Photofabrication of surface relief gratings from azobenzene containing perfluorocyclobutane aryl ether polymer

An azobenzene based perfluorocyclobutane (PFCB) aryl ether polymer, poly[4‐(phenylazo)triphenylamine‐1,2‐hexafluorocyclobutyl ether], was synthesized by using a palladium catalyzed amination reaction and the 2π + 2π cyclodimerization of 4‐[(trifluorovinyl)oxy]bromobenzene. This polymer was designed and synthesized to permit azo chromophores to be incorporated, thus introducing photoinduced dynamic behavior into the PFCB containing polymer structure. The polymer exhibited a T_g of about 122 °C, and the maximum absorption of the azo chromophores was 407 nm in the film state. A thin film was prepared through a spin coating process, and the rapid growth of diffraction efficiency was then achieved by irradiation with an interference beam. The efficient formation of holographic surface relief gratings was also verified from AFM images, which show regularly defined and aligned grating structures. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 3525–3532, 2005     

Photo-fabrication of surface relief gratings on polymer films

Surface relief gratings were optically produced on a number of azobenzene-based polymer films. The surface grating formation was investigated by monitoring the diffraction efficiency and using atomic force microscopy. The effect of the structure of the chromophores on surface modulation was investigated. The surface deformation process depended on the polarization state of the writing beams. The localized variations of the light intensity and alteration of the resulting electric field polarization were essential writing conditions to the formation of the surface relief gratings. The surface pattern from straight edge diffraction established that the surface profile of the recorded gratings is proportional to negative gradient of the intensity pattern incident on the polymer film.     

Fabrication of surface: relief gratings and their laser induced damage resistance properties

This work demonstrates a promising method for fabricating ZrO₂ surface–relief gratings by photosensitive sol–gel method combining with two-beam laser interference. UV-photosensitive ZrO₂ resist with high resolution are prepared by using metal–chelate complexes as precursors. Two-beam laser interference lithography is carried out by a Kr ion laser with a wavelength of 350.7 nm and ZrO₂ gratings with the minimum line-width of 150 nm are obtained. Laser induced damage resistance properties of ZrO₂ gratings are investigated by a Q-switched solid state laser with the wavelength of 527 nm and the pulse width of 8.65 ns as the incident source. The results show that the LIDT of ZrO₂ gratings on glass substrate heated at 600 °C is about 4.59 ± 0.06 J/cm².     

Small dosage of holographic exposure via a He-Ne laser to fabricate tunable liquid crystal phase gratings operated with low electric voltages

The fabrication processes of tunable liquid crystal (LC) phase gratings via small dosage of holographic exposure of a He-Ne laser beam were investigated. The initial LC cells were filled with various ratios of ingredients mainly including LCs and photocurable monomers. The fabricated LC phase gratings shown in the Raman–Nath regime possessed a maximum value of first-order diffraction efficiency close to 33.3% at 5.8 V_rms. Furthermore, optimised grating was demonstrated and used as an interference recorder in holography.     

Photoinduced surface relief gratings in high-Tg main-chain azoaromatic polymer films

We have synthesized two classes of polyureas with mono- and bisazoaromatic groups in their main chains via reactions between isophorone diisocyanate and the corresponding diamines. Holographic gratings were fabricated on azoaromatic polyurea films prepared by spin-coating from solutions. The effect of high glass transition temperature and dipole moment of azo groups on the formation of gratings was investigated. Although the two polymers have relatively high glass transition temperatures (197 and 236°C), chromophore alignment was induced by laser beam irradiation at modest light intensities. Regularly spaced surface relief gratings on the polymer film were also recorded upon exposure to an interference pattern of two polarized argon laser beams. Erasure could be achieved by heating above T_g or by exposure to one of the beams in a manner similar to low-T_g side-chain azo polymers. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 283–289, 1998     

可溶性聚酰亚胺类偶氮高分子的合成与表征

用聚合物的后重氮偶合方法合成了以可溶性聚酰亚胺为主链 ,偶氮生色团为侧基的新型偶氮高分子 ,并通过引入线性长链烷烃侧基来提高聚合物的溶解性 .采用红外光谱、氢核磁共振、紫外光谱和热分析等手段 ,对产物的结构、热性能及光学性能等进行了表征 .该聚合物膜在氩离子干涉激光的照射下形成正弦波形的表面起伏光栅 ,起伏深度可达 2 0 0nm .     

New developments in the dye-doped polymer dispersed liquid crystals gratings: A review

In this study, the dye-doped polymer dispersed liquid crystals (PDLC) gratings techniques performed by the various research groups or being developed are briefly reviewed. Especially, the electrically switched diffraction and holographic gratings, have attained much attention by various research groups working in the PDLC-related display studies. The fabrication methodologies used for such grating texture, include like the conventional dye-doped PDLC grating, Azo-dye doped PDLC gratings, and lasing techniques etc., adopted for dye-doped PDLC gratings. The useful features and characteristics of their fabrication process of such gratings are discussed. Finally, some of the future perspectives on this particular research field are presented.     

DFB laser diodes in the wavelength range from 760 nm to 2.5 μm

We present a novel device technology to produce DFB laser diodes which are suitable for tunable diode laser spectroscopy. The new technological approach employs lateral metal distributed feedback (DFB) gratings in close proximity to the laser ridge which results in single mode emission with high spectral purity and output powers as required for most spectroscopic applications. Over the entire wavelength range from the visible (760 nm) up to the near-infrared (2.5 microm) single mode emission can be obtained for devices based on different semiconductor systems such as GaAs, InP and GaSb. Typical side mode suppression ratios are better than 35 dB for cw-room temperature operation and narrow linewidths ensure high spectroscopic resolution.     

Acrylic polymer/silica organic–inorganic hybrid emulsions for coating materials: Role of the silane coupling agent

Acrylic polymer/silica organic–inorganic hybrid emulsions were synthesized by a simple method, that is, a conventional emulsion polymerization and subsequent sol–gel process, to provide water‐based coating materials. The acrylic polymer emulsions contained a silane coupling agent monomer, such as methacryloxypropyltriethoxysilane, to form highly solvent‐resistant hybrid films. On the other hand, the hybrid films from the surface‐modified polymer emulsions, in which the silane coupling agent was located only on the surface of the polymer particles and the particle core was not crosslinked, did not exhibit high solvent resistance. A honeycomblike array structure, which was derived from the polymer particles (diameter ≈ 50 nm) and the silica domain, on the hybrid film surfaces was observed by atomic force microscopy. The crosslinked core part and silane coupling agent containing the shell part of the polymer particles played important roles in attaining high solvent resistance. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 4736–4742, 2006     

Fabrication of fluorescent surface relief patterns using AIE polymer through a soft lithographic approach

A new aggregation‐induced emission (AIE) active polymer (PS‐TPE) with high tetraphenylethene (TPE) loading density was synthesized. The synthesized polymer showed significant AIE properties, good solubility and high thermal stability. Soft‐lithographic contact printing process by using photoinduced surface relief structures on azo polymer film as masters and duplicated PDMS elastomer as stamps was used to fabricate fluorescent PS‐TPE patterns. Various fluorescent structures with high contrast including surface relief gratings, periodically dotted patterns, and quasi‐crystal structures can be easily fabricated through this approach. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1838–1845     

Fabrication of photoprocessible azo polymer microwires through a soft lithographic approach

In this work, a soft lithographic approach has been developed to fabricate free-standing azo polymer microwires with unique photoprocessible characteristics. In the process, an epoxy-based azo polymer (BP-AZ-CA) was used to prepare both the soft lithographic masters and the microwires. The masters were prepared by photofabricating surface relief gratings on BP-AZ-CA thin films. Then the elastomeric stamps were prepared by replica molding of poly(dimethylsiloxane) prepolymer against the masters. With use of the stamps and a solution of BP-AZ-CA as "ink", the microwires were prepared by contact printing and wet etching. The microwires possessed a uniform sub-micrometer-scale transverse dimension and macroscopic longitudinal dimension. Those characteristic sizes depended on the adjustable features of the masters and stamps used in the process. The transverse dimension of the microwires could be altered after exposure to a linearly polarized Ar+ laser single beam with the polarization direction perpendicular to the longitudinal axes of the microwires. Upon irradiation of interfering p-polarized Ar+ laser beams, regular surface relief structures could be inscribed on the microwires along the longitudinal direction, which coincided with both the polarization direction of the laser beams and the grating vector direction of the interference pattern. The microwires with photoprocessible properties are potentially usable as sub-micrometer-scale materials in future miniaturized components and devices. The approach reported in this work can be further extended to the fabrication of nano-/microwires from other polymeric materials.     

Organic Printed Core–Shell Heterostructure Arrays: A Universal Approach to All‐Color Laser Display Panels

A universal approach is demonstrated for realizing dual‐wavelength lasing in organic core–shell structured microlaser arrays, which show great promise in serving as all‐color laser display panels. By alternately printing hydrophilic and hydrophobic laser dye solutions on preprocessed substrates, precisely patterned core–shell heterostructure arrays were obtained. The spatially separated core and shell independently function as optical resonators to support dual‐wavelength tunable lasing in each heterostructure. Such a general method enables to flexibly control the lasing wavelength of the core–shell microlasers across a wide spectral range by systematically designing the gain media. Using as‐prepared microlaser arrays as display panels, full‐color laser displays were achieved with a color gamut much larger than that of standard RGB space. These results provide insights for design concepts and device construction for novel optoelectronic applications.     

Real time laser interference microscopy for bar‐spread polystyrene/poly(methyl methacrylate) blends

We demonstrate that real‐time laser interference microscopy can be used to directly observe the dynamics of film formation and phase separation processes for a bar‐spread polystyrene/poly(methyl methacrylate) blend. The ability to dynamically image laser interference patterns allows compete drying curves and polymer content to be determined throughout the film formation process. The polymer content at which phase separation structure first is observed in the interference micrograph sequence is in good agreement with calculated spinodal curves. Morphology evolution proceeds from phase separation onward via coarsening and coalescence to arrive at the final domain structure. In comparison, spin coating the same polymer blend results in structure evolution being quenched further from equilibrium due to the faster drying rate. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2014 , 52, 985–992     

Fabrication of Two-Dimensional Gratings Using Photosensitive Gel Films and Their Characterization

Two-dimensional (2D) surface-relief gratings have been fabricated by the two-beam interference method on photosensitive gel films, which are derived from chemically modified metal-alkoxides, and characterized with respect to surface morphology and antireflection effect. Photosensitive ZrO₂ gel film was deposited on a silica glass substrate using the sol that was prepared from Zr-tetrabutoxide chemically modified with benzoylacetone. The gel film was exposed to two-beam interference fringe (1.0 m period) of He-Cd laser and then rotated by 90° in its own plane, followed by an additional exposure. Leaching of the gel film with ethanol gave lattice or island types of 2D-gratings depending on the dose of laser irradiation. The morphology of the gratings changed with irradiation time of laser, leaching conditions and so on. The formation of 2D-grating of island type on a silica glass substrate substantially reduced the reflection at its surface in a wavelength range of 1.3 to 2.6 m.     

Fabrication of TiO2 Grating with Composites of Azobenzene Polymer and TiO2 Nanoparticles

We have used the formation of surface relief gratings (SRG) on azobenzene polymers to manipulate TiO₂ nanoparticles and to fabricate TiO₂ nanoparticle gratings. Suspensions of an azobenzene polymer (PDO3) and TiO₂ were used to spin coat thin films on glass slide substrates. By interfering coherent light from an Argon laser on the surface of the PDO3‐TiO₂ composite films, SRGs were fabricated. Atomic force microscopic images of the SRGs show TiO₂ nanoparticles dispersed throughout the sample, and in particular, at the peaks of the SRG after oxygen plasma treatment. The lateral forces acting on the azobenzene polymer during the SRG fabrication drag the TiO₂ nanoparticles. These results indicated that it is feasible to create TiO₂ nanoparticle gratings with the composites.     

Acrylic polymer/silica hybrids prepared by emulsifier‐free emulsion polymerization and the sol–gel process

Acrylic polymer/silica hybrids were prepared by emulsifier‐free emulsion polymerization and the sol–gel process. Acrylic polymer emulsions containing triethoxysilyl groups were synthesized by emulsifier‐free batch emulsion polymerization. The acrylic polymer/silica hybrid films prepared from the acrylic polymer emulsions and tetraethoxysilane (TEOS) were transparent and solvent‐resistant. Atomic force microscopy studies of the hybrid film surface suggested that the hybrid films did not contain large (e.g., micrometer‐size) silica particles, which could be formed because of the organic–inorganic phase separation. The Si? O? Si bond formed by the cocondensation of TEOS and the triethoxysilyl groups on the acrylic polymer increased the miscibility between the acrylic polymer component and the silica component in the hybrid films, in which the nanometer‐size silica domains (particles) were dispersed homogeneously in the acrylic polymer component. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 273–280, 2006     

Structure induced by irradiation of femtosecond laser pulse in dyed polymeric materials

We investigated the structures induced by an irradiation of a near‐infrared (NIR) femtosecond laser pulse in dye‐doped polymeric materials {poly(methyl methacrylate) (PMMA), thermoplastic epoxy resin (Epoxy), and a block copolymer of methyl methacrylate and ethyl acrylate‐butyl acrylate [p(MMA/EA‐BA) block copolymer]}. Dyes used were classified into two types—type 1 with absorption at 400 nm and type 2 with no absorption at 400 nm. The 400‐nm wavelength corresponds to the two‐photon absorption region by the irradiated NIR laser pulse at 800 nm. Type 1 dye‐doped PMMA and p(MMA/EA‐BA) block copolymer showed a peculiar dye additive effect for the structures induced by the line irradiation of a NIR femtosecond laser pulse. On the contrary, dye‐doped Epoxy did not exhibit a dye additive effect. The different results among PMMA, p(MMA/EA‐BA) block copolymer, and Epoxy matrix polymers are supposed to be related to the difference of electron‐acceptor properties. The mechanism of this type 1 dye‐additive‐effect phenomenon for PMMA and p(MMA/EA‐BA) block copolymer is discussed on the basis of two‐photon absorption of type 1 dye at 400 nm by the irradiation of a femtosecond laser pulse with 800 nm wavelength and the dissipation of the absorbed energy to the polymer matrix among various transition processes. Dyes with a low‐fluorescence quantum yield favored the formation of thicker grating structures. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 2800–2806, 2002     

Bottom-up and top-down approach for periodic microstructures on thin oxide films by controlled photo-activated chemical processes

Micropatterned oxide films were fabricated by controlling the photo-induced processes, such as buckling driven wrinkle formation and photomigration, in the photo monomer-oxide precursor hybrid films. The photo-induced process depended on the wavelength of the illuminated light, that is to say, the penetration depth of the UV light for polymerization; a uniform illumination of 254 nm light from the incoherent black light induces the surface buckling which resulted in the self-organized formation of a long-range ordered surface wrinkle structure (bottom-up process). On the other hand, 325 nm or 365 nm illumination enables us to fabricate a microstructure by the conventional photolithography technique, such as the mask method or holographic illumination (top-down process). The simultaneous illumination of the black light (uniform, 254 nm) and the He–Cd laser (holographic, 325 nm) resulted in the formation of a 2D micropattern in which the holographic gratings are formed by the holographic illumination together with the array of dots by surface buckling. This result indicates that the present microfabrication offers an integration of the top-down and bottom-up approach to realize the simultaneous fabrication of multi-scale and complex microstructured thin oxide films for photonic applications.