Phase-field simulations of Te-precipitate morphology and evolution kinetics in Te-rich CdTe crystals

Te precipitates are one of principal defects that form during cooling of melt-grown CdTe or CZT crystals when grown Te-rich. Many factors such as the kinetic properties of intrinsic point defects (vacancy, interstitial, and antisite defects); stresses associated with the lattice mismatch between precipitate and matrix; temperature gradients and extended defects (dislocations, twin and grain boundaries); non-stoichiometric composition; thermal treatment history all affect the formation and growth/dissolution of Te precipitates in CdTe. A good understanding of these effects on Te precipitate evolution kinetics is technically important in order to optimize material processing and obtain high-quality crystals. This research develops a phase-field model capable of investigating the evolution of coherent Te precipitates in a Te-rich CdTe crystal undergoing cooling from the melt. Cd vacancies and Te interstitials are assumed to be the dominant diffusing species in the system, which is in two-phase equilibrium (matrix CdTe and liquid Te inclusion) at high temperatures and three-phase equilibrium (matrix CdTe, Te precipitate, and void) at low temperatures. Using available thermodynamic and kinetic data from experimental phase diagrams and thermodynamic calculations, the effects of Te interstitial and Cd vacancy mobility, cooling rates and stresses on Te precipitate, and void evolution kinetics are investigated.     

Study of microstructural evolutions in phosphorus-doped ZnO films grown by pulsed laser deposition

The microstructure of P-doped ZnO films grown on the c-plane sapphire substrate by pulsed laser deposition (PLD) was investigated. ZnO films were highly textured along c-axis with two different in-plane orientations. The textured domain was surrounded by the threading dislocations, resulting in the formation of low-angle grain boundary. It was found that the degree of texture and crystalline quality of P-doped ZnO films decreased with increasing the phosphorus atomic percent. For the microstrain study, X-ray diffraction line profile analysis (LPA) was performed. The 0.5 at% P-doped ZnO film showed much higher microstrain than the 1.0 at% P-doped ZnO film as well as as-grown film, which indicated that the phosphorus in former film was effectively incorporated into ZnO film. X-ray photoelectron spectroscopy (XPS) results showed that the phosphorus in 1.0 at% P-doped ZnO film tended towards segregation, which was well consistent with XRD results.     

Epitaxial lateral overgrowth on (2 1¯ 1¯ 0) a-plane GaN with [0 1¯ 1 1]-oriented stripes

Epitaxial lateral overgrowth was applied to a-plane GaN on r-plane sapphire using SiO₂ stripe masks oriented parallel to [0 1¯ 1 1]. Coalescence and defect distribution was studied using scanning electron microscopy and cathodoluminescence. Defects, i.e., threading dislocations and basal plane stacking faults from the template propagate into the overgrown layer through the mask openings. Stacking faults spread into the whole overgrown layer, whereas threading dislocations are laterally confined in the region above the mask where a part of them is terminated at the inclined coalescence boundary. Lateral overgrowth and dislocation termination at the coalescence boundary leads to an improvement in luminescence intensity and crystal quality, in comparison to the template. The measured XRD rocking curve FWHM were 453″ with incidence along the [0 0 0 1] c-direction and 280″ with incidence along the [0 1 1¯ 0] m-direction.     

On microcrack nucleation at twin vertices and boundaries in bcc and fcc metals

Nucleation of microcracks at the vertex and boundary of a decelerated twin is studied for a number of bcc and fcc metals. A twin and its boundary are represented as stepped pileups of twinning dislocations located in the neighboring glide planes. The formation of microcracks through the merging of head dislocations by the force and thermally-activated mechanisms is analyzed. Analytical expressions are obtained that describe the conditions necessary for microcrack nucleation at the vertices of stepped dislocation pileups. It is established that with an increase in the shear-modulus value, the critical parameters of microcrack nucleation by the two above mechanisms become closer in all the metals considered.     

High-resolution electron microscopy of microstructure of SrTiO3/BaZrO3 bilayer thin films on MgO substrates

SrTiO₃/BaZrO₃ heterofilms as buffer layers are deposited on (0 0 1) MgO substrates by an RF-sputtering technique. The atomic structure and the defect configuration at the interfaces are investigated by means of aberration-corrected high-resolution transmission electron microscopy. At the BaZrO₃/MgO interface, two types of interfacial structures, MgO/ZrO₂-type and MgO/BaO-type, are observed. Antiphase boundaries and dislocations are found at the BaZrO₃/MgO interface. The formation of these lattice defects is discussed in terms of film growth and structural imperfections of the substrate surface. At the SrTiO₃/BaZrO₃ interface, a high density of misfit dislocations is observed with different configurations. The formation of these dislocations contributes both to the relaxation of the large misfit strain and to stopping of the further propagation of lattice defects which are formed in the BaZrO₃ layer into the SrTiO₃ layer.     

Reduction of grown-in dislocation density in Ge Czochralski-grown from the B2O3-partially-covered melt

Germanium (Ge) single crystals with an extremely low density of grown-in dislocations were grown by the Czochralski (CZ) technique with boron oxide (B₂O₃) liquid. Because attachment of particles floating on the melt surface to a growing Ge crystal leads to generation of dislocations during the growth, partial covering of the Ge melt surface with B₂O₃ liquid was attempted. Such attachment of particles was drastically suppressed or the particles were caught by the introduction of B₂O₃ liquid, and a particle-free Ge melt was realized in the central region of the melt surface. Ge single crystals were successfully grown from such melt, the grown-in dislocation density being 0–1×10³ cm⁻², which was remarkably lower than that in Ge crystals grown by a conventional CZ technique. The contaminations by B and O atoms of the grown crystal detected by SIMS analysis were very low. These Ge crystals have the potential for application to be applied as high-quality, dislocation-free substrates of GaAs solar cells for various usages including in space.     

Growth of multicrystalline Si with controlled grain boundary configuration by the floating zone technique

The floating zone technique was employed to grow multicrystalline Si with controlled grain boundary configuration. Purposely designed bi-crystals were utilized as seed crystals to investigate the effect of the tilt angle from the perfect twin boundary on the growth behavior. When the growth was initiated from a bi-crystal with a Σ3 twin boundary, no particular change took place on the grain boundary configuration during growth. On the other hand, the decrease of the tilt angle during growth was observed when the growth was initiated from a bi-crystal with a tilted boundary from Σ3. This was accompanied by the appearance of new crystal grains. The reduction of the total interface energy would be a possible driving mechanism for this phenomenon.     

Defect characterization and composition distributions of mercury indium telluride single crystals

A mercury indium telluride (MIT) ingot was grown by the vertical Bridgman method. The defects in MIT crystals were characterized by the chemical etching method. A defect etchant for MIT crystals was developed. The etch pits of dislocations, microcracks and boundary was observed by scanning electron microscopy. It was elucidated that the etch pits density of dislocations of MIT wafers was about 4×10⁵ cm⁻². Te and In reduced at the grain boundaries, but were homogeneously distributed within the grains in the as-grown MIT crystals. The distribution of In in MIT crystals along the growth direction and radial direction was analyzed by electronic probe microscopy. It was found that In concentration was higher in the initial part and lower in the final part of the MIT ingot, which indicated that the segregation coefficient of In in MIT crystals was 1.15. The radial In concentration increased from the center to edge of the wafers and homogeneous in the middle part.     

The crystal growth and perfection of 2,4,6-trinitrotoluene

Large crystals of TNT were grown from ethyl acetate solution by both temperature lowering and solvent evaporation. The perfection of crystals grown from seeds under carefully controlled conditions was generally higher than those prepared by uncontrolled solvent evaporation. Examination by X-ray topography revealed the crystals to have a characteristic growth induced defect structure comprising growth sectors and boundaries, growth banding, solvent inclusions and dislocations. Twins and stacking faults (SF) were also observed. Many of the defects noted in the topographs can be attributed to impurities. The influence of the highly anisotropic crystal structure on the nature of growth defects is discussed. A structural model proposed to explain twinning and SF formation is partially supported by topographic evidence.     

Investigation on the origin of crystallographic tilt in lateral epitaxial overgrown GaN using selective etching

The crystallographic tilt of the lateral epitaxial overgrown (LEO) GaN on sapphire substrate with SiN_x mask is investigated by double crystal X-ray diffraction. Two wing peaks beside the GaN 0002 peak can be observed for the as-grown LEO GaN. During the selective etching of SiN_x mask, each wing peak splits into two peaks, one of which disappears as the mask is removed, while the other remains unchanged. This indicates that the crystallographic tilt of the overgrown region is caused not only by the plastic deformation resulted from the bending of threading dislocations, but by the non-uniformity elastic deformation related with the GaN/SiN_x interfacial forces. The widths of these two peaks are also studied in this paper.     

The features of X-ray topographic contrast formation in silicon with dislocation clusters

The features of formation of diffraction images of edge dislocation sets forming clusters (of two, three and more dislocations) as well as small-angle dislocation boundaries (walls) have been studied. A variety of diffraction effects of wave fields created in strongly distorted crystals regions along dislocation lines have been observed. Various intensity interference effects of rescattering and internal reflection of the newly formed and already existing wave fields on thickness distributions of intensity for the case of presence in the same glide plane of edge dislocations with parallel and anti-parallel Burgers vectors were discovered.     

Transmission electron microscopy study of defects in AlN crystals with rough and smooth surface grains

Defects present in (0 0 0 1) textured polycrystalline AlN grown by the sublimation–recombination method were analyzed using transmission electron microscopy (TEM) methods. Grains in the polycrystalline boule had either a smooth or a rough surface. The rough surface grains had mainly edge dislocations, whereas the smooth surface grains had some sub-grain boundaries and were mostly free of dislocations. Dislocations at the grain boundaries were pinned and could not be annihilated.     

Propagation behavior of threading dislocations during physical vapor transport growth of silicon carbide (SiC) single crystals

The dislocation formation and propagation processes in physical vapor transport (PVT) grown 4H silicon carbide (4H–SiC) single crystals have been investigated using defect selective etching and transmission electron microscopy (TEM). It was found that while the growth initiation process generally increased the density of threading dislocations in the grown crystal, for certain areas of the crystal, threading dislocations were terminated at the growth initiation. Foreign polytype inclusions also introduced a high density of dislocations at the polytype boundary. In the polytype-transformed areas of the crystal, almost no medium size hexagonal etch pits due to threading screw dislocations were observed, indicating that the foreign polytype inclusions had ceased the propagation of threading screw dislocations. Based on these results, we argued the formation and propagation of the threading dislocations in PVT grown SiC crystals, and proposed the dislocation conversion process as a plausible cause of the density reduction of threading dislocations during the PVT growth of SiC single crystals.     

Twin Structure of (La,Nd)GaO3 Solid Solutions

For La_1‐xNd_xGaO₃ crystals the La‐Nd substitution leads to decrease of spontaneous strains and for composition with x≈0.32 the six possible twin states of orthorhombic phase (m3mFmmm) may be degenerated in three twin states inhered in m3mF4/mmm species when a distorted perovskite pseudocell becomes tetragonal. The {110} and {112} reflection twins and axial twins with compositional planes close to (211) and (21‐1) (S‐walls) were identified in La_1‐xNd_xGaO₃ (x=0.07, 0.12, 0.20) solid solutions crystals. All observed twins are typical for crystals with GdFeO₃ type perovskite‐like structure. It has been shown that for x≤0.2 and x≥0.5 orientations of S‐walls weakly depend on La/Nd ratio, whereas in the range of 0.2<x<0.5 they depend strongly on the solid solution composition. The tilt angle between two twin states across twin boundary in La_1‐xNd_xGaO₃ (x<0.6) solid solutions is smaller than that between two twins in pure LaGaO₃ or NdGaO₃.     

Study of the Nature and Distribution of Elementary Steps on the (100) Cleavage Faces of MgO Single Crystals by Atomic Force Microscopy

Some observations made on the nature and distribution of monolayer (elementary) steps on the (100) cleavage faces of MgO single crystals by atomic force microscopy are presented and discussed. The following types of patterns of monolayer steps are described: (1) trains of steps, (2) steps terminating on the cleaved surface at the emergence points of screw dislocations, and (3) localized pinning of advancing steps at random sites (probably at the emergence points of edge dislocations). It is shown that: (1) the origins of emergence points of monolayer steps are devoid of hollow cores due to a small Burgers vector of dislocations and (2) the minimum distance between two emerging steps due to screw dislocations and between two pinning centres due to edge dislocations depends on their sign, and is determined by the mutual interaction between neighbouring dislocations.     

On the Formation of Dislocation Hollow Cores on Cleaved {100} Faces of L-Arginine Phosphate Monohydrate Single Crystals

Thermodynamic conditions and energy considerations for the formation of hollow cores at the emergence points of monolayer cleavage steps associated with screw dislocations on the cleaved {100} faces of LAP single crystals are discussed. Analysis of the formation of hollow cores and the change of the curvature of steps in the vicinity of their origins reveals that dislocations responsible for the origin of hollow cores have stress fields due to trapped mother liquor of different supersaturations. The results also show that (1) the radius of a hollow core is inversely proportional to the one-third power of the interface supersaturation while the volume of hollow corés increases exponentially with their radius, and that (2) the strain energy associated with a dislocation is responsible for the formation of an equilibrium hollow core of a particular depth at the origins of cleavage steps associated with dislocations.     

High resolution neutron and X‐ray diffraction studies as a function of temperature and electric field of the ferroelectric phase transition of RDP

Neutron and high resolution X‐ray diffraction investigations on perfect single crystals of RbH₂PO₄ (RDP), a hydrogen bonded ferroelectric of KDP type are reported. The results of crystal structure analysis from diffraction data, below and above the paraelectric ‐ ferroelectric phase transition, support a disorder ‐ order character of [PO₄H₂]^‐‐groups. The tetragonal symmetry of the paraelectric phase with the double well potential of the hydrogen atoms obtained by diffraction, results simply from a time‐space average of orthorhombic symmetry. According to the group ‐ subgroup relation between the tetragonal space group I42d and the orthorhombic Fdd2 a short range order of ferroelectric clusters in the tetragonal phase is observed. With decreasing temperature the ferroelectric clusters increase and the long range interaction between their local polarisation vectors leads to the formation of lamellar ferroelectric domains with alternating polarisation directions at T_C = 147 K. From the high resolution X‐ray data it is concluded that below T_C the ferroelastic strain in the (a,b)‐plane leads to micro‐angle grain boundaries at the domain walls. The tilt angle is enhanced by an applied electric field parallel to the ferroelectric axis. The resulting dislocations at the domain walls persist in the paraelectric phase leading to a memory effect for the arrangement of twin lamellae. With increased electric field the phase transition temperature T_C is decreased. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Defect Structure of Strained Heteroepitaxial In(1—x)Al(x)P Layers Deposited by MOVPE on (001) GaAs Substrates

Weak-beam, large angle convergent beam electron diffraction and high resolution transmission electron microscope experiments have revealed, that after strain relaxation due to plastic deformation dislocation networks can be observed in In_(1—x)Al_(x)P heteroepitaxial layers grown on (001) GaAs substrates under compressive stress. The 60° slip dislocations are mostly dissociated into partials of Shockley type whereas in the particular case of layers grown under tension twins are predominantly formed by successive nucleation and slip of 90° Shockley partials on adjacent {111} glide planes lying inclined to the (001) surface. When a few 90° Shockley partials pile up during extension of twins, then planar incoherent twin boundaries with {112} coincidence planes have been formed during strain relaxation. Due to the space group symmetry ((InAl)P belongs to the space group F4-3m) there is a striking asymmetry in defect formation, i.e. defect nucleation and slip on the planes (111) and (1-1-1) slip of the [1-10] zone are preferred to nucleation and slip on the {111} planes of the [110] zone. Apparently, the occupacy of the atomic sites in the dislocation core with either group-III or group-V atoms is responsible for this behaviour. The nature of the defects implies that their spontaneous nucleation should have taken place at the growing surface. Under tensile strain the 90° Shockley partial is nucleated first and the 30° one trails. Under compressive strain this sequence is reversed. It is evident, for dissociated dislocations lying at the interface always the 30° partial, i.e. the partial with less mobility or with higher friction force, is detained near or directly in the interface. Thus, in layers grown under tension the stacking fault associated with the dissociated 60° dislocation lies inside the GaAs substrate. For layers grown under compression it is located inside the ternary layer.     

Extended defects in bulk GaN and III-nitrides grown on this substrate

A short review of the structural perfection of high-pressure grown bulk crystals is given. As-grown undoped and Mg-doped crystals are described. The dependence of defect arrangement and quality of the surface on growth polarity is described. A high perfection of homoepitaxial layers grown on these substrates is shown. However, growth of thick layers by HVPE may lead to the formation of differently arranged dislocations and the formation of low angle grain boundaries associated with cracks. It is shown that the introduction of dopant or growth of mismatched layers on undoped high-pressure substrates may lead to the formation of additional defects.     

Investigation of characteristics of laterally overgrown GaN on striped sapphire substrates patterned by wet chemical etching

The new developed maskless lateral-epitaxial-overgrowth technique, in which the striped substrates are patterned by wet chemical etching, is systematically investigated using scanning electron microscopy, X-ray diffraction, and atomic force microscopy (AFM). Wing tilt is measured for the GaN films on patterned substrates with a range of “fill factor” (ratio of groove width to stripe period) and for the GaN in different growth time. It is found that changes in these parameters have a significant effect on the extent and distribution of wing tilt in the laterally overgrown regions relative to the GaN directly on the sapphire substrate. Increasing the thickness of GaN films is benefit to reduce wing tilt. The tilt is avoided in the GaN films with 4.5 μm thickness and fill factor for 0.46. The full-width at half-maximum of X-ray rocking curves of the asymmetric diffraction peaks and the image of AFM both show that the threading dislocations in the developed lateral epitaxial overgrowth of GaN films are reduced sharply. The GaN template could be used as an excellent substrate to fabricate high-performance optoelectronic devices.