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1.
Amorphous hydrogenated carbon (a-C:H) thin films deposited on a silicon substrate under various mixtures of methane-hydrogen gas by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) was investigated. Microstructure, surface morphology and mechanical characterizations of the a-C:H films were analyzed using Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation technique, respectively. The results indicated there was an increase of the hydrogen content, the ratio of the D-peak to the G-peak (ID/IG) increased but the surface roughness of the films was reduced. Both hardness and Young's modulus increased as the hydrogen content was increased. In addition, the contact stress-strain analysis is reported. The results confirmed that the mechanical properties of the amorphous hydrogenated carbon thin films improved using a higher H2 content in the source gas.  相似文献   

2.
In this study, the effects of post-annealing on the structure, surface morphology and nanomechanical properties of ZnO thin films doped with a nominal concentration of 3 at.% Ga (ZnO:Ga) are investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) and nanoindentation techniques. The ZnO:Ga thin films were deposited on the glass substrates at room temperature by radio frequency magnetron sputtering. Results revealed that the as-deposited ZnO:Ga thin films were polycrystalline albeit the low deposition temperature. Post-annealing carried out at 300, 400 and 500 °C, respectively, has resulted in progressive increase in both the average grain size and the surface roughness of the ZnO:Ga thin film, in addition to the improved thin films crystallinity. Moreover, the hardness and Young's modulus of ZnO:Ga thin films are measured by a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM) option. The hardness and Young's modulus of ZnO:Ga thin films increased as the annealing temperature increased from 300 to 500 °C, with the best results being obtained at 500 °C.  相似文献   

3.
ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.  相似文献   

4.
CaxCo4Sb12 skutterudite thin films have been prepared by pulsed laser deposition using a Nd:YAG laser working at 532 or 266 nm of wavelength. Characterization has been carried out by X-ray diffraction, atomic force microscopy and scanning electron microscopy. Emphasis has been put on the difficulty to obtain the skutterudite phase. Influence of the deposition temperature, the way of sticking the substrate, the laser fluence, the base pressure prior to deposition and the laser wavelength has been studied. All parameters revealed to have a drastic effect, and the skutterudite could only be achieved in a very narrow range of temperature and laser fluence, for a given wavelength, showing the importance on how these parameters are measured to ensure reproducible results.  相似文献   

5.
The nanoindentation characterizations and mechanical properties of fluorine-doped tin oxide (SnO2:F) films deposited on glass substrates, using chemical vapor deposition (CVD) method, were studied, which included the effects of the indentation loads, the loading time and the hold time on the thin film. The surface roughness, fractal dimension and frictional coefficient were also studied by varying the freon flow rates. X-ray diffraction (XRD), atomic force microscopy (AFM) and frictional force microscopy (FFM) were used to analyze the morphology of the microstructure. The results showed that crystalline structure of the film had a high intensity (1 1 0) peak orientation, especially at a low freon flow rate. According to the nanoindentation records, the Young's modulus ranged from 62.4 to 75.1 GPa and the hardness ranged from 5.1 to 9.9 GPa at a freon flow rate of 8000 sccm. The changes in measured properties were due to changing loading rate.  相似文献   

6.
Amorphous silicon carbide (SiC) thin films were deposited on silicon substrates by pulsed laser ablation at room temperature. Thicknesses and surface morphology of the thin films were characterized using optical profilers, atomic force and field emission scanning electron microscopy. Nanohardnes, modulus and scratch resistance properties were determined using XP nanoindenter. The results show that crack free, smooth and nanostructured thin films can be deposited using low laser energy densities.  相似文献   

7.
GaN基量子阱是光电子器件如发光二极管、激光二极管的核心结构。实验表明,采用InGaN/GaN三元和AlInGaN/GaN四元两种不同量子阱结构的激光二极管的发光性质和发光效率有明显差别,研究了这两种不同量子阱结构的显微特征。利用原子力显微镜表征了样品的(001)面;通过高分辨X射线衍射对两种量子阱结构的(002)面作ω/2θ扫描测得其卫星峰并分析了两种不同量子阱结构的界面质量;利用X射线衍射对InGaN/GaN和AlInGaN/GaN这两种量子阱的(002)、(101)、(102)、(103)、(104)、(105)和(201)面做ω扫描,进而得到其摇摆曲线。最后利用PL谱研究了它们的光学性能。通过这些显微结构的分析和研究,揭示了InGaN/GaN三元和AlInGaN/GaN四元两种不同量子阱结构宏观性质不同的结构因素。  相似文献   

8.
Surface preparation procedures for indium gallium nitride (InGaN) thin films were analyzed for their effectiveness for carbon and oxide removal as well as for the resulting surface roughness. Aqua regia (3:1 mixture of concentrated hydrochloric acid and concentrated nitric acid, AR), hydrofluoric acid (HF), hydrochloric acid (HCl), piranha solution (1:1 mixture of sulfuric acid and 30% H2O2) and 1:9 ammonium sulfide:tert-butanol were all used along with high temperature anneals to remove surface contamination. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were utilized to study the extent of surface contamination and surface roughness, respectively. The ammonium sulfide treatment provided the best overall removal of oxygen and carbon. Annealing over 700 °C after a treatment showed an even further improvement in surface contamination removal. The piranha treatment resulted in the lowest residual carbon, while the ammonium sulfide treatment leads to the lowest residual oxygen. AFM data showed that all the treatments decreased the surface roughness (with respect to as-grown specimens) with HCl, HF, (NH4)2S and RCA procedures giving the best RMS values (∼0.5-0.8 nm).  相似文献   

9.
Thin films of ferrites of the type MIIFe2O4 (M = Cu, Mg, Zn) are prepared by spray-pyrolysis using ethylene glycol solutions of mixed-metal citric complexes of the respective metals at substrate temperature between 350 °C and 450 °C and post-deposition annealing at 480-750 °C in air. Phase composition, crystal structure, morphology and adhesion of the obtained films (40-400 nm in thickness) are studied by X-ray diffraction, SEM, energy dispersive X-ray microanalysis and AFM. Single phase dense uniform films with grains from 30-100 nm (M = Cu, Mg) to 0.15-2 μm (M = Zn) are obtained.  相似文献   

10.
Titanium dioxide thin layers were prepared by annealing method, on glass substrate at different temperatures, 150, 250 and 350 °C, in presence of 5 cm3/s uniform oxygen flow. The structural investigations were performed by means of atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. Roughness of the films changed due to annealing process. The optical constants of the layers were obtained by Kramers–Kronig analysis of the reflectivity curves. There was a good agreement between structural and optical properties of the layers. Annealing temperature can play an important role in nanostructures of the films.  相似文献   

11.
Tungsten trioxide (WO3) thin films were prepared by thermal evaporation method onto quartz substrates at room temperature. Effect of annealing temperature (from 200 to 800 °C) to morphology, crystallographic structure and electrical properties were investigated. In order to investigate the temperature dependant resistivity properties of the films dark current–voltage measurements were done at the temperatures of 30, 60, 90, 120 and 150 °C. From the AFM pictures it is seen that the increasing annealing temperature causes an increase in grain sizes. At elevated temperatures the grains combine to each other and thus form continuous and homogenous surfaces. From the XRD patterns it was seen that the as-prepared and annealed films at 200, 300, 310 and 320 °C were amorphous. On the other hand at 330 °C and higher temperatures the films were found as in crystallized structures (monoclinic phase). From the current–voltage measurements it was seen that the contacts areohmic and the current increased with increasing temperatures. From the calculated values it was seen that the produced films shows good semiconducting nature.  相似文献   

12.
MOCVD生长的InGaN合金的发光特性   总被引:1,自引:4,他引:1  
研究了用金属有机化学气相沉积(MOCVD)法在蓝宝石基底上生长的InGaN样品的发光特性。样品XRD谱中存在InGaN、In、InN相,表明样品中存在相分离;透射谱能看到由于F-P腔调制引起的震荡;相对氙灯激发发光谱,激光激发的发光谱其发光峰位置发生蓝移。由于样品上下表面形成F-P腔,对发光谱产生强烈的调制,在较高强度激发下,在室温下带边峰分成三个峰,其中波长较短的两个发光峰表现出相同的特征,其发光机制可能为以In量子点为局域中心的局域化激子复合发光,而波长较长的发光峰,是一个超线性受激发光峰,其发光机制可能是电子-空穴等离子的散射。不同温度的PL谱表明两个主要的发光峰表现出不同的温度特征,利用F-P干涉理论分析可知,当温度高于120K后样品折射率随着温度的升高而增大。  相似文献   

13.
The Ag-In-Se thin films were deposited by e-beam evaporation of the Ag3In5Se9 single crystal powder under high vacuum without intentional doping. Energy dispersive X-ray analysis (EDXA) showed the decreasing behavior of Se and Ag in the structure depending on the annealing. X-ray diffraction (XRD) analysis showed that as-grown films have amorphous structure while annealing the films under nitrogen environment at 200 °C transformed from the amorphous to polycrystalline structure. The crystallinity of the films improved as annealing temperature increases up to 400 °C by 100 °C-step. The polycrystalline films show mixed binary and ternary crystalline phases. Each phase was determined by comparing XRD patterns with complete data cards as Ag3In5Se9, AgInSe2, In4Se3, In2Se3, InSe, Se6 and Se. The existence of Se segregation was supported by the formation of Se aggregates in crystalline phases of Se6 and Se. The X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) analysis have been carried out in order to obtain detailed information about the atomic composition, chemical states and morphology of the thin film surface. The decomposition of In 4d, Se 3d and Ag 3d photoelectron peaks revealed the existence of In-In, In-Se, In-Ag, Se-Se and Ag-Ag bondings in as-grown thin films. After annealing the thin films at different temperatures, the concentration of In-Se and In-Ag bonds decreases significantly, which results in an In-rich, but Ag- and Se-deficient thin film structure. The roughness of the film surface as a result of application of post-annealing in between 200 and 400 °C monitored by AFM technique was observed to change from 1.81 to 22.89 nm.  相似文献   

14.
The zinc selenide thin films have been deposited using modified chemical bath deposition (M-CBD) method. Zinc acetate and sodium selenosulphate were used as Zn2+ and Se2− ion sources, respectively. The preparative parameters such as concentration, pH, number of deposition cycles have been optimized in order to deposit ZnSe thin films. The as-deposited ZnSe thin films are specularly reflective and faint yellowish in color. The as-deposited ZnSe films are annealed in an air atmosphere at 473 K for 2 h. The films are characterized using structural, morphological, compositional, optical and electrical properties.  相似文献   

15.
Transparent and conducting ITO/Au/ITO multilayered films were deposited without intentional substrate heating on polycarbonate (PC) substrate using a magnetron sputtering process. The thickness of ITO, Au and ITO metal films in the multilayered structure was constant at 50, 10 and 40 nm, respectively.Although the substrate temperature was kept constant at 70 °C, ITO/Au/ITO films were polycrystalline with an (1 1 0) X-ray diffraction peak, while single ITO films were amorphous. Surface roughness analysis indicated ITO films had a higher average roughness of 1.76 nm, than the ITO/Au/ITO film roughness of 0.51 nm. The optoelectrical properties of the ITO/Au/ITO films were dependent on the Au thin film, which affected the ITO film crystallinity. ITO/Au/ITO films on PC substrates were developed with a resistivity as low as 5.6 × 10−5 Ω cm and a high optical transmittance of 71.7%.  相似文献   

16.
Uranium dioxide films were deposited on Si (1 1 1) substrates by dc magnetron sputtering method at different sputtering parameters. The structure, morphology and chemical state of the films were studied by field emission scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and atomic force microscopy. Influences of film thickness on the microstructure and optical properties were investigated. Experimental results show that the film crystallites are preferentially oriented with the (1 1 1) planes. The average grain size increases with increasing film thickness. AFM images show that the root mean square roughness of the films is between 1.2 nm and 2.1 nm. Optical constants (refractive index, extinction coefficient) of the films in the wavelength range of 350-1000 nm are obtained by ellipsometric spectroscopy. The result shows that the refractive index decreases with the increasing film thickness, while extinction coefficient increases with the film thickness.  相似文献   

17.
Effect of Si-doping on InGaN layers below the quantum wells (QWs), which cause different levels of charge concentration in the depletion region, have been investigated for InGaN light emitting diodes (LEDs). Four groups of InGaN LEDs with different levels of Si-doping on InGaN/GaN layers below quantum-wells have been produced for the experiment (i.e., 0.5 × 1017 cm?3 for group A, 1 × 1017 cm?3 for group B, 5 × 1017 cm?3 for group C, and 1 × 1018 cm?3 for group D.) The reverse leakage current of LED can be significantly decreased and the light output power of LED can be enhanced by lowering the background charge concentration in the depletion region of LED. Such result enables us to improve the device lifetime by inhibiting the degradation of the GaN-based LED.  相似文献   

18.
This paper describes the effect of doping on the composition, surface morphology and optical, structural and electrical properties of Al doped ZnO thin films by pulsed laser deposition. SEM analysis shows that the crystalline nature of the deposited films decreases with an increase of Al doping concentration from 1% to 6%. In the AFM analysis, the surface roughness of the deposited films increases by increasing the doping concentration of Al. Al doping strongly influences the optical properties of the ZnO thin films. Optical transmittance spectra show a very good transmittance in the visible region (450–700 nm). The calculated optical band gap was found to be in the range from 3.405 to 3.464 eV. Structural analysis confirms that the increases of Al concentration decrease the crystallinity of the ZnO films and the particle size decreases from 45.7±0.09 to 28.0±0.02 nm. In the Raman analysis, the active mode of Al(=1%) doped ZnO films were observed at 434.81 cm−1. The shifts of the active mode (E2)(E2) show the presence of tensile stress in the deposited films. The electrical properties of the deposited films showed that the values of the Hall mobility was in the range between 2.51 and 10.64 cm2/V s and the carrier concentration between 15.7 and 0.78×1017 and the resistivity values between 1.59 and 10.97 Ωcm, depending on the doping concentration.  相似文献   

19.
Tungsten nitride thin films were deposited on stainless steel-304 substrates by using a low energy (2 kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and microhardness are used to study the surface of treated samples. The XRD analysis shows that the degree of crystallinity of deposited thin films strongly depends on axial and angular positions of samples. The SEM micrographs of the deposited films at different angular positions (0°, 10° and 30°) and axial position of 8 cm show that the content of WN sub-micro crystalline structures on the surface of deposited films decreased with increasing the angle with respect to anode axis. From AFM results we observe that for the sample deposited at 8 cm and 0° axial and angular positions, respectively, the most uniform surface and the most homogenous distribution of grains are obtained. Also the hardness results show that the highest mechanical hardness is obtained when the film is deposited at 8 cm and 0° axial and angular positions, respectively.  相似文献   

20.
InGaN multiple quantum well laser diode (LD) wafer that lased at 400 nm was shown to have the InN mole fraction, x, of only 6% in the wells. Nanometer-probe compositional analysis showed that the fluctuation of x was as small as 1% or less, which is the resolution limit. However, the wells exhibited a Stokes-like shift (SS) of 49 meV and an effective localization depth E0 was estimated by time-resolved photoluminescence (TRPL) measurement to be 35 meV at 300 K. Since the effective electric field due to polarization in the wells is estimated to be as small as 286 kV/cm, SS is considered to originate from an effective bandgap inhomogeneity. Because the well thickness fluctuation was insufficient to produce SS or E0, the exciton localization is considered to be an intrinsic phenomenon in InGaN material. Indeed, bulk cubic In0.1Ga0.9N, which does not suffer any polarization field or thickness fluctuation effect, exhibited an SS of 140 meV at 77 K and similar TRPL results. The origin of the localization is considered to be due to the large bandgap bowing and In clustering in InGaN material. Such shallow and low density localized states are leveled by injecting high density carriers under the lasing conditions for the 400 nm LDs.  相似文献   

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