Synthesis of highly dispersed,block copolymer‐grafted TiO2 nanoparticles within neat block copolymer films

The objective of the study is to formulate exclusive block copolymer (BCP) nanocomposites by dispersing bcp end‐grafted nanoparticles (bcp‐g‐nps) of PMMA‐b‐PS‐g‐TiO₂ within PS‐b‐PMMA matrix. PMMA‐b‐PS‐g‐TiO₂ is synthesized using a “grafting‐to” approach and characterized by XPS and TGA to establish that the copolymer chains were bonded to NPs. Good dispersion of bcp‐g‐nps in PMMA and PS‐PMMA bcp films is observed, in contrast to poor dispersion in PS films. In PS‐PMMA films, the compatible and identical bcp nature of the end‐grafted polymer, and large NP size caused it to span across entire PS‐PMMA domains. Poor and good dispersion in PS and PMMA matrices, respectively, can be rationalized by the fact that NPs interactions are driven by the PMMA at the outer corona of the bcp‐g‐nps. Developing bcp‐g‐nps as a strategic route to preparation of highly dispersed high permittivity NPs like titanium dioxide (TiO₂) in bcp matrix can have important ramifications for energy storage devices. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 468–478     

Nanoparticle‐Driven Orientation Transition and Soft‐Shear Alignment in Diblock Copolymer Films via Dynamic Thermal Gradient Field

Sharp dynamic thermal gradient (∇T ≈ 45 °C mm⁻¹) field‐driven assembly of cylinder‐forming block copolymer (c‐BCP) films filled with PS‐coated gold nanoparticles (AuNPs; d_NP ≈ 3.6 nm, φ_NP ≈ 0–0.1) is studied. The influence of increasing AuNP loading fraction on dispersion and assembly of AuNPs within c‐BCP (PS‐PMMA) films is investigated via both static and dynamic thermal gradient fields. With φ_NP increasing, a sharp transition from vertical to random in‐plane horizontal cylinder orientation is observed due to enrichment of AuNPs at the substrate side and favorable interaction of PMMA chains with gold cores. Furthermore, a detachable capping elastomer layer can self‐align these random oriented PMMA microdomains into unidirectional hybrid AuNP/c‐BCP nanolines, quantified with an alignment order parameter, S.

     

A Facile Route to Reassemble Titania Nanoparticles Into Ordered Chain‐like Networks on Substrate

A facile route to reassemble titania nanoparticles within the titania‐block copolymer composite films has been developed. The titania nanoparticles templated by the amphiphilic block copolymer of poly(styrene)‐block‐poly (ethylene oxide) (PS‐b‐PEO) were frozen in the continuous PS matrix. Upon UV exposure, the PS matrix was partially degraded, allowing the titania nanoparticles to rearrange into chain‐like networks exhibiting a closer packing. The local structures of the Titania chain‐like networks were investigated by both AFM and SEM; the lateral structures and vertical structures of the films were studied by GISAXS and X‐ray reflectivity respectively. Both the image analysis and X‐ray scattering characterization prove the reassembly of the titania nanoparticles after UV exposure. The mechanism of the nanoparticle assembly is discussed.     

Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering

Self‐assembly of diblock copolymers (BCP) into periodic arrays is a promising route to generate templates for the fabrication of nanoscopic elements, when one block is selectively removed. In cylindrical morphology polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) copolymer (BCP) films, the efficiency of different processes for removing the PMMA from cylinders is studied using grazing incidence small angle X‐ray scattering (GISAXS), x‐ray reflectivity and critical dimension scanning electron microscopy. The detailed analysis of the GISAXS patterns leads to the determination of the depth of cylindrical holes left by removal of the PMMA. It is found that the combination of a preliminary UV exposure followed by a wet treatment allows to remove totally the PMMA blocks. Furthermore, the optimization of both UV exposition time and solvent allows to preserve the PS matrix and interestingly for nanolithographic applications to decrease the process costs. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1137–1144     

Directed Self‐Assembly of Diblock Copolymer Thin Films on Prepatterned Metal Nanoarrays

The sequential layer by layer self‐assembly of block copolymer (BCP) nanopatterns is an effective approach to construct 3D nanostructures. Here large‐scale highly ordered metal nano­arrays prepared from solvent annealed thin films of polystyrene‐block‐poly(2‐vinylpyridine) (PS‐b‐P2VP) diblock copolymer are used to direct the assembly of the same BCP. The influence of initial loading concentration of metal precursor, the type of metal nanoparticle (gold, platinum, and silver), and the nanoparticle–substrate interaction on the directed assembly behavior of the upper BCP layer have been focused. It is found that the upper BCP film can be completely directed by the gold nanoarray with P2VP domain exclusively located between two adjacent gold nanowires or nanodots, which behaves the same way as on the platinum nanoarray. While the silver nanoarray can be destroyed during the upper BCP self‐assembly with the silver nanoparticles assembled into the P2VP domain. Based on the discussions of the surface energy of nanoparticles and the interplay between nanoparticle–substrate interaction and nanoparticle–polymer interaction, it is concluded that the effect of immobilization of nanoparticles on the substrate, together with entropy effect to minimize the energetically unfavorable chain stretching contributes to the most effective alignment between each layer.

     

Nanoparticle directed domain orientation in thin films of asymmetric block copolymers

We investigated the thin film morphology of two different asymmetric block copolymers (BCP), polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) and poly(n-pentyl methacrylate)-block-poly(methyl methacrylate) (PPMA-b-PMMA), loaded with pre-synthesized iron oxide nanoparticles (NP). The chemical composition of the BCP constituents determines the strength of the interaction between polymer chains and nanoparticles. In the case of NP/PS-b-P4VP system, the nanoparticles interact preferentially with the P4VP block and hence localize selectively in the P4VP cylindrical microdomains. However, for the NP/PPMA-b-PMMA system, the nanoparticles have no significant preference for the copolymer blocks and segregate at the polymer/substrate interface. Interestingly, this changes the effective substrate surface energy and hence leads to a remarkable change in domain orientation from parallel to perpendicular with respect to the substrate. These results clearly demonstrate the importance of both enthalpic and entropic factors which determine spatial distribution of NP in BCP films and influence domain orientation.     

Selective control over the lamellar thickness of one domain in thin binary blends of block copolymer films

Thin binary blends of poly(styrene‐b‐methyl methacrylate) (PS‐PMMA) block copolymers in films where the lamellar thickness of one domain is controlled while preserving the thickness of the other domain were demonstrated without microphase separation. One of the block copolymers used here was short and symmetric, and the other was long and asymmetric; the molecular weights of the PMMA block chains in the constituents were similar. A random copolymer brush was introduced and film thickness and composition of brush were adjusted to induce perpendicular orientation in thin film. As the blend composition of the long asymmetric block copolymer increased, the PS lamellar thickness increased from 15.8 to 25.1 nm, whereas the PMMA lamellar thickness remained constant at approximately 14 nm (the thickness decreased slightly from 14.0 to 13.3 nm). The domain spacing behavior in thin film was consistent in the bulk. These results were compared with the Birshtein, Zhulina, and Lyatskaya model and the theories for pure block copolymers in the strong segregation limit and in the intermediate segregation regime. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1393–1399     

Investigation of block depth distribution in PS‐b‐PMMA block copolymer using ultra‐low‐energy cesium sputtering in ToF‐SIMS

Directed self‐assembly of block copolymers (BCPs) is a promising candidate for next generation nanolithography. In order to validate a given pattern, the lateral and in‐depth distributions of the blocks should be well characterized; for the latter, time‐of‐flight (ToF) SIMS is a particularly well‐adapted technique. Here, we use an ION‐TOF ToF‐SIMS V in negative mode to provide qualitative information on the in‐depth organization of polystyrene‐b‐polymethylmethacrylate (PS‐b‐PMMA) BCP thin films. Using low‐energy Cs⁺ sputtering and Bi₃⁺ as the analysis ions, PS and PMMA homopolymer films are first analyzed in order to identify the characteristic secondary ions for each block. PS‐b‐PMMA BCPs are then characterized showing that self‐assembled nanodomains are clearly observed after annealing. We also demonstrate that the ToF‐SIMS technique is able to distinguish between the different morphologies of BCP investigated in this work (lamellae, spheres or cylinders). ToF‐SIMS characterization on BCP is in good agreement with XPS analysis performed on the same samples. Copyright © 2013 John Wiley & Sons, Ltd.     

Highly ordered nanoporous thin films by blending of PSt‐b‐PMMA block copolymers and PEO additives as structure directing agents

Herein, we present a simple method for producing nanoporous templates with a high degree of lateral ordering by self‐assembly of block copolymers. A key feature of this approach is control of the orientation of polymeric microdomains through the use of hydrophilic additives as structure directing agents. Incorporation of hydrophilic poly(ethylene oxide) (PEO) moieties into poly(styrene‐b‐methyl methacrylate) (PSt‐b‐PMMA) diblock copolymers gives vertical alignment of PMMA cylinders on the substrate after solvent annealing. Because of the miscibility between PEO and PMMA, PEO additives were selectively positioned within PMMA microdomains and by controlling the processing conditions, it was found that ordering of PSt‐b‐PMMA diblock copolymers could be achieved. The perpendicular orientation of PMMA cylinders was achieved by increasing the molecular size of the PEO additives leading to an increased hydrophilicity of the PMMA domains and consequently to control the orientation of microdomains in PSt‐b‐PMMA block copolymer thin films. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 8041–8048, 2008     

The Formation of Ordered Nanoholes in Binary,Chemically Similar,Symmetric Diblock Copolymer Blend Films

Summary: Binary symmetric diblock copolymer blends, that is, low‐molecular‐weight poly(styrene‐block‐methyl methacrylate) (PS‐b‐PMMA) and high‐molecular‐weight poly(styrene‐block‐methacrylate) (PS‐b‐PMA), self‐assemble on silicon substrates to form structures with highly ordered nanoholes in thin films. As a result of the chemically similar structure of the PMA and the PMMA block, the PMMA chain penetrates through the large PMA block that absorbs preferentially on the polar silicon substrate. This results in the formation of nanoholes in the PS continuous matrix.

An atomic force microscopy image of the thin film obtained from the blend of low‐molecular‐weight PS‐b‐PMMA and high‐molecular‐weight PS‐b‐PMA. The regular array of nanoholes in the films surface is clearly visible.     

Water‐soluble top coats for orientation control of liquid crystal‐containing block copolymer films

An easily removable, water‐soluble top coat of polyvinylpyrrolidone (PVP) is used to control the orientation of microdomains in a liquid crystalline block copolymer (LC BCP, poly(ethylene oxide)‐block‐poly(6‐(4‐methoxy‐azobenzene‐4′‐butyl) hexyl methacrylate)). The corresponding LC homopolymer is also investigated for comparison. Atomic force microscopy is used to determine the orientation of the cylindrical microdomains of the LC BCP. UV–vis spectroscopy and grazing incidence wide‐angle X‐ray scattering are used to determine the orientation of the LC mesogens in the LC homopolymer and the LC BCP films annealed both with and without a top coat. Once the LC BCP morphology is self‐assembled, the PVP top coat layer can be easily removed with water or alcohol. The facile removal of the top coat improves the processability of BCPs in technological applications, and enables direct investigation of the BCP morphology in scientific studies. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 1569–1574     

Polymer‐Coated PtCo Nanoparticles Deposited on Diblock Copolymer Templates: Chemical Selectivity versus Topographical Effects

Metal–polymer hybrid films are prepared by deposition of polymer‐coated PtCo nanoparticles onto block copolymer templates. For templating, a thin film of the lamella‐forming diblock copolymer poly(styrene‐b‐methyl methacrylate) P(S‐b‐MMA) is chemically etched and a topographical surface relief with 3 nm height difference is created. Two types of polymer‐grafted PtCo nanoparticles are compared to explore the impact of chemical selectivity versus the topographical effect of the nanotemplate. A preferable wetting of the polystyrene (PS) domains with poly(styrenesulfonate) (PSS)‐coated PtCo nanoparticles (instead of residing in the space between the domains) is observed. Our investigation reveals that the interaction between PSS‐coated nanoparticles and PS domains dominates over the topographical effects of the polymer surface. In contrast, a non‐selective deposition of poly(N‐vinyl‐2‐pyrrolidone) (PVP)‐coated PtCo nanoparticles and the formation of large metal‐particle aggregates on the film is observed.     

Catenated PS–PMMA Block Copolymers via Supramolecularly Templated ATRP Initiator Approach

A novel route to synthesize catenated macrocyclic PS–PMMA block copolymers is demonstrated via combination of supramolecular chemistry and controlled radical polymerization (CRP). Polymerization of styrene with bromopropionate ester initiator coupled with phenanthroline Cu(I) complex affords a four arm PS macroinitiator, which upon further chain extension by polymerization of MMA generates a four arm PS–PMMA block copolymer. Intramolecular coupling of PS–PMMA–Br arms via low temperature styrene‐assisted atom transfer radical coupling (ATRC) leads to the formation of PS–PMMA catenand, which generates the metal‐free catenated macrocyclic PS–PMMA block copolymer after removal of Cu metal. The interlocked structures of catenated block copolymers are confirmed by GPC, NMR, and AFM image analysis.     

The influence of nanoparticle fillers on the morphology of a spin-cast thin film polymer blend

Polymer/nanoparticle composite films are receiving growing attention thanks to their potential for application in ultra-thin electronic and optical devices. Polymer blend demixing has been shown to be a suitable technique for the structuring of polymer thin films and the patterning of nanoparticles (NP) within them. In this work we show that the morphology of thin polymer films made by spin-casting a polymer blend solution containing NP fillers on a surface depends strongly on the concentration of NP fillers. More specifically, polystyrene/polymethylmethacrylate (PS/PMMA) films formed from a toluene solution, and which demix following a nucleation and growth mechanism, were studied. It was found that both the height and the surface density of PMMA domains increased as the concentration of CoPt:Cu NPs in the film was increased. We find that similar effects are induced in a NP-free PS/PMMA demixed film upon increasing the molecular weight of the PS molecules. This suggests that under certain conditions the NPs and the polymer molecules in the blend do not behave as separate species but form aggregates.     

Synthesis and phase‐separation behavior of α,ω‐difunctionalized diblock copolymers

A series of diblock copolymers of n‐pentyl methacrylate and methyl methacrylate (PPMA/PMMA BCP) with one or two terminal functional groups was prepared by sequential anionic polymerization of PMA and MMA using an allyl‐functionalized initiator and/or and end‐capping with allyl bromide. Allyl functional groups were successfully converted into OH groups by hydroboration. The morphology in bulk was examined by temperature‐dependent small‐angle X‐ray measurements (T‐SAXS) and transmission electron microscopy (TEM) showing that functional groups induced a weak change in d‐spacings L₀ as well as in the thermal expansion behavior. T‐SAXS proved that the lamellar morphologies were stable over multiple heating/cooling cycles without order‐disorder transition (ODT) until 300 °C. While non‐functionalized BCP formed parallel lamellae morphologies, additional OH‐termination at the PMMA block forced in very thin films (ratio between film thickness and lamellar d‐spacing below 1) the generation of perpendicular lamellae morphology through the whole film thickness, as shown by Grazing‐incidence small‐angle X‐ray scattering experiments (GISAXS) measurements. Functionalized BCP were successfully used in thin films as templates for silica nanoparticles in an in‐situ sol–gel process. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Enhancing the PLA crystallization rate by incorporating a polystyrene‐block‐poly(methyl methacrylate) block copolymer: Synergy of polystyrene and poly(methyl methacrylate) segments

A polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) exhibiting a well‐defined structure was prepared combining anionic polymerization and mercaptan/ε‐caprolactam living polymerization. To evaluate how this block copolymer affected the crystallization of polylactide (PLA), 0.5 wt % thiol‐terminated PS homopolymer (PSSH), PMMA, and PS‐b‐PMMA was melt‐blended with PLA. The calorimetric characterization of the nonisothermal and isothermal crystallization behavior was analyzed according to Avrami's theory, indicating that PS‐b‐PMMA more effectively increased the crystallization kinetics of the PLA matrix than did PSSH or PMMA. The results revealed that the synergistic effect of the PS and PMMA blocks appeared only when they were simultaneously presented in the PLA matrix. The PS block increased the number of nucleation sites and decreased the spherulite size, whereas the PMMA block facilitated the excellent dispersion of PS‐b‐PMMA in the PLA matrix as shown in polarizing optical microscope experiments. Incorporating PS‐b‐PMMA improved the PLA crystallization rate by promoting heterogeneous nucleation. In addition, incorporating 0.5 wt % PS‐b‐PMMA increased the relative crystallinity of PLA to 43.5%, and decreased the crystallization half‐time to 2.4 min when the blend was isothermal at 105 °C. The PLA crystal structure was unchanged by the presence of PS‐b‐PMMA; however, the crystallization rate was enhanced as probed by SEM and X‐ray diffraction. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2014 , 52, 823–832     

Evolution in surface morphology during rapid microwave annealing of PS‐b‐PMMA thin films

Microwave annealing enables rapid (60 s) ordering and orientation of block copolymer films. The developed morphology in polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) thin films depends on details of the heating rate that is controlled by microwave output energy as well as the sample location in the microwave. Over a wide heating rate (1.1–2.7 °C/s), perpendicular orientation of the cylindrical mesostructure at the surface is >50% after 60 s, but goes through a maximum at 1.8 °C/s leading to approximately 97% perpendicular cylinders at the surface. The propagation of this perpendicular surface morphology through the film thickness is also dependent upon the microwave annealing conditions. The surface structure evolves with the microwave annealing time from imperfect ordering to perpendicular cylinders to parallel cylinders as the annealing time increases. This work demonstrates the importance of controlling the heating rate during microwave annealing, which will be critical for optimizing microwave conditions for directed self‐assembly. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1499–1506     

In situ synthesis of ABA triblock copolymer nanoparticles by seeded RAFT polymerization: Effect of the chain length of the third a block on the triblock copolymer morphology

Synthesis of the ABA triblock copolymer nanoparticles of poly(N,N‐dimethylacrylamide)‐block‐polystyrene‐block‐poly(N,N‐dimethylacrylamide) (PDMA‐b‐PS‐b‐PDMA) by seeded RAFT polymerization is performed, and the effect of the introduced third poly(N,N‐dimethylacrylamide) (PDMA) block on the size and morphology of the PDMA‐b‐PS‐b‐PDMA triblock copolymer nanoparticles is investigated. This seeded RAFT polymerization affords the in situ synthesis of the PDMA‐b‐PS‐b‐PDMA core‐corona nanoparticles, in which the middle solvophobic PS block forms the compacted core, and the first solvophilic PDMA block and the introduced third PDMA block form the solvated complex corona. During the seeded RAFT polymerization, the introduced third PDMA block extends, and the molecular weight of the PDMA‐b‐PS‐b‐PDMA triblock copolymer linearly increases with the monomer conversion. It is found that, the size of the PS core in the PDMA‐b‐PS‐b‐PDMA triblock copolymer core‐corona nanoparticles is almost equal to that in the precursor of the poly(N,N‐dimethylacrylamide)‐block‐polystyrene diblock copolymer core‐corona nanoparticles and it keeps constant during the seeded RAFT polymerization, and whereas the introduction of the third PDMA block leads to a crowded complex corona on the PS core. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 1777–1784     

Synthesis of H‐shaped complex macromolecular structures by combination of atom transfer radical polymerization,photoinduced radical coupling,ring‐opening polymerization,and iniferter processes

Three controlled/living polymerization processes, namely atom transfer radical polymerization (ATRP), ring‐opening polymerization (ROP) and iniferter polymerization, and photoinduced radical coupling reaction were combined for the preparation of ABCBD‐type H‐shaped complex copolymer. First, α‐benzophenone functional polystyrene (BP‐PS) and poly(methyl methacrylate) (BP‐PMMA) were prepared independently by ATRP. The resulting polymers were irradiated to form ketyl radicals by hydrogen abstraction of the excited benzophenone moieties present at each chain end. Coupling of these radicals resulted in the formation of polystyrene‐b‐poly(methyl methacrylate) (PS‐b‐PMMA) with benzpinacole structure at the junction point possessing both hydroxyl and iniferter functionalities. ROP of ε‐caprolactone (CL) by using PS‐b‐PMMA as bifunctional initiator, in the presence of stannous octoate yielded the corresponding tetrablock copolymer, PCL‐PS‐PMMA‐PCL. Finally, the polymerization of tert‐butyl acrylate (tBA) via iniferter process gave the targeted H‐shaped block copolymer. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013 , 51, 4601–4607     

Ordering poly(trimethylsilyl styrene‐block‐D,L‐lactide) block copolymers in thin films by solvent annealing using a mixture of domain‐selective solvents

Controlling the morphology, domain orientation, and domain size of block copolymer (BCP) thin films is desirable for many applications in nanotechnology. These properties can be tuned during solvent annealing by varying the solvent choice and degree of swelling which affect the effective miscibility and volume fraction of the BCP domains. In this work, we demonstrate with a bulk lamellae‐forming BCP, poly(4‐trimethylsilylstyrene‐block‐D ,L ‐lactide) (PTMSS‐b‐PLA), that varying the composition of a mixture of solvent vapors containing cyclohexane (PTMSS‐selective) and acetone (PLA‐selective), enables formation of perpendicularly oriented lamellae with sub‐20‐nm pitch lines. The BCP domain periodicity was also observed to increase by 30%, compared to bulk, following solvent annealing. Furthermore, solvent annealing alone is shown to induce a transition from a disordered to an ordered BCP. We rationalize our observations by hypothesizing that the use of a combination of domain selective solvent mixtures serves to increase the effective repulsion between the blocks of the copolymer. We furnish results from self‐consistent field theory calculations to support the proposed mechanism. © 2013 Wiley Periodicals, Inc. J. Polym. Sci. Part B: Polym. Phys. 2014 , 52, 36–45