Effect of annealing in N2 atmosphere on net acceptor concentration in ZnSe:N grown by MOCVD

Annealing effect on net acceptor concentration in ZnSe:N is investigated. ZnSe:N homo-epitaxial layer was grown at 823 K by MOCVD using ammonia (NH₃) as a dopant source. Photoluminescence (PL) spectra measured on as-grown layer exhibited the strong deep donor–acceptor pair (D^dAP) emission and the weak I₁^N emission line. In order to enhance the activation of nitrogen in ZnSe epitaxial layer, sample was annealed at the 823 K in nitrogen (N₂) and hydrogen (H₂) atmosphere. Only the annealing in nitrogen atmosphere increased I₁^N emission intensity indicate the activation of nitrogen acceptor. And net acceptor concentration was estimated to be 3 × 10¹⁷cm⁻³ by C–V measurements. This activation mechanism is interpreted as hydrogen is released from N–H bonds during annealing in nitrogen atmosphere.     

Theoretical investigations of spin splittings in asymmetric AlSb/InAs/GaSb heterostructures and the possibility of electric field induced magnetization

We use the effective bond orbital model method to examine the spin splitting due to the Rashba effect in AlSb/InAs/GaSb asymmetric heterostructures. We find for the resulting two-dimensional electron gas (2DEG) under study that large theoretical values of the Bychkov–Rashba coefficients in the range of 30 × 10 ^{− 10}to 50 × 10 ^{− 10}eV · cm can be achieved. Finally, we present a phenomenon that might lead to a direct observation of the Rashba effect. We derive an expression, valid in the diffusive limit, for the spin polarization of the current resulting from a bias parallel to the plane of the quantum well.     

Computer modeling of MWIR single heterojunction photodetector based on mercury cadmium telluride

In the present paper, an abrupt heterojunction photodetector based on Hg_1 − xCd_xTe (MCT) has been simulated theoretically for mid-infrared applications. A semi-analytical simulation of the device has been carried out in order to study the performance ratings of the photodetector for operation at room temperature. The energy band diagram, carrier concentration, electric field profile, dark current, resistance–area product, quantum efficiency and detectivity have been calculated and optimized as a function of different parameters such as device thickness, applied reverse voltage and operating wavelength. The effect of energy band offsets in conduction and valance band on the transportation of minority carriers has been studied. The influences of doping concentration, electron affinity gradient and the p–n junction position within heterostructure on potential barrier have been analyzed. The optical characterization has been carried out in respect of quantum efficiency, and detectivity of the heterojunction photodetector. In present model the Johnson–Nyquist and shot noise has been considered in calculation of detectivity. The simulated results has been compared and contrasted with the available experimental results. Results of our analytical-cum-simulation study reveal that under suitable biasing condition, the photodetector offers a dark current, I_D ≈ 6.5 × 10⁻¹² A, a zero-bias resistance–area product, R₀A ≈ 11.3 Ω m², quantum efficiency, η ≈ 78%, NEP = 2 × 10⁻¹² W Hz^1/2 and detectivity D^* ≈ 4.7 × 10¹⁰ mHz^1/2/W.     

Carrier concentration and shallow electron states in In-doped hydrothermally grown ZnO

Single-crystal ZnO has been hydrothermally grown with additional In₂O₃ in the solution. Schottky barrier contacts have been deposited by electron beam evaporation of Pd onto the face. Capacitance–voltage measurements have been performed to reveal the carrier concentration as a function of the In₂O₃ content in the solution, and secondary-ion mass spectrometry was used to measure the resulting In concentration in the samples. For an In₂O₃ content of 2×10¹⁹ cm⁻³, the average free electron concentration increased to 5×10¹⁸ cm⁻³ compared to 4×10¹⁷ cm⁻³ for the non-doped material. An increase of the In₂O₃ content to 4×10¹⁹ cm⁻³ leads to a measured carrier concentration of approximately 1×10¹⁹ cm⁻³; however, only up to a quarter of the incorporated In became electrically active. From thermal admittance spectroscopy measurements two prominent electronic levels are found, and compared with to the non-doped material case, the freeze-out of the shallow doping in the In-doped samples takes place at lower temperatures (below 80 K).     

NOx generation in laser-produced plasma in air as a function of dissipated energy

An experimental study on the production of NO_x as a function of dissipated energy in laser-produced plasma in air is presented. A plasma was produced by focusing a (60–180) mJ, 5 ns, 532 nm pulse from a Q-switched Nd:YAG laser. The results show that for laser energy in the range of 13–99 mJ the laser plasma generates 6.7×10¹⁶ NO_x molecules per joule and 4.6×10¹⁶ NO molecules per joule. An order of magnitude estimate of the NO and NO_x production per unit volume of heated gas based on a simple model show that the NO_x and NO production efficiency in air are about 3×10²² and 2×10²² molecules J⁻¹ m⁻³.     

The influence of the annealing conditions on the photoluminescence of ion-implanted SiO2:Si nanosystem at additional phosphorus implantation

The influence of P ion doping on the photoluminescence (PL) of the system of nanocrystals in SiO₂ matrix (SiO₂:Si) both without annealing and after annealing at various temperatures (provided before and after additional P implantation) is investigated. The Si and P implantation was carried out with ion energies of 150 keV and doses Φ_Si=10¹⁷ cm⁻² and Φ_P=(0.1–300)×10¹⁴ cm⁻² (current density j3 μAcm⁻²). The system after Si implantation was formed at 1000°C and 1100°C (2 h). For the case of SiO₂:Si system as-implanted by P, the intensity of PL was drastically quenched, but partially retained. As for the step-by-step annealing (at progressively increased temperatures) carried out after P implantation, the sign and degree of doping effect change with annealing temperature. The possible mechanisms of these features are discussed.     

Rotational absorption spectrum of methylene fluoride in the 20–100 cm region

The pure rotational spectrum of CH₂F₂ was recorded in the 20–100 cm⁻¹ spectral range and analyzed to obtain rotation and centrifugal distortion constants. Analysis of the data yielded rotation constants: A = 1.6392173 ± 0.0000015, B = 0.3537342 ± 0.00000033, C = 0.3085387 ± 0.00000027, τ_aaaa = −(7.64 ± 0.46) × 10⁻⁵, τ_bbbb = −(2.076 ± 0.016) × 10⁻⁶, τ_cccc = −(9.29 ± 0.12) × 10⁻⁷, T₁ = (4.89 ± 0.20) × 10⁻⁶, and T₂ = −(1.281 ± 0.016) × 10⁻⁶cm⁻¹.     

Optical and Photoelectric Inhomogeneity of CdTe:V Crystals

The optical and photoelectric properties of CdTe:V crystals with the doping impurity concentration N _V = 5·10¹⁸–5·10¹⁹ cm^–3 are investigated and the possibility of their use as a photorefractive material is considered. As is seen from the spectra of optical transmission, the crystals of both types possess high transparency (50–65%), which for CdTe:V specimens with N _V = 5·10¹⁹ cm^–3 decreases sharply and in the range 12–14 m does not exceed 5%, whereas for CdTe:V crystals with vanadium concentration of 5·10¹⁸ cm^–3 such a value of transmission remains unchanged up to 25 m, implying a good optical quality of the latter crystals and their possible application in the spectral range 1.06–1.25 m in modern fiber-optic communication lines.     

Effect of oxygen partial pressure on the structural and optical properties of dc reactive magnetron sputtered molybdenum oxide films

Molybdenum oxide films (MoO₃) were deposited on glass and crystalline silicon substrates by sputtering of molybdenum target under various oxygen partial pressures in the range 8 × 10⁻⁵–8 × 10⁻⁴ mbar and at a fixed substrate temperature of 473 K employing dc magnetron sputtering technique. The influence of oxygen partial pressure on the composition stoichiometry, chemical binding configuration, crystallographic structure and electrical and optical properties was systematically studied. X-ray photoelectron spectra of the films formed at 8 × 10⁻⁵ mbar showed the presence of Mo⁶⁺ and Mo⁵⁺ oxidation states of MoO₃ and MoO_3−x. The films deposited at oxygen partial pressure of 2 × 10⁻⁴ mbar showed Mo⁶⁺ oxidation state indicating the films were nearly stoichiometric. It was also confirmed by the Fourier transform infrared spectroscopic studies. X-ray diffraction studies revealed that the films formed at oxygen partial pressure of 2 × 10⁻⁴ mbar showed the presence of (0 k 0) reflections indicated the layered structure of α-phase MoO₃. The electrical conductivity of the films decreased from 3.6 × 10⁻⁵ to 1.6 × 10⁻⁶ Ω⁻¹ cm⁻¹, the optical band gap of the films increased from 2.93 to 3.26 eV and the refractive index increased from 2.02 to 2.13 with the increase of oxygen partial pressure from 8 × 10⁻⁵ to 8 × 10⁻⁴ mbar, respectively.     

Weak-field magnetoresistance anomaly and Shubnikov–de Haas oscillations in Sn-doped InSb thin films on GaAs (100) substrates

Distinctive magnetoresistance (MR) effects in weak magnetic fields before the appearance of Shubnikov–de Haas (SdH) oscillations at low temperatures in Sn-doped (7×10¹⁶ cm⁻³) InSb films grown on GaAs(100) substrates by MBE have been investigated with decreasing film thickness d from 1 μm. The negative MR found in weak magnetic fields for d0.5 μm can be broadly divided into two regimes: T-sensitive negative MR below B_c observed with anisotropy between parallel and perpendicular magnetic field and a T-insensitive parabolic one above B_c observable only under in-plane magnetic fields. The latter is ascribable to the skipping orbit effect due to surface boundary scattering. In vanishing magnetic fields far below B_c, the negative MR reduces with decreasing d and the different positive MR overlaps with it below 0.5 μm, eventually dominating the positive MR at d0.2 μm. These results have been analyzed using a two-layer model for the films, where the composition of the upper layer under the surface and the lower one adjacent to the InSb/GaAs interface is assumed. The MR data in the extremely weak magnetic fields below 100 G for each layer have been successfully fitted to the two-dimensional (2D) weak localization (WL) theory. These results explain that the crossover from the 2D WL to the weak anti-localization (WAL) occurs when the interface is approached with the increase of SO interaction in the layers caused by the increased influence of the asymmetric potential at the hetero interface (Rashba term) and the SO rate in the intrinsic InSb film due to the crystal field of the zinc-blende structure (Dresselhaus term) is as small as τ_so⁻¹3×10⁸ s⁻¹.     

High-quality InAlN/GaN heterostructures grown by metal–organic vapor phase epitaxy

We fabricated high-quality InAlN/GaN heterostructures by metal–organic vapor phase epitaxy (MOVPE). X-ray diffraction measurements revealed that InAlN/GaN heterostructures grown under optimal conditions have flat surfaces and abrupt heterointerfaces. Electron mobility from 1200 to 2000 cm²/V s was obtained at room temperature. To our knowledge, this mobility is the highest ever reported for InAlN/GaN heterostructures. We also investigated the relationship between the Al composition and sheet electron density (N_s) for the first time. N_s increased from 1.0×10¹² to 2.7×10¹³ cm⁻² when the Al composition increased from 0.78 to 0.89.     

Fourier Transform Spectroscopy of theYΣ–XΠiTransition of CuO

TheY²Σ⁺–X²Π_inear-infrared electronic transition of CuO was observed at high resolution for the first time. The spectrum was recorded with the Fourier transform spectrometer associated with the McMath–Pierce Solar Telescope at Kitt Peak. The excited CuO molecules were produced in a low pressure copper hollow cathode sputter with a slow flow of oxygen. Constants for theY²Σ⁺states of CuO are:T₀= 7715.47765(54) cm⁻¹,B= 0.4735780(28) cm⁻¹,D= 0.822(12) × 10⁻⁶cm⁻¹,H= 0.46(10) × 10⁻¹⁰cm⁻¹, γ = −0.089587(42) cm⁻¹, γ_D= 0.1272(79) × 10⁻⁶cm⁻¹,b_F= 0.12347(22) cm⁻¹, andc= 0.0550(74) cm⁻¹. ImprovedX²Π_iconstants are also presented.     

High power diode single-end-pumped Nd:YVO4 laser

A fiber-coupled diode-single-end-pumped Nd:YVO₄ laser with an Nd:YVO₄ crystal of 0.3 at% doping concentration and 3×3×10 mm³ dimensions was reported. 14.850 W of continuous-wave output power in an M² factor of 1.12 was obtained under pump power of 27.365 W, with an optical conversion efficiency of 60.49%, and a slope efficiency of 64.5%.     

Free-to-bound radiative recombination in highly conducting InN epitaxial layers

We present a theoretical simulation of near-band-edge emission spectra of highly conducting n-InN assuming the model of ‘free-to-bound’ radiative recombination (FBRR) of degenerate electrons from the conduction band with nonequilibrium holes located in the valence band tails. We also study experimental photoluminescence (PL) spectra of highly conducting InN epitaxial layers grown by MBE and MOVPE with electron concentrations in the range (7.7×10¹⁷–6×10¹⁸) cm⁻³ and find that the energy positions and shape of the spectra depend on the impurity concentration. By modeling the experimental PL spectra of the InN layers we show that spectra can be nicely interpreted in the framework of the FBRR model with specific peculiarities for different doping levels. Analyzing simultaneously the shape and energy position of the InN emission spectra we determine the fundamental bandgap energy of InN to vary between E_g=692 meV for effective mass m_n0=0.042m₀ and E_g=710 meV for m_n0=0.1m₀.     

Elementary reactions of formyl (HCO) radical studied by laser photolysis—transient absorption spectroscopy

Several elementary reactions of formyl radical of combustion importance were studied using pulsed laser photolysis coupled to transient UV–Vis absorption spectroscopy: HCO → H + CO (1), HCO + HCO → products (2), and HCO + CH₃ → products (3). One-pass UV absorption, multi-pass UV absorption as well as cavity ring-down spectroscopy in the red spectral region were used to monitor temporal profiles of HCO radical. Reaction (1) was studied over the buffer gas (He) pressure range 0.8–100 bar and the temperature range 498–769 K. Reactions (2a), (2b), (2c), (3a) and (3b) as well as the UV absorption spectrum of HCO, were studied at 298 and 588 K, and the buffer gas (He) pressure of 1 bar. Pulsed laser photolysis (308, 320, and 193 nm) of acetaldehyde, propionaldehyde, and acetone was used to prepare mixtures of free radicals. The second-order rate constant of reaction (1) obtained from the data at 1 bar is: k₁(He) = (0.8 ± 0.4) × 10⁻¹⁰exp(−(66.0 ± 3.4) kJ mol⁻¹/RT) cm³ molecule⁻¹ s⁻¹. The HCO dissociation rate constants measured in this work are lower than those reported in the previous direct work. The difference is a factor of 2.2 at the highest temperature of the experiments and a factor of 3.5 at the low end. The experimental data indicate pressure dependence of the rate constant of dissociation of formyl radical 1, which was attributed to the early pressure fall-off expected based on the theory of isolated resonances. The UV absorption spectrum of HCO was revised. The maximum absorption cross-section of HCO is (7.3 ± 1.2) × 10⁻¹⁸ cm² molecule⁻¹ at 230 nm (temperature independent within the experimental error). The measured rate constants for reactions (2a), (2b), (2c), (3a) and (3b) are: k₂ = (3.6 ± 0.8) × 10⁻¹¹ cm³ molecule⁻¹ s⁻¹ (298 K); k₃ = (9.3 ± 2.3) × 10⁻¹¹ cm³ molecule⁻¹ s⁻¹(298 and 588 K).     

Exceptional sensitivity to neutrino parameters with a two-baseline Beta-beam set-up

We examine the reach of a Beta-beam experiment with two detectors at carefully chosen baselines for exploring neutrino mass parameters. Locating the source at CERN, the two detectors and baselines are: (a) a 50 kton iron calorimeter (ICAL) at a baseline of around 7150 km which is roughly the magic baseline, e.g., ICAL@INO, and (b) a 50 kton Totally Active Scintillator Detector at a distance of 730 km, e.g., at Gran Sasso. We choose ⁸B and ⁸Li source ions with a boost factor γ of 650 for the magic baseline while for the closer detector we consider ¹⁸Ne and ⁶He ions with a range of Lorentz boosts. We find that the locations of the two detectors complement each other leading to an exceptional high sensitivity. With γ=650 for ⁸B/⁸Li and γ=575 for ¹⁸Ne/⁶He and total luminosity corresponding to 5×(1.1×10¹⁸) and 5×(2.9×10¹⁸) useful ion decays in neutrino and antineutrino modes respectively, we find that the two-detector set-up can probe maximal CP violation and establish the neutrino mass ordering if sin²2θ₁₃ is 1.4×10⁻⁴ and 2.7×10⁻⁴, respectively, or more. The sensitivity reach for sin²2θ₁₃ itself is 5.5×10⁻⁴. With a factor of 10 higher luminosity, the corresponding sin²2θ₁₃ reach of this set-up would be 1.8×10⁻⁵, 4.6×10⁻⁵ and 5.3×10⁻⁵ respectively for the above three performance indicators. CP violation can be discovered for 64% of the possible δ_CP values for sin²2θ₁₃10⁻³ (8×10⁻⁵), for the standard luminosity (10 times enhanced luminosity). Comparable physics performance can be achieved in a set-up where data from CERN to INO@ICAL is combined with that from CERN to the Boulby mine in United Kingdom, a baseline of 1050 km.     

Electrical properties and defect model of tin-doped indium oxide layers

Tin-doped In₂O₃ layers were prepared by the spray technique with doping concentrationsc _Sn between 1 and 20 at. % and annealed at 500 °C in gas atmospheres of varying oxygen partial pressures. The room-temperature electrical properties were measured. Maximum carrier concentrationsN=1.5×10²¹cm^–3 and minimum resistivities =1.3×10^–4 cm are obtained if the layers are doped withc _Sn9 at. % and annealed in an atmosphere of oxygen partial pressurep _O2 10^–20 bar. At fixed doping concentration, the carrier mobility increases with decreasing oxygen pressure. The maximum obtainable mobility can be described in terms of electron scattering by ionized impurities. From an analysis of the carrier concentration and additional precision measurements of the lattice constants and film thicknesses, a defect model for In₂O₃:Sn is developed. This comprises two kinds of interstitial oxygen, one of which is loosely bound to tin, the other forming a strongly bound Sn₂O₄ complex. At low doping concentrationc _Sn4 at. % the carrier concentration is governed by the loosely bound tin-oxygen defects which decompose if the oxygen partial pressure is low. The carrier concentration follows from a relationN=K ₁ ·p _O2 ^–1/8 ·(3 ×10¹⁰ × c_Sn –N)^1/4 with an equilibrium constantK ₁=1.4×10¹⁵ cm^–9/4bar^1/8, determined from our measurements.     

Low resistance nonalloyed Al-based ohmic contacts on n-ZnO:Al

We have investigated the electrical properties of nonalloyed Al, Al/Au, and Al/Pt ohmic contacts on n-type ZnO:Al (2×10¹⁸ cm⁻³). All Al-based nonalloyed ohmic contacts on the n-ZnO:Al reveal linear current–voltage behavior with low specific contact resistivity of 8.5×10⁻⁴ (Al), 8.0×10⁻⁵ (Al/Au) and 1.2×10⁻⁵ Ω cm² (Al/Pt), respectively. Using secondary ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS) depth profiles, it was found that the O atoms in the ZnO:Al layer outdiffused to Al metal layer while the Al atoms indiffused to the surface region of ZnO:Al. This interdiffusion between Al and O atoms at room temperature results in an increase of doping concentration in the surface region of the ZnO:Al and reduces a specific contact resistivity of the Al-based ohmic contacts without thermal annealing process.     

Polarization spectroscopy of ion-pair states of ICl

Molecular constants for the E0⁺(³P₂) and 1(³P₂) ion-pair states of ICl vapor have been determined using sequential two-photon polarization-labeling spectroscopy. The two states are coupled by a heterogeneous perturbation which is analyzed in some detail for low-lying vibrational levels of 1(³P₂). The I³⁵Cl potential constants for the 1(³P₂) state and the rotation-vibration constants for the set of f sublevels—i.e., the constants unaffected by coupling with the E state—are (in cm⁻¹) 1(³P₂): Y_0,0= 39103.814(32), Y_1,0= 170.213(15), Y_2,0= −0.4528(22), Y_3,0= −7.0(12) × 10⁻⁴, Y_4,0= −1.48(24) × 10⁻⁵ and Y_5,0= −6.6(19) × 10⁻⁸, Y^(f)_0,1= 5.6878(17) × 10⁻² Y^(f)_1,1= −2.110(24) × 10⁻⁴, Y^(f)_2,1= −1.23(62) × 10⁻⁷, and Y^(f)_0,1= −3.08(22) × 10⁻⁸Likewise, the I³⁵Cl constants determined for the E 0⁺(³P₂) state are E 0⁺(³P₂: Y_0,0= 39054.38(61), Y_1,0= 166.96(10), Y_2,0 = −0.3995(42), Y_0,1= 5.738(31) × 10⁻², and Y_1,1= −1.67(26) × 10⁻⁴Practical constraints in pumping the sequence E 0⁺ ← B 0⁺ ← × 0⁺ restrict the analysis of the E state to levels v = 9–15. Given the long extrapolation to the equilibrium state the 3σ statistical uncertainties quoted for these constants should be treated with caution.     

Thermal oxidation of n-type ZnN films made by -sputtering from a zinc nitride target, and their conversion into p-type films

Transparent p-type thin films, containing zinc oxide phases, have been fabricated from the oxidation of n-type zinc nitride films. The zinc nitride thin films were deposited by rf-magnetron sputtering from a zinc nitride target in pure N₂ and pure Ar plasma. Films deposited in Ar plasma were conductive (resistivity 4.7×10⁻² Ω cm and carrier concentrations around 10²⁰ cm⁻³) Zn-rich Zn_xN_y films of low transmittance, whereas Zn_xN_y films deposited in N₂ plasma showed high transmittance (>80%), but five orders of magnitude lower conductivity. Thermal oxidation up to 550 C converted all films into p-type materials, exhibiting high resistivity, 10²–10³ Ω cm, and carrier concentration around 10¹³ cm⁻³. However, upon oxidation, the Zn_xN_y films did not show the zinc oxide phase, whereas Zn-rich Zn_xN_y films were converted into films containing ZnO and ZnO₂ phases. All films exhibited transmittance >85% with a characteristic excitonic dip in the transmittance curve at 365 nm. Low temperature photoluminescence revealed the existence of exciton emissions at 3.36 and 3.305 eV for the p-type zinc oxide film.