辉光放电质谱分析中质谱干扰及其校正方法的现状

详细地介绍了辉光放电质谱分析中的质谱干扰如同量异位素、多原子离子和多电荷离子干扰。从同位素选择、高分辨率仪器、碰撞诱导解离、离子源冷却、数学方法校正、放电气体更换和放电气体纯度提高等方面对辉光放电质谱的质谱干扰校正方法的现状进行了评述(引用文献共68篇)。     

辉光放电质谱研究与应用新进展

简要介绍了辉光放电的基本原理,主要概述了过去４年有关辉光放电质谱研究的新进展,包括辉光放电质谱的基础研究,新装置和新方法的发展,以及辉光放电质谱的分析应用。文中最后展望了辉光放电质谱法的发展前景。     

磁质谱在核科学领域的研究进展

对磁质谱在核科学领域的研究进展进行了综述。介绍了磁质谱的基本原理，详细论述了扇形磁场电感耦合等离子体质谱、加速器质谱、二次离子质谱、热电离质谱、激光共振电离质谱、辉光放电质谱的电离机理、特征及应用领域。扇形磁场电感耦合等离子体质谱分辨率高，检测限低，在元素和同位素分析中应用最为广泛。加速器质谱通常用于样品中超痕量、长寿命放射性核素的量化分析。TI-MS被认为是元素同位素比值分析最精确的仪器之一，而辉光放电质谱主要运用于高纯材料中杂质的分析。     

辉光放电质谱新方法分析颗粒状金属铪

采用直流辉光放电质谱方法((dc-GD-MS)分析颗粒状((2mm×1mm×1mm)金属铪中的杂质元素.本方法解决金属铪样品尺寸太小难以直接进行辉光放电质谱分析的问题.采用聚四氟乙烯管(内径2.3 mm×外径3.2 mm)与医用注射器连接并密封接口,再将粒状铪置于管子前端(管长的1/3处),接着将PTFE 管水平插入已...     

辉光放电质谱法测定纯锡中24种杂质元素和锡记忆效应的消除

采用辉光放电质谱法(GDMS)测定了纯锡中24种杂质元素,分析方法为无标定量分析。分析前纯锡样品须依次用乙醇、水及乙醇冲洗以除去表面的灰尘颗粒,凉干后用于分析。本工作对辉光放电过程中的三项关键因素,即辉光放电电压、放电电流及放电气流三者在辉光放电溅射/电离时的相互关系及其对总离子流强度的影响进行了试验和讨论,并确定了仪器在最佳状态时辉光放电的优化条件为:放电电压590V,放电电流30mA,放电气流450mL·min~(-1)。为排除各元素测定中质谱(MS)干扰的影响,选择了在不同的分辨模式(中/高)下用相对丰度较高、干扰较少的质量数进行分析。所测定元素测定结果的相对标准偏差(n=5)均小于15%。各元素的检出限(3s)为0.003～0.174μg·g~(-1)之间。本方法所得测定结果与电感耦合等离子体原子发射光谱法(ICP-AES)或电感耦合等离子体质谱法(ICP-MS)的测定结果基本一致。经试验,通过更换GDMS的阳极帽、导流管、采样锥和透镜等4种耗材,可完全消除锡的记忆效应。     

双电离源(辉光放电/激光溅射电离)四极杆质谱仪的研制

本研究将辉光电离源与激光溅射电离源巧妙地结合在同一台仪器中,使固体样品在离子源腔体中既能辉光电离,也能激光电离;并且使用同一质量分析器,两种离子源的结果可以相互比对,进而得到更为准确的分析结果.此仪器主要由真空系统、离子源、离子传输系统、四极杆质量分析器及检测与数据采集系统等组成.实验中分别用两种离子源测试了标准样品SRM 1262b,并获得了半定量结果.结果表明,仪器具有定性能力强,分析速度快,检测灵敏度高等优点,对固体样品元素分析的检出限可达μg/g量级.实验表明,激光溅射电离质谱的性能优于辉光放电质谱.     

大气采样辉光放电质谱仪的设计与应用

针对某些弱极性类物质难以通过大气压离子源直接电离的问题,提出基于大气采样辉光放电电离方式实现弱极性物质在大气压下直接进样、电离和质谱分析的方法.通过在大气压接口-四极质谱仪的第一级真空中的离子透镜上施加交流高压产生放电,简化了辉光放电离子源的设计,能直接离子化大气压接口吸人的物质,离子在离子透镜的传输下进入四极杆质量分析器实现质谱分析.实验表明,本方法能电离电喷雾电离离子源和大气压化学电离离子源未能电离的弱极性物质——艾试剂,并且负离子工作模式比正离子工作模式的信号至少强40倍.     

辉光放电质谱法定量测定重掺晶体硅中替位碳含量

采用辉光放电质谱法测定单晶硅中替位碳含量,通过优化仪器工作条件,得到最佳放电参数。利用低温傅里叶变换红外光谱法对呈梯度的四个单晶硅片中替位碳含量进行赋值,将辉光放电质谱法测得替位碳强度与硅的离子束比与赋值结果作工作曲线,计算得到相对灵敏度因子(RSF_(cal))为1.19。在优化过的工作条件下,用辉光放电质谱法测未知样,用RSF_(cal)进行计算,得到单晶硅中替位碳的定量分析结果,与二次离子质谱(SIMS)法测定结果进行对照,相对误差为3.7%,一致性较好。     

高纯钛的辉光放电质谱法多元素分析

采用辉光放电质谱法(GD-MS)测定高纯钛中Mg、Al、Cr、Fe、V、Mn、Co、Ni、Cu、Zn、As、Sn、Sb、Ta、W、Pb、Bi等痕量杂质元素,并对GD-MS工作参数及条件进行了优化。主要元素与内标校正ICP-MS法定量分析的结果一致,对结果差异的原因进行分析,论述了Element GD辉光放电质谱仪在痕量杂质元素分析方面的优势。     

等离子体常压解吸离子源质谱

近年来,常压开源质谱解吸/离子化(ambient desorption/ionization mass spectrometry)技术的开发促进了质谱分析的蓬勃发展.作为常压开源质谱技术的一大重要分支,基于等离子体的常压质谱解吸/离子化技术因无需样品预处理、无溶剂化过程、高灵敏度、高通量、能实时在线检测样品等优点,受到了学术界及仪器制造、化学和生物分析等相关产业界的广泛关注.本文从离子源的种类、原理及应用等角度对目前我国在开源质谱领域中自主研发的基于等离子体的常压离子源的研究进展进行了总结,并对此类等离子体常压离子源的发展进行了展望,重点涉及微波等离子体源、常压微辉光放电等离子体源和解吸电晕束离子源.     

New developments and applications in GDMS

An overview is given about the new developments in GDMS, both with respect to the glow discharge source as to the coupling with various kinds of mass spectrometers. Moreover, as for every analytical technique, methodological and fundamental research is being carried out to improve the analytical results of GDMS, and some of the new developments in these fields will be discussed as well. Finally, the various analytical applications of GDMS will be presented. Received: 11 November 1998 / Revised: 29 January 1999 / Accepted: 6 February 1999     

辉光放电质谱法在无机非金属材料分析中的应用

辉光放电质谱法(GDMS)作为一种固体样品直接分析技术,已广泛应用于金属、半导体等材料的痕量和超痕量杂质分析。近年来,随着制样方法和离子源装置的改进,GDMS同样也能很好地应用于玻璃、陶瓷、氧化物粉末等非导体材料的成分分析。简介了GDMS的基本原理和分析特点,概述了GDMS在无机非金属材料分析的方法以及应用情况。     

Isotopic abundance measurements on solid nuclear-type samples by glow discharge mass spectrometry

A double-focusing Glow Discharge Mass Spectrometer (GDMS) installed in a glovebox for nuclear sample screening has been employed for isotopic measurements. Isotopic compositions of zirconium, silicon, lithium, boron, uranium and plutonium which are elements of nuclear concern have been determined. Interferences arising from the matrix sample and the discharge gas (Ar) for each of these elements are discussed. The GDMS results are compared with those from Thermal Ionization Mass Spectrometry (TIMS). For boron and lithium at microg/g-ng/g levels, the two methods gave results in good agreement. In samples containing uranium the isotopic composition obtained by GDMS was in agreement with those from TIMS independently of the enrichment. Attempts for the determination of plutonium isotopic composition were also made. In this case, due to the interferences of uranium at mass 238 and americium at mass 241, the GDMS raw data are complementary with those values obtained from physical non-destructive techniques.     

On-line coupling of ion chromatography and atomic spectrometry and use of direct graphite furnace atomic absorption spectrometry as new tools for ultra trace determinations in refractory metals

On-line coupling of inductively coupled plasma (ICP) techniques such as ICP-AES and ICP-MS with ion chromatography (IC) offers unique features for ultra-trace analysis. An on-line preconcentration procedure based on cation exchange enables sub-ng/g analysis in complex matrices like molybdenum and tungsten. The best dissolution reagent for these matrices is hydrogen peroxide, which can be cleaned to ultra high purity with the same metal free chromatography equipment used for the preconcentration. Preconcentration is possible for elements that show cationic reactions within acidic peroxide containing solutions. In this study 28 elements detrimental for microelectronics applications are observed. A comparison of the combinations IC-ICP-AES and IC-ICP-MS with glow discharge mass spectrometry (GDMS) for the analysis of today's purest tungsten samples shows the analytical power and accuracy of the coupled devices. Graphite furnace atomic absorption spectrometry (GFAAS) as an extremely sensitive analytical technique is applied with and without the same sample pretreatment as used for the on-line coupling. Direct GFAAS measurements of alkali metals are complementary to IC-ICP techniques. The data evaluated with these wet chemical techniques are compared to the usual manufacturers characterisation technique GDMS. With respect to the low concentrations present in these high purity materials (ng/g level in the solid) the discrepancies between all methods are acceptable. The sensitivity of IC-ICP-MS is in most cases far superior to IC-ICP-AES and for some elements also to GDMS. Furthermore the specific advantages of on-line coupling such as the elimination of isobaric interferences in ICP-MS or spectral interferences in ICP-AES are shown for ICP-AES and ICP-MS determinations.     

On copper diffusion in silicon measured by glow discharge mass spectrometry

Copper contamination occurs frequently in silicon for photovoltaic applications due to its very fast diffusion coupled with a low solid solubility, especially at room temperature. The combination of these properties exerts a challenge on the direct analysis of Cu bulk concentration in Si by sputtering techniques like glow discharge mass spectrometry (GDMS). This work aims at addressing the challenges in quantitative analysis of fast diffusing elements in Si matrix by GDMS. N-type, monocrystalline (Czochralski) silicon samples were intentionally contaminated with Cu after solidification and consequently annealed at 900 °C to ensure a homogeneous distribution of Cu in the bulk. The samples were quenched after annealing to control the extent of the diffusion to the surface prior to the GDMS analyses, which were carried out at different time intervals from within few minutes after cooling onward. The Cu profiles were measured by high-resolution GDMS operating in a continuous direct current mode, where the integration step length was set to ～0.5 μm over a total sputtered depth of 8–30 μm. The temperature of the samples during the GDMS analyses was also measured in order to evaluate the diffusion. The Cu contamination of n-type Si samples was observed to be highly material dependent. The practical impact of Cu out-diffusion on the calculation of the relative sensitivity factor (RSF) of Cu in Si is discussed.     

无机质谱法在固体直接分析中的应用

本文归纳了无机质谱法在固体直接分析中的应用,并详细阐述了辉光放电质谱法(GDMS)、二次离子质谱法(SIMS)、激光溅射电感耦合等离子体质谱法(LA-ICPMS)和激光电离质谱法(LIMS)四种可用于固体样品直接检测的无机质谱法的检测原理、应用以及各自的优缺点.     

Isotopic abundance measurements on solid nuclear-type samples by glow discharge mass spectrometry

A double-focusing Glow Discharge Mass Spectrometer (GDMS) installed in a glovebox for nuclear sample screening has been employed for isotopic measurements. Isotopic compositions of zirconium, silicon, lithium, boron, uranium and plutonium which are elements of nuclear concern have been determined. Interferences arising from the matrix sample and the discharge gas (Ar) for each of these elements are discussed. The GDMS results are compared with those from Thermal Ionization Mass Spectrometry (TIMS). For boron and lithium at g/g-ng/g levels, the two methods gave results in good agreement. In samples containing uranium the isotopic composition obtained by GDMS was in agreement with those from TIMS independently of the enrichment. Attempts for the determination of plutonium isotopic composition were also made. In this case, due to the interferences of uranium at mass 238 and americium at mass 241, the GDMS raw data are complementary with those values obtained from physical non-destructive techniques.     

Comparison between the use of direct current glow discharge mass spectrometry and inductively coupled plasma quadrupole mass spectrometry for the analysis of trace elements in nuclear samples

The quantitative determination of trace elements in nuclear samples by GDMS and ICP-MS is presented and compared. Spectral interferences, matrix effects, detection limits, precision and accuracy are discussed. Results for selected samples demonstrated that both techniques are complementary. The use of a multi-standard solution provides the most accurate results in ICP-MS, whereas in GDMS this is achieved by relative sensitivity factors (RSF) matrix matched. Nevertheless, the use of standard RSF allows a fast screening.     

Comparison between the use of direct current glow discharge mass spectrometry and inductively coupled plasma quadrupole mass spectrometry for the analysis of trace elements in nuclear samples

The quantitative determination of trace elements in nuclear samples by GDMS and ICP-MS is presented and compared. Spectral interferences, matrix effects, detection limits, precision and accuracy are discussed. Results for selected samples demonstrated that both techniques are complementary. The use of a multi-standard solution provides the most accurate results in ICP-MS, whereas in GDMS this is achieved by relative sensitivity factors (RSF) matrix matched. Nevertheless, the use of standard RSF allows a fast screening.     

辉光放电质谱法测定高纯铟中痕量元素

采用辉光放电质谱法(GDMS)对高纯铟中铁、铜、铅、锌、铊、镉、锡等14种元素进行了测定,对仪器工作参数进行了优化,对预溅射过程时间的确定和质谱干扰的排除进行了讨论,结果表明,GDMS是目前具有足够灵敏度对高纯导电材料进行直接分析的有效手段。