Calculation of displacement fields and simulation of HRTEM images of dislocations in sphalerite type A(III)B(V) compound semiconductors

The displacement fields of different kinds of both perfect and dissociated dislocations have been calculated for an isotropic continuum, and by means of linear elasticity. Additionally, the corresponding HRTEM images have been simulated by the well-established EMS program package in order to predetermine the structural aspects of dislocations, and then to compare it with experimental HRTEM micrographs. The latter ones resulted from plastically deformed GaP single crystals and InAs/(001)GaAs single epitaxial layers. It could be established that using the simple approach of linear elasticity and isotropy results can be obtained which correspond well to the experimental images. So, the structure of various Shockley partial dislocations bounding a stacking fault can be detected unambiguously. The splitting behaviour of perfect 30° dislocations (separation into a 0° and 60° partial) and 90° dislocations (separation into two 60° partials) both with line direction along 〈112〉, 60° dislocations (separation into 30°/90° and 90°/30° configuration) and screw dislocations (separation into two 30° partials) along 〈110〉 are discussed in the more detail. Moreover, the undissociated sessile Lomer dislocation, glissile 60° dislocation and edge dislocation have been considered too.     

Misfit Strain Relaxation by Dislocations in InAs Islands and Layers Epitaxially Grown on (001)GaAs Substrates by MOVPE

The misfit dislocation configurations in InAs islands as well as in more or less continuous layers grown on (001) oriented GaAs substrates were studied by weak-beam and high-resolution electron microscopy. The islands are confined by {101} and {111} facets where the aspect ratio (height/lateral extension) can be affected by the growth conditions. It is possible to grow well-defined islands as well as relatively continuous layers by MOVPE under As-stabilized conditions. At constant deposition parameters the growth is characterized by islands of different sizes (but with constant aspect ratio) in various strain states depending on their dislocation content. Coherently strained islands without any dislocation can be observed for heights up to 23 ML InAs, or otherwise, up to a maximal island extension of about 12 nm (for the particular aspect ratio ≈︂0.585). With further increase of island height and lateral extension, the introduction of dislocations becomes favourable. Independent of the island size, the layer thickness and the dislocation density, a residual elastic strain of about ε^r = —0.8% remains after relaxation. This means, about 88% of the total misfit strain of ε = —6.686 × 10^—2 were compensated by Lomer dislocations. These sessile Lomer dislocations lie in the island interior only, where single 60° dislocations were observed exclusively in their near-edge regions. With increasing island size and/or layer thickness some close-spaced 60° dislocations occur additionally within the interfacial region. The Lomer dislocations that are always located 4 monolayers (ML) above the InAs/GaAs interfacial plane result from the well-known fusion of two 60° slip dislocations. These 60° dislocations have been nucleated 7 … 8 ML above the interface at surface steps on the {111} facets confining the islands. Based on our experimental observations a new mechanism is proposed that explains the origin of these 60° dislocations. Their further fusion to sessile Lomer dislocations that compensate the misfit strain most efficiently occurs in the way as commonly accepted.     

Defect Structure in Te-doped GaAs single Crystals after Plastic Deformation (I). Twins and Stacking Faults

At temperatures above the brittle-to-ductile transition (490 °C) in Te-doped GaAs three types of predominant defect configurations have been observed after uniaxial compression along a [001] direction: (i) twins and stacking faults (500 … 520 °C), (ii) slip zones of dislocations (≈ 550 °C) and (iii) dislocation cells (580 … 590 °C). In Part I quantitative details of the appearance of twins and stacking faults are given. Most frequently found were 30° partials in twins and stacking faults.     

Influence of a buried misfit dislocation network on the pyramid-to-dome transition size of Ge self-assembled quantum dots on Si(0 0 1)

The critical sizes of the pyramid-to-dome transition of Ge self-assembled quantum dots (SAQDs) grown on relaxed SiGe buffer layers were investigated for the relationship between the misfit strain built in dots and nucleation sites. The strain field of arrays of buried dislocations in a relaxed SiGe buffer layer provided preferential nucleation sites for quantum dots. Burgers vector analysis using plan-view transmission electron microscopy verified that the preferential nucleation sites of Ge SAQDs depended on the Burgers vector direction of corresponding dislocations. The measurement of the lateral distance between SAQDs and dislocations clarified that the location of SAQDs was at the intersection of the dislocation slip plane and the top surface. The samples are fabricated to contain low dislocation densities. The average dislocation spacing is larger than the surface migration length of Ge adatoms, resulting in two groups of SAQDs, those that are located along the dislocations, and those that are not. Atomic force microscopy observations showed a distinctively larger critical size for Ge SAQDs grown over the intersection of the dislocation slip plane and the top surface than those grown in regions between dislocations. These experimental observations indicate that the critical size of the pyramid-to-dome transition is strongly dependent on misfit strain in SAQDs with lower strain being associated with a larger critical size.     

Edge misfit dislocations in the GeSi/Si(001) pair: Conditions and specific features of high-quantity generation

Dislocation structure of Ge_xSi_1?x films (x=0.4?0.8) grown by molecular-beam epitaxy on Si(001) substrates was studied by means of transmission electron microscopy. It was found that the density of edge MDs formed at the early stage of plastic strain relaxation in the films could exceed the density of 60° MDs. In our previous publications, a predominant mechanism underlying the early formation of edge misfit dislocations (MD) in Ge_xSi_1?x/Si films with x>0.4 was identified; this mechanism involves the following processes. A 60° glissile MD provokes nucleation of a complementary 60° MD gliding on a mirror-like tilted plane (111). A new edge MD forms as a result of interaction of the two complementary 60° MDs, and the length of the newly formed edge MD can then be increased following the motion of the “arms” of the complementary 60° MDs. Based on this scenario of the edge MD generation process, we have calculated the critical thickness of insertion of an edge MD into GeSi layers of different compositions using the force balance model. The obtained values were found to be more than twice lower than the similar values for 60° MDs. This result suggests that a promising strategy towards obtaining dislocation arrays dominated by 90° dislocations in MBE-grown Ge_xSi_1?x/Si films can be implemented through preliminary growth on the substrate of a thin, slightly relaxed buffer layer with 60° MDs present in this layer. The dislocated buffer layer, acting as a source of threading dislocations, promotes the strain relaxation in the main growing film through nucleation of edge MDs in the film/buffer interface. It was shown that in the presence of threading dislocations penetrating from the relaxed buffer into the film nucleation of edge MDs in the stressed film can be initiated even if the film thickness remains small in comparison with the critical thickness for insertion of 60° MDs. Examples of such unusual MD generation processes are found in the literature.     

A Gamma-ray Diffraction Study of MBE-Grown CaF2/Si(111) Heterostructures

MBE grown epitaxial films of CaF₂ onto Si(111) substrates were investigated by gamma ray diffraction to obtain assertions about the real structure and the strain situation in the epitaxial systems. It were measured the integral reflection coefficient R_i and the angle distribution of the reflected intensity of both (111) and (333) reflections. It was found that (i) a high temperature annealing step during the wafer preparation (1200 °C) causes a drastical increase of real structure defects in the substrate material, (ii) expitaxial layers of 18 nm thickness are grown pseudomorphically, layers having a thickness of 30 nm are relaxed, (iii) the misfit dislocation network formed during the relaxation process is localized not in the deposit but in the substrate material.     

Twins in CdMnTe single crystals grown by Bridgman method

Cd_1‐xMn_xTe (x =0.2, CdMnTe) crystal was grown by the vertical Bridgman method, which exhibits a pure zincblende structure in the whole ingot. The major defect, twins, which is fatal to CdMnTe crystal, was analyzed with scanning electron microscopy (SEM), X‐ray energy disperse spectroscopy (XEDS) and optic microscopy on the chemical etching surface. The twins observed in the as‐grown ingot are mainly lamellar ones, which lie on the {111} faces from the first‐to‐freeze region of the ingot and run parallel to the growth axis of the ingot. Coherent twins with {115}_t‐{111}_h orientations when indexed with respect to both the twin and host orientations, are often found to be terminated by {110}_t‐{114}_h lateral twins. Te inclusions with about 20 μm in width are observed to preferentially decorate the lamellar twin boundaries. The origin of the twins, relating to the growth twin and the phase transformation twin, is also discussed in this paper. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Slip band formation during bending of gap wafers

{001} LEC-GaP:S wafers were deformed between 470 °C and 640 °C. {111} slip planes of maximum resolved shear stress were activated. Heights and densities of slip steps have been measured by optical and electron microscopy. At lower temperatures deformation proceeds mainly by growth of step heights whereas at higher temperatures bending is accomplished by the increase of slip band density rather than of height.     

Dislocation density in heteroepitaxial indium arsenide layers

In As layers have been grown by CVD on (111)B-oriented GaAs substrates. The dislocation density (N_D) distribution through the layer thickness has been studied. N_D is dependent on the mole fraction of AsCl₃ in the gaseous phase and, consequently, on the current carriers concentration. This results in the supposition that the decreasing of N_D in the layers after a “critical” thickness is due to the “pinning” of dislocations at impurity atoms which form stronger bonds with the host In or As atoms than the bond In–As, an effect which is known for bulk GaAs and InP crystals.     

Defect Structure in Te-doped GaAs Single Crystals after Plastic Deformation (II). Dislocation Slip and Cell Formation

At temperatures above the brittle-to-ductile transition (490 °C) in Te-doped GaAs three types of predominant defect configurations have been observed after uniaxial compression along a [001] direction: (i) twins and stacking faults (500 … 520 °C), (ii) slip zones of dislocations (≈550 °C) and (iii) dislocation cells (580 … 590 °C). In Part II quantitative details of the appearance of slip and cell formation are given. Leading segments of gliding half loops are mainly of 60° type. Cell walls were formed by multiple slip of perfect dislocations.     

Nucleation,Glide Velocity and Blocking of Misfit Dislocations in SiGe/Si

Relaxation of strained layer systems is still not well understood. It is time dependent and changes considerably for samples with different growth history. This has to be discussed in terms of nucleation, glide velocity and blocking of misfit dislocations. We have investigated these phenomena at samples with SiGe layer thicknesses ranging from 60 nm up to 120 nm grown by molecular beam epitaxy (MBE) or chemical vapor deposition (CVD) by means of X-ray topography. The samples were annealed at temperatures between 500° and 600° C. Nucleation of misfit dislocations is heterogeneous and the rate is obviously dependent on layer strain and thickness. A quantified nucleation rate was not yet accessible, mainly due to the preferential formation of dislocation bundles. The propagation velocities of misfit dislocation segments were measured during annealing by means of synchrotron radiation plane wave topography (reflection geometry). The values agree well with theory and there is no evidence that they depend on growth regime. It is shown that the interaction of propagating misfit dislocations with crossing ones may lead to blocking or cross slip in different glide systems. These results are corroborated by investigations with atomic force and transmission electron microscopy.     

Preparation and Characterization of MBE-grown Si/CaF2 Heterostructures

Growth and fabrication of silicon-on-insulator structures, based on heteroepitaxial growth of insulating films on Si, is an area of research that has rapidly developed in recent years. Thin CaF₂ films and Si/CaF₂ multilayers were prepared on {111}-oriented Si substrates by molecular beam epitaxy (MBE) and were investigated by RHEED and RBS. For epitaxial growth the Si substrates were cleaned using the ultraviolet/ozone surface cleaning method which is an effective tool to remove contaminants from the surface by low-temperature in-vacuo preheating. The growth of CaF₂ on such Si{111} substrates provides epitaxial layers with a high structural perfection. When this layer system, however, is used as a substrate for epitaxial Si growth the Si layers show always twin formation. Si layers without twins could be obtained only after deposition of thin amorphous Si buffer layers at room temperature, immediately followed by Si growth at 700 °C.     

Growth of ZnTe layers on (111) GaAs substrates by metalorganic vapor phase epitaxy

ZnTe layers were grown on (111) GaAs substrates by metalorganic vapor phase epitaxy using dimethylzinc and diethyltelluride as the source materials. X-ray diffraction analysis revealed that epitaxial ZnTe layers can be obtained on (111) GaAs substrates. X-ray rocking curves, Raman spectroscopy, and photoluminescence measurements showed that the crystal quality of ZnTe layers depends on the substrate temperature during the growth. A high-crystalline quality (111) ZnTe heteroepitaxial layer with strong near-band-edge emission at 550 nm was obtained at a substrate temperature of 440 °C.     

Dislocations and dislocation reduction in space grown GaSb

The behaviour of dislocations in GaSb crystals grown in space both from a stoichiometric melt (floating zone method, FZ) and a Bi solution (floating solution zone, FSZ) respectively, is studied. Predominantly straight 60° dislocations with Burgers vectors of the type b = a/2 <110> in (111) glide planes are identified. In the 20 mm long FZ single crystal the linear growing out of the dislocations is observed which reduces the dislocation density in the centre of the crystal to values below 300 cm^–2. The Bi incorporation in the FSZ crystal results in a misfit between seed and grown crystal and in a network of misfit dislocations at the interface. Thermocapillary convection during growth as well as the surface tension may be the reasons for the presence of curved dislocations and the higher dislocation density within a 1 – 2 mm border region at the edges of both of the crystals. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Investigation of X‐ray Satellite Reflections Attributed to Antiphase Boundaries in Epitaxial (Ga,In)P Layers grown on (001) GaAs Substrates

We report on the analysis of additional X‐ray reflections that probably arise from antiphase domain boundaries within (Ga,In)P/(001) GaAs heteroepitaxial layers. Due to the preferred cation ordering along the crystallographic directions [1‐1 1] and [‐1 1 1] which belong to the [110] zone the original sphalerite‐type structure of (Ga,In)P changes into a CuPt‐like of the cation sublattice. This ordering phenomenon causes a loss of symmetry, i.e. the cubic structure is converted into a rhombohedral one. The antiphase boundaries between ordered domains are assumed to behave similar to lattice planes at X‐ray diffraction. Therefore, additional reflections may occur spatially neighboured to the [001] direction. The presented results of X‐ray experiments are discussed in relation to TEM experiments published in the literature in order to explain the origin of the satellite reflections. In the case of the investigated samples (grown on GaAs substrates misoriented 2° towards the azimuthal [010] direction) the APBs run preferentially in directions tilted up to angles of 20° with respect to growth direction. A preferential occurrence of satellite reflections in <13 2 1> directions was observed coinciding with {13 2 1} "lattice planes" whose normals enclose the same angle to the [001] growth direction as the normals of the average planes characterized by APBs. The appearence of the phenomenon in other directions that are also spatially neighboured to the <13 2 1> directions was determined on the basis of the shift of the reflection positions due to tilting the sample around an axis geometrically included in the scattering plane.     

MOVPE growth of spontaneously ordered (GaIn) and (AlIn)P layers lattice matched to GaAs substrates

A systematic study of the metal-organic vapour-phase epitaxial growth of (GaIn)P and (AlIn)P layers deposited on GaAs substrates with (001) and (110) orientation is presented. Special attention has been paid to the growth on (001)-oriented wafers with different misorientations to the growth direction. The influence of the growth conditions on the properties of the epitaxial layers such as lattice mismatch, alloy composition, photoluminescence (PL) wavelength, FWHMs of PL peaks and atomic ordering is discussed. Layers with mirrorlike surfaces and various degrees of order could be deposited at growth temperatures T_g ranging from 595 °C to 750 °C for (GaIn)P and 720 °C to 800 °C for (AlIn)P. In addition to the influence of T_g on the Ga incorporation during the (GaIn)P growth we found the Ga distribution coefficient k_Ga to be affected by the misorientation of the substrates. k_Ga correlates presumably with the number of kinks and steps on the substrate surface. Transmission electron diffraction (TED) and PL investigations show that the degree of order — often described by the ordering paramter η — depends strongly on T_g the ordering is more pronounced when the layers are deposited on substrates misoriented towards the (1 11) lattice plane. Strong ordering has been observed for (GaIn)P samples grown at 680 °C on substrates 2° misoriented towards the [1 10] direction and at 650 °C on substrates 6° misoriented towards the same direction. For the (AlIn)P samples striking ordering has been found when they were grown at 720 °C.     

Deformation Modes and Structure Evolution in Laser‐Shock‐Loaded Molybdenum Single Crystals of High Purity

This paper reports on the microstructural changes occurring within molybdenum single crystals after shock treatment with an excimer laser‐system in a confined ablation mode with different number of impacts. Using different complementary investigation methods (optical microscopy, scanning electron microscopy and transmission electron microscopy) it is found that slip and twinning are active modes of deformation during the shock‐induced plastic deformation. After laser treatment with a single laser pulse slip bands on {112} planes containing several microscopic twins are the dominating microstructural feature, whereas further laser‐shock‐processing leads to the formation of a homogeneous arrangement of screw dislocations, tangles and loops. Deformation modes and microstructure in laser shocked samples prove to be quite similar to those of explosive shocked specimens although the laser‐induced peak pressure is about an order of magnitude lower than that during explosive loading.It is shown that the laser shock‐induced hardening increases with increasing number of impacts in the range from 1 to 6 impacts. This shock‐induced strengthening is correlated with the overall dislocation density.     

Thermally activated stress relief in garnet layers grown by liquid phase epitaxy

The lattice misfit of (Lu, Tb)₃Fe₅O₁₂ epitaxial layers grown in compression on Gd₃Ga₅O₁₂ substrates has been found to decrease as a result of annealing at temperatures between 1000 and 1300°C. The deformation rate is thermally activated and depends on the degree of compressive misfit stress at the annealing temperature, the layer thickness and the reducing nature of the anneal atmosphere. Layers which were in tension at the annealing temperature (obtained by using Y₃Fe₅O₁₂ as the substrate material) did not exhibit stress relief. The process has been found to occur nonhomogeneously by the formation of regions of almost total relief which grow and multiply with continued annealing. The shape symmetry of these regions is consistent with dislocation climb in {112} planes. The results are interpreted in terms of a mechanism involving dislocation climb loops (∽1μm diameter) which develop as a result of the formation of oxygen vacancies.     

Growth of InGaAs/GaAs on Offcut Substrates by MOVPE: Influence on Macrosteps and Dislocations Formation

A study of the relationship between the macrosteps caused by the substrate misorientation and dislocation nucleation in MOVPE-grown InGaAs/GaAs is presented. The macrosteps could favour strain relaxation and the decrease of the critical thickness, also by generation of misfit dislocations in the 1/2〈110〉{011} glide system, as they can provide sites for stress accumulation above the average value far from the macrosteps. This adds up to the enhanced homogeneous dislocation nucleation associated with the offcut angle. The use of offcut substrates thus produces both compositional inhomogeneities and an increase of the overall dislocation density.     

On the nature of growth hillocks on sodium chlorate crystals

Optical examination of as-grown {100} surfaces of sodium chlorate crystals grown from aqueous solution revealed the presence of elliptical growth hillocks. The hillocks were present on both enantiomorphous forms and originated from dislocations, inclusions, and microcrystals attached to the growing surface. The value of the surface entropy factor equal to 4.55 at 313 K suggests that crystals grow via/or with the participation of dislocation mechanism, and the hillocks are dislocation growth centers. Compound mechanism controlled growth of some crystals because edge nucleation and dislocation centers operated simultaneously on the same surfaces.