Spin coating process of sol-gel silicate films deposition: Effect of spin speed and processing temperature

The effect of two factors having the most important influence on spin coating process of sol-gel films: the spin speed and the temperature (of the substrate and the applied solution) during film deposition is discussed. It is shown, that film thickness and thickness uniformity are determined by centrifugal driving force dynamics, viscous polymer rheology, solvent evaporation dynamics, and film porous microstructure.     

Stress evolution on gel-to-ceramic thin film conversion

In situ cracking observation, uncracking critical thickness evaluation and in situ stress measurement were conducted during heating for alkoxide-derived gel coating films. Higher water-to-alkoxide ratios and lower heating rates were shown to cause cracking at lower temperatures. The in situ stress measurement suggested that higher water-to-alkoxide ratios in solutions and lower heating rates result in larger in-plane tensile stress to be generated in the heating-up stage, which was thought to cause the cracking at lower temperatures. Methyltriethoxysilane, chelating agents and polyvinylpyrrolidone were shown to be effective in increasing uncracking critical thickness and/or thick film formation. The in situ stress measurement suggested that these additives or components are effective in suppressing the stress evolution during heating.     

Observation of Organic Thin Film Surface by Atomic Force Microscopy

The 8-hydroxyquinoline neodymium(Ndq3) organic thin films deposited on the cleaned indium/tin oxide (ITO) at different deposition rates with the same vacuity (133.3×10^-5 Pa) were revealed by atomic force microscopy (AFM). Organic devices with one layer of Ndq3 as the e-type conductive material at different deposition rates sandwiched between ITO and aluminum electrodes have been fabricated. respectively. Evidence suggests that the current-voltage (I-V) characteristics were determined by the uniformity of organic film which was controlled by the deposition conditions.     

Coating process regimes in particulate film production by forced-convection-assisted drag-out

Operating conditions for the deposition of monolayer and bilayer particulate coatings from aqueous 20-nm-diameter silica dispersions are identified in the context of a drag-out operation assisted by forced convection. The dry film thickness, uniformity, and morphology are assessed within an operating window parametrized by the capillary number and silica dispersion weight fraction. Three film deposition regimes with respect to the capillary number are observed: convective film deposition at low process rates, film entrainment at moderate process rates, and a thin-film transition regime at intermediate process rates. Locally ordered particulate films of variable layering thickness, including (i) a discontinuous submonolayer or (ii) a mixed submonolayer and monolayer, (iii) a mixed monolayer and bilayer, and (iv) multilayers, are dominant under convective deposition conditions. A map of morphologies is presented within the capillary number-weight fraction operating window, where monolayer and mixed monolayer-bilayer films are demonstrated in the thin-film transition regime at an intermediate dispersion weight fraction. A complementary map of the morphologies formed by the drag-out of 110 nm silica dispersions reveals a broader applicability to this type of operability diagram. These operating maps are constructed using model silica dispersions and are therefore relevant to particulate coatings of other inorganic materials.     

In situ AFM study of electrochemical synthesis of polypyrrole/Au nanocomposite

In this work, in situ AFM measurements with simultaneously electrochemical characterization were developed to study the mechanisms of both polypyrrole (PPy) and PPy/Au composite deposition. The nanoscale information derived from the in situ AFM images associated with theoretical simulation from the measured current–time transient (i–t) reveals that Au nanoparticles with negatively charged carboxylic groups can be the nuclei by both adsorption on the electrode surface and doping on PPy for the polymerization, and thus has faster nucleation and growth rate than Py alone at the early polymerization stage. The PPy/Au deposition shows parallel nucleation processes of Au nanoparticle and Py, and an instantaneous 3D nucleation mode. The work not only provides fundamental insights for PPy/Au nanocomposite deposition process, but also optimization approaches to fabricate a superior PPy/Au film with favorable features for greater potential applications.     

Influence of the Deposition Parameters on the Characteristics of Aerosol-Gel Deposited Thin Films

The aerosol-gel process is a thin film deposition process based on the sol-gel polymerisation of a liquid film deposited from an ultrasonically sprayed aerosol. This process offers an attractive alternative for the deposition of sol-gel thin films. The effects of the aerosol deposition route on the film characteristics have been investigated with regard to sol-gel chemistry. TEOS solutions have been studied by viscosimetry and FTIR spectroscopy using an ATR device. Silica xerogel coatings have been studied by transmission FTIR and optical microscopy. Film morphology and uniformity depend closely on the aerosol deposition conditions. The film growth is controlled by a droplet coalescence surface phenomenon.     

Parametric study on electrochemical deposition of copper nanoparticles on an ultrathin polypyrrole film deposited on a gold film electrode

Monoshaped and monosized copper nanostructured particles have been prepared by potentiostatic electrochemical deposition on an ultrathin polypyrrole (PPY) film, electrochemically grown on a Si(100) substrate sputter-coated with a thin gold film or gold-film electrode (GFE). The crystal size and the number density of the copper nanocrystals have been examined by varying several deposition parameters, including the thickness of the gold film, the PPY film thickness, the applied potential, and the Cu2+ and the electrolyte concentrations for copper deposition. Optimal conditions for uniform growth ofnanocrystals well-dispersed on the GFE have been determined, along with insight into the mechanism of crystal growth. A minimum gold film thickness of 80 nm is required to eliminate the effects of the gold-silicon interface. The PPY film thickness and homogeneity principally affect the shape uniformity of the nanocrystals, while the copper deposition potential could be used to regulate the size and number density of the nanocrystals. Both the Cu2+ and electrolyte concentrations are also found to play important roles in controlling the electrodeposition of nanocrystal growth.     

Analyzing refractive index profiles of confined fluids by interferometry part II: Multilayer and asymmetric systems

Methods for determining the substrate properties and the optical thickness of thin films or any variation in the refractive index of a fluid or film near a surface for unknown 5-layer symmetric and 3-layer asymmetric interferometers are presented. Both systems can be fully resolved without any known layer properties and without contact or confining the films. The method was tested using realistic simulated interferometer data, and was found to consistently yield accurate values for all desired properties. The method was experimentally validated through analysis of an asymmetric three layer interferometer system of linear polyethyleneimine (LPEI) adsorbed onto mica substrates of differing thickness and identical refractive index. The results were in excellent agreement with the dry polymer film properties measured using conventional SFA contact measurements. More complicated systems were also evaluated for feasibility, and any additional parameter specifications required for analysis were determined. The utility of this method is broad, as a single experiment in a laboratory setting can independently provide non-contact film properties and the effects of confinement on the film structure, which can be correlated to a simultaneously measured interaction force profile.     

New approach to fabricate nanoporous gold film

A simple preparation of ultrathin nanoporous gold film was described. Copper and gold were used to fabricate Cu-Au alloy film sthrough vacuum deposition. The formation of nanoporous gold films from the alloy films involved thermal process and chemical etch by hydrochloric acid or by nitric acid. The free-standing nanoporous gold films have been analyzed by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectrometer (XPS) and surface-enhanced Raman scattering (SERS). It was noted that the nanoporous gold film etched by hydrochloric acid is uniform with a cover of fog-like moieties.     

Incipient CdS thin film formation

The quality of a final thin film is essentially determined by the processes taking place at incipient CdS deposition, which in turn are strongly influenced by the physicochemical properties of the substrate and liquid in contact. SEM pictures of deposits formed through steady flow of a supersaturated (with respect to CdS) solution suggest that initially nuclei are continuously generated on the substrate and grow as discrete "surface" particles. With time, these particles tend to "coalesce" with neighboring ones, while new nuclei keep forming and growing, leading to the formation of a coherent film. There is evidence that similar growth patterns prevail in CdS deposition via the chemical bath deposition (CBD) process. Based on experimental observations, a simple model is developed, which is capable of predicting macroscopically determined film characteristics such as the temporal thickness evolution including the "induction period." Two cases of the growth pattern are examined theoretically; one based on instantaneous surface nucleation (due to its simplicity) and another with a constant surface nucleation rate, which appears to be closer to experimental observations.     

Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachloride

Plasma-chemical reduction of SiCl₄ in mixtures with H₂ and Ar has been studied by optical emission spectroscopy (OES) and laser interferometry techniques. It has been found that the Ar:H₂ ratio strongly affects the plasma composition as well as the deposition (r _D) and etch (r _E) rates of Si: H, Cl films and that the electron impact dissociation is the most important channel for the production of SiCl_x species, which are the precursors of the film growth. Chemisorption of SiCl_x and the reactive surface reaction SiCl_x+H–SiCl_(x–1)0+HCl are important steps in the deposition process. The suggested deposition model givesr _D [SiCl_x][H], in agreement with the experimental data. Etching of Si: H, Cl films occurs at high Ar: H₂ ratio when Cl atoms in the gas phase become appreciable and increases with increasing Cl concentration. The etch rate is controlled by the Cl atom chemisorption step.     

Multi-step surface functionalization of polyimide based evanescent wave photonic biosensors and application for DNA hybridization by Mach-Zehnder interferometer

The process of surface functionalization involving silanization, biotinylation and streptavidin bonding as platform for biospecific ligand immobilization was optimized for thin film polyimide spin-coated silicon wafers, of which the polyimide film serves as a wave guiding layer in evanescent wave photonic biosensors. This type of optical sensors make great demands on the materials involved as well as on the layer properties, such as the optical quality, the layer thickness and the surface roughness. In this work we realized the binding of a 3-mercaptopropyl trimethoxysilane on an oxygen plasma activated polyimide surface followed by subsequent derivatization of the reactive thiol groups with maleimide-PEG₂-biotin and immobilization of streptavidin. The progress of the functionalization was monitored by using different fluorescence labels for optimization of the chemical derivatization steps. Further, X-ray photoelectron spectroscopy and atomic force microscopy were utilized for the characterization of the modified surface. These established analytical methods allowed to derive information like chemical composition of the surface, surface coverage with immobilized streptavidin, as well as parameters of the surface roughness. The proposed functionalization protocol furnished a surface density of 144 fmol mm⁻² streptavidin with good reproducibility (13.9% RSD, n = 10) and without inflicted damage to the surface. This surface modification was applied to polyimide based Mach-Zehnder interferometer sensors to realize a real-time measurement of streptavidin binding validating the functionality of the MZI biosensor. Subsequently, this streptavidin surface was employed to immobilize biotinylated single-stranded DNA and utilized for monitoring of selective DNA hybridization. These proved the usability of polyimide based evanescent photonic devices for biosensing application.     

Effect of reaction conditions on film morphology of polyaniline composite membranes for gas separation

Composite membranes combining polyaniline as an active layer with a polypropylene support have been prepared using an in situ deposition technique. The protonated polyaniline layer with a thickness in the range of 90–200 nm was prepared using precipitation, dispersion, or emulsion polymerization of aniline with simultaneous deposition on top of the porous polypropylene support, which was immersed in the reaction mixture. Variables such as temperature, concentration of reagents, presence of steric stabilizers, surfactants, and heteropolyacid were found to control both the formation and the quality of the polyaniline layers. Both morphology and thickness of the layers were characterized using scanning electron microscopy. Selective separation of carbon dioxide from its mixture with methane is used to illustrate potential application of these composite membranes. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Layer—by—layer Multilaryer Films Self—assembled from a Rare—earth—containing Poly—oxometalate,Na9[Eu（W5O18）2] and Poly （allylamine hydrochloride） and Their Photoluminescent Properties

Ultrathin multilayer films of a rare-earth-containing polyoxometalate Na9[Eu(W5O18)2](EW) and poly (allymamine hydrochloride)(PAH) have been prepared by layer-by-layer self-assembly from dilute aqueous solution.The fabrication process of the EW/PAH multilaryer films was followed by UV-vis spectroscopy and ellipsometry,which show that the deposition process is linear and highly reproducible from layer to layer.An average EW/PAH bilayer thickness of ca.2.1nm was determined by ellipsometry.In addition,the scanning electron microscopy(SEM) image of the EW/PAH film indicates that the film surface is relatively uniform and smooth.The photoluminescent properties of these films were also investigated by fluorescence spectroscopy.     

喷墨打印聚合物薄膜均匀性调控研究进展

聚合物发光显示材料具有发光颜色在全可见光区可调、可溶液简单加工及适用于柔性大面积基底的特点,成为目前研究的热点。 在聚合物发光薄膜图案化技术中,喷墨打印因为具有加工过程简单高效、适用于溶液方式加工、柔性的加工过程等特点而被认为是最具有应用潜力的技术。 高质量聚合物薄膜的制备是高精度发光显示器件制作的关键,但喷墨打印液滴在干燥过程中通常伴随着“咖啡环”现象,造成薄膜不均匀沉积。 因此,消除“咖啡环”现象,实现聚合物薄膜的均匀沉积,是喷墨打印高性能器件的重要研究方向。 本文主要论述了“咖啡环”效应的产生机理,如何抑制喷墨打印聚合物薄膜加工过程中的“咖啡环”效应,最终实现聚合物薄膜均匀性调控。     

Early Stages of CeO2 Thin-film Nucleation and Growth with Photo Irradiation

In this paper, the early stages of nucleation and photoirradiation growth of CeO₂ thin films have been studied. Cyclic voltammetry, chronoamperometry and scanning electron microscopy were used to analyze the nucleation process of CeO₂ thin films deposited on the anode with photo irradiation. Experimental results show that the anodic deposition process with photo illumination is controlled by diffusion. Compared with the dark state, photo illumination mainly contributed to increase the current density of the three-dimensional nucleation process, because photo illumination is helpful to create active sites and accelerate the nucleation progress on the surface that a thin ceria film has been formed. Two-dimensional nucleation process mainly exists within the initial 2 s, and then only three-dimensional instantaneous nucleation process continues, which may be the main reason why the thickness of the CeO₂ film can continue to grow with photo illumination but not in the dark state. Increasing the deposition overpotential can promote two-dimensional nucleation and growth rate, whilst when the potential exceeds 0.65 V, three-dimensional current density decreases. The li-miting factor at that time may be the diffusion rate of cerium ions in the solution towards the electrode substrate.     

Effect of film thickness controlled by ink‐jet printing method on the optical properties of an electroluminescent polymer

Ink‐jet printing (IJP) represents a highly promising liquid processed polymer deposition method for the film preparation of functional polymers in photo‐electronic devices. In this report, the results on the IJP of a fluorene‐based electroluminescent polymer, poly(9,9‐dihexylfluorene‐alt‐2,5‐dioctyloxybenzene) (PF6OC8), from a piezoelectric droplet generator are presented. The polymer film thickness has been found to show an approximate linear relation with the number of droplets per unit area; it is thus convenient to control the film thickness by the space of printed dots in IJP process. In comparison, spin coating approach is also used to prepare polymer films with different thicknesses by varying solution concentration and spinning speed. However, it is found that spin coating is difficult to control the film thickness quantitatively. The influence of film thickness on the photoluminescence (PL) properties of PF6OC8 films prepared by IJP and spin coating is comparatively investigated. For both ink‐jet printed and spin coated films, the intensity of PL spectra first increases and then decreases with increase in the film thickness, probably due to the exciton quenching in thicker films. When the polymer film thickness is at nanoscale, the major peak in the PL spectrum is the 0–0 vibronic emission at about 420 nm, and with increase in the film thickness, the 0–1 vibronic peak at about 440 nm becomes dominant. The red‐shifted PL spectra with increase in film thickness show the change from the 2D exciton state to the 3D one. Copyright © 2009 John Wiley & Sons, Ltd.     

Epitaxial polymerization of 1,3-butadiyne by chemical vapor deposition

1,3-Butadiyne was epitaxially polymerized on the graphite basal plane by chemical vapor deposition to form a homogeneous thin film. The film thickness varied from 100 to 3000 Å depending on the polymerization condition. The films on the graphite showed a variety of interference colors such as blue, purple, or gold depending on the film thickness. Raman spectra revealed that the polymerized film was mainly composed of ? C?C? bonds. Electron diffraction pattern and the ESCA spectrum of the film were quite similar to those of graphite, suggesting that butadiyne was polymerized in an epitaxial manner.     

Ablative photodecomposition of polymer films by pulsed far-ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditions

Data on the ablative photodecomposition of three condensation polymers [polyimide, poly(ethylene terephthalate), and polycarbonate] and one addition polymer (polymethyl methacrylate) by laser pulses at 193 nm are presented. The etch depth/pulse is a linear function of the number of pulses at constant laser fluence. It varies with the logarithm of the fluence in a linear manner at different fluences. The etch depth is independent of the atmosphere above the film, whether it is air at 1 atm, or a vacuum. The etching of PMMA at fluences > 100 mJ/cm² is believed to follow a mechanism different from the process at lower fluences. Etching of polyimide and polyethylene terephthalate at 248 and 308 nm is also reported. The mechanism of etching by laser radiation may receive greater contribution from a thermal process with increasing wavelength. This is manifested in the etch depth versus log fluence plot by sharp changes in slope.     

Effect of processing temperature during spin-on application on the properties of sol-gel silica films

The effect of the temperature (of the substrate and the solution) during film deposition on spin coating process of sol-gel films is discussed. The increase of substrate temperature as well as coating solution liquid temperature leads to formation of thicker films with higher porosity. The temperature dependence of films thickness is mainly determined by the change of solvent vapour pressure with consideration for the change of liquid viscosity.