Structural and optoelectrical properties of Ga‐doped ZnO semiconductor thin films grown by magnetron sputtering

Transparent conductive gallium‐doped zinc oxide (Ga‐doped ZnO) films were prepared on glass substrate by magnetron sputtering. The influence of substrate temperature on structural, optoelectrical and surface properties of the films were investigated by X‐ray diffraction (XRD), X‐ray photoelectron spectroscopy (XPS), spectrophotometer, four‐point probe and goniometry, respectively. Experimental results show that all the films are found to be oriented along the c‐axis. The grain size and optical transmittance of the films increase with increasing substrate temperature. The average transmittance in the visible wavelength range is above 83% for all the samples. It is observed that the optoelectrical property is correlated with the film structure. The Ga‐doped ZnO film grown at the substrate temperature of 400 °C has the highest figure of merit of 1.25 × 10⁻² Ω⁻¹, the lowest resistivity of 1.56 × 10⁻³ Ω·cm and the highest surface energy of 32.3 mJ/m².     

Cd‐Doping Effects on The Properties of Polycrystalline α‐In2Se3 Thin Films

The X‐ray diffraction has revealed that the polycrystalline hexagonal structured α‐In₂Se₃ thin films grown at substrate temperature of 200 °C with the unit cell parameters a = 4.03 Å and c = 19.23 Å becomes polycrystalline hexagonal structured InSe with a unit cell parameters of a = 4.00 Å and c = 16.63 Å by Cd‐doping. The analysis of the conductivity temperature dependence in the range 300‐40 K revealed that the thermionic emission of charged carriers and the variable range hopping are the predominant conduction mechanism above and below 100 K, respectively. Hall measurements revealed that the mobility is limited by the scattering of charged carriers through the grain boundaries above 200 K and 120 K for the undoped and Cd‐doped samples, respectively. The photocurrent (I_ph) increases with increasing illumination intensity (F) and decreasing temperature up to a maximum temperature of ∼100 K, below which I_ph is temperature invariant. It is found to have the monomolecular and bimolecular recombination characters at low and high illumination intensities, respectively. The Cd‐doping increases the density of trapping states that changes the position of the dark Fermi level leading to the deviation from linearity in the dependence of I_ph on F at low illumination intensities.     

Conversion of CuS thin films to structured nanosheet CuyS (1 < y ≦ 2) by vacuum annealing

In this study, large‐area and uniform thickness novel nano‐sheet structured CuS thin films on ITO glass have been prepared by the one‐step electrodeposition method from a dimethyl sulfoxide solution. Thin films of completely preserved nano‐sheet like morphology of Cu_yS (y = 1.75, 1.8, 1.95, and 2.0) are grown by vacuum annealing CuS thin films at 500 °C for different lengths of time. The 500 °C sample heated for 10 hours was nearly converted to single phase of Cu₂S with y ∼ 2. The optical direct band gaps of nano‐sheet Cu_yS thin films annealed at 500 °C of 2, 6, and 10 hours in vacuum were found to be 1.94, 1.68, and 1.44 eV, respectively.     

Correlation between growth orientation and growth temperature for bismuth tri‐iodide films

This paper reports the growth of bismuth tri‐iodide thick films intended for direct and digital X‐ray imaging. Films were grown by the vertical physical vapor deposition method, onto glass substrates 2″x 2″ in size, with gold previously deposited as rear electrode. The film thickness was up to 33 μm (±5 %). Optical microscopy and SEM were performed on the films and grain size resulted to be up to 40 μm. A strong correlation was found between the microcrystals growth orientation and the growth temperature. At low temperatures, microcrystals grow with their c axis parallel to the substrate, whereas at higher temperatures, they grow with their c axis perpendicular to the substrate. The higher the growth temperature, the lower the dark current of the film, and the higher the resistivity, which was from 10¹³ to 10¹⁵ Ωcm. A sensitivity to X‐rays of 6.9 nC/R.cm² was measured irradiating the films with X‐rays from a mamographer. Film properties were correlated with the growth temperature, with previous results for bismuth tri‐iodide films and monocrystals and with data for films of alternative materials such as lead and mercuric iodide. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Microstructural,optical and electrical properties of GeO2 thin films prepared by sol‐gel method

GeO₂ thin films were prepared by sol‐gel method on ITO/Glass substrate. The electrical and optical properties and the microstructures of these films were investigated with special emphasis on the effects of an annealing treatment in ambient air. The films were annealed at various temperatures from 500 °C to 700 °C. Structural analysis through X‐ray diffraction (XRD) and atomic force microscope (AFM) showed that surface structure and morphological characteristics were sensitive to the treatment conditions. The optical transmittance spectra of the GeO₂/ITO/Glass were measured using a UV‐visible spectrophotometer. All films exhibited GeO₂ (101) orientation perpendicular to the substrate surface where the grain size increased with increasing annealing temperature. The optical transmittance spectroscopy further revealed high transparency (over 70 %) in the wave range 400 – 800 nm of the visible region. At an annealing temperature level of 700 °C, the GeO₂ films were found to possess a leakage current density of 1.31×10^‐6A/cm² at an electrical field of 20 kV/cm. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

High-quality silicon/insulator heteroepitaxial structures formed by molecular beam epitaxy using Al2O3 and Si

Heteroepitaxial growth of γ-Al₂O₃ films on a Si substrate and the growth of Si films on the γ-Al₂O₃/Si structures by molecular beam epitaxy have been investigated. It has been found from AFM and RHEED observations that, γ-Al₂O₃ films with an atomically smooth surface with an RMS values of ∼3 Å and high crystalline quality can be grown on Si (1 1 1) substrates at substrate temperatures of 650–750°C. Al₂O₃ films grown at higher temperatures above 800°C, did not show good surface morphology due to etching of a Si surface by N₂O gas in the initial growth stage. It has also been found that it is possible to grow high-quality Si layers by the predeposition of Al layer followed by thermal treatment prior to the Si molecular beam epitaxy. Cross-sectional TEM observations have shown that the epitaxial Si had significantly improved crystalline quality and surface morphology when the Al predeposition layer thickness was 10 Å and the thermal treatment temperature was 900°C. The resulting improved crystalline quality of Si films grown on Al₂O₃ is believed to be due to the Al₂O₃ surface modification.     

Growth of AlN single crystals on 6H‐SiC (0001) substrates with AlN MOCVD buffer layer

6H‐SiC (0001) deposited 300 nm thick AlN film by MOCVD was used as the substrate to grow AlN crystals by the physical vapour transport (PVT) method. It was confirmed that c‐axis oriented AlN films were grown and this material had a 3D growth mode. The root mean square (RMS) value for the film was measured to be 2.17 nm. Nucleation and further growth of AlN on so prepared substrate was investigated. Colorless and transparent AlN crystal with 1 mm thick and 40 mm in diameter was obtained after 4 h growth on this substrate. The transparent AlN showed strong (0001) texture XRD patterns, only the (0002) reflection was observed in symmetric θ‐2θ scans. The full width at half maximum for a (0002) X‐ray rocking curve was less than 0.1° indicating good crystalline quality. Anisotropic etchings in molten KOH shows that the growth (0001) plane exposed to the AlN source predominately has an aluminum polarity, no N‐polar inversion domains were observed. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of selenization temperature on synthesis,morphology, and properties of nanostructured CoSe2 films

Nanostructured cobalt selenide (CoSe₂) thin films were deposited on a glass substrate using the selenization of Co films at different selenization temperatures (300 °C, 400 °C, and 500 °C) in a pure Se vapor for two hours. The morphology and structure of the as‐deposited films shows that the film morphology and crystallinity are affected by the selenization temperature. Increasing the selenization temperature from 300 °C to 400 °C and 500 °C results in a change in the surface and cross sectional morphology. At 300 °C, the Co films have an almost amorphous structure, while at temperatures of 400 and 500 °C, the Co films have a crystalline nanostructure with bilayered morphology. Optical analyses of the CoSe₂ films at 500 °C show a large absorption (α > 1.0 × 10⁵ cm⁻¹) and a direct band gap (∼1.0 eV).     

An effective growth method to improve the homogeneity of relaxor ferroelectric single crystal Pb(In1/2Nb1/2)O3‐ Pb(Mg1/3Nb2/3)O3‐PbTiO3

Compositional segregation usually has negative effects on the growth of solid solution ferroelectric single crystals of Pb(In_1/2Nb_1/2)O₃‐Pb(Mg_1/3Nb_2/3)O₃‐PbTiO₃ (abbr. PIN‐PMN‐PT or PIMNT). A modified Bridgman method was adopted in this work to control the segregation and improve the compositional homogeneity significantly. The characteristic of this work is to use multiround growths and gradient composition raw materials in order to keep the PbTiO₃ concentration constant during the crystal growth. As an example, the two‐round growth of ternary PIN‐PMN‐PT single crystal is conducted in the same Pt crucible with gradient raw materials, where the first‐round boule was used as the seed crystal for the second‐round growth. Our results show that the as‐grown (Ф80 mm × 270 mm) PIN‐PMN‐PT crystals exhibit higher phase transition temperatures (T_c∼180 °C, T_r/t∼110 °C) and larger coercive field (E_c∼5–5.5 kV/cm), which are much better than the performances of Pb(Mg_1/3Nb_2/3)O₃‐PbTiO₃ crystals, and similar dielectric and piezoelectric performances (ε∼5000, tanδ∼1.25%, d₃₃∼1500 pC/N, k_t∼60%). And about 85 percent of the crystal boule grown by the two‐round growth technique could maintain its compositions around the morphotropic phase boundary.     

Synthesis and field emission properties of SnO2 nanowalls

SnO₂ nanowalls were synthesized on silicon substrate by the thermal chemical vapor transport method at a low temperature of around 650 °C under atmospheric pressure. The microstructure and morphology of the SnO₂ nanowalls were evaluated by using scanning electron microscopies and X‐ray diffraction. Room temperature photoluminescence spectra of the nanowalls showed a broad emission band centering at about 530 nm. Field emission measurements demonstrated that the nanowalls possessed good performance with a turn‐on field of ∼3.5 V/μm and a threshold field of ∼6.1 V/μm. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Epitaxial growth of ferroelectric PLZT [(Pb,La)(Zr,Ti)O3] thin films

Thin films of PLZT were epitaxially grown at around 700°C on sapphire and SrTiO₃ substrates: (111) PLZT  (0001) sapphire and (100) PLZT  (100) SrTiO₃. PLZT films on semiconductor substrates were also grown at around 620°C. The crystal quality of these PLZT films was investigated by X-ray diffraction, reflection electron diffraction, scanning electron microscopy (SEM), and Auger electron spectroscopy (AES). The epitaxy of PLZT films grown on different single crystal substrates is discussed. The refractive index of the film on the sapphire substrate was determined as 2.49₇ by an optical waveguide technique.     

Growth behavior of CuPc films by physical vapor deposition

Various Cu‐phthalocyanine (CuPc) films were grown from physical vapor deposition on top of indium‐tin‐oxide glass substrates by controlling substrate temperature (T_sub), source temperature (T_sou), and growth time. From side‐view SEM pictures, the growth rates for these CuPc films are estimated and can be categorized into three regions. From the Arrhenius plot of growth rate versus 1/T_sub, the activation energy E_A can be obtained. As T_sou = 390 °C, for region (A) with T_sub < 140 °C, the growth of CuPc films is dominated by the adhesion process with E_A = 810 meV. For region (B) with 140 °C < T_sub < 320 °C, the growth is then limited by the steric character associated with the organic molecular solids with E_A = 740 meV. For region (C) with T_sub > 320 °C, the re‐evaporation of the CuPc adhered molecules from the interface becomes dominant. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth of YBa2Cu3O7 films with [110] tilt of CuO planes to surface on SrTiO3 crystals

YBa₂Cu₃O₇ films with the CuO plane tilted to the surface have been grown on SrTiO₃ crystalline substrates by pulsed laser deposition. This tilt was obtained by rotating the film lattice with respect to the substrate surface around its [110] axis oriented parallel to the surface. The zero tilt of the CuO plane was implemented at the orientation of the SrTiO₃ crystal surface parallel to the (100) plane. The rotation angles were varied in the range from 0° to 70°. It is found that, being tilted at any angle, the CuO planes of the film remain parallel to one or several crystallographic planes of the (100)-type substrate. In the range of tilt angles from 0° to 49°, the film has a single-crystal structure. Above 49° the film is transformed into a three-domain texture and its surface roughness sharply increases.     

Dielectric properties of betaine phosphite and deuterated betaine phosphite films

Polycrystalline films of betaine phosphite (BPI) and deuterated BPI have been grown by evaporation on LiNbO₃, α-SiO₂, α-Al₂O₃, and NdGaO₃ substrates. These films consist of large single-crystal blocks in which the polar axis (b) lies in the substrate plane. The results of studying the dielectric properties of the films using interdigital electrodes, X-ray diffraction, and block images in a polarized-light microscope in reflection are reported. The film transition into the ferroelectric state at T = T _c is accompanied by strong anomalies of the capacitance of the film/interdigital structure/substrate structure. The deuteration of BPI films leads to an increase in their temperature T _c: from T _c = 200 K for BPI-based structures to T _c = 280 K for structures with a high degree of deuteration (d ∼ 90%).     

Spray pyrolysis deposition and characterization of highly (100) oriented magnesium oxide thin films

Transparent dielectric thin films of MgO has been deposited on quartz substrates at different temperatures between 400 and 600°C by a pneumatic spray pyrolysis technique using Mg(CH₃COO)₂·4H₂O as a single molecular precursor. The thermal behavior of the precursor magnesium acetate is described in the results of thermogravimetry analysis (TGA) and differential thermal analysis (DTA). The prepared films are reproducible, adherent to the substrate, pinhole free and uniform. Amongst the different spray process parameters, the substrate temperature effect has been optimized for obtaining single crystalline and transparent MgO thin films. The films crystallize in a cubic structure and X‐ray diffraction measurements have shown that the polycrystalline MgO films prepared at 500°C with (100) and (110) orientations are changed to (100) preferred orientation at 600°C. The MgO phase formation was also confirmed with the recorded Fourier Transform Infrared (FTIR) results. The films deposited at 600°C exhibited highest optical transmittivity (>80%) and the direct band gap energy was found to vary from 4.50 to 5.25 eV with a rise in substrate temperature from 500 to 600°C. The measured sheet resistance and the resistivity of the film prepared at 600°C were respectively 10¹³Ω/□ and 2.06x10⁷Ω cm. The surface morphology of the prepared MgO thin films was examined by atomic force microscopy. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of Thermal Annealing on Structural Properties,Morphologies and Electrical Properties of TiO2 Thin Films Grown by MOCVD

TiO₂ thin films, were deposited on Si(100) and Si(111) substrates by metalorganic chemical vapor deposition at 500 °C, and have been annealed for 2 min, 30 min and 10 hours at the temperature from 600 °C to 900 °C, in oxygen and air flow, respectively. XRD and atomic force microscopy characterized the structural properties and surface morphologies of the films. As‐deposited films show anatase polycrystalline structure with a surface morphology of regular rectangled grains with distinct boundaries. Rutile phase formed for films annealed above 600 °C, and pure rutile polycrystalline films with (110) orientation can be obtained after annealing under adequate conditions. Rutile annealed films exhibit a surface morphology of equiaxed grains without distinct boundaries. The effects of substrate orientation, annealing time and atmosphere on the structure and surface morphology of films have also been studied. Capacitance‐Voltage measurements have been performed for films deposited on Si(100) before and after annealing. The dielectric properties of TiO₂ films were greatly improved by thermal annealing above 600 °C in oxygen.     

Growth of YBa2Cu3O7 films with [100] tilt of CuO planes to the surface on SrTiO3 crystals

YBa₂Cu₃O₇ films with CuO planes tilted to the surface have been grown on SrTiO₃ crystals by pulsed laser deposition. The tilt angle was varied in the range from 0° (CuO planes are parallel to the surface) to 70°. At this tilt, the crystalline lattice of the film was rotated by rotating the substrate crystalline lattice around its axis [100], which is oriented parallel to the surface. The zero tilt of CuO planes corresponds to the orientation of the SrTiO₃ surface parallel to the (100) plane. It is established that the CuO planes of the film remain parallel to one or several (100)-type planes of the substrate at an arbitrary tilt angle. In the range of tilt angles from 0° to 41°, the film has a single-crystal structure. At tilt angles above 41°, the film is transformed into a two-domain texture and its surface roughness sharply increases.     

In Situ Deposition of Highly C-axis Oriented Lanthanum Modified Lead Titanate Thin Films by Multi-Ion-Beam Reactive Co-sputtering Technique

Highly c-axis oriented La-modified PbTiO₃ (PLT) thin films were in situ grown on Pt(100)/MgO(100) and MgO(100) substrates by multi-ion-beam reactive co-sputtering (MIBRECS) technique at the substrate temperature range of 450°C-540°C. The orientation degree a of the films is more than 90%. The chemical composition is in good agreement with the designed one and is almost uniform across the surface of the substrates. The remanent polarization (P_r) and coercive field (E_c) were found to be 5.3 μC/cm² and 78 kV/cm, respectively.     

Structural and optical properties of TiO2 thin films derived by sol–gel dip coating process

Nanocrystalline thin films of titanium dioxide have been fabricated on glass and silica substrates from partially hydrolyzed precursor solution. These films were subjected to heat treatment for 1 h at temperatures 100, 200, 300, 400, 500, 600, 700, 800 and 900 °C and characterized by XRD, SEM, XPS and optical techniques. As deposited films are found to be amorphous and also contain hydroxyl and organic functional groups. Films heat treated above 100 °C do not contain hydroxyl and organic functional groups. Microcrystalline behavior is observed in the films heat treated above 300 °C. Crystallite size increases from ∼5 to 50 nm as sintering temperature is increased from 300 to 700 °C. Formation of anatase phase with c-axis length 7.03 Å is observed in the films annealed up to 700 °C. These films peel off from the substrate beyond 700 °C annealing temperature. Density as well as refractive index of the films increases with increase in annealing temperature up to 700 °C. Refractive index is found to show Cauchys behavior. Transmission better than 70% is observed in the visible range. There is a strong absorption around 370 nm, which is attributed to band gap absorption of the material.     

Growth of Biaxial Textured MgO‐Layers by Ion‐Beam Assisted Pulsed Laser Deposition

MgO thin films were deposited on amorphous substrates using pulsed laser deposition. Without an assisting ion beam, strong fibre textures are observed changing with temperature. Using an ion beam at 55° with respect to the substrate normal and energies of more than 400 eV, biaxially textured films are grown with the <200> direction parallel to the ion beam. Decreasing the deposition rate the texture changes towards the desired cube texture and resputtering becomes more important. Investigations of the surface topography show an increase in roughness and grain size with increasing film thickness. Preliminary ideas of texture and microstructure development in this deposition process are presented.