃和CdSeS量子点界面之间的电荷转移作用,以及在量子点之间进行跳跃传输的电子数量都会改变样品的载流子迁移率. 关键词： 3')" href="#">Alq₃ CdSeS量子点 飞行时间法     

Photoluminescence and magneto-optical properties of multilayered type-II ZnTe/ZnSe quantum dots

Multilayered Zn–Se–Te structures grown by migration enhanced epitaxy are studied by temperature- and excitation-dependent photoluminescence (PL) as well as magneto-PL. The PL consists of two bands: a blue band, overlaid with band edge sharp lines, dominant at low temperatures and high excitation, and a green band, which appears at elevated temperature and low excitation. Upon varying excitation intensity by four orders of magnitude, the green band peak energy shifts by ∼60 meV, indicating recombination of excitons in type-II quantum dots (QDs); no significant shift is observed for the blue band. Therefore, the green emission is attributed to ZnTe/ZnSe type-II QDs, which co-exist with isoelectronic centers, responsible for the blue and band edge emissions. The existence of type-II ZnTe/ZnSe QDs is further confirmed by magneto-PL, for which the observed oscillations in the PL intensity as a function of magnetic field is explained in terms of the optical Aharonov–Bohm effect.     

Reasons of emission inhomogeneity in InAs quantum dot structures

The photoluminescence (PL) inhomogeneity has been studied in InAs quantum dots (QDs) embedded in the symmetric In_0.15Ga_0.85As/GaAs quantum wells (QWs) with QDs grown at different temperatures. It was shown that three reasons are responsible for the emission inhomogeneity in studied QD structures: (i) the high concentration of nonradiative recombination centers in the capping In_0.15Ga_0.85As layer at low QD growth temperatures, (ii) the QD density and size distributions for the structure with QD grown at 510 ^°C, (iii) the high concentration of nonradiative recombination centers in the GaAs barrier at higher QD growth temperatures.