EAST反向束在不同电流平台下注入的实验分析

对EAST装置在相同束放电参数不同等离子体电流平台下开展的束反向注入实验进行了比较分析，并利用NUBEAM程序分析了不同的等离子体电流放电平台对束电流驱动、束功率沉积、束功率沉积分布及束能量损失的影响，以此来寻求优化的注入本底等离子体参数。结果表明，较高的电流平台更有利于束与等离子体的作用以及更有效提高本底等离子体温度、束驱动电流及等离子体旋转，更有效改善等离子体约束品质。     

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采用高斯光束的研究方法,结合Fokker-Planck方程,在堆级等离子体条件下模拟了发射波功率密度的改变对电子回旋波功率沉积以及电流驱动的影响。结果表明,高功率密度的波束会拓宽功率沉积剖面,使功率沉积的位置略有外移,电流驱动效率略有降低。     

发射波功率密度对电子回旋波电流驱动的影响

采用高斯光束的研究方法,结合Fokker-Planck方程,在堆级等离子体条件下模拟了发射波功率密度的改变对电子回旋波功率沉积以及电流驱动的影响。结果表明,高功率密度的波束会拓宽功率沉积剖面,使功率沉积的位置略有外移,电流驱动效率略有降低。     

EAST中性束反向注入的初步实验研究

对EAST中性束反向注入过程中等离子体加热和电流驱动进行了实验研究,并采用了美国普林斯顿大学等离子体物理实验室开发的TRANSP 程序对高功率中性束注入过程中能量热输运进行了分析。结果表明,中性束注入可有效提高本底等离子体温度,产生束驱动非感应电流,提高等离子体旋转以及有效改善等离子体约束。     

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对EAST中性束反向注入过程中等离子体加热和电流驱动进行了实验研究,并采用了美国普林斯顿大学等离子体物理实验室开发的TRANSP程序对高功率中性束注入过程中能量热输运进行了分析.结果表明,中性束注入可有效提高本底等离子体温度,产生束驱动非感应电流,提高等离子体旋转以及有效改善等离子体约束.     

填充等离子体的介质同轴波导中的切伦科夫辐射

 利用自洽线性场理论，导出了薄环形相对论电子注通过填充等离子体的介质同轴波导中的注波互作用色散方程，得到了注波互作用产生切伦科夫辐射的同步条件和波增长率。分析了填充等离子体后的波与电子注之间的能量交换及等离子体密度对色散特性、波增长率和注波能量交换的影响。分析结果表明：切伦科夫辐射是由沿介质同轴波导传播的慢波与沿薄环形相对论电子注传播的负能空间电荷波耦合所致，且其耦合强度与电子注的密度成正比；输出频率和波增长率随着填充等离子体密度的增大而提高；保持一定的输出频率，增大电子注的束流可得到高的微波输出功率。     

电子束电流对介质切伦科夫脉塞色散关系的影响

采用等离子体流体理论,从线性扰动方程出发,研究了电子束电流大小对介质切伦科夫脉塞中束波相互作用色散关系的影响,得到了当等离子体返回电流能有效中和与不能有效中和电子束电流两种情形下色散关系和波的增长率,并讨论了电子束电流对束波相互作用色散关系和波增长率的影响。研究表明,等离子体返回电流能有效中和与不能有效中和电子束电流两种情况下有着不同的色散关系和波的增长率。在波导参数和背景等离子体参数固定的情况下,电子束电流并不是越大越好,电子束电流过大不利于提高器件效率,它们之间存在最佳匹配关系。     

Monte Carlo simulation of lower hybrid current drive in tokamaks

In this paper, we present a method for noninductive current drive studies based on three-dimensional simulation of test particle orbits. A Monte Carlo momentum diffusion operator is developed to model the wave-particle interaction. The scheme can be utilized in studies of current drive efficiency as well as in examining the current density profiles caused by waves with a finite parallel wave number spectrum and a nonuniform power deposition profile in a toroidal configuration space of arbitrary shape. Calculations performed with a uniform power deposition profile of lower hybrid waves for axisymmetric magnetic configurations having different aspect ratios and poloidal cross-section shape confirm the semianalytic estimates for the current drive efficiency based on the solutions of the flux surface averaged Fokker-Planck equation for configurations with circular poloidal cross section. The consequences of the combined effect of radial diffusion, magnetic trapping and radially nonhomogeneous power deposition and background plasma parameter profiles are investigated     

Simulation on effect of poloidal power spectrum on lower hybrid wave propagation

The coupling of lower hybrid wave to the plasma is a crucial issue for efficient current drive in tokamaks. This paper establishes a new coupling model which assumes the antenna to be a curved face and the plasma to be a cylinder. Power spectrum considering the coupling between wave-guides in both poloidal and toroidal direction is simply estimated and discussed. The effect of the poloidal wave vector on wave propagation, power deposition and driven current is also investigated with the help of lower hybrid current drive code. Results show that the poloidal wave vector affects the ray tracing, and also has effect on power deposition and driven current. The effect of the poloidal wave vector on power deposition and driven current profile depends on plasma parameters. Preliminary studies suggest that it seems possible to control the current profile by adjusting the poloidal phase difference between the waveguide in poloidal direction.     

Sputtering of the magnetron diode target in the presence of an external ion beam

The effect of an external ion beam on the plasma and target of a dc magnetron sputtering system in the course of reactive deposition of films is investigated. A combined experimental setup consisting of a magnetron diode and a hall-current ion source is constructed. The influence of a fast ion beam on the discharge current formation, the target emission characteristics, and the target etching rate is considered. It is shown that the ion assistance expands the operating range of the magnetron diode, increases the deposition rate, and substantially shortens the target training time. At the same time, it practically does not affect the ionization processes in the plasma.