Single InAs/InP quantum dot spectroscopy in 1.3–1.55 μm telecommunication band

We present an optical spectroscopy and photon correlation measurement at telecommunication wavelengths performed on single InAs/InP quantum dots. Two main approaches brought high optical quality: an application of a ‘double-cap’ growth method to metalorganic chemical vapor deposition, and fabrication of a small mesa structure using low-damage wet chemical etching. Sharp and discrete exciton transition lines have been observed on the single quantum dots, which widely cover the spectral range of 1.3–1.55 μm. Using a pulsed excitation source and gated single-photon detection modules, we observed a photon antibunching behavior for an isolated exciton emission line, indicating nonclassical light emission near the wavelength of 1.3 μm.     

GaN/AlN quantum dot photodetectors at 1.3–1.5 μm

We have demonstrated GaN/AlN quantum dots (QD) photodetectors, relying on intraband absorption and in-plane carrier transport in the wetting layer. The devices operate at room temperature in the wavelength range 1.3–1.5 μm. Samples with 20 periods of Si-doped GaN QD layers, separated by 3 nm-thick AlN barriers, have been grown by plasma-assisted molecular-beam epitaxy on an AlN buffer on a c-sapphire substrate. Self-organized dots are formed by the deposition of 5 monolayers of GaN under nitrogen-rich conditions. The dot height is 1.2±0.6 to 1.3±0.6 nm and the dot density is in the range 10¹¹–10¹² cm⁻². Two ohmic contacts were deposited on the sample surface and annealed in order to contact the buried QD layers. The dots exhibit TM polarized absorption linked to the s–p_z transition. The photocurrent at 300 K is slightly blue-shifted with respect to the s–p_z intraband absorption. The responsivity increases exponentially with temperature and reaches a record value of 10 mA/W at 300 K for detectors with interdigitated contacts.     

Intraband photoresponse of SiGe quantum dot/quantum well multilayers

In this contribution we study the intravalence band photoexcitation of holes from self-assembled Ge quantum dots (QDs) in Si followed by spatial carrier transfer into SiGe quantum well (QW) channels located close to the Ge dot layers. The structures show maximum response in the important wavelength range 3–5 μm. The influence of the SiGe hole channel on photo- and dark current is studied depending on temperature and the spatial separation of QWs and dot layers. Introduction of the SiGe channel in the active region of the structure increases the photoresponsivity by up to about two orders of magnitude to values of 90 mA/W at T=20 K. The highest response values are obtained for structures with small layer separation (10 nm) that enable efficient transfer of photoexcited holes from QD to QW layers. The results indicate that Si/Ge QD structures with lateral photodetection promise very sensitive large area mid-infrared photodetectors with integrated readout microelectronics in Si technology.     

Optical spectroscopy of single InAs/InP quantum dots around λ=1.55 μm

We discuss the preparation and spectroscopic characterisation of a single InAs/InP quantum dot suitable for long-distance quantum key distribution applications around λ=1.55 μm. The dot is prepared using a site-selective growth technique which allows a single dot to be deposited in isolation at a controlled spatial location. Micro-photoluminescence measurements as a function of exciton occupation are used to determine the electronic structure of the dot. Biexciton emission, shell filling and many-body re-normalization effects are observed for the first time in single InAs/InP quantum dots.     

Tuning of long-wavelength emission in InxGa1−xAs quantum dot structures

This work explores the conditions to obtain the extension of the PL emission beyond 1.3 μm in InGaAs quantum dot (QD) structures growth by MOCVD. We found that, by controlling the In incorporation in the barrier embedding the QDs, the wavelength emission can be continuously tuned from 1.25 μm up to 1.4 μm at room temperature. However, the increase in the overall strain of the structures limits the possibility to increase the maximum gain in the QD active device, where an optical density as high as possible is required. By exploring the kinetics of QD surface reconstruction during the GaAs overgrowth, we are able to obtain, for the first time, emission beyond 1.3 μm from InGaAs QDs grown on GaAs matrix. The wavelength is tuned from 1.26 μm up to 1.33 μm and significant improvements in terms of line shape narrowing and room temperature efficiency are obtained. The temperature-dependent quenching of the emission efficiency is reduced down to a factor of 3, the best value ever reported for QD structures emitting at 1.3 μm.     

Magneto-optic phase shift in plasmon propagation along garnet/semiconductor-on-insulator structures

This paper discusses the magneto-optic phase shift in garnet/semiconductor-on-insulator plasmonic waveguides. We consider two structures: (1) Y IG/Si/SiO₂ and (2) Y IG/GaInAsP/AlInAs-oxide. A dispersion relation for the plasmon propagation has been derived and the nonreciprocal phase shift of the fundamental TM mode has been determined at wavelengths of 1.55 μm, 1.5 μm and 1.3 μm.     

Picosecond timescale carrier dynamics of InAs quantum dots: The role of a continuum background

We have investigated the ultrafast carrier dynamics in Molecular Beam Epitaxy (MBE)-grown InAs/InGaAs/GaAs quantum dots emitting at 1.3 μm by means of time resolved photoluminescence upconversion measurements with a time resolution of about 200 fs. The detection energies scan the spectral region from the energy of the quantum dot excitonic transition up to the barrier layer absorption edge. We found, under high excitation intensity, that the intrinsic electronic states are populated mainly by carriers directly captured from the barrier.     

Molecular beam epitaxy growth and characterization of self-assembled InAs quantum dots on (1 0 0) InAlAs/InP substrates

Self-assembled InAs quantum dots (QDs) on In_0.52Al_0.48As layer lattice matched to (1 0 0) InP substrates have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL). TEM observations indicate that defect-free InAs QDs can be grown to obtain emissions over the technologically important 1.3–1.55 μm region. The PL peak positions for the QDs shift to low energy as the InAs coverage increases, corresponding to increase in QD size. The room temperature PL peak at 1.58 μm was observed from defect-free InAs QDs with average dot height of 3.6 nm.     

5 μm thick 3C-SiC layers grown on Ge-modified Si(100) substrates

The effect of the germanium coverage prior to the epitaxial growth of 5 μm thick 3C-SiC on Si(100) substrates were evaluated with Atomic Force Microscopy and μ-Raman spectroscopy. The 3C-SiC layers were grown by atmospheric pressure chemical vapor deposition via a special procedure leading to layers with compressive instead of tensile stress. The Ge amount was varied from 0 up to 2 ML. The obtained results showed that the residual stress inside the layers is shifted in the compressive direction; the crystalline quality is improved with the Ge introduction but on the account of the surface roughness. These results open the route for the use of Ge-modified Si(100) as a potential substrate in order to improve the heteroepitaxial growth of 3C-SiC on silicon substrates.     

Theoretical calculations of a square multilayer Bragg–Fresnel lens by quantum theory

A theoretical method based on the quantum scattering theory is presented to evaluate the performances of a two-dimensional (2-D) focusing square multilayer Bragg–Fresnel lens. The numerical application results of the square multilayer Bragg–Fresnel lens working at 0.7 nm wavelength (W/Si 25 periods with a double layer thickness of 5.38 nm, the size of the diffraction pattern is about 291×291 μm, the size of the center square in the diffraction pattern is 21.4×21.4 μm, and the size of the smallest square in the diffraction pattern is 0.39×0.39 μm) are given. Our theoretical results are compared with the experimental results of the linear Bragg–Fresnel lens reported by other researchers; an analysis and a discussion are carried out regarding the advantages of an optical system based on the 2-D focusing square multilayer Bragg–Fresnel lens, in contrast to a Kirkpatrick–Baez optical system on the basis of a two-linear Bragg–Fresnel lens.     

High temperature (T>300 K) light emitting diodes for 8–12 μm spectral range

Contrary to conventional light emitting diodes for visible and very near infrared utilizing interband (ω>E_g) luminescence, the longer infrared emitting diodes (LIREDs) we describe here utilize intraband (ω<E_g) electron transitions and emit beyond the fundamental absorption range of the material used. Made of indirect band gap semiconductors (like Ge, Si) and, therefore, free from the Auger recombination impact, LIREDs efficiently operate at higher temperatures (T>300 K) in the longer wavelength atmospheric window (8–12 μm). Electrically modulated power emitted is comparable to that for black body sources whereas shorter rise–fall times are due to recombination processes (200 μs) and not dependent on pixel thermal mass and thermal conduction. LIREDs can be made of different semiconductor structures provided the controllable modulation of free carrier concentration in the device base is achieved. The main parameters of Ge based LIREDs under injection mode are reported.     

Development of surface-textured hydrogenated ZnO:Al thin-films for μc-Si solar cells

This study addresses the optimization of rf magnetron-sputtered hydrogenated ZnO:Al (HAZO) films as front contacts in microcrystalline silicon solar cells. The front contact of a solar cell has to be highly conductive and highly transparent to visible and infrared radiation. Furthermore, it has to scatter the incident light efficiently in order for the light to be effectively trapped in the underlying silicon layers. In this research, HAZO films were rf-magnetron-sputtered on glass substrates from a ceramic (98 wt% ZnO, 2 wt% Al₂O₃) target. Various compositions of AZO films on glass substrates were prepared by changing the H₂/(Ar + H₂) ratio of the sputtering gas. The resulting smooth films exhibited high transparencies (T  85% for visible light including all reflection losses) and excellent electrical properties (ρ = 2.7 × 10⁻⁴ Ω · cm). Depending on their structural properties, these films developed different surface textures upon post-deposition etching using diluted hydrochloric acid. The light-scattering properties of these films could be controlled simply by varying the etching time. Moreover, the electrical properties of the films were not affected by the etching process. Therefore, within certain limits, it is possible to optimize the electro-optical and light-scattering properties separately. The microcrystalline silicon (μc-Si:H)-based p–i–n solar cells prepared using these new texture-etched AZO:H substrates showed high quantum efficiencies in the long wavelength range, thereby demonstrating effective light trapping. Using the optimum AZO:H thin-film textured surface, we achieved a p–i–n μc-Si solar cell efficiency of 7.78%.     

InAs/GaAs quantum dot infrared photodetectors with different growth temperatures

InAs/GaAs quantum dot infrared photodetectors were fabricated with quantum dots grown at three different temperatures. Large detection wavelength shift (5–14.5 μm) was demonstrated by changing 40 degrees of the epitaxy temperature. The smaller quantum dots grown at lower temperature generate 14.5 μm responses. The detectivity of the normal incident 15 μm QDIP at 77 K is 3 × 10⁸ cm Hz^1/2/W. A three-color detector was also demonstrated with quantum dots grown at medium temperature. The three-color detection comes from two groups of different sizes of dots within one QD layer. This new type of multicolor detector shows unique temperature tuning behavior that was never reported before.     

Low-frequency modulation of 0.6328 μm He–Ne laser by transverse magnetic field intensity

Effect of transverse magnetic field on 0.6328 μm He–Ne laser light polarized parallel and perpendicular to transverse magnetic field has been studied in this paper. Low-frequency modulation of two kinds of polarized laser light is completed and low-frequency modulation of polarization degree is put forward.     

InGaAsSb negative luminescent devices with built-in cavities emitting at 3.9 μm

An As₂S₃ fiber coupled to an InGaAsSb photodiode was used to record the radiation distribution over the emitting surface in InGaAsSb episide-down-bonded negative luminescence devices (λ=3.9 μm). Emission spectra were recorded under forward and reverse bias and both were modulated by a Fabry–Perot resonator formed by the anode contact and emitting InAs surface in 45-μm thick diodes. The results show that the current/emission distribution crowds in the vicinity of the contact under forward bias, while a uniform current/emission distribution over the emitting surface is seen under reverse bias.     

Si1−xGex/Si multi-quantum well phototransistor for near-infrared operation

For the first time in the literature, we report the monolithic integration of SiGe near-infrared phototransistor and planar hetero-junction bipolar transistor (HBT). The phototransistor is made with SiGe/Si multi-quantum well structure (MQW_PHT). At room temperature, the MQW_PHT reveals an optical responsivity of 1904 mW/A at 0.85 μm and 1.25 mW/A at 1.3 μm under the reversed bias of V_CE=1.5 V. For electrical DC and microwave performance, the SiGe HBT has a current gain of 160 and a cut-off frequency (f_T) of 25 GHz, respectively.     

Short wave pass and long wave pass dichroic coating at 45° on zinc selenide substrate for dual band thermal imager

In dual band thermal imager dichroic coating plays a vital role in separating 3–5 μm and 7.5–10.5 μm wavelength region for observing better image quality from two different channels. In this work a study has been carried out on the design and fabrication of short and long wave pass dichroic coating at 45° on zinc selenide flat substrate. These dichroic coated optics can be used to separate 3–5 μm (in reflection or transmission channel) and 7.5–10.5 μm (in transmission or reflection channel) wavelength region. An inhomogeneous refractive index profile which is a polynomial of 5th order was considered to design the high and low wave pass dichroic coating on zinc selenide substrate. The inhomogeneous profile was then approximated with five steps from substrate to air medium. These steps were then converted in terms of durable coating materials of six and seven layer stack for short and long wave pass dichroic coating respectively. The coating material combination used was germanium as high index material and IR-F625 as low index material. Result achieved for short wave pass dichroic filter was 94% average transmission in 3–5 μm region and 95% average reflection in 7.5–10.5 μm region. Similarly, result achieved for long wave pass dichroic filter was 95% average reflection in 3–5 μm region and 94% average transmission in 7.5–10.5 μm.     

A pulsed synthesis of β-FeSi2 layers on silicon implanted with Fe ions

Continuous layers and fine-grained films of β-FeSi₂ were synthesized using the implantation of Fe⁺ ions into Si (1 0 0) with subsequent pulsed nanosecond ion-beam treatment of the implanted layers. The X-ray diffraction studies showed that the pulsed ion-beam treatment brings about the formation of a mixture of two phases: FeSi and β-FeSi₂ with strained crystal lattices. Subsequent rapid thermal annealing led to the complete transformation of the FeSi phase into the β-FeSi₂ phase with the formation of a textured layer. The data obtained using Raman spectroscopy corroborate the formation of the β-FeSi₂ phase with a high degree of silicon crystallinity.The results of measuring the optical absorption point to the formation of β-FeSi₂ layers and precipitates with a direct-gap structure, an optical gap of E_g≈0.83 eV. The photoluminescence band peaked at λ≈1.56 μm and caused by direct band-to-band transitions in β-FeSi₂ was observed at temperatures lower than 210 K.     

Demonstration of 640 × 512 pixels long-wavelength infrared (LWIR) quantum dot infrared photodetector (QDIP) imaging focal plane array

We have exploited the artificial atom-like properties of epitaxially grown self-assembled quantum dots (QDs) for the development of high operating temperature long wavelength infrared (LWIR) focal plane arrays (FPAs). QD infrared photodetectors (QDIPs) are expected to outperform quantum well infrared detectors (QWIPs) and are expected to offer significant advantages over II–VI material based FPAs. We have used molecular beam epitaxy (MBE) technology to grow multi-layer LWIR dot-in-a-well (DWELL) structures based on the InAs/InGaAs/GaAs material system. This hybrid quantum dot/quantum well device offers additional control in wavelength tuning via control of dot-size and/or quantum well sizes. DWELL QDIPs were also experimentally shown to absorb both 45° and normally incident light. Thus we have employed a reflection grating structure to further enhance the quantum efficiency. The most recent devices exhibit peak responsivity out to 8.1 μm. Peak detectivity of the 8.1 μm devices has reached 1 × 10¹⁰ Jones at 77 K. Furthermore, we have fabricated the first long-wavelength 640 × 512 pixels QDIP imaging FPA. This QDIP FPA has produced excellent infrared imagery with noise equivalent temperature difference of 40 mK at 60 K operating temperature.     

Quantum dots formed by activated spinodal decomposition of InGa(Al)As alloy on InAs stressors

We have studied quantum dots (QDs) fabricated by activated spinodal decomposition (ASD) of an InGa(Al)As alloy deposited on top of self-organized InAs nanoscale stressors on GaAs substrate. Such a growth sequence results in a strong red shift of the PL emission down to 1.3 μm at 300 K. This red shift is caused by the formation of In-rich areas in the vicinity of the InAs islands, which increase the effective dot size. Beyond a certain critical InAs composition or nominal thickness of the InGa(Al)As layer the PL line shifts back towards higher energies. Adding Al to the alloy increases the red shift for a given In concentration. Room temperature lasing near 1.3 μm with threshold current densities of about 85 A/cm² was achieved for lasers based on three-fold stacked ASD-formed QDs, with a maximum cw output power of 2.7 W.