Reaction mechanism for CO oxidation on Cu(3 1 1): A density functional theory study

The microscopic reaction mechanism for CO oxidation on Cu(3 1 1) surface has been investigated by means of comprehensive density functional theory (DFT) calculations. The elementary steps studied include O₂ adsorption and dissociation, dissociated O atom adsorption and diffusion, as well as CO adsorption and oxidation on the metal. Our results reveal that O₂ is considerably reactive on the Cu(3 1 1) surface and will spontaneously dissociate at several adsorption states, which process are highly dependent on the orientation and site of the adsorbed oxygen molecule. The dissociated O atom may likely diffuse via inner terrace sites or from a terrace site to a step site due to the low barriers. Furthermore, we find that the energetically most favorable site for CO molecule on Cu(3 1 1) is the step edge site. According to our calculations, the reaction barrier of CO + O → CO₂ is about 0.3 eV lower in energy than that of CO + O₂ → CO₂ + O, suggesting the former mechanism play a main role in CO oxidation on the Cu(3 1 1) surface.     

Kinetic aspect of CO2 reforming of CH4 on Ni(1 1 1): A density functional theory calculation

Reaction pathways of CO₂ reforming of CH₄ on Ni(1 1 1) were investigated by using density functional theory calculation. The computed kinetic parameters agree with the available experimental data, and a new and simplified mechanism was proposed on the basis of computed energy barriers. The first step is CO₂ dissociation into surface CO and O (CO₂ → CO + O) and CH₄ sequentially dissociation into surface CH and H (CH₄ → CH₃ → CH₂ → CH). The second step is CH oxygenation into CHO (CH + O → CHO), which is more favored than its dissociation into C and hydrogen (CH → C + H). The third step is the dissociation of CHO into surface CO and H (CHO → CO + H). Finally, H₂ and CO desorb from Ni(1 1 1) and form free H₂ and CO. The rate-determining step is the CH₄ dissociative adsorption, and the key intermediate is surface adsorbed CHO. Parameters, which might modify the proposed mechanism, have been analyzed. In addition, the formation, deposition and elimination of surface carbon have been discussed accordingly.     

The initial interactions of beryllium with O2 and H2O vapor at elevated temperatures

In the 310-790 K temperature range, the mechanism of initial oxidation by O₂ is oxide island nucleation and growth. At the lower temperature range, oxygen is first chemisorbed and the oxide nucleates at coverage of ∼0.2. Increasing the temperature causes the oxide islands to nucleate at lower coverage and at 700 K and above, the oxide nucleates without any significant stage of chemisorbed oxygen. The temperature dependence shows that while the dissociation stage is not activated, the oxide nucleation and growth are thermally activated. Also, opposite to O₂ adsorption, the initial H₂O adsorption and oxidation rate was found to decrease with temperature. Opposite to the oxygen case, upon exposure to water vapor there is no noticeable stage of chemisorbed oxygen (or OH) and oxide is directly nucleated. Only after oxide coalescence, this tendency changes and the oxidation rate is increased with temperature.     

A theoretical study of the water gas shift reaction mechanism on Cu(1 1 1) model system

The water gas shift (WGS) reaction is an important reaction system and has wide applications in several processes. However, the mechanism of the reaction is still in dispute. In this paper we have investigated the reaction mechanism on the model Cu(1 1 1) system using the density functional method and slab models. We have characterized the kinetics and the thermodynamics of the four reaction pathways containing 24 elementary steps and computed the reaction potential energy surfaces. Calculations show that the formate (HCOO) intermediate mechanism (CO + OH → HCOO → CO₂ + H) and the associative mechanism (CO + OH → CO₂ + H) are kinetically unlikely because of the high formation barrier. On the other hand, the carboxyl (HOCO) intermediate mechanism (CO + OH → HOCO → CO₂ + H) and the redox mechanism (CO + O → CO₂) are demonstrated to be feasible. Our calculations also indicate that surface oxygen atoms can reduce the barriers of both water dissociation and HOCO decomposition significantly. The calculated potential energy surfaces show that the water dissociation which produces OH groups is the rate-determining step at the initial stage of the reaction or in the absence of surface oxygen atoms. With the development of the reaction or in the presence of oxygen atoms on the surface, CO + OH → HOCO and CO + O → CO₂ become the rate-limiting step for the carboxyl and redox mechanisms, respectively.     

The adsorption of CO2 and CO on Ca and CaO films studied with MIES, UPS and XPS

Metastable Induced Electron Spectroscopy (MIES), Ultraviolet Photoelectron Spectroscopy (UPS), and X-ray Photoelectron Spectroscopy (XPS) are employed to study the adsorption of CO₂ and CO on Ca and CaO films. Ca films are prepared by evaporation of Ca onto clean Si(1 0 0) substrates. CaO films are produced by Ca evaporation in an oxygen atmosphere at a substrate temperature of 670 K. CO₂ interaction with the Ca films is initiated by dissociation of the impinging molecules leading to the formation of Ca-O bonds. These Ca-O bonds are subsequently consumed in the formation of a closed CaCO₃ layer on top of the surface. CO interaction with the Ca surfaces also leads to the dissociation of the molecule and the formation of Ca-O bonds. We find evidence for the subsequent formation of complexes on top of the surface. On CaO surfaces, both CO₂ and CO lead to the formation of a closed CaCO₃ top layer, though displaying very different reaction rates.     

Adsorption of silane and methylsilane on gold surfaces

The adsorption of silane and methylsilane on the (1 1 0) and polycrystalline surfaces of gold is examined using vibrational electron energy loss spectroscopy (VEELS), angle-resolved ultraviolet photoelectron spectroscopy (ARUPS) and X-ray photoelectron spectroscopy (XPS). Adsorption of silane onto the Au(1 1 0) surface at low temperatures is dissociative and yields an SiH₂ and possibly also SiH₃ surface species. Further dissociation occurs at room temperature to yield adsorbed SiH, which is tilted on the surface, with complete dissociation to Si occurring by 110 °C. The similarity in the UP spectra for silane adsorbed on the polycrystalline sample suggests that the same surface species are present over that temperature range. Above 200 °C, spectral changes suggest rearrangement of the Si atoms, which, by 350 °C, have diffused into the bulk. Adsorption of methylsilane onto the (1 1 0) surface at low temperatures initially produces adsorbed CH₃SiH or CH₃SiH₂, with undissociated methylsilane physisorbing at higher exposures. By room temperature, desorption and decomposition leaves (or direct adsorption yields) only adsorbed CH₃Si. After further heating, the hydrogen-carbon bonds of the CH₃ group break to leave an adsorbed SiC species. On the polycrystalline surface, methylsilane adsorption is the same at low temperatures as on (1 1 0). In contrast to the latter, though, the UP spectra indicate that direct exposures at room temperature yield adsorbed Si or SiC initially, with CH₃Si again adsorbing at higher exposures. Upon further heating to 330 °C, little if any methyl-groups remain on the surface and the Si has started to diffuse into the bulk.     

Interaction of ethylene with palladium clusters supported on oxidised tungsten foil

The reactivity with ethylene of palladium clusters supported on oxidised tungsten foil has been investigated by synchrotron radiation-induced photoelectron spectroscopy and temperature programmed desorption. The effect of the heat pre-treatment of the sample on the interaction strength with ethylene is demonstrated. Already at room temperature, adsorption of ethylene causes breaking of both the C-H and C-C bonds and the appearance of a highly reactive C₁ phase with unsaturated bonds. A part of this phase is oxidised to carbon monoxide by oxygen supplied by the support immediately after ethylene adsorption. Another part of ethylene is probably adsorbed in the form of ethylidyne. Heating at temperatures between 400 K and 500 K brings about the dissolution of the C₁ phase in the shallow subsurface region of the Pd clusters. Further oxidation of the C₁ phase by oxygen from the support proceeds at ∼600 K. Substantial reduction of the concentration of C₁ phase at room temperature is observed after heat pre-treatment of the sample at 500 K, while complete suppression of the room temperature ethylene chemisorption proceeds upon heat pre-treatment at 800 K. This effect is related to thermally induced encapsulation of palladium clusters in surface tungsten oxide.     

Inhibition of hydrogen chemisorption on uranium surfaces by traces of water vapor

Traces of about 2% water vapor are sufficient to inhibit hydrogen dissociation and chemisorption on uranium surfaces, under low pressure exposures, at room temperature. The efficiency of the inhibition increases with temperature in the range of 200 - 400 K. The inhibition effect is also influenced by the extent of residual strain of the sample, with increasing inhibition efficiencies exhibited by a less strained surface. O₂, in contrast to H₂O, is not an inhibitor to surface adsorption and dissociation of hydrogen. Three types of mechanisms are discussed in order to account for the above inhibition effect of water. It is concluded that the most probable mechanism involves the reversible adsorption of water molecules on hydrogen dissociation sites causing their “blocking”.     

Kinetic study of chlorine behavior in the waste incineration process

The waste incineration atmosphere was simulated as HCl/H₂O/O₂/CO₂/N₂ in order to experimentally study chlorine behavior as temperature ranges from 1173 to 1473 K and residence time varies. The results show that Cl radicals, produced by the decomposition of HCl at high temperature, mainly recombine to form Cl₂ and HCl at the quenching section. It was found that temperature, residence time, cooling rate and feeding gas composition influence Cl₂ concentration. To thoroughly understand this reaction system, a kinetic model was developed and validated against experimental results. The key reactions and main pathway were found out with the use of sensitivity and rate of production analysis (ROP). The reaction HCl + O₂ → Cl + HO₂ was shown to initiate the reaction system, and it was found that a significant amount of Cl₂ was simultaneously produced by the following high temperature reaction: Cl + HOCl → Cl₂ + OH. In the cooling process, the main consumption reactions of Cl radicals were H₂O + Cl → HCl + OH, OH + Cl → HCl + O and Cl + Cl + M → Cl₂ + M. Among these, the first two reactions can be used to explain the effect of H₂O on the concentration of Cl radical at high temperature. In addition, the influence of the quenching rate on the distribution of chlorine was found to occur because of the varying effects that temperature change causes to the different Cl radical consumption reactions.     

Methanol adsorption on a CeO2(1 1 1)/Cu(1 1 1) thin film model catalyst

Adsorption and desorption of methanol on a CeO₂(1 1 1)/Cu(1 1 1) thin film surface was investigated by XPS and soft X-ray synchrotron radiation PES. Resonance PES was used to determine the occupancy of the Ce 4f states with high sensitivity. Methanol adsorbed at 110 K formed adsorbate multilayers, which were partially desorbed at 140 K. Low temperature desorption was accompanied by formation of chemisorbed methoxy groups. Methanol strongly reduced cerium oxide by forming hydroxyl groups at first, which with increasing temperature was followed by creation of oxygen vacancies in the topmost cerium oxide layer due to water desorption. Dissociative methanol adsorption and creation of oxygen vacancies was observed as a Ce⁴⁺ → Ce³⁺ transition and an increase of the Ce 4f electronic state occupancy.     

Quantum chemical and RRKM calculations of reactions in the H/S/O system

Quantum chemical calculations at the MRCI/aug-cc-pV5Z level are used to describe the conversions between HSO, HOS, H + SO, S + OH and O + SH on the doublet H/S/O potential energy surface. An RRKM analysis of this multiple-well system was carried out in the temperature range 300-2000 K between 0.1 and 10 atm. At these pressures, the stabilization reaction H + SO → HSO or HOS is at the low pressure limit, and stabilization from S + OH and O + SH was not detected. The reactions S + OH → H + SO and O + SH → H + SO were found to be barrierless and very fast at room temperature (4 × 10¹⁴ and 1.5 × 10¹⁴ cm³ mol⁻¹ s⁻¹, respectively). The reaction channel O + SH → S + OH is two orders of magnitude slower than the more exothermic O + SH → H + SO reaction, although a second pathway involving direct H-abstraction (O + SH → S + OH) on the quartet surface appears as a minor channel at high temperatures.     

Interaction of H2O with the RuO2(1 1 0) surface studied by HREELS and TDS

The adsorption of water on a RuO₂(1 1 0) surface was studied by using high-resolution electron energy loss spectroscopy (HREELS) and thermal desorption spectroscopy (TDS). The first thermal desorption peak observed between 350 and 425 K is attributed to molecular water adsorbed on fivefold coordinated Ru_cus sites. Higher coverages of water give rise to TDS peaks between 190 and 160 K, which we attribute to water in the second layer bound to bridge oxygen, and multilayers, respectively. HREELS shows that H₂O chemisorbs on Ru_cus sites through oxygen inducing a slight red shift of the vibrational frequency of O_bridge atoms. Molecular adsorption is also confirmed by the presence of both the scissor and the libration modes showing the expected isotopic shift for D₂O. The water adsorbed on the Ru_cus sites also forms hydrogen bonds with the bridge oxygen indicated by the broad intensity at the lower frequency side of the O-H stretch mode. HREELS and TDS results suggest that on the perfect RuO₂(1 1 0) surface water dissociation is almost negligible.     

Adsorption of water on thin V2O3(0 0 0 1) films

V₂O₃(0 0 0 1) films have been grown epitaxially on Au(1 1 1) and W(1 1 0). Under typical UHV conditions these films are terminated by a layer of vanadyl groups as has been shown previously [A.-C. Dupuis, M. Abu Haija, B. Richter, H. Kuhlenbeck, H.-J. Freund, V₂O₃(0 0 0 1) on Au(1 1 1) and W(1 1 0): growth, termination and electronic structure, Surf. Sci. 539 (2003) 99]. Electron irradiation may remove the oxygen atoms of this layer. H₂O adsorption on the vanadyl terminated surface and on the reduced surface has been studied with thermal desorption spectroscopy (TDS), vibrational spectroscopy (IRAS) and electron spectroscopy (XPS) using light from the BESSY II electron storage ring in Berlin. It is shown that water molecules interact only weakly with the vanadyl terminated surface: water is adsorbed molecularly and desorbs below room temperature. On the reduced surface water partially dissociates and forms a layer of hydroxyl groups which may be detected on the surface up to T ∼ 600 K. Below ∼330 K also co-adsorbed molecular water is detected. The water dissociation products desorb as molecular water which means that they recombine before desorption. No sign of surface re-oxidation could be detected after desorption, indicating that the dissociation products desorb completely.     

Mixed water/OH structures on Pd(1 1 1)

Chemisorbed O and water react on Pd(1 1 1) at low temperatures to form a mixed OH/H₂O layer with a (√3 × √3)R30° registry. Reaction requires at least two water molecules to each O before the (2 × 2)O islands are consumed, the most stable OH/water structure being a (OH + H₂O) layer containing 0.67 ML of oxygen, formed by the reaction 3H₂O + O → 2(H₂O + OH). This structure is stabilised compared to pure water structures, decomposing at 190 K as OH recombines and water desorbs. The (√3 × √3)R30° − (OH + H₂O) phase cannot be formed by O/H reaction and is distinct from the (√3 × √3)R30° structure formed by O/H coadsorption below 200 K. Mixed OH/water structures do not react with coadsorbed H below 190 K on Pd(1 1 1), preventing this phase catalyzing the low temperature H₂/O₂ reaction which only occurs at higher temperatures.     

A kinetic Monte Carlo/UBI-QEP model of O2 adsorption on fcc (1 1 1) metal surfaces

The previously developed kinetic Monte Carlo model of molecular oxygen adsorption on fcc (1 0 0) metal surfaces has been extended to fcc (1 1 1) surfaces. The model treats uniformly all elementary steps of the process—O₂ adsorption, dissociation, recombination, desorption, and atomic oxygen hopping—at various coverages and temperatures. The model employs the unity bond index—quadratic exponential potential (UBI-QEP) formalism to calculate coverage-dependent energetics (atomic and molecular binding energies and activation barriers of elementary steps) and a Metropolis-type algorithm including the Arrhenius-type reaction rates to calculate coverage- and temperature-dependent features, particularly the adsorbate distribution over the surface. Optimal values of non-energetic model parameters (the spatial constraint, a travel distance of “hot” atoms, attempt frequencies of elementary steps) have been chosen. Proper modifications of the fcc (1 0 0) model have been made to reflect structural differences in the fcc (1 1 1) surface, in particular the presence of two different hollow sites (fcc and hcp). Detailed simulations were performed for molecular oxygen adsorption on Ni(1 1 1). We found that at very low coverages, only O₂ adsorption and dissociation were effective, while O₂ desorption and O₂ and O diffusion practically did not occur. At a certain O + O₂ coverage, the O₂ dissociation becomes the fastest process with a rate one-two orders of magnitude higher than adsorption. Dissociation continuously slows down due to an increase in the activation energy of dissociation and due to the exhaustion of free sites. The binding energies of both molecular and atomic oxygen decrease with coverage, and this leads to greater mobility of atomic oxygen and more pronounced desorption of molecular oxygen. Saturation is observed when the number of adsorbed molecules becomes approximately equal to the number of desorbed molecules. Simulated coverage dependences of the sticking probability and of the atomic binding energy are in reasonable agreement with experimental data. From comparison with the results of the previous work, it appears that the binding energy profiles for Ni(1 1 1) and Ni(1 0 0) have similar shapes, although at any coverage the absolute values of the oxygen binding energy are higher for the (1 0 0) surface. For metals other than Ni, particularly Pt, the model projections were found to be too parameter-dependent and therefore less certain. In such cases further model developments are needed, and we briefly comment on this situation.     

Interactions of water vapor with polycrystalline uranium surfaces

The initial room-temperature interactions of water vapor with polycrystalline bulk annealed uranium surfaces were studied by combined measurements utilizing direct recoil spectrometry (DRS) and X-ray photoelectron spectroscopy (XPS). It was found that the water goes through a complete dissociation into oxidic oxygen and two neutral H atoms throughout the whole exposure range. The process proceeds by two consecutive stages: (i) below about 80% monolayer coverage, the dissociation products chemisorb mainly on the remaining non-reacted metallic surface by a simple Langmuir-type process; (ii) between about 80% and full coverage, three-dimensional oxide islands (that start to form at 50-60% coverage) cover most of the surface and full dissociation continues on top of them. It seems that on top of the oxide the dissociation consists of a two-step process: first partial dissociation into OH⁻ + H⁰, where the neutral hydrogen atom chemisorbs on the oxide and the hydroxyl group migrates into the subsurface region and then undergoes a reductive dissociation at the oxide-metal interface, producing a second hydrogen atom, located beneath the surface.     

Photoelectron spectroscopy study of oxygen adsorption on Mo2C(0 0 0 1)

Oxygen adsorption on the α-Mo₂C(0 0 0 1) surface has been investigated with X-ray photoelectron spectroscopy and valence photoelectron spectroscopy utilizing synchrotron radiation. It is found that oxygen adsorbs dissociatively at room temperature, and the adsorbed oxygen atoms interact with both Mo and C atoms to form an oxycarbide layer. As the O-adsorbed surface is heated at ≧800 K, the C-O bonds are broken and the adsorbed oxygen atoms are bound only to Mo atoms. Valence PES study shows that the oxygen adsorption induces a peculiar state around the Fermi level, which enhances the emission intensity at the Fermi edge in PES spectra.     

Experimental and detailed kinetic modeling study of the high pressure oxidation of methanol sensitized by nitric oxide and nitrogen dioxide

The perturbation of the combustion by NO_x is important in several practical systems (recent NO_x-reduction strategies, combustion with exhaust-gas recirculation in diesel and HCCI engines and for mild combustion). New experimental results were obtained for the oxidation of methanol in absence and in presence of NO or NO₂ in a fused silica jet-stirred reactor operating at 10 atm, over the temperature range 700-1100 K. Probe sampling followed by on-line FTIR analyses and off-line GC-TCD/FID analyses permitted to measure the concentration profiles of the reactants, stable intermediates and the final products. A detailed chemical kinetic modeling of the present experiments was performed. An overall good agreement between the present data and this modeling was obtained. The oxidation of methanol is significantly sensitized by NO₂, whereas the effect of NO is more limited. According to the proposed model, the mutual sensitization of the oxidation of methanol and NO proceeds through the NO to NO₂ conversion by HO₂. The increased production of OH resulting from the oxidation of NO by HO₂ promotes the oxidation of the fuel. A simplified reaction scheme can be proposed for the NO-seeded oxidation of methanol: NO + HO₂ ⇒ NO₂ + OH followed by OH + CH₃OH ⇒ H₂O + CH₂OH and CH₃O. The enhanced oxidation of methanol by addition of NO₂ is also due to additional OH production through: NO₂ + HO₂ ⇒ HONO + O₂, NO₂ + H ⇒ NO + OH and HONO ⇒ NO + OH followed by OH + CH₃OH ⇒ CH₂OH and CH₃O. The further reactions CH₂OH + O₂ ⇒ CH₂O + HO₂; CH₃O ⇒ CH₂O + H; CH₂O + OH ⇒ HCO; HCO + O₂ ⇒ HO₂ and H + O₂ ⇒ HO₂ complete the sequence whether NO or NO₂ is added.     

Adsorption of glycine on a NiAl(1 1 0) alloy surface

The adsorption and desorption of glycine (NH₂CH₂COOH), vacuum deposited on a NiAl(1 1 0) surface, were investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED), temperature-programmed desorption, work function (Δφ) measurements, and ultraviolet photoelectron spectroscopy (UPS). At 120 K, glycine adsorbs molecularly forming mono- and multilayers predominantly in the zwitterionic state, as evidenced by the UPS results. In contrast, the adsorption at room temperature (310 K) is mainly dissociative in the early stages of exposure, while molecular adsorption occurs only near saturation coverage. There is evidence that this molecularly adsorbed species is in the anionic form (NH₂CH₂COO⁻). Analysis of AES data reveals that upon adsorption glycine attacks the aluminium sites on the surface. On heating part of the monolayer adsorbed at 120 K is converted to the anionic form and at higher temperatures dissociates further before desorption. The temperature-induced dissociation of glycine (<400 K) leads to a series of similar reaction products irrespective of the initial adsorption step at 120 K or at 310 K, leaving finally oxygen, carbon and nitrogen at the surface. AES and LEED measurements indicate that oxygen interacts strongly with the Al component of the surface forming an “oxide”-like Al-O layer.     

A density functional theory study on the adsorption and dissociation of N2O on Cu2O(1 1 1) surface

Density functional theory has been employed to investigate the adsorption and the dissociation of an N₂O at different sites on perfect and defective Cu₂O(1 1 1) surfaces. The calculations are performed on periodic systems using slab model. The Lewis acid site, Cu_CUS, and Lewis base site, O_SUF are considered for adsorption. Adsorption energies and the energies of the dissociation reaction N₂O → N₂ + O(s) at different sites are calculated. The calculations show that adsorption of N₂O is more favorable on Cu_CUS adsorption site energetically. Cu_CUS site exhibits a very high activity. The Cu_CUS-N₂O reaction is exothermic with a reaction energy of 77.45 kJ mol⁻¹ and an activation energy of 88.82 kJ mol⁻¹, whereas the O_SUF-N₂O reaction is endothermic with a reaction energy of 205.21 kJ mol⁻¹ and an activation energy of 256.19 kJ mol⁻¹. The calculations for defective surface indicate that O vacancy cannot obviously improve the catalytic activity of Cu₂O.