Interaction of Sb ions with Eu ions during the room temperature synthesis of luminescent Sb2O3 nanorods: Probed through Eu luminescence

The interaction of Eu³⁺ with Sb³⁺ ions during the room temperature synthesis of luminescent Sb₂O₃ nanorods is investigated using luminescence and vibrational spectroscopic techniques. Our results demonstrate that well crystalline, oriented Sb₂O₃ nanorods having length of around 3-4 μm, a width of around 100-200 nm and luminescence at around 390 nm can be synthesized at room temperature. Incorporation of Eu³⁺ in these nanorods has been attempted and it is found that Eu³⁺ ions do not have any interaction with nanorods and their orientation. Detailed Eu³⁺ luminescence and XRD studies confirmed that a part of Sb³⁺ ions reacts with Eu³⁺ ions in the presence of hydroxyl ions (present in the medium) to form an amorphous antimony europium hydroxide compound. The amorphous compound on heating at high temperatures leads to its decomposition, giving hydrated Sb(V) oxides and Eu₂O₃ as major phases.     

In situ X-ray photoelectron spectroscopy characterization of Al2O3/GaSb interface evolution

GaSb(0 0 1) was treated with (NH₄)₂S_x and the evolution of the interfacial chemistry was investigated, in situ, with monochromatic X-ray photoelectron spectroscopy (XPS), following heat treatment and exposure to trimethylaluminum (TMA) and deionized water (DIW) in an atomic layer deposition reactor. Elemental Sb (Sb-Sb bonding) as well as Sb³⁺ and Sb⁵⁺ chemical states were initially observed at the native oxide/GaSb interface, yet these diminished below the XPS detection limit after heating to 300 °C. No evidence of Ga-Ga bonding was observed whereas the Ga¹⁺/Ga-S chemical state was robust and persisted after heat treatment and exposure to TMA/DIW at 300 °C.     

Effective method for preparation of oxide-free Ge2Sb2Te5 surface: An X-ray photoelectron spectroscopy study

Cleaning the surfaces of the as-deposited Ge₂Sb₂Te₅ was studied by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and X-ray diffraction (XRD). The mixed native oxides on the as-deposited Ge₂Sb₂Te₅ surface can be easily removed by dipping Ge₂Sb₂Te₅ in de-ionized water for 1 min, while the surface morphology remains unchanged after cleaning. Native oxides only re-grow after exposure to air for more than 4 min. Although dipping in water leads to a surface layer deficient in Ge and Sb, the surface composition of Ge₂Sb₂Te₅ can recover to its stoichiometric value after annealing at 200 °C in vacuum. The phase remains amorphous at room temperature after dipping in water, and changes to fcc and hcp after annealing at 100 and 220 °C, respectively.     

Influence of postdeposition annealing on structural properties and electrical characteristics of thin Tm2O3 and Tm2Ti2O7 dielectrics

We describe the structural properties and electrical characteristics of thin thulium oxide (Tm₂O₃) and thulium titanium oxide (Tm₂Ti₂O₇) as gate dielectrics deposited on silicon substrates through reactive sputtering. The structural and morphological features of these films were explored by X-ray diffraction, X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and atomic force microscopy, measurements. It is found that the Tm₂Ti₂O₇ film annealed at 800 °C exhibited a thinner capacitance equivalent thickness of 19.8 Å, a lower interface trap density of 8.37 × 10¹¹ eV⁻¹ cm⁻², and a smaller hysteresis voltage of ∼4 mV than the other conditions. We attribute this behavior to the Ti incorporated into the Tm₂O₃ film improving the interfacial layer and the surface roughness. This film also shows negligible degrees of charge trapping at high electric field stress.     

Investigations on the thermo-chemical stability and electrical conductivity of K-doped Ba3 − xKxCaNb2O9 − δ (x = 0.5, 0.75, 1, 1.25)

In this paper, we report the synthesis, crystal structure and electrical transport properties of new K-doped Ba₃CaNb₂O₉ (BCN) and investigate their chemical stability in H₂O and pure CO₂ at elevated temperature. The powder X-ray diffraction (PXRD) of Ba_2.5K_0.5CaNb₂O_9 − δ, Ba_2.25K_0.75CaNb₂O_9 − δ, Ba₂KCaNb₂O_9 − δ, and Ba_1.75K_1.25CaNb₂O_9 − δ showed the formation of a single-phase double perovskite (A₃BB^/₂O₉)-like cell with a lattice constant of a ∼ 2a_p (where a_p is a simple perovskite cell of ∼ 4 Å). Perovskite-like structure was found to be retained after treating with CO₂ at 700 °C and also after boiling H₂O for 120 h. The lattice constant of CO₂ and H₂O treated samples was found to be comparable to that of the corresponding as-prepared compound. The total electrical conductivity of all the investigated K-doped BCN increases with increasing K content in BCN in various atmospheres, including air, dry H₂, wet N₂ and wet H₂. The electrical conductivity in dry and wet H₂ atmospheres was found to be higher than that of air in the temperature range of 300-700 °C, while in wet N₂ a slightly lower value was observed. Among the compounds investigated in the present study Ba_1.75K_1.25CaNb₂O_9 − δ showed the highest total electrical conductivity of 1 × 10^− 3 S/cm in dry H₂ at 700 °C with an activation energy of 1.28 eV in the temperature range of 300-700 °C.     

Effect of Li2O and CoO-doping of CuO/Fe2O3 system on its surface and catalytic properties

Physicochemical, surface and catalytic properties of pure and doped CuO/Fe₂O₃ system were investigated using X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX), nitrogen adsorption at −196 °C and CO-oxidation by O₂ at 80-220 °C using a static method. The dopants were Li₂O (2.5 mol%) and CoO (2.5 and 5 mol%). The results revealed that the increase in precalcination temperature from 400 to 600 °C and Li₂O-doping of CuO/Fe₂O₃ system enhanced CuFe₂O₄ formation. However, heating both pure and doped solids at 600 °C did not lead to complete conversion of reacting oxides into CuFe₂O₄. The promotion effect of Li₂O dopant was attributed to dissolution of some of dopant ions in the lattices of CuO and Fe₂O₃ with subsequent increase in the mobility of reacting cations. CoO-doping led also to the formation of mixed ferrite Co_xCu_1−xFe₂O₄. The doping process of the system investigated decreased to a large extent the crystallite size of unreacted portion of Fe₂O₃ in mixed solids calcined at 600 °C. This process led to a significant increase in the S_BET of the treated solids. Doping CuO/Fe₂O₃ system with either Li₂O or CoO, followed by calcination at 400 and 600 °C decreased its catalytic activity in CO-oxidation by O₂. However, the activation energy of the catalyzed reaction was not much affected by doping.     

Al Kα and Cu Kα1 excited XPS of vanadium oxide and VF3 powders: Measurement of the V 1s – KLL Auger parameters

Al Kα (hν = 1486.6 eV) excited XPS shows that powder samples of V₂O₃, V₂O₅ and VF₃ are surface contaminated and that the V₂O₃ can be cleaned by heating in vacuum at 400 °C. The greater sampling depth of Cu Kα₁ (hν = 8047.8 eV) excited XPS allows measurement of the bulk V 1s – KL₂L₃ Auger parameters (APs) for these materials. The APs of VF₃ and V₂O₅, relative to V metal, fall into the range of values expected for metal fluorides and oxides with non-local final state core-hole screening, whereas the AP of V₂O₃ is significantly closer to that of V metal. We ascribe this to a greater final state valence orbital occupation following photionisation in V₂O₃, part of which results from metal-like screening.     

Characterization of Y2O3 gate dielectric on n-GaAs substrates

Physical and electrical properties of sputtered deposited Y₂O₃ films on NH₄OH treated n-GaAs substrate are investigated. The as-deposited films and interfacial layer formation have been analyzed by using X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS). It is found that directly deposited Y₂O₃ on n-GaAs exhibits excellent electrical properties with low frequency dispersion (<5%), hysteresis voltage (0.24 V), and interface trap density (3 × 10¹² eV⁻¹ cm⁻²). The results show that the deposition of Y₂O₃ on n-GaAs can be an effective way to improve the interface quality by the suppression on native oxides formation, especially arsenic oxide which causes Fermi level pinning at high-k/GaAs interface. The Al/Y₂O₃/n-GaAs stack with an equivalent oxide thickness (EOT) of 2.1 nm shows a leakage current density of 3.6 × 10⁻⁶ A cm⁻² at a V_FB of 1 V. While the low-field leakage current conduction mechanism has been found to be dominated by the Schottky emission, Poole-Frenkel emission takes over at high electric fields. The energy band alignment of Y₂O₃ films on n-GaAs substrate is extracted from detailed XPS measurements. The valence and conduction band offsets at Y₂O₃/n-GaAs interfaces are found to be 2.14 and 2.21 eV, respectively.     

Influence of the substrate material on the properties of pulsed laser deposited thin Li1+xMn2O4−δ films

Thin Li_1+xMn₂O_4−δ films were deposited on several substrate materials (stainless steel, p-doped silicon and glassy carbon) by pulsed laser deposition. To obtain the correct thin film stoichiometries, targets with a different amount of excess lithium were required (Li_1.03Mn₂O₄ + xLi₂O; x = 2.5 and 7.5 mol%). The resulting polycrystalline thin films were characterized with respect to their morphology and electrochemical activity. It was found that only thin Li_1+xMn₂O_4−δ films deposited on stainless steel and glassy carbon showed the typical insertion and deinsertion peaks of Li⁺ during cycling.     

Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium

The impact of the ZrO₂/La₂O₃ film thickness ratio and the post deposition annealing in the temperature range between 400 °C and 600 °C on the electrical properties of ultrathin ZrO₂/La₂O₃ high-k dielectrics grown by atomic layer deposition on (1 0 0) germanium is investigated. As-deposited stacks have a relative dielectric constant of 24 which is increased to a value of 35 after annealing at 500 °C due to the stabilization of tetragonal/cubic ZrO₂ phases. This effect depends on the absolute thickness of ZrO₂ within the dielectric stack and is limited due to possible interfacial reactions at the oxide/Ge interface. We show that adequate processing leads to very high-k dielectrics with EOT values below 1 nm, leakage current densities in the range of 0.01 A/cm², and interface trap densities in the range of 2-5 × 10¹² eV⁻¹ cm⁻².     

Atomic force microscopy study of surface morphology change in spinel LiMn2O4: Possibility of direct observation of Jahn-Teller instability

Surface morphology in 3.5 × 3.5 μm² area of spinel LiMn₂O₄, which is a typical cathode material for Li ion secondary batteries, is studied using an atomic force microscopy (AFM) with a conductive probe. Negative bias voltage is applied to the probe to attract Li⁺ ions toward LiMn₂O₄ surface during the AFM observation. Before applying the voltage (0 V), the whole LiMn₂O₄ surface is covered with scale-shaped grains. Under the negative voltage of 5.5 V, electric current abruptly increases, indicating Li⁺ ionic conduction. Simultaneously, part of the scale-shaped grains expand and flatten. Jahn-Teller phase transition, which is induced by the repulsive interaction between the Mn-e_g and O-2p electrons in Li accumulated layer, is proposed as a possible origin of these results.     

First-principle study of electronic structure and stability of Sn0.5Sb0.5O2

A theoretical study on Sb-doped SnO₂ has been carried out by means of periodic density functional theory (DFT) at generalized gradient approximation (GGA) level. Stability and conductivity analyses were performed based on the formation energy and electronic structures. The results show that Sn_0.5Sb_0.5O₂ solid solution is stable because the formation energy of Sn_0.5Sb_0.5O₂ is −0.06 eV. The calculated energy band structure and density of states showed that the band gap of SnO₂ narrowed due to the presence of the Sb impurity energy levels in the bottom of the conduction band, namely there is Sb 5s distribution of electronic states from the Fermi level to the bottom of conduction band after the doping of antimony. The studies provide a theoretical basis to the development and application of Sn_1−xSb_xO₂ solid solution electrode.     

A structural analysis of W-Sb mixed oxide catalyst

An investigation on the structure of W-Sb mixed oxide catalyst, W₁₂Sb_xO_y (x = 1, 3, 5), is proposed. The W-Sb mixed oxide powders were prepared by the calcination of aqueous precursors, antimony tartrate and ammoniummetatungstate, and characterized with scanning electron microscope, X-ray diffractometer, and transmission electron microscope. At low content of Sb (x = 1), the W-Sb mixed oxide powder consisted of polyhedral particles, and their crystal structure was triclinic WO₃. At higher content (x = 3, 5), majority of the oxide powders were bar-shaped particles, consisting of triclinic WO₃ and tetragonal WO₃. With electron diffraction pattern and simulation, Sb incorporation into the cuboctahedral sites of perovskite-like WO₃ was proved and its effect on the phase transition from triclinic to tetragonal was discussed.     

Electronic band structure and Fermi surface of new low-temperature Ni-based superconductors: 3.3 K (Ni2P2)(Sr4Sc2O6) and 2.7 K (Ni2As2)(Sr4Sc2O6) from first principles

Based on first-principle FLAPW-GGA calculations, we have investigated structural and electronic properties of the recently synthesized tetragonal (space group P4/nmm) nickel-based pnictide oxide superconductors: 3.3 K (Ni₂P₂)(Sr₄Sc₂O₆) and 2.7 K (Ni₂As₂)(Sr₄Sc₂O₆). Optimized structural data, electronic bands, total and partial densities of states, and Fermi surface topology have been obtained and discussed in comparison with available experiments and with their Fe-based (Fe₂P₂)(Sr₄Sc₂O₆) and (Fe₂As₂)(Sr₄Sc₂O₆) analogs.     

Rare-earth gate oxides for GaAs MOSFET application

Rare-earth oxide films for gate dielectric on n-GaAs have been investigated. The oxide films were e-beam evaporated on S-passivated GaAs, considering interfacial chemical bonding state and energy band structure. Rare-earth oxides such as Gd₂O₃, (Gd_xLa_1−x)₂O₃, and Gd-silicate were employed due to high resistivity and no chemical reaction with GaAs. Structural and bonding properties were characterized by X-ray photoemission, absorption, and diffraction. The electrical characteristics of metal-oxide-semiconductor (MOS) diodes were correlated with material properties and energy band structures to guarantee the feasibility for MOS field effect transistor (FET) application.Gd₂O₃ films were grown epitaxially on S-passivated GaAs (0 0 1) at 400 °C. The passivation induced a lowering of crystallization temperature with an epitaxial relationship of Gd₂O₃ (4 4 0) and GaAs (0 0 1). A better lattice matching relation between Gd₂O₃ and GaAs substrate was accomplished by the substitution of Gd with La, which has larger ionic radius. The in-plane relationship of (Gd_xLa_1−x)₂O₃ (4 4 0) with GaAs (0 0 1) was found and the epitaxial films showed an improved crystalline quality. Amorphous Gd-silicate film was synthesized by the incorporation of SiO₂ into Gd₂O₃. These amorphous Gd-silicate films excluded defect traps or current flow path due to grain boundaries and showed a relatively larger energy band gap dependent on the contents of SiO₂. Energy band parameters such as ΔE_C, ΔE_V, and E_g were effectively controlled by the film composition.     

Promotion of surface SOx on the selective catalytic reduction of NO by hydrocarbons over Ag/Al2O3

The promotion of sulfur oxides on the selective catalytic reduction (SCR) of NO by hydrocarbons in the presence of a low concentration of sulfur oxides over Ag/Al₂O₃ has been investigated by a flow reaction test and in situ infrared spectroscopy. When the C₃H₆ (or C₁₀H₂₂) + NO + O₂ feed-flow reaction was tested, maximum NO reduction was below 30% over fresh Ag/Al₂O₃. After the addition of SO₂ to the feed flow, conversion increased slightly. Conversion increased further after SO₂ was cut-off from the feed flow. This demonstrated that the increase in NO reduction activity of the catalyst was related to SO_x adsorbed on the catalyst. SO_x adsorbed on the catalytic surface (1375 cm⁻¹) was detected by IR spectroscopy and was stable within the temperature range. NCO species, as an intermediate in NO reduction, on SO_x-adsorbed Ag/Al₂O₃ in a C₃H₆ + NO + O₂ feed flow was observed in in situ IR spectra during the elevation of the reaction temperature from 473 to 673 K, while it was only observed at 673 K on fresh Ag/Al₂O₃ under the same experimental conditions. We suggest that SO_x in low concentrations depressed the combustion of reductants by contaminating hydrocarbon combustion active sites on the catalyst, resulting in an increase in NO reduction efficiency of the reductants.     

The effect of different gas atmospheres on luminescent properties of pulsed laser ablated SrAl2O4:Eu,Dy thinfilms

SrAl₂O₄:Eu²⁺,Dy³⁺ thin films were grown on Si (1 0 0) substrates using the pulsed laser deposition (PLD) technique to investigate the effect of vacuum, oxygen (O₂) and argon (Ar) deposition atmospheres on the structural, morphological, photoluminescence (PL) and cathodoluminescence (CL) properties of the films. The films were ablated using a 248 nm KrF excimer laser. Atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS) and fluorescence spectrophotometry were used to characterize the thin films. Auger electron spectroscopy (AES) combined with CL spectroscopy were employed for the surface characterization and electron-beam induced degradation of the films. Better PL intensities were obtained from the unannealed films prepared in Ar and O₂ atmospheres with respect to those prepared in vacuum. A stable green emission peak at 515 nm, attributed to 4f⁶5d¹→4f⁷ Eu²⁺ transitions were obtained with less intense peaks at 619 nm, which were attributed to transitions in Eu³⁺. After annealing the films prepared in vacuum at 800 °C for 2 h, the intensity of the green emission (520 nm) of the thin film increased considerably. The amorphous thin film was crystalline after the annealing process. The CL intensity increased under prolonged electron bombardment during the removal of C due to electron stimulated surface chemical reactions (ESSCRs) on the surface of the SrAl₂O₄:Eu²⁺, Dy³⁺ thin films. The CL stabilized and stayed constant thereafter.     

Epitaxial MoOx nanostructures on TiO2(1 1 0) obtained using thermal decomposition of Mo(CO)6

Stoichiometric and highly-defective TiO₂(1 1 0) surfaces (called as yellow and blue, respectively) were exposed to Mo(CO)₆ vapours in UHV and in a reactive O₂ atmosphere. In the case of yellow-TiO₂, an O₂ reactive atmosphere was necessary to obtain the Mo(CO)₆ decomposition at 450 °C with deposition of MoO_x nanostructures where, according to core level photoemission data, the Mo⁺⁴ state is predominant. In the case of blue-TiO₂ it was possible to obtain Mo deposition both in UHV and in an O₂ atmosphere. A high dose of Mo(CO)₆ in UHV on blue-TiO₂ allowed the deposition of a thick metallic Mo layer. An air treatment of this sample at 580 °C led to the elimination of Mo as MoO₃ and to the formation of a transformed layer of stoichiometry of Ti_(1−x)Mo_xO₂ (where x is close to 0.1) which, according to photoelectron diffraction data, can be described as a substitutional near-surface alloy, where Mo⁺⁴ ions are embedded into the titania lattice. This embedding procedure results in a stabilization of the Mo⁺⁴ ions, which are capable to survive to air exposure for a rather long period of time. After exposure of the blue-TiO₂(1 1 0) substrate to Mo(CO)₆ vapours at 450 °C in an O₂ atmosphere it was possible to obtain a MoO₂ epitaxial ultrathin layer, whose photoelectron diffraction data demonstrate that is pseudomorphic to the substrate.     

Studies of the electrochemical reduction processes of Bi, HTeO2 and their mixtures

The reduction process of Bi³⁺, HTeO₂⁺ and their mixtures on Au electrode surface was studied by cyclic voltammetry, linear sweep voltammetry, electrochemical impedance spectroscopy and chronoamperometry. XRD and EDS methods were also used to measure the reductive products prepared under different potentials and provide the evidences of the reactions. The results indicate that the reduction of HTeO₂⁺ occurs at more positive potential than that of Bi³⁺, but its reduction rate is slower and adsorption phenomenon exists during its reduction process. Bi₂Te₃ compound can be obtained potentiostatically at a proper potential in all the mixed solutions with concentration ratio CHTe+O₂/CBi3+ in our research range (0.1-10). But pure Bi₂Te₃ compound can only be obtained at 42 mV in the solution with concentration ratio CHTe+O₂/CBi3+ equaling to 1. And the formation of Bi₂Te₃ compound is an inductive co-depositing process: (1) HTeO₂⁺ + 4e⁻ + 3H⁺ → Te⁰ + 2H₂O, (2) 3Te⁰ + 2Bi³⁺ + 6e⁻ → Bi₂Te₃.     

Thermal stability, oxygen non-stoichiometry and transport properties of LaNi0.6Fe0.4O3

Thermal stability, oxygen non-stoichiometry and electrical conductivity of LaNi_0.6Fe_0.4O_3−δ were investigated in the temperature region of 20-1000 °C in Ar/O₂ gas flows at oxygen partial pressures between 0.5 and 21,000 Pa. Diffusion mobility was measured in Ar/O₂ gas flow at pO₂ = 18 Pa. Crystal structure of this compound was found to be stable at the mentioned experimental conditions. LaNi_0.6Fe_0.4O_3−δ is a p-type semiconductor with metallic type conductivity above 150 °C at the investigated pO₂ range. Two different (fast and slow) oxygen exchange areas on the temperature-pO₂ diagram were established, which are due to two different oxygen anion positions in the double B-site mixed perovskite structure. Oxygen non-stoichiometry in the fast oxygen exchange region reaches about 0.005 of oxygen atomic index. Chemical diffusion and oxygen surface exchange coefficients do not vary at 600-800 °C, but show visible increase above 800-850 °C.