Étude par spectrométrie Auger de films passifs formes sur le tantale en solution d'acide phosphorique

Elemental in-depth profiles of passivated films formed on electrolytically anodized tantalum in phosphoric acid were constructed from Auger electron spectroscopy N′(E) peaks while ion beam etching the anodized tantalum surfaces. The profiles are shown to be useful in determining the stoichiometry of anodic-oxide layers.The thickness of the passivated films decreases with increasing current density and/or acid concentration for a constant anodization voltage. The film thickness is shown to increase, for given anodization conditions, with increased bath temperatures. The profiles also show that phosphorus from the H₃PO₄ bath is only present at the outermost surface layers of the films.     

The anodization of ZK60 magnesium alloy in alkaline solution containing silicate and the corrosion properties of the anodized films

The anodization of ZK60 magnesium alloy in an alkaline electrolyte of 100 g/l NaOH + 20 g/l Na₂B₄O₇·10H₂O + 50 g/l C₆H₅Na₃O₇·2H₂O + 60g/l Na₂SiO₃·9H₂O was studied in this paper. The corrosion resistance of the anodic films was studied by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization techniques and the microstructure and composition of films were examined by SEM and XRD. The influence of anodizing time was studied and the results show that the anodizing time of 60 min is suitable for acquiring films with good corrosion resistance. The influence of current density on the corrosion resistance of anodizing films was also studied and the results show that the film anodized at 20 mA/cm² has the optimum corrosion resistance. The film formed by anodizing in the alkaline solution with optimized parameters show superior corrosion resistance than that formed by the traditional HAE process. The XRD pattern shows that the components of the anodized film consist of MgO and Mg₂SiO₄.     

Growth process of atomically flat anodic films on titanium under potentiostatical electrochemical treatment in H2SO4 solution

The as-deposited titanium film on silicon wafer was electrochemically treated in potential sweep and potential step modes in 0.1 M H₂SO₄ solution at 30 °C. Under the anodization conditions of potential sweep and properly modulated cyclic voltammetry (CV), nanoscale grains, step-terrace structure and atomic images were clearly observed on the surface of anodic oxide film on titanium. Under potential step conditions, if the anodization time was short (1 s), no grains could be found on the anodic oxide film surface, even though the potential was high up to 9000 mV. Moreover, whatever potential sweep or potential step mode was performed, sufficient time (low sweep rate means a prolonged anodization time) was needed for the formation of nanoscale grains, atomically flat surface and step-terrace structure on the anodized titanium film.     

Effects of anodizing conditions on bond strength of anodically oxidized film to titanium substrate

The bond strength of the oxide film to the titanium substrate and its inherent structural characteristics are very important preconditions for the success of titanium implants. The purpose of this study was to evaluate the micro-morphologies, crystalline structures, and bond strengths of the anodically oxidized films formed on titanium with the variation of electrolytes and applied current densities. In contrast to the specimens produced using sulfuric acid as the electrolyte, those produced using phosphoric acid showed quite different shapes and densities of the pores as the applied current densities were varied. The oxide films anodized in sulfuric acid consisted of anatase and rutile TiO₂, whileTiP₂O₇ was predominantly formed on the Ti surfaces anodized using phosphoric acid as the electrolyte. The oxide films, which did not experience spark deposition showed amorphous shape and their bond strengths were significantly lower than those of the other groups (p < 0.05). Those specimens which experienced initial spark deposition with a low current condition showed the highest bond strengths (34.2 MPa) within each electrolyte sub-set. The growing rates of the oxide film thicknesses in relation to the electric current changes varied according to the type of electrolyte, and the oxide film thickness influenced the bond strength.     

Improvement of corrosion resistance of NiTi sputtered thin films by anodization

Anodization of sputtered NiTi thin films has been studied in 1 M acetic acid at 23 °C for different voltages from 2 to 10 V. The morphology and cross-sectional structures of the untreated and anodized surfaces were investigated by field emission scanning electron microscopy (FE-SEM). The results show that increasing anodization voltage leads to film surface roughening and unevenness. It can be seen that the thickness of the anodized layer formed on the NiTi surface is in the nanometer range. The corrosion resistance of anodized thin films was studied by potentiodynamic scan (PDS) and impedance spectroscopy (EIS) techniques in Hank's solution at 310 K (37 °C). It was shown that the corrosion resistance of the anodized film surface improved with increasing voltage to 6 V. Anodization of austenitic sputtered NiTi thin films has also been studied, in the same anodizing conditions, at 4 V. Comparison of anodized sputtered NiTi thin films with anodized austenitic shape memory films illustrate that the former are more corrosion resistant than the latter after 1 h immersion in Hank's solution, which is attributed to the higher grain boundary density to quickly form a stable and protective passive ?lm.     

Synthesis of Y-junction carbon nanotubes within porous anodic aluminum oxide template

Y-junction carbon nanotubes with the average diameter about 200 nm were successfully synthesized within porous anodic aluminum oxide template, which was prepared by anodic anodizing aluminum sheet in 1.0 mol/l H₃PO₄ solution at a constant anodization voltage 90 V.     

Electrodeposited ruthenium oxide thin films for supercapacitor: Effect of surface treatments

Amorphous and porous ruthenium oxide thin films have been deposited from aqueous Ru(III)Cl₃ solution on stainless steel substrates using electrodeposition method. Cyclic voltammetry study of a film showed a maximum specific capacitance of 650 F g⁻¹ in 0.5 M H₂SO₄ electrolyte. The surface treatments such as air annealing, anodization and ultrasonic weltering affected surface morphology. The supercapacitance of ruthenium oxide electrode is found to be dependent on the surface morphology.     

Electrochemical impedence spectroscopy versus optical interferometry techniques during anodization of aluminium

In the present investigation, holographic interferometry was utilized for the first time to measure in situ the thickness of the oxide film, alternating current (AC) impedance, and double layer capacitance of aluminium samples during anodization processes in aqueous solution without any physical contact. The anodization process (oxidation) of the aluminium samples was carried out by the electrochemical impedance spectroscopy (EIS), in different concentrations of sulphuric acid (1.0–2.5% H₂SO₄) at room temperature. In the mean time, the real-time holographic interferometric was used to measure the thickness of anodized (oxide) film of the aluminium samples in aqueous solutions. Also, mathematical models were applied to measure the AC impedance, and double layer capacitance of aluminium samples by holographic interferometry, during anodization processes in aqueous solution. Consequently, holographic interferometric is found very useful for surface finish industries especially for monitoring the early stage of anodization processes of metals, in which the thickness of the anodized film, the AC impedance, and the double layer capacitance of the aluminium samples can be determined in situ. In addition, a comparison was made between the electrochemical values obtained from the holographic interferometry measurements and from measurements of EIS. The comparison indicates that there is good agreement between the data from both techniques.     

Electrochemical behaviors of the magnesium alloy substrates in various pretreatment solutions

Interface reactions and film features of AZ91D magnesium alloy in pickling, activation and zinc immersion solutions have been investigated. The surface morphologies of the specimens were observed with scanning electron microscope (SEM). Electrochemical behaviors of AZ91D magnesium alloy in the baths of pickling, activation and zinc immersion were analyzed based on the open circuit potential (OCP) - time curves in various solutions. The results show that the corrosive rate in HNO₃ + CrO₃ or HNO₃ + H₃PO₄ pickling solution was more rapid than in KMnO₄ pickling-activation solution. Both α phase and β phase of the substrates were uniformly corroded in HNO₃ + CrO₃ or HNO₃ + H₃PO₄ pickling solution, the coarse surface can augment the mechanical occlusive force between the subsequent coatings and the substrates, so coatings with good adhesion can be obtained. In HF activation solution, the chromic compound formed via HNO₃ + CrO₃ pickling was removed and a compact MgF₂ film was formed on the substrate surface. In K₄P₂O₇ activation solution, the corrosion products formed via HNO₃ + H₃PO₄ pickling were removed, a new thin film of oxides and hydroxides was formed on the substrate surface. In KMnO₄ pickling-activation solution, a film of manganic oxides and phosphates was adhered on the substrate surface. Zinc film was symmetrically produced via K₄P₂O₇ activation or KMnO₄ pickling-activation, so it was good interlayer for Ni or Cu electroplating. Asymmetrical zinc film was produced because the MgF₂ film obtained in the HF activation solution had strong adhesive attraction and it was not suitable for interlayer for electroplating. However, the substrate containing compact MgF₂ film without zinc immersion was fit for direct electroless Ni-P plating.     

Investigation of heat-treatment and pre-treatment on microstructure and electrochemical properties of cerium nano-oxide films on AA7020-T6 by sol-gel methods

In this paper cerium nano-oxide films were applied on AA7020-T6 alloy by sol-gel method. Potentiodynamic polarization and EIS studies have been used to study the corrosion behavior of cerium oxide nano films in 3.5% NaCl. Microstructural and phase properties of cerium oxide were investigated by SEM and XRD. The results showed that heat-treatment temperature and pre-treatment have an important effect on microstructure and electrochemical properties of cerium nano-oxide films. It can be seen from the results that with increasing heat-treatment temperature from 150 to 300 °C, the corrosion resistance of the films increased. It is related to increase the condensation of the films with adding temperature. Also, it can be seen that with adding temperature from 300 to 400 °C, the corrosion resistance of the films decrease. This is an important case related to crystallization of the cerium oxide films between 300 and 400 °C which showed that crystallized ceria films illustrate less corrosion resistance with respect to an amorphous film. Although with applying cerium oxide films the corrosion resistance of the films increased but still the passive region of the ceria films was tiny. So that in this research especially pre-treatment (etching in NaOH solution for 1 min, washing with deionized water for 5 min, etching with acid solution which contained several acids (H₂SO₄, HF, HCl, H₃PO₄), washing with deionized water for 5 min and after that following the samples in boiling deionized water for 1 h) was applied on samples before ceria treatment. The results showed that after applying this pre-treatment the passive region of the films increased extremely. It is related to formation of the thick and porous alumina films after applying pre-treatment which are similar to millepore.     

Measurement of the a.c. impedance of aluminium samples by holographic interferometry

In the present investigation, holographic interferometry was utilized for the first time to measure the alternating current (a.c.) impedance of aluminium samples during the initial stage of anodization processes in aqueous solution without any physical contact. The anodization process (oxidation) of the aluminium samples was carried out chemically in different sulphuric acid concentrations (0.5–3.125% H₂SO₄) at room temperature. In the mean time, a method of holographic interferometric was used to measure the thickness of anodization (oxide film) of the aluminium samples in aqueous solutions. Along with the holographic measurement, a mathematical model was derived in order to correlate the a.c. impedance of the aluminium samples in solutions to the thickness of the oxide film of the aluminium samples which forms due to the chemical oxidation. The thickness of the oxide film of the aluminium samples was measured by the real-time holographic interferometry. Consequently, holographic interferometry is found very useful for surface finish industries especially for monitoring the early stage of anodization processes of metals, in which the thickness of the anodized film as well as the a.c. impedance of the aluminium samples can be determined in situ. In addition, a comparison was made between the a.c. impedance values obtained from the holographic interferometry measurements and from measurements of electrochemical impedance spectroscopy. The comparison indicates that there is good agreement between the data from both techniques.     

Surface characteristics of TiN/ZrN coated nanotubular structure on the Ti-35Ta-xHf alloy for bio-implant applications

In this study, we investigated the surface characteristics of the TiN/ZrN-coated nanotubular structure on Ti-35Ta-xHf ternary alloys for bio-implant applications. These ternary alloys contained from 3 wt.% to 15 wt.% Hf contents and were manufactured in an arc-melting furnace. The Ti-35Ta-xHf alloys were heat treated in Ar atmosphere at 1000 °C for 24 h, followed by water quenching. Formation of the nanotubular structure was achieved by an electrochemical method in 1 M H₃PO₄ electrolytes containing 0.8 wt.% NaF. The TiN coating and ZrN coating were subsequently prepared by DC-sputtering on the nanotubular surface. Microstructures and nanotubular morphology of the alloys were examined by FE-SEM, EDX and XRD. The microstructure showed a duplex (α′′ + β) phase structure. Traces of martensite disappeared with increasing Hf content, and the Ti-35Nb-15Hf alloy had an entirely equiaxed structure of β phase. This research has shown that highly ordered, high aspect ratio, and nanotubular morphology surface oxide layers can be formed on the ternary titanium alloys by anodization. The TiN and ZrN coatings formed on the nanotubular surfaces were uniform and stable. The top of the nanotube layers was uniformly covered with the ZrN film compared to the TiN film when the Ti-35Ta-xHf alloys had high Hf content.     

Nitric acid method for fabrication of gate oxides in TFT

We have developed low temperature formation methods of SiO₂ layers which are applicable to gate oxide layers in thin film transistors (TFT) by use of nitric acid (HNO₃). Thick (>10 nm) SiO₂ layers with good thickness uniformity (i.e., ±4%) can be formed on 32 cm × 40 cm substrates by the two-step nitric acid oxidation method in which initial and subsequent oxidation is performed using 40 and 68 wt% (azeotropic mixture) HNO₃ aqueous solutions, respectively. The nitric acid oxidation of polycrystalline Si (poly-Si) thin films greatly decreases the height of ridge structure present on the poly-Si surfaces. When poly-Si thin films on 32 cm × 40 cm glass substrates are oxidized at azeotropic point (i.e., 68 wt% HNO₃ aqueous solutions at 121 °C), ultrathin (i.e., 1.1 nm) SiO₂ layers with a good thickness uniformity (±0.05 nm) are formed on the poly-Si surfaces. When SiO₂/Si structure fabricated using plasma-enhanced chemical vapor deposition is immersed in 68 wt% HNO₃, oxide fixed charge density is greatly decreased, and interface states are eliminated. The fixed charge density is further decreased by heat treatments at 200 °C, and consequently, capacitance-voltage characteristics which are as good as those of thermal SiO₂/Si structure are achieved.     

Transparent titania nanotubes of micrometer length prepared by anodization of titanium thin film deposited on ITO

Transparent TiO₂ nanotube arrays of micrometer lengths were prepared by anodization of titanium thin film RF sputtered on indium tin oxide (ITO) which was coated on glass substrate. The sputtering process took place at elevated temperature of 500 °C. The structures of the films were studied using scanning electron microscopy (SEM) and X-ray diffraction (XRD) while the optical properties of the films were investigated using UV-visible spectroscopy. Two types of electrolytes were used in this work: an aqueous mixture of acetic acid and HF solution and a mixture of NH₄F and water dissolved in ethylene glycol. The concentration of NH₄F, voltage and the thickness of the sputtered titanium film were varied to study their effect on the formation of TiO₂ nanotube arrays. It is demonstrated in this work that the nanoporous layer is formed on top of the ordered array of TiO₂ nanotubes. Furthermore, the optical transmittance of TiO₂ nanotubes annealed at 450 °C is much lower than the non annealed TiO₂ nanotubes in the visible wavelength region.     

Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

Chemical dissolution of the barrier layer of porous oxide formed on thin aluminum films (99.9% purity) in the 4% oxalic acid after immersion in 2 mol dm⁻³ sulphuric acid at 50 °C has been studied. The barrier layer thickness before and after dissolution was calculated using a re-anodizing technique. It has been shown that above 57 V the change in the growth mechanism of porous alumina films takes place. As a result, the change in the amount of regions in the barrier oxide with different dissolution rates is observed. The barrier oxide contains two layers at 50 V: the outer layer with the highest dissolution rate and the inner layer with a low dissolution rate. Above 60 V the barrier oxide contains three layers: the outer layer with a high dissolution rate, the middle layer with the highest dissolution rate and the inner layer with a low dissolution rate. We suggest that the formation of the outer layer of barrier oxide with a high dissolution rate is linked with the injection of protons or H₃O⁺ ions from the electrolyte into the oxide film at the anodizing voltages above 57 V.     

Microscale steps and micro-nano combined structures by anodizing aluminum

In this paper, we firstly present a novel microscale-step structure fabricated by anodizing aluminum in a mixture of 0.05-0.5 wt% NaCl (HCl), 2 wt% H₃PO₄ and 20 wt% ethanol under potentials of 1-40 V at room temperature. Then, we present two micro-nano combined structures by integrating the microsteps with nanopores through multi-step anodizations. The microstep-nanopore hierarchical structure was obtained by re-anodizing the sample in oxalic acid, and the regular nanopores can be realized on the microscale patterned aluminum surface. The two-layer porous structure was one layer of nanoporous anodic alumina and another layer of micropores by two-step anodization on sample's both sides. These two novel structures can be useful for surface engineering and high flux filtration, respectively. The current fabrication approach broadens the applications of aluminum anodization, and brings a new method for assembling micro-nano structures.     

Effect of the chemistry and structure of the native oxide surface film on the corrosion properties of commercial AZ31 and AZ61 alloys

The purpose of this study has been to advance in knowledge of the chemical composition, structure and thickness of the thin native oxide film formed spontaneously in contact with the laboratory atmosphere on the surface of freshly polished commercial AZ31 and AZ61 alloys with a view to furthering the understanding of protection mechanisms. For comparative purposes, and to more fully describe the behaviour of the native oxide film, the external oxide films formed as a result of the manufacturing process (as-received condition) have been characterised. The technique applied in this research to study the thin oxide films (thickness of just a few nanometres) present on the surface of the alloys has basically been XPS (X-ray photoelectron spectroscopy) in combination with ion sputtering. Corrosion properties of the alloys were studied in 0.6 M NaCl by measuring charge transfer resistance values, which are deduced from EIS (electrochemical impedance spectroscopy) measurements after 1 h of exposure. Alloy AZ61 generally showed better corrosion resistance than AZ31, and the freshly polished alloys showed better corrosion resistance than the alloys in as-received condition. This is attributed to a combination of (1) higher thickness of the native oxide film on the AZ61 alloy and (2) greater uniformity of the oxide film in the polished condition. The formation of an additional oxide layer composed by a mixture of spinel (MgAl₂O₄) and MgO seems to diminish the protective properties of the passive layer on the surface of the alloys in as-received condition.     

Effect of electrolyte temperature on the formation of self-organized anodic niobium oxide microcones in hot phosphate-glycerol electrolyte

Nanoporous niobium oxide films with microcone-type surface morphology were formed by anodizing at 10 V in glycerol electrolyte containing 0.6 mol dm⁻³ K₂HPO₄ and 0.2 mol dm⁻³ K₃PO₄ in a temperature range of 428-453 K. The microcones appeared after prolonged anodizing, but the required time was largely reduced by increasing electrolyte temperature. The anodic oxide was initially amorphous at all temperatures, but crystalline oxide nucleated during anodizing. The anodic oxide microcones, which were crystalline, appeared on surface as a consequence of preferential chemical dissolution of initially formed amorphous oxide. The chemical dissolution of an initially formed amorphous layer was accelerated by increasing the electrolyte temperature, with negligible influence of the temperature on the morphology of microcones up to 448 K.     

Tip-induced local anodic oxidation on p-GaAs surface with non-contact atomic force microscopy

Nano-sized oxide structures resulted from localized electrochemical oxidation induced by a negatively biased atomic force microscopy (AFM) tip operated with the non-contact mode were fabricated on p-GaAs(1 0 0) surface. The geometrical characteristics of the oxide patterns and their dependences on various fabrication parameters, e.g., the anodization time, the biased voltages, the tip scanning rates, as well as the formation mechanism and relevant growth kinetics are investigated. Results indicate that the height of the protruded oxide dots grow exponentially as a function of time in the initial stage of oxidation and soon reaches a maximum height depending linearly with the anodized voltages, in according with the behaviors predicted by space charge limited local oxidation mechanism. In addition, selective micro-Auger analysis of the anodized region reveals the formation of Ga(As)O_x, indicating the prominent role played by the field-induced nanometer-size water meniscus in producing the nanometer-scale oxide dots and bumps on p-GaAs(1 0 0) surface.     

Electrochemical and surface behavior of hydyroxyapatite/Ti film on nanotubular Ti-35Nb-xZr alloys

In this paper, we investigated the electrochemical and surface behavior of hydroxyapatite (HA)/Ti films on the nanotubular Ti-35Nb-xZr alloy. The Ti-35Nb-xZr ternary alloys with 3-10 wt.% Zr content were made by an arc melting method. The nanotubular oxide layers were developed on the Ti-35Nb-xZr alloys by an anodic oxidation method in 1 M H₃PO₄ electrolyte containing 0.8 wt% NaF at room temperature. The HA/Ti composite films on the nanotubular oxide surfaces were deposited by a magnetron sputtering method. Their surface characteristics were analyzed by field-emission scanning electron microscopy (FE-SEM), energy-dispersive X-ray spectroscopy (EDS) and an X-ray diffractometer (XRD). The corrosion behavior of the specimens was examined through potentiodynamic and AC impedance tests in 0.9% NaCl solution. From the results, the Ti-35Nb-xZr alloys showed a solely β phase microstructure that resulted from the addition of Zr. The nanotubular structure formed with a diameter of about 200 nm, and the HA/Ti thin film was deposited on the nanotubular structure. The HA/Ti thin film-coated nanotubular Ti-35Nb-xZr alloys showed good corrosion resistance in 0.9% NaCl solution.