Optimization of parameters for deposition of Ga-doped ZnO films by DC reactive magnetron sputtering using Taguchi method

Ga-doped ZnO (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. Taguchi method was used to find the optimal deposition parameters including oxygen partial pressure, argon partial pressure, substrate temperature, and sputtering power. By employing the analysis of variance, we found that the oxygen and argon partial pressures were the most influencing parameters on the electrical properties of ZnO:Ga films. Under the optimized deposition conditions, the ZnO:Ga films showed acceptable crystal quality, lowest electrical resistivity of 2.61 × 10⁻⁴ Ω cm, and high transmittance of 90% in the visible region.     

Pulsed laser deposition of high-quality ZnO films using a high temperature deposited ZnO buffer layer

High-quality ZnO film growth on sapphire was achieved by pulsed laser deposition using a high temperature deposited ZnO buffer layer. This high temperature deposited buffer layer remarkably improves crystallinity of subsequent films. In particular, the full width at half-maximum of X-ray diffraction ω-rocking curves for ZnO films grown with the buffer layer is 0.0076° (27.36 arcsec) and 0.1242° (447.12 arcsec) for the out-of-plane (002) and in-plane (102) reflections, respectively. In addition, ZnO films grown with this buffer layer showed a carrier mobility of 88 cm²/V s, which is three times higher than that realized for ZnO films grown without the buffer layer. The room temperature photoluminescence spectra showed strong band edge emission with little or no defect-related visible emission. PACS 78.55.Et; 81.05.Dz     

Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Transparent conductive Al-doped zinc oxide (AZO) films with highly (0 0 2)-preferred orientation were deposited on quartz substrates at room temperature by RF magnetron sputtering. Optimization of deposition parameters was based on RF power, Ar pressure in the vacuum chamber, and distance between the target and substrate. The structural, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, Hall measurement, and optical transmission spectroscopy. The 250 nm thickness AZO films with an electrical resistivity as low as 4.62 × 10⁻⁴ Ω cm and an average optical transmission of 93.7% in the visible range were obtained at RF power of 300 W, Ar flow rate of 30 sccm, and target distance of 7 cm. The optical bandgap depends on the deposition condition, and was in the range of 3.75-3.86 eV. These results make the possibility for light emitting diodes (LEDs) and solar cells with AZO films as transparent electrodes, especially using lift-off process to achieve the transparent electrode pattern transfer.     

High-quality oriented ZnO films grown by sol-gel process assisted with ZnO seed layer

High-quality oriented ZnO films were prepared on silicon and quartz glass by sol-gel, assisted with a ZnO seed layer. The effects of the seed layer on the orientation, morphology and optical properties of ZnO films were investigated. Results show that the seed layer can effectively induce the growth of high-quality oriented ZnO films on two substrates, and the effectiveness of the seed layer strongly depends on preparation conditions, i.e., the spin-coating layer number and the preheating temperature. ZnO films with five layers on the seed layer preheated at 500 °C exhibit the single (0 0 2) orientation, which is much stronger than that on the flat substrate. Additionally, ZnO films on the seed layer show a denser internal structure and higher optical quality than that on the flat substrate. At ten layers, however, ZnO films on the seed layer show the multiple-orientation, which is similar to that on the flat substrate. Finally, the physical mechanism underlying the growth behavior of ZnO films assisted with the seed layer was discussed.     

Direct current magnetron sputter-deposited ZnO thin films

Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 °C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.     

Low-temperature deposition of transparent conducting ZnO:Zr films on PET substrates by DC magnetron sputtering

Transparent conducting zirconium-doped zinc oxide (ZnO:Zr) films were firstly deposited on polyethylene terephthalate (PET) substrates with ZnO buffer layers by DC magnetron sputtering at room temperature. Dependence of physical properties of ZnO:Zr films on deposition pressure was systematically studied. All the deposited films were polycrystalline and (1 0 0) oriented. When deposition pressure increases from 1 to 2.5 Pa, the crystallinity of the films improves and the resistivity decreases. While deposition pressure increases from 2.5 to 3.5 Pa, the crystallinity of the films deteriorates and the resistivity increases. The lowest resistivity of 1.8 × 10⁻³ Ω cm was obtained for the films deposited at the optimum deposition pressure of 2.5 Pa. All the films present a high transmittance of above 86% in the wavelength range of the visible spectrum.     

Method for pulsed magnetron deposition of diamondlike films on large-area substrates

The circuit of the pulse power supply of a magnetron sputtering system and the circuit of a high voltage generator used to realize the process of pulsed magnetron deposition of diamondlike films on large-area substrates are described. Measurements of the parameters of the plasma produced on pulsed magnetron sputtering of graphite in the argon medium have been performed. The plasma density (10¹⁷–10¹⁸ cm⁻³) has been shown to be one or two orders of magnitude higher than that in the case of dc magnetron sputtering and approach the plasma density achievable on vacuum arc cathode sputtering and pulsed laser sputtering. Samples of diamondlike films on crystalline silicon, titanium, and stainless steel have been prepared and examined. It has been demonstrated that high voltage bias pulses applied to the substrate promote production of high-quality diamondlike films showing high adherence to the substrate. Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 12, pp. 53–60, December, 1999.     

Direct current magnetron sputtering deposition of InN thin films

In this paper, InN thin films were deposited on Si (1 0 0) and K9 glass by reactive direct current magnetron sputtering. The target was In metal with the purity of 99.999% and the gases were Ar (99.999%) and N₂ (99.999%). The properties of InN thin films were studied. Scanning electron microscopy (SEM) shows that the film surface is very rough and energy dispersive X-ray spectroscopy (EDX) shows that the film contains In, N and very little O. X-ray diffraction (XRD) and Raman scattering reveal that the film mainly contains hexagonal InN. The four-probe measurement shows that InN film is conductive. The transmission measurement demonstrates that the transmission of InN deposited on K9 glass is as low as 0.5% from 400 nm to 800 nm.     

Production of high-quality manganite-based films on an improved VUP-5M magnetron device

The design of an additional thermal and electric shield intended to improve the quality (crystal lattice, thickness uniformity) of deposited films is described. This shield makes it possible to use a more powerful heat source to heat a substrate and to optimize epitaxial film growth. Simultaneously, the shield plays the role of an additional anode, which changes the plasma dynamics in the working space and homogenizes the radial distribution of the neutral particle flux density from a target to a substrate.     

用磁控溅射和真空硒化退火方法制备高质量的铜铟硒多晶薄膜

用双靶磁控溅射的方法在玻璃衬底上制备了Cu11In9合金薄膜,然后将Cu11In9合金薄膜封闭在石墨盒中进行真空硒化退火得到CuInSe2薄膜.用扫描电子显微镜(SEM)和X射线粉末衍射(XRD)对CuInSe2薄膜进行了表征,结果表明CuInSe2薄膜具有单一的晶相,均匀、致密的结构,以及粒径超过了3μm的晶粒. 关键词： 铜铟硒多晶薄膜 磁控溅射 真空硒化 太阳能电池     

高质量纳米ZnO薄膜的光致发光特性研究

报道了利用低压-金属有机物化学气相沉积技术生长纳米ZnS薄膜，然后，将ZnS薄膜在氧气中于800℃温度下进行热氧化制备高质量纳米ZnO薄膜.x射线衍射结果表明，纳米ZnO薄膜具有六角纤锌矿多晶结构.室温下观察到一束强的紫外(3.26 eV) 光致发光和很弱的深能级发射.根据激子峰的半高宽度与温度的关系确定了激子-纵向光学声子（LO）的耦合强度（ГLO）.由于量子限域效应使ГLO减少较多. 关键词： 光致发光 热氧化 激子 纳米ZnO薄膜     

Magnetic properties of Er-doped ZnO films prepared by reactive magnetron sputtering

All Zn_1−x Er _x O (x=0.04, 0.05, and 0.17) films deposited on glass substrates by radio-frequency reactive magnetron sputtering exhibit the mixture of ferromagnetic and paramagnetic phases at room temperature. The estimated magnetic moment per Er ion decreases with the increase of Er concentration. The temperature dependence of the magnetization indicates that there is no intermetallic ErZn buried in the films. The ferromagnetism is attributed to the Er ions substitution for Zn²⁺ in ZnO lattices, and it can be interpreted by the bound-magnetic-polaron model.     

C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates

Highly textured YBaCuO thin films were sputtered on MgO (100)-oriented single crystal substrates at ambient temperature followed by an anneal in oxygen for 1 h at temperatures up to 920 °C. X-ray diffractograms of the highly textured films indicate an orientation of the c-axis of the YBaCuO lattice perpendicular to the substrate surface. There are strong indications that the oriented c-axis growth is due to a CuO self-flux effect. Auger measurements reveal a copper diffusion profile into the substrate down to a depth of more than 400 nm.     

磁控溅射制备ZnO薄膜及其声表面波特性

通过射频磁控溅射技术在GaAs，Au/GaAs，Si和玻璃基片上成功制备了ZnO多晶薄膜，利用X射线衍射对ZnO薄膜的取向、结晶性进行了表征，结果表明ZnO薄膜呈完全c轴取向，Au缓冲层可以有效地改善ZnO薄膜的晶体质量，X射线摇摆曲线结果表明ZnO(002)衍射峰的半高宽仅为2.41°，同时发现Au缓冲层的结晶质量对ZnO薄膜的c轴取向度有很大影响，通过扫描电子显微镜对ZnO/GaAs和ZnO/Au/GaAs薄膜的表面形貌进行了观测，利用网络分析仪对IDT/ZnO/GaAs薄膜的声表面波特性进行了测量. 关键词： ZnO薄膜 X射线衍射 声表面波     

ZnO films grown by successive chemical solution deposition

ZnO films were grown from 0.1-M zincate solutions on stainless-steel and aluminosilicate glass substrates by the successive chemical solution deposition method. The structure, morphology, composition, and optical emission properties of the films were studied by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and photoluminescence techniques. Results revealed that the as-grown film contains a substantial amount of amorphous zinc hydroxide (15–25%), at least on its surface. This can be reduced to 7% by annealing the film in argon (350 °C, 1 h). Despite the presence of the hydroxide phase, the films hexagonal lattice constants match the standard values. The films surface texture and the grains shape and preferential orientation depend on the type of the substrate and its surface conditioning. The UV photoluminescence emission from as-grown films at 3.22±0.04 eV (380–390 nm) and its suppression due to the effect of chlorine are addressed. PACS 81.16.Be; 81.05.Dz; 78.55.Et; 79.60.-i; 68.55.Jk     

Inclined ZnO thin films produced by pulsed-laser deposition

ZnO thin films with a uniformly inclined structure are grown by pulsed-laser deposition on SrTiO₃. The c-axis of ZnO films is inclined by an angle =20±0.5° and =42±0.5° against the surface normal of 25° miscut (100) SrTiO₃ and (110) SrTiO₃ single crystal substrates, respectively. The inclined structure is due to epitaxial growth of hexagonal ZnO on cubic SrTiO₃ as evidenced by X-ray diffraction and high-resolution transmission electron microscopy investigations. The range of deposition parameters (substrate temperature, oxygen background pressure) to achieve epitaxial growth is determined. The inclined films are smooth with an rms surface roughness of 1.5 nm for layer thicknesses up to 700 nm. PACS 61.10.-i; 68.37.-d; 81.15.Fg     

Controlled synthesis of oriented ZnO nanorod arrays by seed-layer-free electrochemical deposition

Oriented ZnO nanorod arrays were successfully prepared on transparent conductive substrates by seed-layer-free electrochemical deposition in solution of Zn(NO₃)₂ at a low temperature of 70 °C without using any catalysts, additives, and additional seed crystals. The effects of the Zn(NO₃)₂ concentration, deposition time and applied current on the localized nanorod arrays are investigated. X-ray powder diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) were used to characterize the structures and the morphologies of ZnO nanorod arrays. The heights and diameters of ZnO nanorods can be tuned by controlling the electrodeposition parameters.     

磁控溅射法制备钴掺杂氧化锌薄膜室温磁学性质

钴掺杂氧化锌是室温稀磁半导体的重要候选材料,其磁学特性和钴掺杂浓度、显微结构及光学性质密切相关。磁控溅射具有成本低、易于大面积沉积高质量薄膜等特点,是广受关注的稀磁半导体薄膜制备方法。利用磁控溅射方法制备了不同浓度的钴掺杂氧化锌薄膜,并对其显微结构、光学性质和磁学特性进行了系统分析。结果表明：当掺杂原子分数在8%以内时,钴掺杂氧化锌薄膜保持单一的铅锌矿晶体结构,钴元素完全溶解在氧化锌晶格之中;薄膜在可见光区域有很高的透射率,但在567, 615和659 nm处有明显吸收峰,这些吸收峰源于Co2+处于O2-形成的四面体晶体场中的特征d-d跃迁。磁学特性测试结果表明钴掺杂氧化锌薄膜具有室温铁磁性,且钴的掺杂浓度对薄膜的磁学特性有重要影响。结合薄膜结构、光学和电学性质分析,实验中观察到的室温铁磁性应源于钴掺杂氧化锌薄膜的本征属性,其铁磁耦合机理可由束缚磁极化子模型进行解释。     

Blue luminescence from Ce-doped ZnO thin films prepared by magnetron sputtering

The photoluminescence properties of undoped and Ce-doped ZnO thin films that were prepared by DC magnetron sputtering were investigated. It was found that the incorporation of Ce could intensively affect the structural, optical, and photoluminescence properties of the ZnO thin films. The undoped ZnO thin films showed a sharp UV luminescence, whereas the Ce-doped ZnO thin films showed a broad blue luminescence. The effects of excitation wavelength and annealing atmosphere on the photoluminescence properties of Ce-doped ZnO thin films were also studied. After post-annealing in air and oxygen atmospheres, the blue emissions of the prepared films were drastically suppressed. Our results indicate that the blue emissions of Ce-doped ZnO thin films are related to zinc interstitials and the intrinsic transition of Ce³⁺ ions.     

磁控溅射法制备钴掺杂氧化锌薄膜室温磁学性质

钴掺杂氧化锌是室温稀磁半导体的重要候选材料,其磁学特性和钴掺杂浓度、显微结构及光学性质密切相关。磁控溅射具有成本低、易于大面积沉积高质量薄膜等特点,是广受关注的稀磁半导体薄膜制备方法。利用磁控溅射方法制备了不同浓度的钴掺杂氧化锌薄膜,并对其显微结构、光学性质和磁学特性进行了系统分析。结果表明:当掺杂原子分数在8%以内时,钴掺杂氧化锌薄膜保持单一的铅锌矿晶体结构,钴元素完全溶解在氧化锌晶格之中;薄膜在可见光区域有很高的透射率,但在567, 615和659 nm处有明显吸收峰,这些吸收峰源于Co2+处于O2-形成的四面体晶体场中的特征d-d跃迁。磁学特性测试结果表明钴掺杂氧化锌薄膜具有室温铁磁性,且钴的掺杂浓度对薄膜的磁学特性有重要影响。结合薄膜结构、光学和电学性质分析,实验中观察到的室温铁磁性应源于钴掺杂氧化锌薄膜的本征属性,其铁磁耦合机理可由束缚磁极化子模型进行解释。