Morphology and optical properties of p-type porous GaAs(1 0 0) layers made by electrochemical etching

Porous GaAs layers were formed by electrochemical etching of p-type GaAs(1 0 0) substrates in HF solution. A surface characterization has been performed on p-type GaAs samples using X-ray photoelectron spectroscopy (XPS) technique in order to get information about the chemical composition, particularly on the surface contamination. According to the XPS spectra, the oxide layer on as-received porous GaAs substrates contains As₂O₃, As₂O₅ and Ga₂O₃. Large amount of oxygen is present at the surface before the surface cleaning.Compared to untreated GaAs surface, room temperature photoluminescence (PL) investigations of the porous layers reveal the presence of two PL bands: a PL peak at ∼871 nm and a “visible” PL peak at ∼650-680 nm. Both peak wavelengths and intensities varied from sample to sample depending on the treatment that the samples have undergone. The short PL wavelength at 650-680 nm of the porous layers is attributed to quantum confinement effects in GaAs nano-crystallites. The surface morphology of porous GaAs has been studied using atomic force microscopy (AFM). Nano-sized crystallites were observed on the porous GaAs surface. An estimation of the mean size of the GaAs nano-crystals obtained from effective mass theory and based on PL data was close to the lowest value obtained from the AFM results.     

Comparison of the band alignment of strained and strain-compensated GaInNAs QWs on GaAs and InP substrates

We present a comparison of the band alignment of the Ga_1−xIn_xN_yAs_1−y active layers on GaAs and InP substrates in the case of conventionally strained and strain-compensated quantum wells. Our calculated results present that the band alignment of the tensile-strained Ga_1−xIn_xN_yAs_1−y quantum wells on InP substrates is better than than that of the compressively strained Ga_1−xIn_xN_yAs_1−y quantum wells on GaAs substrates and both substrates provide deeper conduction wells. Therefore, tensile-strained Ga_1−xIn_xN_yAs_1−y quantum wells with In concentrations of x0.53 on InP substrates can be used safely from the band alignment point of view when TM polarisation is required. Our calculated results also confirm that strain compensation can be used to balance the strain in the well material and it improves especially the band alignment of dilute nitride Ga_1−xIn_xN_yAs_1−y active layers on GaAs substrates. Our calculations enlighten the intrinsic superiority of N-based lasers and offer the conventionally strained and strain-compensated Ga_1−xIn_xN_yAs_1−y laser system on GaAs and InP substrates as ideal candidates for high temperature operation.     

Role of hydrogen in improving optical quality of GaNAs alloys

Effects of hydrogen irradiation on optical quality of GaN_xAs_1−x alloys grown by gas source molecular beam epitaxy are studied by photoluminescence (PL) and PL excitation spectroscopies. A strong blue shift of the alloy band gap towards the value of a reference N-free GaAs samples is revealed. Substantial improvements in the optical quality of the structures induced by hydrogen, due to a reduction of band edge potential fluctuations, is also demonstrated. The effect is tentatively attributed to the preferential trapping of hydrogen atoms at the lattice sites with the highest N compositions, which leads to the neutralization of electronic states contributing to the band tail states as well as to the improvement in strain uniformity.     

A novel method for positioning of InAs islands on GaAs (1 1 0)

A novel method for positioning of InAs islands on GaAs (1 1 0) by cleaved edge overgrowth is reported. The first growth sample contains strained In_xGa_1−xAs/GaAs superlattice (SL) of varying indium fraction, which acts as a strain nanopattern for the cleaved-edge overgrowth. Atoms incident on the cleaved edge will preferentially migrate to InGaAs regions where favorable bonding sites are available. By this method InAs island chains with lateral periodicity defined by the thickness of InGaAs and GaAs of SL have been realized by molecular beam epitaxy (MBE). They are observed by means of atomic force microscopy (AFM). The strain nanopattern's effect is studied by the different indium fraction of SL and MBE growth conditions.     

Structural and vibrational properties of dilute GaNxAs1−x(P1−x)

We report a comprehensive analyzes of the Fourier transform infrared (FTIR) absorption and Raman scattering data on the structural and vibrational properties of dilute ternary GaAs_1−xN_x,[GaP_1−xN_x] (x<0.03) alloys grown on GaAs [GaP] by metal organic chemical vapor deposition (MOCVD) and solid source molecular beam epitaxy (MBE). By using realistic total energy and lattice dynamical calculations, the origin of experimentally observed N-induced vibrational features are characterized. Useful information is obtained about the structural stability, vibrational frequencies, lattice relaxations and compositional disorder in GaNAs (GaNP) alloys. At lower composition (x<0.015) most of the N atoms occupy the As [P] sublattice {N_As[N_P]}—they prefer moving out of their substitutional sites to more energetically favorable locations at higher x. Our results for the N-isotopic shifts of local mode frequencies compare favorably well with the existing FTIR data.     

Chemically prepared well-ordered InP(0 0 1) surfaces

In the present work HCl-isopropanol treated and vacuum annealed InP(0 0 1) surfaces were studied by means of low-energy electron diffraction (LEED), soft X-ray photoemission (SXPS), and reflectance anisotropy (RAS) spectroscopies. The treatment removes the natural oxide and leaves on the surface a physisorbed overlayer containing InCl_x and phosphorus. Annealing at 230 °C induces desorption of InCl_x overlayer and reveals a P-rich (2 × 1) surface. Subsequent annealing at higher temperature induces In-rich (2 × 4) surface. The structural properties of chemically prepared InP(0 0 1) surfaces were found to be similar to those obtained by decapping of As/P-capped epitaxial layers.     

Well defined superlattice structures made by phase-locked epitary using RHEED intensity oscillations

Long continuing intensity oscillations of the RHEED pattern in the [100] azimuth on a (001) oriented substrate were observed during MBE growth of GaAs and Al_xGa_1−xAs. Using these oscillations, growth rates of GaAs and Al_xGa_1−xAs, and the Al mole fraction x of the Al_xGa_1−xAs were accurately monitored during the growth. The phase of the RHEED oscillations was analyzed by computer and molecular beam shutters were operated at a particular phase of the oscillations. This computer controlled phase-locked epitaxy (PLE) was used to grow precisely defined (GaAs)₂(AlAs)₂ bi-layer superlattices. Raman scattering spectra of the bi-layer superlattice showed split lines characteristic of superlattices. From TEM observation of a GaAs-AlAs multi-layered structure, it was verified that one cycle of oscillations corresponds to one monolayer growth of GaAs and AlAs. This PLE has a great advantage over the conventional MBE growth method for the precise control of very thin films and superlattice structures because it is invulnerable to fluctuations of molecular beam flux intensity.     

Optical anisotropy and surface morphology of InGaAs lattice-mismatched with GaAs(0 0 1)

We investigated surface morphology and optical anisotropy of strained InGaAs films grown on GaAs(0 0 1) substrate using atomic force microscopy (AFM) and reflectance difference/reflectance anisotropy spectroscopy (RDS/RAS). High temperature (HT)-grown samples were found to have a rippled surface structure, however for films grown using a low temperature (LT) growth technique, the surface morphology was significantly improved, without the ripple structure seen on the HT samples. Furthermore, ex situ RD spectra of LT-grown samples showed notable peaks near the critical energies of band structure originated from bulk electronic transitions.     

Optical properties of GaNAs/GaAs triple quantum well structures

Optical properties of the GaNAs/GaAs triple quantum well structures were characterized by using photoreflectance and photoluminescence spectroscopy at different temperatures. The excitonic interband transitions of the triple quantum well systems were observed in the spectral range above hν=E_g(GaN_xAs_1−x). A matrix transfer algorithm was used to match the GaN_xAs_1−x/GaAs boundary conditions and calculate the triple quantum well subband energies numerically for theoretical comparison. The internal electric field in the system was extracted from Franz-Keldysh oscillations in the photoreflectance spectra. The influences of the annealing treatment on the transition energy and the internal electric field are also analyzed.     

Comparative study of (1 0 0) and (1 1 1)B InGaAs single quantum well laser diodes

In this work, a series of identical In_xGa_1−xAs/Al_yGa_1−yAs single quantum well laser diodes, grown on (1 0 0) and (1 1 1)B GaAs substrates, have been thoroughly studied. For all samples, clear evidence of reduced threshold current densities in the (1 1 1)B substrate has been observed in electroluminescence spectra at 17 and 300 K. Modelling of the devices, based on a self-consistent solution of Schrödinger–Poisson's equations, was utilised in order to reproduce the experimental results. The model incorporates strain and piezoelectric effects on the quantum well states, free carrier screening, overlap integral computation, and optical gain calculation. The underlying mechanism, that explains the threshold reduction observed in the (1 1 1)B laser diodes, is discussed based on the results of the modelling.     

Systematic theoretical investigations for contribution of lattice constraint to novel atomic arrangements in alloy semiconductor thin films

The atomic arrangements in zinc blende structured GaN_xAs_1−x thin films coherently grown on V-grooved substrates are theoretically investigated using empirical interatomic potentials and Monte Carlo simulation. The resultant atomic arrangements in GaN_xAs_1−x strongly depend on concentration x and substrate lattice parameter a_sub. Surface segregation of As or N is mainly found in GaN_xAs_1−x with large lattice mismatch to the substrate. On the other hand, the novel atomic arrangements such as layered segregation or ordered structure are found in GaN_xAs_1−x at the specific region such as (x, a_sub) = (0.5, 5.3), (0.3, 5.3), and (0.3, 5.1). This specific region corresponds to that with negative excess energy and with sufficient N and As atoms remaining in thin film layers even after their surface segregation. The formation of the novel atomic arrangements is discussed in terms of bond lengths in the surface layers. These results suggest that various novel atomic arrangements in alloy semiconductor thin films appear depending on x and a_sub which control degree of lattice constraint.     

Energy band gaps for the GaxIn1−xAsyP1−y alloys lattice matched to different substrates

A pseudopotential formalism within the virtual crystal approximation in which the effects of composition disorder are involved is applied to the Ga_xIn_1−xAs_yP_1−y quaternary alloys in conditions of lattice matching to GaAs, InP and ZnSe substrates so as to predict their energy band gaps. Very good agreement is obtained between the calculated values and the available experimental data for the alloy lattice matched to InP and GaAs. The alloy is found to be a direct-gap semiconductor for all y compositions whatever the lattice matching to the substrates of interest. The (Γ→Γ) band-gap ranges and the ionicity character are found to depend considerably on the particular lattice-matched substrates suggesting therefore that, for an appropriate choice of y and the substrate, Ga_xIn_1−xAs_yP_1−y could provide more diverse opportunities to obtain desired band gaps, which opens up the possibility of discovering new electronic devices with special features and properties.     

Photoluminescence of Al x Ga1−x As/GaAs quantum well heterostructures grown by molecular beam epitaxy

Nominally undoped Al_xGa_1–xAs grown by molecular beam epitaxy from As₄ species at elevated substrate temperatures of 670°C exhibits well-resolved excitonic fine structure in the low-temperature photoluminescence spectra, if the effective As-to-(Al+Ga) flux ratio on the growth surface is kept within a rather narrow range of clearly As-stabilized conditions. In contrast to previous results on Al_xGa_1–xAs of composition 0.15not to shift in energy by changing the excitation intensity. This implies a simple freeelectron carbon-acceptor recombination mechanism for the line without any participation of a donor. In Al_xGa_1–xAs of composition close to the direct-to-indirect cross-over point, two distinct LO-phonons separated by 34 and 48 meV from the (D ⁰,C ⁰) peak position at x=0.43 were observed which were before only detectable by Raman scattering experiments. The intensity of the carbon-impurity related luminescence lines in bulk-type Al_xGa_1–xAs and GaAs layers was found to be strongly reduced, as compared to the excitonic recombination lines, if the respective active layer was covered by a very thin confinement layer of either GaAs on top of Al_xGa_1–xAs or vice versa grown in the same growth cycle.     

Contactless electroreflectance spectroscopy of Ga(In)NAs/GaAs quantum well structures containing Sb atoms

Contactless electroreflectance (CER) spectroscopy has been applied to investigate the optical transitions in Ga(In)NAs/GaAs quantum well (QW) structures containing Sb atoms. The identification of the optical transitions has been carried out in accordance with theoretical calculations which have been performed within the framework of the effective mass approximation. Using this method, the bandgap discontinuity for GaN_0.027As_0.863Sb_0.11/GaAs, Ga_0.62In_0.38As_0.954N_0.026Sb_0.02/GaAs, and Ga_0.61In_0.39As_0.963N_0.017Sb_0.02/GaN_0.027As_0.973/GaAs QW structures has been determined. It has been found that the conduction-band offset is ∼50 and ∼80% for GaN_0.027As_0.863Sb_0.11/GaAs and Ga_0.62In_0.38As_0.954N_0.026Sb_0.02/GaAs QWs, respectively. It corresponds to 264 and 296 meV depth QW for electrons and heavy-holes in GaN_0.027As_0.863Sb_0.11/GaAs QW; and 520 and 146 meV depth QW for electrons and heavy-holes in Ga_0.62In_0.38As_0.954N_0.026Sb_0.02/GaAs QW. In the case of the Ga_0.61In_0.39As_0.963N_0.017Sb_0.02/GaN_0.027As_0.973/GaAs step-like QW structure it has been shown that the depth of electron and heavy-hole Ga_0.61In_0.39As_0.963N_0.017Sb_0.02/GaN_0.027As_0.973 QW is ∼144 and ∼127 meV, respectively.     

Numerical analysis of the short-circuit current density in GaInAsSb thermophotovoltaic diodes

In this paper, a simulation and analysis on the short-circuit current density (J_sc) of the P-GaSb window/P-Ga_xIn_1−xAs_1−ySb_y emitter/N-Ga_xIn_1−xAs_1−ySb_y base/N-GaSb substrate structure is performed. The simulations are carried out with a fixed spectral control filter at a radiator temperature (T_rad) of 950 °C, diode temperature (T_dio) of 27 °C and diode bandgap (E_g) of 0.5 eV. The radiation photons are injected from the front P-side. Expressions for minority carrier mobility and absorption coefficient of Ga_xIn_1−xAs_1−ySb_y semiconductors are derived from Caughey–Thomas and Adachi’s model, respectively. The P-Ga_xIn_1−xAs_1−ySb_y emitter with a much longer diffusion length is adopted as the main optical absorption region and the N-Ga_xIn_1−xAs_1−ySb_y base region contribute little to J_sc. The effect of P-GaSb window and P-Ga_xIn_1−xAs_1−ySb_y emitter region parameters on J_sc is mainly analyzed. Dependence of J_sc on thickness and carrier concentration of the window are analyzed; these two parameters need to be properly selected to improve J_sc. Contributions from the main carrier recombination mechanisms in the emitter region are considered; J_sc can be improved by suppressing the carrier recombination rate. Dependence of J_sc on the carrier concentration and layer thickness of the emitter P-region are also analyzed; these two parameters have strong effect on J_sc. Moreover, adding a back surface reflector (BSR) to the diode can improve J_sc. The simulated results are compared with the available experimental data and are found to be in good agreement. These theoretical simulations help us to better understand the electro-optical behavior of Ga_xIn_1−xAs_1−ySb_y TPV diode and can be utilized for performance enhancement through optimization of the device structure.     

稀掺杂GaNxAs1－x(x≤0.03)薄膜的调制光谱研究

利用室温下压电调制反射光(PzR)谱技术系统测量了N掺杂浓度为0.0%—3%的分子束外延生长GaN_xAs_1-x薄膜，并对图谱中所观察的光学跃迁进行了指认.在GaN_0.005As_0.995和GaN_0.01As_0.99薄膜的PzR谱中观察到此前只在椭圆偏振谱中才看到的N掺杂相关能态E₁+Δ₁+Δ_N.当N掺杂浓度达到 关键词： 压电调制反射光谱(PzR) xAs_1-x薄膜')" href="#">GaN_xAs_1-x薄膜 分子束外延(MBE)     

Photoluminescence characterization of air exposed AlGaAs surface and passivated ex situ by ultrathin silicon interface control layer

Using the photoluminescence surface state spectroscopy (PLS³) technique, attempts were made to determine the surface state density (N_ss) distribution on Al_xGa_1−xAs (x≈0.3) surfaces passivated by the Si interface control layer (ICL) technique. Air-exposed AlGaAs epitaxial wafers which are technologically important for fabrication of various devices were passivated ex situ by forming a SiO₂/Si₃N₄/Si ICL/AlGaAs structure after the HCl treatment and their photoluminescence behavior was investigated in detail. The result of the PLS³ analysis indicated that Si ICL-based passivation reduces the minimum interface state density value down to 10¹⁰ cm⁻² eV⁻¹ range. Some indication was also obtained that further improvements are possible by using electron cyclotron resonance (ECR)-enhanced N₂ plasma for Si₃N₄/Si ICL interface formation.     

Structural and electronic properties of GaAsBi

The structural and electronic properties of the GaAs_1−xBi_x ternary alloy are investigated by means of two first principles and full potential methods, the linear augmented plane waves (FPLAPW) method and a recent version of the full potential linear muffin-tin orbitals method (FPLMTO) which enables an accurate treatment of the interstitial regions. In particular, we have found that the maximal GaBi mole fraction x for which GaBi_xAs_1−x remains a semiconductor is probably around x=0.5. The electronic properties of (GaAs)_m/(GaBi)_n quantum well superlattices (SLs) have also been calculated and it is found that such SLs are semiconductors when m is larger or equal to n.     

Contactless electroreflectance of GaNyAs1−y/GaAs multi quantum wells: The conduction band offset and electron effective mass issues

Interband transitions in GaN_yAs_1−y/GaAs multi quantum well (MQW) samples with y=0.012 and 0.023 have been studied by contactless electroreflectance spectroscopy (CER). Optical transitions related to absorption in the GaAs barriers and in the GaN_yAs_1−y/GaAs QWs have been observed and analyzed. The GaAs related transition exhibits clear Franz-Keldysh oscillations with the period corresponding to the built-in electric field of 14 and 17 kV/cm for samples with y=0.012 and 0.023, respectively. The portion of the CER spectrum related to absorption in the GaN_yAs_1−y/GaAs QW exhibits two clear resonances which are attributed to optical transitions between the ground and excited states confined in the QWs. The resonance attributed to the ground state transition is associated with absorption between the first light- and heavy-hole subbands and the first electron subband (11L and 11H) while the resonance attributed to the excited state transition is associated with absorption between the second heavy-hole subband and the second electron subband (22H). The energies of the 11H and 22H transitions have been matched with those obtained from theoretical calculations performed within the effective mass approximation. Thus, the GaN_yAs_1−y/GaAs QWs are type-I structures with a conduction band offset, Q_C, between 70 and 80%. Moreover, the incorporation of N atoms into GaAs is found to cause a significant increase in the electron effective mass. The determined values of electron effective mass for GaN_yAs_1−y/GaAs QW with y=0.012 and 0.023 are 0.105m₀ and 0.115m₀, respectively.     

Effect of structural defects on InSb/AlxIn1−x Sb quantum wells grown on GaAs (0 0 1) substrates

We investigate oriented abrupt steps (OASs), a type of surface defect in InSb/Al_xIn_1−xSb quantum-well (QW) samples grown on GaAs (0 0 1) substrates. Previous atomic force microscopy studies have reported that the OASs are oriented along the [1 1 0] and directions and have an inclination angle of 5°–15° with respect to the sample surface. Our plan-view and cross-sectional transmission electron microscopy analyses reveal that the OASs are the terminal edges of threading micro-twins at the sample surface. Hall effect measurements indicate that the density of OASs correlates with the electron mobility in the InSb QWs.